公开(公告)号：US5498506A

公开(公告)日：1996-03-12

申请号：US362491

申请日：1995-01-09

申请人： Horst Wengenroth ,  Horst Roeschert ,  Walter Spiess ,  Gerhard Buhr ,  Georg Pawlowski

发明人： Horst Wengenroth ,  Horst Roeschert ,  Walter Spiess ,  Gerhard Buhr ,  Georg Pawlowski

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03C1/492

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/039

摘要： The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms an acid under the action of actinic radiation and c) a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by an acid, wherein said mixture additionally contains 0.1 to 70 mol %, based on the maximum amount of acid which can theoretically be produced from the compound b), of at least one compound having at least one nitrogen atom in an amine or amide bond. The mixture is used in particular in the production of electronic components. The invention also relates to a recording material having a substrate and a radiation-sensitive coating.

摘要翻译： PCT No.PCT / EP93 / 01430 Sec。 371日期1995年1月9日 102（e）1995年4月9日PCT PCT 1993年6月7日PCT公布。 出版物WO94 / 01805 日本1990年1月20日。本发明涉及一种辐射敏感性混合物，其包含a）不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂，b）在光化反应的作用下形成酸的化合物 辐射和c）含有至少一个可被酸裂解的COC或CO-Si键的化合物，其中所述混合物另外含有0.1-70mol％，基于理论上可从 化合物b），至少一种在胺或酰胺键中具有至少一个氮原子的化合物。 该混合物特别用于生产电子元件。 本发明还涉及具有基底和辐射敏感性涂层的记录材料。

公开(公告)号：US4927732A

公开(公告)日：1990-05-22

申请号：US260307

申请日：1988-10-20

申请人： Hans-Joachim Merrem ,  Gerhard Buhr ,  Ruediger Lenz

发明人： Hans-Joachim Merrem ,  Gerhard Buhr ,  Ruediger Lenz

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03C1/73 ,  G03F7/004 ,  G03F7/022 ,  G03F7/09

CPC分类号： G03F7/091

摘要： A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C--O--C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.

摘要翻译： 公开了一种正性感光性组合物，其包含与邻醌二叠氮类型的光敏化合物或包含光解酸供体与含有COC基团的化合物组合的粘合剂，在水溶性溶剂中可溶或溶胀的粘合剂， 碱性溶液和通式I的染料（I）本发明的光敏组合物比含有其它染料的可比组合物具有更高的光敏性。

公开(公告)号：US4802312A

公开(公告)日：1989-02-07

申请号：US395619

申请日：1982-07-06

申请人： Karl C. Glaeser ,  Gerhard Buhr

发明人： Karl C. Glaeser ,  Gerhard Buhr

IPC分类号： B24C1/08 ,  B24C1/00

CPC分类号： B24C7/0084 ,  B24C11/005 ,  B24C7/0046

摘要： For sand blasting a stream of a suspension of a carrier gas and solid particles under superatmospheric pressure is restricted so that it is accelerated, and a liquid-carrying additive gas is mixed with the stream to moisten the particles. The additive gas is introduced into the stream at a pressure greater than the pressure of the stream at the location by between 1.5 and 2.5 times. Normally the additive-gas pressure is about twice the carrier-gas pressure, that is the additive gas is normally introduced at a pressure of between about 10 bar and 30 bar. This high-pressure introduction ensures that the additive gas enters well into the carrier-gas stream so that the liquid carried by the additive gas contacts and wets the solids carried by the carrier gas without just passing through it and wetting the inside of the sand-blast mix nozzle. The additive gas is introduced into the stream in a unit of time at a rate sufficient to introduce into the stream a quantity of the liquid equal to between about one-twentieth to one-thirtieth, preferably one-twenty-fifth, the mass of the particles passing the location during the unit of time.

摘要翻译： 对于喷砂，限制了载气和固体颗粒在超大气压下的悬浮液流，使其加速，并将载液的添加剂气体与流混合以润湿颗粒。 添加气体以比该位置处的流的压力大1.5-2.5倍的压力被引入流中。 通常，添加剂 - 气体压力是载气压力的约两倍，即通常在约10巴和30巴之间的压力下引入添加气体。 这种高压引入确保添加剂气体充分进入载气流中，使得由添加气体携带的液体接触并润湿由载气承载的固体，而不仅仅通过它并润湿砂 - 喷射混合喷嘴。 将添加气体以足以引入流中的一定时间的时间单位引入流中，所述液体的量等于大约二十分之一到一三十分之一，优选二十五分之一 颗粒在时间单位内通过位置。

公开(公告)号：US4339530A

公开(公告)日：1982-07-13

申请号：US196279

申请日：1980-10-14

申请人： Gerhard Sprintschnik ,  Rudolf Neubauer ,  Gerhard Buhr

发明人： Gerhard Sprintschnik ,  Rudolf Neubauer ,  Gerhard Buhr

IPC分类号： G03F7/038 ,  G03F7/30 ,  G03F7/32 ,  G03C5/24 ,  G03C7/02

CPC分类号： G03F7/32

摘要： This invention relates to a developer mixture for washing out light-sensitive copying layers previously exposed in imagewise manner and containing a polymer of an N-vinyl amine, of vinyl alcohol or of a vinyl alcohol derivative, an alcohol being water-soluble in an amount less than 10% by weight, and water as the main constituent, the mixture containing as said polymer a copolymer which is water-soluble or which can be dispersed in water to form a stable dispersion, composed of (a) hydrophilic units of the formula I: ##STR1## wherein A is O-R or ##STR2## R is a hydrogen atom or a methyl group; R.sub.1 is a hydrogen atom, an alkyl group or an alkoxy alkyl group having 1 to 10 carbon atoms each or an aryl group with 6 to 10 carbon atoms; R.sub.2 is an alkyl group or an acyl group having 1 to 5 carbon atoms each, and wherein a homopolymer of the hydrophilic units is water-soluble and of (b) hydrophobic units of vinyl monomers whose homopolymer is water-insoluble and which have an aromatic or a long-chain aliphatic group as the substituent, the proportion of the hydrophobic units being sufficient to ensure that an 0.1% aqueous solution of said copolymer has a surface tension of not more than 50 mN/m and that the quantity of said copolymer is at least sufficient to emulsify any quantity of alcohol exceeding the solubility limit. The invention also relates to a process for developing exposed light-sensitive copying layers using said developer mixture.

摘要翻译： 本发明涉及一种显影剂混合物，其用于洗涤先前以成像方式暴露并含有N-乙烯基胺，乙烯醇或乙烯醇衍生物的聚合物的乙烯醇衍生物的聚合物，水溶性的醇 小于10重量％，以水为主要成分，该混合物含有作为所述聚合物的共聚物，该共聚物是水溶性的，或者可以分散在水中以形成稳定的分散体，它由（a）式 I：其中A为OR或R为氢原子或甲基; R1是氢原子，烷基或具有1-10个碳原子的烷氧基烷基或具有6-10个碳原子的芳基; R 2是各自具有1至5个碳原子的烷基或酰基，并且其中亲水单元的均聚物是水溶性的，和（b）均聚物是水不溶性且具有芳族化合物的乙烯基单体的疏水单元 或长链脂族基团作为取代基时，疏水单元的比例足以确保所述共聚物的0.1％水溶液的表面张力不大于50mN / m，并且所述共聚物的量为 至少足以使超过溶解度极限的任何量的醇乳化。 本发明还涉及使用所述显影剂混合物显影曝光的感光复印层的方法。

公开(公告)号：US4311782A

公开(公告)日：1982-01-19

申请号：US169133

申请日：1980-07-15

申请人： Gerhard Buhr ,  Hans Ruckert

发明人： Gerhard Buhr ,  Hans Ruckert

IPC分类号： G03C1/72 ,  C08G65/16 ,  C08L69/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/038 ,  G03C1/68 ,  G03C5/00

CPC分类号： G03F7/022 ,  C08G65/16 ,  C08L69/00 ,  G03F7/0045

摘要： A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

摘要翻译： 描述了一种辐射敏感性混合物，其包含（a）在光化辐射的作用下形成酸的化合物，和（b）具有复发性原羧酸酯基团的聚合化合物，并且其包含由 式I的反应性单元：其中R 1是氢原子或烷基，环烷基或芳基，R 2，R 3和R 5相同或不同，表示氢原子或烷基或芳基，R 4表示 亚烷基或-if a1 = a2 = 1-也是亚烷基氧基，亚烷基可以被杂原子或不饱和或环状基团中断，R6表示氢原子或甲基，a1和a2 每个表示0,1或2，a1 + a2表示1或2，m表示3至200的数字。该混合物适用于生产具有高光敏度的复制材料，特别是印刷版。

公开(公告)号：US5776652A

公开(公告)日：1998-07-07

申请号：US949777

申请日：1997-10-14

申请人： Mathias Eichhorn ,  Gerhard Buhr

发明人： Mathias Eichhorn ,  Gerhard Buhr

IPC分类号： C07D295/12 ,  C07C245/20 ,  C07C309/06 ,  C07C323/48 ,  C07D209/88 ,  C07D295/135 ,  G03C1/56 ,  G03F7/016 ,  G03F7/021 ,  G03F7/09 ,  G03F7/023

CPC分类号： C07D295/135 ,  C07C245/20 ,  C07C323/48 ,  C07D209/88 ,  G03C1/56 ,  G03F7/0163 ,  G03F7/021 ,  G03F7/091

摘要： The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.

摘要翻译： 本发明涉及1,1,2,3,3,3-六氟 - 丙磺酸芳族或杂芳族单或双重氮。 它们用于用于涂覆辐射敏感记录材料的正性或负性辐射敏感混合物中。

公开(公告)号：US5413899A

公开(公告)日：1995-05-09

申请号：US254500

申请日：1994-06-06

申请人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

发明人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

IPC分类号： G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021 ,  G03F7/30

CPC分类号： G03F7/022

摘要： A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

摘要翻译： 含有不溶于水但在碱性水溶液中至少溶胀或至少可溶胀的树脂粘合剂和邻萘醌二叠氮化物 - 磺酸酯的光敏混合物，该邻萘醌二叠氮化物 - 磺酸酯为式I 其中R为氢或烷基或芳基，R1为氢或1,2-萘醌-2-重氮-4-磺酰基，1,2-萘醌-2-重氮基-5-磺酰基 或7-甲氧基-1,2-萘醌-2-二叠氮-4-磺酰基，分子中定义为R1的相同或不同的萘醌二叠氮基 - 磺酰基的数目为1〜5; 可用于制备光敏抗蚀剂材料。 使用感光性混合物制造的抗蚀剂材料具有高的光敏感性和对碱性显影剂非常好的显影剂抗性，并且可以在没有水性弱碱性溶液的问题的情况下开发。

公开(公告)号：US5268252A

公开(公告)日：1993-12-07

申请号：US863679

申请日：1992-04-01

申请人： Siegfried Scheler ,  Wolfgang Zahn ,  Axel Schmitt ,  Gerhard Buhr

发明人： Siegfried Scheler ,  Wolfgang Zahn ,  Axel Schmitt ,  Gerhard Buhr

IPC分类号： C09K9/02 ,  C07C309/26 ,  C07C309/71 ,  C07C309/76 ,  C07C311/16 ,  C07C323/66 ,  G02F1/065 ,  G03F7/022 ,  G03C1/52

CPC分类号： G02F1/065 ,  C07C309/71 ,  C07C309/76 ,  C07C311/16 ,  C07C323/66 ,  G03F7/022

摘要： The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

摘要翻译： 本发明涉及一种辐射敏感性酯，它是（a）含有2-6个芳族羟基的化合物的缩合产物，（b）环取代的（邻 - 萘醌-2-二叠氮化物）-4-磺酸（化合物 D1和（c）不进一步取代的（邻 - 萘醌-2-二叠氮化物）-4-或-5-磺酸（化合物D2）和/或非辐射敏感性有机酸（化合物D0），其中 （b）:( c）摩尔比为0.1:1〜39:1。

公开(公告)号：US5206111A

公开(公告)日：1993-04-27

申请号：US639354

申请日：1991-01-10

申请人： Peter Wilharm ,  Gerhard Buhr ,  Juergen Fuchs

发明人： Peter Wilharm ,  Gerhard Buhr ,  Juergen Fuchs

IPC分类号： C08G8/28 ,  C08G16/04 ,  C08G18/54 ,  C08G18/64 ,  C08G18/71

CPC分类号： C08G18/718 ,  C08G16/04 ,  C08G18/542 ,  C08G18/64 ,  C08G8/28

摘要： A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.Photosensitive mixtures containing this binder are resistant to plasma etching, stable on storage and have a high thermal stability.

摘要翻译： 在碱中可溶或可溶胀的甲硅烷基化聚合物粘合剂具有多个脂族和芳族羟基中的至少一个，其至少一部分由式I和II单元衍生：[（A-Bn） mC] - [（DoEp）BC] u（I）和[（DoEp）BC] v（II），其为聚合物粘合剂的侧链，其中A表示含有至少2个硅原子的硅烷基， 在硅原子的无分支链中彼此连接的其它但不多于3个的硅原子; B表示桥连基团; C表示与粘合剂，D组或E组的芳族，脂族或脂环族羟基形成共价键的官能团; D表示接枝的一元或多元脂肪醇; E表示接枝的一元或多元芳香醇; n表示0或1; m表示1或2; o，p，u和v各自表示0或1.含有该粘合剂的感光性混合物耐等离子体蚀刻，在储存时稳定并具有高的热稳定性。

公开(公告)号：US5198325A

公开(公告)日：1993-03-30

申请号：US199296

申请日：1988-05-26

申请人： Bernd Hupfer ,  Gerhard Buhr ,  Charlotte Eckes

发明人： Bernd Hupfer ,  Gerhard Buhr ,  Charlotte Eckes

IPC分类号： C08F2/48 ,  C08F2/50 ,  G03F7/029

CPC分类号： G03F7/0295

摘要： A photopolymerizable mixture for producing relief structures composed of highly heat-resistant polymers is described which is composed essentially of a soluble prepolymer containing photosensitive radicals bound in an ester-like manner to carboxyl groups, monomers and a photoinitiator, wherein the photoinitiator carries at least one trihalomethyl group which reacts when exposed to light. Of advantage is the fact that, even after exposure times which are by a factor of 4 to 5 shorter compared with conventional photopolymerizable mixtures, sharp-edged resist images can be obtained with a resolution of less than 3 .mu.m.

摘要翻译： 描述了一种用于生产由高耐热聚合物组成的浮雕结构的可光聚合混合物，其基本上由含有以类似羧基的光敏基团结合的可溶性预聚物，单体和光引发剂组成，其中光引发剂携带至少一种 当暴露于光时反应的三卤代甲基。 其优点在于，与常规的可光聚合混合物相比，即使曝光时间比4至5倍更短的事实，可以以小于3μm的分辨率获得锐利边缘的抗蚀剂图像。