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    Positive-working radiation-sensitive mixture
    1.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5654121A

    公开(公告)日：1997-08-05

    申请号：US430073

    申请日：1995-04-27

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  G03F7/021 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/111

    摘要： The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I) ,R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

    摘要翻译： 本发明涉及一种正性工作辐射敏感性混合物，其包含a）具有酸不稳定基团的聚合物粘合剂，和b）在照射下形成强酸的化合物，其中所述粘合剂同时含有式I，II和 III-R1-OH（Ⅰ），R1-O-CO2R2（Ⅱ）R1-O-CH2-CHR3-OH（Ⅲ）。 该混合物用于涂覆可用于生产印刷版和光致抗蚀剂的辐射敏感记录材料。

    N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith
    2.
    发明授权
    N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith 失效
    N，N-二取代磺酰胺和用其制备的辐射敏感性混合物

    公开(公告)号：US5612169A

    公开(公告)日：1997-03-18

    申请号：US287054

    申请日：1994-08-08

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/16 ,  C07C311/53 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492 ,  G03C1/494 ,  G03C1/725 ,  G03C1/76

    CPC分类号： G03F7/0045 ,  C07C311/53

    摘要： The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R 1 [-N（CO-OR 2）-SO 2 -R 3] n（I）和R 1 [-SO 2 -N（CO-OR 2）-R 3] n（II））的N，N-二取代磺酰胺 ，其中n为1-的R1为（C1-C20）烷基，（C3-C10）环烷基，（C6-C14）芳基或（C7-C20）芳烷基，对于n> 1- （C 1 -C 20）烷烃或（C 6 -C 7）环烷烃，非缩合或稠合的单 - 或多核（C 6 -C 18）芳族化合物的3-或4-价基团，R 2是（C 3 -C 11）烷基 ，（C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基 。 本发明还涉及一种正辐射敏感性混合物，其包含a）在光化辐射影响下形成酸的化合物，b）酸性可裂解化合物，其在水性碱性显影剂中的裂解产物具有比起始化合物更高的溶解度， 和c）不溶于水但在碱性水溶液中可溶或至少可溶胀的聚合物粘合剂，其中化合物b）是式I或II的磺酰胺。 根据本发明的混合物特别适用于制造胶版印刷版和光致抗蚀剂。

    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
    3.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N，N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号：US5529886A

    公开(公告)日：1996-06-25

    申请号：US432229

    申请日：1995-05-01

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039

    CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

    摘要： The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，所述含烷基基团中的各个亚甲基任选被杂原子取代， （C 3 -C 11）烷基，C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14） -C 20）芳烷基，R 4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Radiation-sensitive mixture
    4.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5998567A

    公开(公告)日：1999-12-07

    申请号：US932964

    申请日：1997-09-18

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/039 ,  C08G63/02

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

    摘要翻译： 一种辐射敏感性混合物，其包含（a）式（I）的化合物，其中R 1是任选取代的烷基，R 2是氢原子或任选取代的含有1至4个碳原子的烷基， 任选的聚合的脂族或芳族基，n是1至100的数; 和b）在暴露于光化辐射下形成强酸的化合物。

    Positive-working radiation-sensitive mixture
    5.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5879852A

    公开(公告)日：1999-03-09

    申请号：US841659

    申请日：1997-04-30

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  C08F8/14 ,  C08F8/10 ,  G03C1/52

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/111

    摘要： The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

    摘要翻译： 本发明涉及一种正性工作辐射敏感性混合物，其包含a）具有酸不稳定基团的聚合物粘合剂，和b）在照射下形成强酸的化合物，其中所述粘合剂同时含有式I，II和 IIIR1-OH（I），R1-O-CO2R2（II）R1-O-CH2-CHR3-OH（III）。该混合物用于涂覆可用于制备印刷版和光致抗蚀剂的辐射敏感记录材料。

    Radiation-sensitive mixture
    7.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5705317A

    公开(公告)日：1998-01-06

    申请号：US567775

    申请日：1995-12-05

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

    摘要翻译： 一种辐射敏感性混合物，其包含（a）式（I）化合物其中R 1是任选取代的烷基，R 2是氢原子或含有1至4个碳原子的任选取代的烷基 ，R3是n价，任选聚合的脂族或芳族基，n是1至100的数; 和b）在暴露于光化辐射下形成强酸的化合物。

    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
    8.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N，N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号：US5442087A

    公开(公告)日：1995-08-15

    申请号：US165148

    申请日：1993-12-10

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039 ,  C07C271/12 ,  C07C271/24 ,  C07C271/28 ,  C07C311/06

    CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

    摘要： The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，任选地被杂原子取代的含烷基基团中的单个亚甲基， （C3-C11）烷基，（C3-C11）烯基或（C7-C11）芳烷基，R3是未取代或取代的（C1-C6）烷基，（C3-C6）环烷基，（C6-C4）芳基或 （C7-C20）芳烷基，R4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Process for the production of a multicolored image and photosensitive material for carrying out this process
    10.
    发明授权
    Process for the production of a multicolored image and photosensitive material for carrying out this process 失效
    用于生产多彩图像和感光材料以进行该过程的方法

    公开(公告)号：US5725992A

    公开(公告)日：1998-03-10

    申请号：US20829

    申请日：1993-02-19

    申请人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

    发明人： Stephan J. W. Platzer ,  Wojciech A. Wilczak ,  Gerhard Buhr ,  Dieter Mohr

    IPC分类号： G03C1/675 ,  C08F2/50 ,  G03F3/10 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/105 ,  G03F7/34 ,  G03C1/795

    CPC分类号： G03F3/106 ,  G03F7/0295 ,  Y10S430/121 ,  Y10S430/126 ,  Y10S430/127

    摘要： A photosensitive material for the production of color proofing films for multicolor printing, having (A) a transparent, flexible film support, (B) a photopolymerizable layer which contains (B1) a polymeric binder, (B2) a free-radical-polymerizable compound, (B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and (B4) a dye or a colored pigment in a primary color of multicolor printing, and (C) a thermoplastic adhesive layer on the photo-sensitive layer. The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet. The material has increased photosensitivity and gives color prints with lower background discoloration.

    摘要翻译： 一种用于生产多色印刷用彩色印刷膜的感光材料，其具有（A）透明柔性膜载体，（B）含有（B1）聚合物粘合剂的可光聚合层，（B2）可自由基聚合的化合物 ，（B3）作为光引发剂，吸收最大值为300〜380nm，吸收最大吸光度为11000以上，400nm以上的吸光度小于1400的取代双三甲基-s-三嗪 ，和（B4）多色印刷原色的染料或着色颜料，（C）感光层上的热塑性粘合剂层。 该材料通过层压到图像接收材料上，曝光材料并剥离薄膜载体和图像接收材料，将图像接收材料上的未曝光层区域与粘合剂层一起留下。 为了产生多色图像，这些步骤与至少一个另外的单色片重复。 该材料具有增加的光敏性，并且具有较低背景变色的彩色印刷品。