公开(公告)号：US06467345B1

公开(公告)日：2002-10-22

申请号：US09518364

申请日：2000-03-03

Applicant: Armand P. Neukermans ,  Timothy G. Slater

Inventor： Armand P. Neukermans ,  Timothy G. Slater

IPC: G01C1900

CPC classification number: B82Y15/00 ,  G01C19/5719 ,  G02B26/0841 ,  G02B26/085 ,  G02B26/101

Abstract: A method for operating a monolithic, integrated, micromachined structure that includes a reference member and one or more dynamic members. Each dynamic member is supported from the reference member, either directly or indirectly, by torsion hinges. Supported in this way, each dynamic member exhibits a plurality of vibrational modes. Preferably, the structure is micromachined to establishes specified relationships between various pairs of vibrational modes. The method also includes applying force to each dynamic member that urges the member to rotate out of a rest position to a fixed particular angle.

Abstract translation: 一种用于操作单片，集成的微加工结构的方法，其包括参考构件和一个或多个动态构件。 每个动态构件由参考构件直接或间接地由扭转铰链支撑。 以这种方式支持，每个动态构件表现出多个振动模式。 优选地，该结构被微加工以在各种振动模式对之间建立规定的关系。 该方法还包括向推动构件旋转到静止位置到每个固定的特定角度的每个动态构件施加力。

公开(公告)号：US06229139B1

公开(公告)日：2001-05-08

申请号：US09547813

申请日：2000-04-11

Applicant: Armand P. Neukermans ,  James P. Downing ,  Timothy G. Slater

Inventor： Armand P. Neukermans ,  James P. Downing ,  Timothy G. Slater

IPC: G01D530

CPC classification number: H04N1/00689 ,  H04N1/00885 ,  H04N1/00891 ,  H04N1/107 ,  H04N1/1078 ,  H04N1/121 ,  H04N1/193 ,  H04N2201/0096 ,  H04N2201/0471 ,  H04N2201/04732 ,  H04N2201/04737

Abstract: A document transport for a scanner (100) has a flexible, elongated finger (226) disposed adjacent to a document (134), and a force applied to the finger (226) urges teeth (233) on the finger (226) into contact with the document (134) which urges the document (134) along a path through the scanner (100). A piezoelectric plate (222), which applies the force to the finger (226), requires only a small amount of electrical power. To traverse the scanner (100), a document (134) may also be manually fed along a guide (272). First and second speed-sensing detectors (276a and 276b), disposed along the path traversed by the document (134), permit the scanner (100) to determine a speed at which the manually fed document (134) traverses the scanner (100). To conserve electrical energy, the scanner (100) also includes a document-presence detector (274) for activating the scanner (100) when a document (134) to be scanned is present.

Abstract translation: 用于扫描器（100）的文件传送装置具有邻近文件（134）设置的柔性细长的手指（226），并且施加到手指（226）的力促使手指（226）上的齿（233）接触 其中文档（134）沿着通过扫描器（100）的路径敦促文档（134）。 向手指（226）施加力的压电板（222）仅需要少量的电力。 为了横穿扫描器（100），文档（134）也可以沿着引导件（272）手动馈送。 沿着由文件（134）穿过的路径设置的第一和第二速度感测检测器（276a和276b）允许扫描器（100）确定手动馈送的文件（134）穿过扫描仪（100）的速度， 。 为了节省电能，扫描器（100）还包括用于在存在待扫描的文件（134）时启动扫描器（100）的原稿存在检测器（274）。

公开(公告)号：US6044705A

公开(公告)日：2000-04-04

申请号：US855883

申请日：1997-05-12

Applicant: Armand P. Neukermans ,  Timothy G. Slater ,  Philip Downing

Inventor： Armand P. Neukermans ,  Timothy G. Slater ,  Philip Downing

IPC: G01C19/5719 ,  G02B26/08 ,  G02B26/10 ,  G01C19/00

CPC classification number: G01C19/5719 ,  G02B26/085 ,  G02B26/101

Abstract: Two torsion bars project from a reference member to support at least one plate or frame-shaped first dynamic member for rotation about an axis of the torsion bars. In one embodiment, a frame-shaped first dynamic member and a second pair of torsion bars, oriented non-parallel to the first torsion bars, support a second dynamic member for rotation about an axis that is collinear with the second pair of torsion bars. The vibrational frequency of the principal torsional vibrational mode of the dynamic members are respectively lower by at least 20% than the vibrational frequency of any other vibrational mode thereof. Either an electrostatic or electromagnetic drive means imparts rotary motion to the dynamic members about the collinear torsion bar axis(es). The reference member, the torsion bars and the dynamic member(s) are all monolithically fabricated from a stress-free semiconductor layer of a silicon substrate.

Abstract translation: 两个扭杆从参考构件突出，以支撑至少一个板或框架形的第一动态构件，用于围绕扭杆的轴线旋转。 在一个实施例中，框架形状的第一动态构件和不平行于第一扭力杆的第二对扭杆支撑第二动态构件，用于围绕与第二对扭杆共线的轴线旋转。 动态构件的主要扭转振动模式的振动频率分别比其他振动模式的振动频率低至少20％。 静电或电磁驱动装置都可以围绕共线扭杆轴线向动态构件施加旋转运动。 参考构件，扭杆和动态构件都是由硅衬底的无应力半导体层整体制造的。

公开(公告)号：US5658710A

公开(公告)日：1997-08-19

申请号：US395410

申请日：1995-02-24

Applicant: Armand P. Neukermans

Inventor： Armand P. Neukermans

IPC: G01Q70/10 ,  B81C1/00 ,  C23C16/00 ,  G01Q70/14 ,  G01Q70/16 ,  H01J9/02 ,  H01J37/073 ,  C23C26/00

CPC classification number: G01Q70/16 ,  B81C1/00682 ,  B82Y35/00 ,  G01Q70/14 ,  H01J9/025 ,  B81B2201/12 ,  H01J2209/0226

Abstract: The forming of superhard, durable and inert mechanical microstructures, such as tips for atomic force microscopy and field emission, membranes, hinges, actuators, and sensors requires micromachining of silicon or polysilicon. The microstructures are then reacted with a hydrocarbon or ammonia gas, at a temperature in the range of 700.degree. C. to 1100.degree. C. and in partial vacuum conditions for several minutes. Gases such as methane, ethane, or acetylene will convert the surface layers to SiC, which is useful for its conductive properties, while ammonia gas will convert the surface layers to Si.sub.3 N.sub.4, which is useful for its insulative properties. Thus, the converted material will have improved physical, mechanical, chemical and electrical properties.

Abstract translation: 超硬，耐用和惰性的机械微结构的形成，如原子力显微镜和场发射的尖端，膜，铰链，致动器和传感器需要硅或多晶硅的微加工。 然后将微结构与烃或氨气在700℃至1100℃的温度和部分真空条件下反应数分钟。 诸如甲烷，乙烷或乙炔的气体将将表面层转化为SiC，其可用于其导电性能，而氨气将表面层转化为Si3N4，其对其绝缘性质有用。 因此，转化的材料将具有改善的物理，机械，化学和电学性能。

公开(公告)号：US5488862A

公开(公告)日：1996-02-06

申请号：US208424

申请日：1994-03-08

Applicant: Armand P. Neukermans ,  Timothy G. Slater

Inventor： Armand P. Neukermans ,  Timothy G. Slater

IPC: G01C19/5719 ,  G01P15/12 ,  G02B26/08 ,  G02B26/10 ,  G01P9/04 ,  G01P15/02

CPC classification number: G01P15/132 ,  G01C19/5719 ,  G02B26/0833 ,  G02B26/0841 ,  G02B26/085 ,  G02B26/0858 ,  G02B26/101 ,  G01P2015/0831 ,  G01P2015/0837

Abstract: A monolithic single crystal Si rate-gyro consisting of in the preferred embodiment, an outer torsional frame, self resonating with a substantial amplitude, as controlled by a four-terminal piezo torsion sensor, connected to an inner frame by torsional hinges. The inner frame itself is connected to a fixed inner post, by a set of torsion hinges, defining an axis of rotation perpendicular to the first axis. Rotation of the axis of oscillation of the outer body causes the moving mass and the inner frame to tilt and oscillate at the outer frequency due to Coriolis forces, thereby periodically deforming the inner hinges in torsion. These inner hinges are likewise equipped with a four-terminal piezo voltage torsion sensor, giving an indication of the rate of rotation of the sensor. The design allows for good sensitivity, due to the substantial swing of the outer oscillator, its high moment of inertia, excellent Si spring characteristics, and excellent sensitivity of the torsional sensors. Because of the integration of all of parts in silicon and its inherent simplicity, it can be made very inexpensively.

Abstract translation: 由优选实施例组成的单片单晶硅速率 - 陀螺仪，由四端压电扭转传感器控制的具有实质振幅的自谐振的外扭转框架通过扭转铰链连接到内框架。 内框架本身通过一组扭转铰链连接到固定的内柱，其限定垂直于第一轴线的旋转轴线。 外部体的振动轴的旋转导致运动质量和内框架由于科里奥利力而以外频率倾斜和振荡，从而周期性地使内铰链扭转变形。 这些内部铰链同样配备有四端压电电压扭力传感器，用于指示传感器的转速。 由于外部振荡器的大幅摆动，其高转动惯量，优异的Si弹簧特性和扭转传感器的极好的灵敏度，因此该设计具有良好的灵敏度。 由于硅中所有部件的集成及其固有的简单性，可以非常便宜。

公开(公告)号：US5411644A

公开(公告)日：1995-05-02

申请号：US147149

申请日：1993-11-03

Applicant: Armand P. Neukermans

Inventor： Armand P. Neukermans

IPC: G01N27/419 ,  G01N33/00

CPC classification number: G01N33/0014 ,  G01N27/419 ,  G01N33/0006

Abstract: A conduit defined by an oxygen ion permeable wall formed of zirconia or other materials and having gas permeable electrodes disposed on an inner and outer surface of the wall. The electrodes are configured to form two oxygen pumps that share an electrode on the inner surface in order to minimize interference with gas flowing through the conduit, yet allow a number of operations to be performed on the gas as it flows. The conduit can be used as a getter for removal of oxygen from even reactive gases. The conduit can also be used as a pump for injecting a known quantity of oxygen to the gas, the oxygen supplied from air outside the conduit. The upstream pump can be used as a getter and the downstream pump for oxygen injection, thereby providing a known concentration of oxygen gas or oxidants, such as water vapor, in the gas exiting the conduit. The conduit can contain a pair of sensor electrodes on the inner and outer surface downstream of the other electrodes. The sensor electrodes can determine when the oxygen removed from the gas is equal to the known quantity of oxygen injected, providing a means for measuring the concentration of oxidants in the gas.

Abstract translation: 由氧化锆或其他材料形成的氧离子可渗透壁限定的导管，并且具有设置在壁的内表面和外表面上的透气电极。 电极被配置成形成两个在内表面上共享电极的氧气泵，以便最小化对流过导管的气体的干扰，而允许在气体流动时对气体进行若干操作。 导管可用作从甚至反应气体中除去氧气的吸气剂。 导管还可以用作泵，用于将已知量的氧气注入到气体中，氧气从管道外部的空气供应。 上游泵可用作吸气剂和用于氧气注入的下游泵，从而在离开管道的气体中提供已知浓度的氧气或氧化剂，例如水蒸气。 导管可以在其他电极的下游的内表面和外表面上包含一对传感器电极。 传感器电极可以确定从气体中除去的氧气何时等于已知的注入量，提供测量气体中氧化剂浓度的方法。

公开(公告)号：US5189481A

公开(公告)日：1993-02-23

申请号：US736517

申请日：1991-07-26

Applicant: Peter C. Jann ,  Kenneth P. Gross ,  Armand P. Neukermans

Inventor： Peter C. Jann ,  Kenneth P. Gross ,  Armand P. Neukermans

IPC: G01N21/94 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N21/9503

Abstract: A surface inspection apparatus having multiple inspection stations to inspect a wafer for a number of characteristics. The wafer is placed on a chuck connected to a rack-and-pinion or equivalent system so that the wafer simultaneously rotates and translates under the fixed position of the inspection stations. A single light source may be used by all stations in turn. One station may be a particle detector with collection optics receiving a small select portion of the light scattered from the wafer surface. A second station may be a roughness detector with a collection system to direct a large portion of scattered light to a detector. A position sensitive detector may be used to determine the slope of the wafer surface at an inspection point when the wafer is not clamped to the chuck, giving a measure of surface deformation. These or other stations are positioned about either of two inspection points at which the beam from the light source may be directed. The inspection points are spaced one wafer radius apart to minimize the required wafer motion for a complete surface scan.

Abstract translation: 具有多个检查站的表面检查装置，用于检查晶片的多种特性。 将晶片放置在连接到齿条齿轮或等效系统的卡盘上，使得晶片在检查台的固定位置同时旋转和平移。 所有车站可以依次使用单个光源。 一个站可以是具有收集光学器件的粒子检测器，其接收从晶片表面散射的光的小的选择部分。 第二站可以是具有收集系统的粗糙度检测器，以将大部分散射光引导到检测器。 可以使用位置敏感检测器来确定当晶片未夹紧到卡盘时的检查点处的晶片表面的斜率，给出表面变形的量度。 这些或其他站位于来自光源的光束可以被引导的两个检查点中的任一个处。 检查点间隔一个晶片半径，以最小化所需的晶片运动以进行完整的表面扫描。

公开(公告)号：US5076692A

公开(公告)日：1991-12-31

申请号：US531132

申请日：1990-05-31

Applicant: Armand P. Neukermans ,  Peter C. Jann ,  Ralph Wolf ,  David Wolze ,  Stanley Stokowski

Inventor： Armand P. Neukermans ,  Peter C. Jann ,  Ralph Wolf ,  David Wolze ,  Stanley Stokowski

IPC: H01L21/66 ,  G01N21/94 ,  H01L21/027

CPC classification number: G01N21/94 ,  G01N21/4788

Abstract: A method and apparatus for predicting the number of contaminant particles in circuit area of a patterned semiconductor wafer having a number of reflective circuit areas. The method includes forming on a wafer in specified areas, a grating test pattern, such as a line grating. The grating patterns are formed at the same time and in the same manner that repetitive circuit patterns are formed on the wafer. The wafer is then scanned by a light beam. Since the diffraction pattern caused by the grating test patterns is known, it is possible to detect when the light beam is scanning one of the known grating patterns. The diffraction pattern may be inspected for fabrication derived variations. In response to detecting a known grating pattern, a detection mechanism is activated. Since the diffraction pattern is known it may be spatially separated. In this way only light scattered by particles or defects in the pattern are collected and detected. From the scattered light that is collected and detected, a particle count may be determined for the grating pattern area. From this particle count an accurate prediction of the number of particles in the circuit patterns may be made. The apparatus may also inspect bare areas. In this manner real time inspection may be performed on patterned wafers.

Abstract translation: 一种用于预测具有多个反射电路区域的图案化半导体晶片的电路区域中的污染物颗粒数量的方法和装置。 该方法包括在特定区域的晶片上形成光栅测试图案，例如线光栅。 光栅图案是以与在晶片上形成重复电路图案相同的方式形成的。 然后通过光束扫描晶片。 由于由光栅测试图案引起的衍射图案是已知的，因此可以检测光束何时扫描已知光栅图案之一。 可以检查衍射图案以进行制造衍生的变化。 响应于检测到已知的光栅图案，检测机构被激活。 由于衍射图案是已知的，它可以在空间上分离。 以这种方式，仅收集并检测由图案中的颗粒或缺陷散射的光。 从收集和检测的散射光中，可以确定光栅图案区域的粒子数。 从该粒子计数可以进行电路图案中的粒子数量的准确预测。 该设备还可以检查裸露的区域。 以这种方式，可以对图案化的晶片进行实时检查。

公开(公告)号：US4998019A

公开(公告)日：1991-03-05

申请号：US416763

申请日：1989-10-03

Applicant: Stanley Stokowski ,  David Wolze ,  Armand P. Neukermans

Inventor： Stanley Stokowski ,  David Wolze ,  Armand P. Neukermans

IPC: G01B11/06 ,  G01N23/227

CPC classification number: G01B11/0625 ,  G01N23/227

Abstract: Methods for determining the presence or absence of, and the thickness or other spacial extent of, a contaminant layer at each of a plurality of two or more sites on the surface of an electrically conductive material such as a semiconductor, a metal or a metal silicide. The invention uses a change in photoemission current from an illuminated spot on the surface to determine the presence and extent of a contaminant layer at the illuminated site. Compensation is provided for the effects of capacitive current and photovoltaic current. The invention provides a pattern of illumination sites on the conductor surface that can, if desired, cover all points on the surface.

Abstract translation: 在诸如半导体，金属或金属硅化物的导电材料的表面上的多个两个或更多个位置的每一个处确定污染物层的存在或不存在以及厚度或其它空间范围的方法 。 本发明使用来自表面上的照明点的光电流的变化来确定在照明位置处的污染物层的存在和程度。 为电容电流和光伏电流的影响提供补偿。 本发明提供导体表面上的照明位置的图案，如果需要，其可覆盖表面上的所有点。

公开(公告)号：US4988877A

公开(公告)日：1991-01-29

申请号：US416764

申请日：1989-10-03

Applicant: Stanley Stokowksi ,  David Wolze ,  Armand P. Neukermans

Inventor： Stanley Stokowksi ,  David Wolze ,  Armand P. Neukermans

IPC: G01N23/227

CPC classification number: G01N23/2273

Abstract: Method and apparatus for determining the amount, if any, of residue remaining at the bottom of an aperture in a layer of dielectric or insulator material. A layer of electrically conducting material is positioned adjacent to the aperture bottom, an electron collector is positioned adjacent to the mouth of the aperture, and a voltage difference (optional) is impressed between the conducting material and the electron collector. The aperture bottom is illuminated with a light beam with photon energy greater than the electron work function of the conducting material, and a portion of the photons that comprise the light beam reach the conducting material and produce photoelectrons by photoemissive action. A photoelectron current is sensed by the electron collector, and the cleanliness of the aperture bottom is determined from the value of the current.

Abstract translation: 用于确定剩余在电介质或绝缘体材料层中的孔底部的残留量（如果有的话）的方法和装置。 导电材料层定位成与孔底部相邻，电子收集器邻近孔口定位，并且在导电材料和电子收集器之间施加电压差（可选）。 孔径底部被光束照射，其光子能量大于导电材料的电子功函数，并且包含光束的光子的一部分到达导电材料并通过光发射作用产生光电子。 由电子收集器检测光电子电流，并根据电流的值确定光圈底部的清洁度。