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14 条记录 (耗时 0.019 秒)

    Positive-working radiation-sensitive mixture
    2.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5654121A

    公开(公告)日：1997-08-05

    申请号：US430073

    申请日：1995-04-27

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  G03F7/021 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/111

    摘要： The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I) ,R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

    摘要翻译： 本发明涉及一种正性工作辐射敏感性混合物，其包含a）具有酸不稳定基团的聚合物粘合剂，和b）在照射下形成强酸的化合物，其中所述粘合剂同时含有式I，II和 III-R1-OH（Ⅰ），R1-O-CO2R2（Ⅱ）R1-O-CH2-CHR3-OH（Ⅲ）。 该混合物用于涂覆可用于生产印刷版和光致抗蚀剂的辐射敏感记录材料。

    N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith
    3.
    发明授权
    N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith 失效
    N，N-二取代磺酰胺和用其制备的辐射敏感性混合物

    公开(公告)号：US5612169A

    公开(公告)日：1997-03-18

    申请号：US287054

    申请日：1994-08-08

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/16 ,  C07C311/53 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492 ,  G03C1/494 ,  G03C1/725 ,  G03C1/76

    CPC分类号： G03F7/0045 ,  C07C311/53

    摘要： The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R 1 [-N（CO-OR 2）-SO 2 -R 3] n（I）和R 1 [-SO 2 -N（CO-OR 2）-R 3] n（II））的N，N-二取代磺酰胺 ，其中n为1-的R1为（C1-C20）烷基，（C3-C10）环烷基，（C6-C14）芳基或（C7-C20）芳烷基，对于n> 1- （C 1 -C 20）烷烃或（C 6 -C 7）环烷烃，非缩合或稠合的单 - 或多核（C 6 -C 18）芳族化合物的3-或4-价基团，R 2是（C 3 -C 11）烷基 ，（C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基 。 本发明还涉及一种正辐射敏感性混合物，其包含a）在光化辐射影响下形成酸的化合物，b）酸性可裂解化合物，其在水性碱性显影剂中的裂解产物具有比起始化合物更高的溶解度， 和c）不溶于水但在碱性水溶液中可溶或至少可溶胀的聚合物粘合剂，其中化合物b）是式I或II的磺酰胺。 根据本发明的混合物特别适用于制造胶版印刷版和光致抗蚀剂。

    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
    4.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N，N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号：US5529886A

    公开(公告)日：1996-06-25

    申请号：US432229

    申请日：1995-05-01

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039

    CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

    摘要： The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，所述含烷基基团中的各个亚甲基任选被杂原子取代， （C 3 -C 11）烷基，C 3 -C 11）烯基或（C 7 -C 11）芳烷基，R 3是未取代或取代的（C 1 -C 6）烷基，（C 3 -C 6）环烷基，（C 6 -C 14） -C 20）芳烷基，R 4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Radiation-sensitive mixture
    5.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5998567A

    公开(公告)日：1999-12-07

    申请号：US932964

    申请日：1997-09-18

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/039 ,  C08G63/02

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

    摘要翻译： 一种辐射敏感性混合物，其包含（a）式（I）的化合物，其中R 1是任选取代的烷基，R 2是氢原子或任选取代的含有1至4个碳原子的烷基， 任选的聚合的脂族或芳族基，n是1至100的数; 和b）在暴露于光化辐射下形成强酸的化合物。

    Positive-working radiation-sensitive mixture
    6.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5879852A

    公开(公告)日：1999-03-09

    申请号：US841659

    申请日：1997-04-30

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  C08F8/14 ,  C08F8/10 ,  G03C1/52

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/111

    摘要： The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

    摘要翻译： 本发明涉及一种正性工作辐射敏感性混合物，其包含a）具有酸不稳定基团的聚合物粘合剂，和b）在照射下形成强酸的化合物，其中所述粘合剂同时含有式I，II和 IIIR1-OH（I），R1-O-CO2R2（II）R1-O-CH2-CHR3-OH（III）。该混合物用于涂覆可用于制备印刷版和光致抗蚀剂的辐射敏感记录材料。

    Radiation-sensitive mixture
    7.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5705317A

    公开(公告)日：1998-01-06

    申请号：US567775

    申请日：1995-12-05

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

    摘要翻译： 一种辐射敏感性混合物，其包含（a）式（I）化合物其中R 1是任选取代的烷基，R 2是氢原子或含有1至4个碳原子的任选取代的烷基 ，R3是n价，任选聚合的脂族或芳族基，n是1至100的数; 和b）在暴露于光化辐射下形成强酸的化合物。

    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
    8.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N，N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号：US5442087A

    公开(公告)日：1995-08-15

    申请号：US165148

    申请日：1993-12-10

    申请人： Mathias Eichhorn ,  Gerhard Buhr

    发明人： Mathias Eichhorn ,  Gerhard Buhr

    IPC分类号： C07C311/51 ,  C07C311/53 ,  C08F20/38 ,  G03F7/039 ,  C07C271/12 ,  C07C271/24 ,  C07C271/28 ,  C07C311/06

    CPC分类号： C08F20/38 ,  C07C311/53 ,  G03F7/039 ,  Y10S430/107

    摘要： The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译： 本发明涉及式R1-SO2-N（CO-OR2）-R3-O-CO-CR4 = CH2和R1-N（CO-OR2）-SO2-R3-O-CO-CR4 = CH2的单体， 其中R 1是（C 1 -C 20）烷基，（C 3 -C 10）环烷基，（C 6 -C 14）芳基或（C 7 -C 20）芳烷基，任选地被杂原子取代的含烷基基团中的单个亚甲基， （C3-C11）烷基，（C3-C11）烯基或（C7-C11）芳烷基，R3是未取代或取代的（C1-C6）烷基，（C3-C6）环烷基，（C6-C4）芳基或 （C7-C20）芳烷基，R4为氢原子或甲基。 它还涉及具有至少5mol％具有式（e）-R3-N（CO-OR2）-SO2-R1（I）和/或-R3-SO2-N（CO- OR2）-R1（II）和对辐射敏感的混合物，其包含：a）在光化辐射的影响下形成酸的化合物，和b）在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度，以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Infrared-imageable recording material and offset printing plates produced from it
    10.
    发明授权
    Infrared-imageable recording material and offset printing plates produced from it 失效
    由其制造的红外可成像记录材料和胶版印刷版

    公开(公告)号：US06537722B2

    公开(公告)日：2003-03-25

    申请号：US09110819

    申请日：1998-07-07

    申请人： Mathias Eichhorn ,  Karin Maerz ,  Fritz-Feo Grabley

    发明人： Mathias Eichhorn ,  Karin Maerz ,  Fritz-Feo Grabley

    IPC分类号： G03F7039

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/24 ,  B41C2210/262 ,  G03F7/0045 ,  Y10S430/145 ,  Y10S430/165

    摘要： A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.

    摘要翻译： 用于制造胶版印刷版的记录材料包括：具有亲水表面的支撑体和可红外成像层，其包括：a）能够吸收红外辐射并将红外辐射转换成热的组分，b）能够 在由组分a）产生的热的作用下释放酸，和c）具有至少一个被从化合物b）释放的酸裂解的基团和至少一个亲水基团的聚合物粘合剂，并且其中所述层 在被红外线辐射的区域溶于含水碱性显影剂。