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21.发明授权I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive 失效使用1,2-二硝基化合物和羟基喹啉添加剂的I-LINE辐射敏感性碱溶性树脂组合物
公开(公告)号：US5110706A
公开(公告)日：1992-05-05
申请号：US611762
申请日：1990-11-13
申请人： Yoshiji Yumoto , Tsutomu Shimokawa , Takao Miura
发明人： Yoshiji Yumoto , Tsutomu Shimokawa , Takao Miura
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： G03F7/0226
摘要： A radiation-sensitive resin composition comprises (a) an alkali-soluble resin, (b) a 1,2-quinone diazide compound, and (c) an aromatic compound having a specified molecular structure, as essential constituents. The composition is extremely useful for forming a positive type photoresist on a substrate having a high reflectance.
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22.发明授权Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film 有权形成图案的方法，用于形成上层膜的组合物和用于形成底层膜的组合物公开(公告)号：US08119324B2
公开(公告)日：2012-02-21
申请号：US12375915
申请日：2007-07-27
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.
摘要翻译： 提供了适用于使用电子束（EB），X射线或极紫外线（EUV）形成微图案的图形形成方法。 该方法按以下顺序包括以下步骤：（1）形成和固化含有辐射敏感性酸产生剂的底层膜的步骤，所述辐射敏感酸产生剂在暴露于基材上时产生酸，（2）步骤 通过掩模用辐射照射底层膜以在底层膜的暴露区域中选择性地产生酸，（3）形成不含辐射敏感性的上层膜的步骤 酸产生剂，但含有能够通过酸的作用聚合或交联的组合物，（4）通过聚合或选择性地在上层膜对应于下面的区域的区域中选择性地交联固化膜的步骤 产生酸的层 - 膜，以及（5）除去与未生成酸的下层膜的面积对应的上层膜的面积的工序。
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公开(公告)号：US07244549B2
公开(公告)日：2007-07-17
申请号：US10226321
申请日：2002-08-23
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0757 , Y10S430/106
摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500–100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.
摘要翻译： 一种图案形成方法，包括形成辐射敏感性树脂组合物的涂层，其包含含酸解离基团的聚硅氧烷，碱解不溶性或几乎不碱溶性，当酸解离基解离时变成碱溶性 含有碳含量为80重量％以上且聚苯乙烯换算的重均分子量为500〜10000的聚合物的薄膜，提供了对涂层的涂布辐射。 该方法可以通过在干蚀刻工艺中适当地选择特定的蚀刻气体而不受驻波的影响而形成具有高纵横比的微小图案。
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24.发明授权Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物公开(公告)号：US06846895B2
公开(公告)日：2005-01-25
申请号：US10364351
申请日：2003-02-12
IPC分类号： C08G77/42 , C07F7/08 , C08G77/14 , C08G77/24 , C08L83/06 , C08L83/08 , G03F7/004 , G03F7/075 , C08G77/12
CPC分类号： C08L83/08 , C07F7/0838 , C08G77/14 , C08G77/24 , C08L83/06 , G03F7/0045 , G03F7/0757
摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
摘要翻译： 具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A 1和A 2是酸解离的一价有机基团，R 1是氢 ，一价（卤代）烃，卤素或氨基，R 2是一价（卤代）烃基或卤素。 还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。 聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异 等等
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公开(公告)号：US08431324B2
公开(公告)日：2013-04-30
申请号：US12775475
申请日：2010-05-07
申请人： Tsutomu Shimokawa , Takuma Ebata
发明人： Tsutomu Shimokawa , Takuma Ebata
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. The radiation-sensitive acid generator includes a compound (I) shown by a following general formula (I). The mixed solvent includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate, wherein M+ represents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m represents an integer from 1 to 4.
摘要翻译： 辐射敏感性树脂组合物包括树脂，辐射敏感性酸产生剂，酸扩散控制剂和混合溶剂。 辐射敏感性酸产生剂包括由以下通式（I）表示的化合物（I）。 混合溶剂包括约50质量％至约90质量％的丙二醇单甲醚乙酸酯，其中M +表示锍阳离子或碘鎓阳离子，R表示氢原子或具有1至8个碳原子的烃基，Rf表示 氟原子或碳原子数1〜4的全氟烷基，n表示1〜10的整数，m表示1〜4的整数。
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公开(公告)号：US20090274977A1
公开(公告)日：2009-11-05
申请号：US12519519
申请日：2008-01-08
CPC分类号： C07C39/17 , C07C43/23 , C07C69/712 , G03F7/004 , G03F7/0392 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.
摘要翻译： 由下式（1）表示的化合物可以用作能够形成有效响应电子束等的抗蚀剂膜的放射线敏感性组合物的材料，显示出低的粗糙度，并且可以形成高精度的微小图案 以稳定的方式。
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公开(公告)号：US20080187859A1
公开(公告)日：2008-08-07
申请号：US11578546
申请日：2005-04-13
申请人： Isao Nishimura , Takashi Chiba , Tsutomu Shimokawa
发明人： Isao Nishimura , Takashi Chiba , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0757
摘要： A radiation-sensitive resin composition exhibiting only extremely controlled change in the sensitivity after storage when used as a chemically-amplified resist possessing high transparency at a wavelength of 193 nm or less and particularly excellent depth of focus (DOF) is provided.The radiation-sensitive resin composition comprises (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds in the composition being not more than 100 ppm, wherein A and B individually represent a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a hydrogen atom or monovalent acid-dissociable group.
摘要翻译： 提供了当用作具有193nm或更小波长的特别优异的聚焦深度（DOF）时具有高透明度的化学放大抗蚀剂时，储存后灵敏度极度受控变化的辐射敏感性树脂组合物。 辐射敏感性树脂组合物包含（A）具有下式（I）所示的结构单元（I）和/或下式（II）所示的结构单元（II）的硅氧烷树脂，（B）a 光生酸发生剂和（C）溶剂，组合物中含氮化合物的含量不超过100ppm，其中A和B各自表示取代或未取代的二价直链，支链或环状烃基R SUP > 1 表示一价酸解离基团，R 2表示氢原子或一价酸解离基团。
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28.发明授权Polysiloxane, process for production thereof and radiation-sensitive resin composition 有权聚硅氧烷，其制造方法和辐射敏感性树脂组合物公开(公告)号：US07108955B2
公开(公告)日：2006-09-19
申请号：US10476453
申请日：2002-04-30
IPC分类号： G03C1/73
CPC分类号： G03F7/0397 , C08G77/08 , C08G77/24 , G03F7/0045 , G03F7/0046 , G03F7/0757
摘要： A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)
摘要翻译： 提供了具有193nm以下，特别是157nm以下的波长的高透明度，表现出优异的耐干蚀刻性的新颖的聚硅氧烷和包含显示出优异的灵敏度，分辨率等的聚硅氧烷的辐射敏感性树脂组合物 。 聚硅氧烷是具有下式（1）的结构单元（I）和/或结构单元（II），具有酸解离基团的树脂，其中R 1表示单价芳族 被氟原子或氟代烷基取代的基团或被氟原子或氟代烷基取代的一价脂肪族基团，R 2表示上述一价芳族基团，上述一价脂肪族基团，氢 原子，一价烃基，卤代烷基或氨基。 辐射敏感性树脂组合物（A）含有聚硅氧烷（A）和光致酸产生剂（B）
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公开(公告)号：US06852791B2
公开(公告)日：2005-02-08
申请号：US09987367
申请日：2001-11-14
CPC分类号： G03F7/091
摘要： An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): wherein R1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R1's are the same or different; R2 and R3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.
摘要翻译： 提供了防反射涂层组合物。 该组合物包括聚合物和溶剂。 聚合物具有由式（1）表示的结构单元：其中R1是除氢原子或一价基团以外的一价原子，n为0-4的整数，条件是当n为2- 如图4所示，多个R1相同或不同; R2和R3各自为一价原子或基团; X为二价基团。 由该组合物形成的抗反射涂层具有高的抗反射效果，不会产生与抗蚀剂膜的混合，并且能够与正或负的抗蚀剂配合，分辨率和精度优异的抗蚀剂图案轮廓良好。
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公开(公告)号：US06623907B2
公开(公告)日：2003-09-23
申请号：US09774714
申请日：2001-02-01
申请人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
发明人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
摘要翻译： 一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被 叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。 还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物 在酸（E）的存在下。 该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。
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