公开(公告)号：US20050201683A1

公开(公告)日：2005-09-15

申请号：US11054205

申请日：2005-02-09

申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine Yanushefski

发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine Yanushefski

IPC分类号： G02B6/122 ,  G02B6/14 ,  G02B6/26 ,  G02B6/34 ,  G02B6/42

CPC分类号： G02B6/1228 ,  G02B6/4204

摘要： An arrangement for providing optical coupling between a free-space propagating optical signal and an ultrathin silicon waveguide formed in an upper silicon layer of a silicon-on-insulator (SOI) structure includes a silicon nanotaper structure formed in the upper silicon layer (SOI layer) of the SOI structure and coupled to the ultrathin silicon waveguide. A dielectric waveguide coupling layer, with a refractive index greater than the index of the dielectric insulating layer but less than the refractive index of silicon, is disposed so as to overly a portion of the dielectric insulating layer in a region where an associated portion of the SOI layer has been removed. An end portion of the dielectric waveguide coupling layer is disposed to overlap an end section of the silicon nanotaper to form a mode conversion region between the free-space propagating optical signal and the ultrathin silicon waveguide. A free-space optical coupling arrangement (such as a prism or grating) is disposed over the dielectric waveguide coupling layer and used to couple a propagating optical signal between free space and the dielectric waveguide coupling layer and thereafter into the ultrathin silicon waveguide.

摘要翻译： 用于在自由空间传播的光信号和形成在绝缘体上硅（SOI））结构的上硅层中的超薄硅波导之间提供光耦合的装置包括形成在上硅层（SOI层）中的硅纳米锥结构 ）和耦合到超薄硅波导。 具有大于介电绝缘层的折射率但小于硅的折射率的折射率的介质波导耦合层被布置成过度地在介电绝缘层的一部分中的相关部分 SOI层已被去除。 电介质波导耦合层的端部设置成与硅纳米锥的端部部分重叠以在自由空间传播的光信号和超薄硅波导之间形成模式转换区域。 自由空间光耦合装置（诸如棱镜或光栅）设置在介质波导耦合层之上，用于将传播的光信号耦合在自由空间与介质波导耦合层之间，然后耦合到超薄硅波导中。

公开(公告)号：US20090162013A1

公开(公告)日：2009-06-25

申请号：US12316540

申请日：2008-12-11

申请人： Mark Webster ,  Vipulkumar Patel ,  Mary Nadeau ,  Prakash Gothoskar ,  David Piede

发明人： Mark Webster ,  Vipulkumar Patel ,  Mary Nadeau ,  Prakash Gothoskar ,  David Piede

IPC分类号： G02B6/42

CPC分类号： G02B6/32 ,  G02B6/305 ,  G02B6/327

摘要： A plasma-based etching process is used to specifically shape the endface of an optical substrate supporting an optical waveguide into a contoured facet which will improve coupling efficiency between the waveguide and a free space optical signal. The ability to use standard photolithographic techniques to pattern and etch the optical endface facet allows for virtually any desired facet geometry to be formed—and replicated across the surface of a wafer for the entire group of assemblies being fabricated. A lens may be etched into the endface using a properly-defined photolithographic mask, with the focal point of the lens selected with respect to the parameters of the optical waveguide and the propagating free space signal. Alternatively, an angled facet may be formed along the endface, with the angle sufficient to re-direct reflected/scattered signals away from the optical axis.

摘要翻译： 使用基于等离子体的蚀刻工艺来将支撑光波导的光学基板的端面特别地成形为轮廓刻面，这将提高波导与自由空间光信号之间的耦合效率。 使用标准光刻技术对光学端面小平面进行图案化和刻蚀的能力允许形成任何所需的刻面几何形状，并跨越制造的整组组件在晶片的表面上复制。 可以使用适当限定的光刻掩模将透镜蚀刻到端面中，相对于光波导的参数和传播的自由空间信号选择透镜的焦点。 或者，可以沿着端面形成成角度的小面，其角度足以将反射/散射信号重新引导远离光轴。

公开(公告)号：US08121450B2

公开(公告)日：2012-02-21

申请号：US12316540

申请日：2008-12-11

申请人： Mark Webster ,  Vipulkumar Patel ,  Mary Nadeau ,  Prakash Gothoskar ,  David Piede

发明人： Mark Webster ,  Vipulkumar Patel ,  Mary Nadeau ,  Prakash Gothoskar ,  David Piede

IPC分类号： G02B6/32 ,  G02B6/26 ,  G02B6/42

CPC分类号： G02B6/32 ,  G02B6/305 ,  G02B6/327

摘要： A plasma-based etching process is used to specifically shape the endface of an optical substrate supporting an optical waveguide into a contoured facet which will improve coupling efficiency between the waveguide and a free space optical signal. The ability to use standard photolithographic techniques to pattern and etch the optical endface facet allows for virtually any desired facet geometry to be formed—and replicated across the surface of a wafer for the entire group of assemblies being fabricated. A lens may be etched into the endface using a properly-defined photolithographic mask, with the focal point of the lens selected with respect to the parameters of the optical waveguide and the propagating free space signal. Alternatively, an angled facet may be formed along the endface, with the angle sufficient to re-direct reflected/scattered signals away from the optical axis.

摘要翻译： 使用基于等离子体的蚀刻工艺来将支撑光波导的光学基板的端面特别地成形为轮廓刻面，这将提高波导与自由空间光信号之间的耦合效率。 使用标准光刻技术对光学端面小平面进行图案化和刻蚀的能力允许形成任何所需的刻面几何形状，并跨越制造的整组组件在晶片的表面上复制。 可以使用适当限定的光刻掩模将透镜蚀刻到端面中，相对于光波导的参数和传播的自由空间信号选择透镜的焦点。 或者，可以沿着端面形成成角度的小面，其角度足以将反射/散射信号重新引导远离光轴。

公开(公告)号：US07447395B2

公开(公告)日：2008-11-04

申请号：US11810591

申请日：2007-06-06

申请人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

发明人： Robert Keith Montgomery ,  Margaret Ghiron ,  Prakash Gothoskar ,  Paulius Mindaugas Mosinskis ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Mark Webster

IPC分类号： G02B6/12 ,  G02F1/295

CPC分类号： G02F1/025 ,  G02F1/0147 ,  G02F1/225 ,  G02F2201/126

摘要： A silicon-based optical modulator structure includes one or more separate localized heating elements for changing the refractive index of an associated portion of the structure and thereby providing corrective adjustments to address unwanted variations in device performance. Heating is provided by thermo-optic devices such as, for example, silicon-based resistors, silicide resistors, forward-biased PN junctions, and the like, where any of these structures may easily be incorporated with a silicon-based optical modulator. The application of a DC voltage to any of these structures will generate heat, which then transfers into the waveguiding area. The increase in local temperature of the waveguiding area will, in turn, increase the refractive index of the waveguiding in the area. Control of the applied DC voltage results in controlling the refractive index.

摘要翻译： 基于硅的光学调制器结构包括一个或多个单独的局部加热元件，用于改变结构的相关部分的折射率，从而提供校正调整以解决器件性能的不期望的变化。 加热由诸如硅基电阻器，硅化物电阻器，正向偏置PN结等的热光器件提供，其中这些结构中的任何一种可以容易地与硅基光学调制器结合。 对这些结构中的任何一个施加直流电压将产生热量，然后传递到波导区域。 波导区域的局部温度的增加又将增加该区域中波导的折射率。 施加的直流电压的控制导致控制折射率。

公开(公告)号：US07003196B2

公开(公告)日：2006-02-21

申请号：US10935145

申请日：2004-09-07

申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

IPC分类号： G02B6/34

CPC分类号： G02B6/12007 ,  G02B6/122 ,  G02B6/29311 ,  G02B6/34

摘要： A coupling arrangement for allowing multiple wavelengths to be coupled into and out of a relatively thin silicon optical waveguide layer utilizes a diffractive optical element, in the form of a volume phase grating, in combination with a prism coupling structure. The diffractive optical element is formed to comprise a predetermined modulation index sufficient to diffract the various wavelengths through angles associated with improving the coupling efficiency of each wavelength into the silicon waveguide. The diffractive optical element may be formed as a separate element, or formed as an integral part of the coupling facet of the prism coupler.

摘要翻译： 用于允许多个波长耦合到相对薄的硅光波导层中的耦合布置利用体积相位光栅的形式的衍射光学元件与棱镜耦合结构组合。 衍射光学元件被形成为包括足以将各种波长衍射成与提高每个波长到硅波导的耦合效率相关联的角度的预定调制指数。 衍射光学元件可以形成为单独的元件，或者形成为棱镜耦合器的耦合面的整体部分。

公开(公告)号：US08803269B2

公开(公告)日：2014-08-12

申请号：US13463408

申请日：2012-05-03

申请人： Kalpendu Shastri ,  Vipulkumar Patel ,  Mark Webster ,  Prakash Gothoskar ,  Ravinder Kachru ,  Soham Pathak ,  Rao V. Yelamarty ,  Thomas Daugherty ,  Bipin Dama ,  Kaushik Patel ,  Kishor Desai

发明人： Kalpendu Shastri ,  Vipulkumar Patel ,  Mark Webster ,  Prakash Gothoskar ,  Ravinder Kachru ,  Soham Pathak ,  Rao V. Yelamarty ,  Thomas Daugherty ,  Bipin Dama ,  Kaushik Patel ,  Kishor Desai

IPC分类号： H01L31/0232 ,  H01L29/40 ,  H01L23/053 ,  H01L23/12

CPC分类号： H01L25/50 ,  G02B6/423 ,  G02B6/4244 ,  G02B6/4245 ,  G02B6/4249 ,  G02B6/4257 ,  G02B6/426 ,  H01L25/167 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014

摘要： A wafer scale implementation of an opto-electronic transceiver assembly process utilizes a silicon wafer as an optical reference plane and platform upon which all necessary optical and electronic components are simultaneously assembled for a plurality of separate transceiver modules. In particular, a silicon wafer is utilized as a “platform” (interposer) upon which all of the components for a multiple number of transceiver modules are mounted or integrated, with the top surface of the silicon interposer used as a reference plane for defining the optical signal path between separate optical components. Indeed, by using a single silicon wafer as the platform for a large number of separate transceiver modules, one is able to use a wafer scale assembly process, as well as optical alignment and testing of these modules.

摘要翻译： 光电子收发器组件过程的晶片级实现利用硅晶片作为光学参考平面和平台，同时为多个单独的收发器模块组装所有必需的光学和电子部件。 特别地，硅晶片被用作“平台”（插入器），在其上安装或集成多个收发器模块的所有组件，硅插入器的顶表面用作参考平面，用于定义 分离光学元件之间的光信号路径。 实际上，通过使用单个硅晶片作为大量单独的收发器模块的平台，可以使用晶片尺度组装过程以及这些模块的光学对准和测试。

公开(公告)号：US07440703B2

公开(公告)日：2008-10-21

申请号：US11362305

申请日：2006-02-22

申请人： Kalpendu Shastri ,  Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Soham Pathak ,  Katherine A. Yanushefski

发明人： Kalpendu Shastri ,  Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Soham Pathak ,  Katherine A. Yanushefski

IPC分类号： H04B10/04 ,  G02B26/00 ,  G02B6/26

CPC分类号： G02F1/025 ,  G02F1/0121 ,  G02F1/225 ,  G02F2001/0152 ,  H04B10/505 ,  H04B10/58

摘要： An electro-optic modulator arrangement for achieving switching speeds greater than 1 Gb/s utilizes pre-emphasis pulses to accelerate the change in refractive index of the optical waveguide used to form the electro-optic modulator. In one embodiment, a feedback loop may be added to use a portion of the modulated optical output signal to adjust the magnitude and duration of the pre-emphasis pulses, as well as the various reference levels used for modulated. For free carrier-based electro-optic modulators, including silicon-based electro-optic modulators, the pre-emphasis pulses are used to accelerate the movement of free carriers at the transitions between input signal data values.

摘要翻译： 用于实现大于1Gb / s的开关速度的电光调制器装置利用预加重脉冲来加速用于形成电光调制器的光波导的折射率变化。 在一个实施例中，可以添加反馈回路以使用调制的光输出信号的一部分来调整预加重脉冲的幅度和持续时间以及用于调制的各种参考电平。 对于基于硅的电光调制器的自由载体的电光调制器，预加重脉冲用于加速在输入信号数据值之间的转变处的自由载流子的移动。

公开(公告)号：US07065301B2

公开(公告)日：2006-06-20

申请号：US10842064

申请日：2004-05-10

申请人： Kalpendu Shastri ,  Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Soham Pathak ,  Katherine A. Yanushefski

发明人： Kalpendu Shastri ,  Prakash Gothoskar ,  Margaret Ghiron ,  Vipulkumar Patel ,  Robert Keith Montgomery ,  Soham Pathak ,  Katherine A. Yanushefski

IPC分类号： H04B10/04 ,  G02B26/00

CPC分类号： G02F1/025 ,  G02F1/0121 ,  G02F1/225 ,  G02F2001/0152 ,  H04B10/505 ,  H04B10/58

摘要： An electro-optic modulator arrangement for achieving switching speeds greater than 1 Gb/s utilizes pre-emphasis pulses to accelerate the change in refractive index of the optical waveguide used to form the electro-optic modulator. In one embodiment, a feedback loop may be added to use a portion of the modulated optical output signal to adjust the magnitude and duration of the pre-emphasis pulses, as well as the various reference levels used for modulated. For free carrier-based electro-optic modulators, including silicon-based electro-optic modulators, the pre-emphasis pulses are used to accelerate the movement of free carriers at the transitions between input signal data values.

摘要翻译： 用于实现大于1Gb / s的开关速度的电光调制器装置利用预加重脉冲来加速用于形成电光调制器的光波导的折射率变化。 在一个实施例中，可以添加反馈回路以使用调制的光输出信号的一部分来调整预加重脉冲的幅度和持续时间以及用于调制的各种参考电平。 对于基于硅的电光调制器的自由载体的电光调制器，预加重脉冲用于加速在输入信号数据值之间的转变处的自由载流子的移动。

公开(公告)号：US07187837B2

公开(公告)日：2007-03-06

申请号：US11069852

申请日：2005-02-28

申请人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

发明人： Prakash Gothoskar ,  Margaret Ghiron ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Kalpendu Shastri ,  Soham Pathak ,  Katherine A. Yanushefski

IPC分类号： G02B6/26 ,  G02B6/10 ,  H01L29/22 ,  H01L33/00 ,  H01L27/14 ,  H01L31/00

CPC分类号： G02B6/12004 ,  G02F1/025 ,  G02F1/292 ,  G02F2001/294

摘要： An arrangement for actively controlling, in two dimensions, the manipulation of light within an SOI-based optical structure utilizes doped regions formed within the SOI layer and a polysilicon layer of a silicon-insulator-silicon capacitive (SISCAP) structure. The regions are oppositely doped so as to form an active device, where the application of a voltage potential between the oppositely doped regions functions to modify the refractive index in the affected area and alter the properties of an optical signal propagating through the region. The doped regions may be advantageously formed to exhibit any desired “shaped” (such as, for example, lenses, prisms, Bragg gratings, etc.), so as to manipulate the propagating beam as a function of the known properties of these devices. One or more active devices of the present invention may be included within a SISCAP formed, SOI-based optical element (such as, for example, a Mach-Zehnder interferometer, ring resonator, optical switch, etc.) so as to form an active, tunable element.

摘要翻译： 用于主动地控制SOI基光学结构内的光的操纵的布置利用形成在SOI层内的掺杂区域和硅绝缘体 - 硅电容（SISCAP）结构的多晶硅层。 这些区域相反地掺杂以形成有源器件，其中在相对掺杂区域之间施加电压电位用于改变受影响区域中的折射率并改变传播通过该区域的光信号的特性。 可以有利地形成掺杂区域以呈现任何期望的“成形”（例如，透镜，棱镜，布拉格光栅等），以便根据这些器件的已知特性来操纵传播光束。 本发明的一个或多个有源器件可以包括在形成SISCAP的SOI基光学元件（例如，诸如Mach-Zehnder干涉仪，环形谐振器，光学开关等）中，以形成活跃的 ，可调元素。

公开(公告)号：US07020364B2

公开(公告)日：2006-03-28

申请号：US10668947

申请日：2003-09-23

申请人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

发明人： Margaret Ghiron ,  Prakash Gothoskar ,  Robert Keith Montgomery ,  Vipulkumar Patel ,  Soham Pathak ,  Kalpendu Shastri ,  Katherine A. Yanushefski

IPC分类号： G02B6/34

CPC分类号： G02B6/4206

摘要： A trapezoidal shaped single-crystal silicon prism is formed and permanently attached to an SOI wafer, or any structure including a silicon optical waveguide. In order to provide efficient optical coupling, the dopant species and concentration within the silicon waveguide is chosen such that the refractive index of the silicon waveguide is slightly less than that of the prism coupler (refractive index of silicon≈3.5). An intermediate evanescent coupling layer, disposed between the waveguide and the prism coupler, comprises a refractive index less than both the prism and the waveguide. In one embodiment, the evanescent coupling layer comprises a constant thickness. In an alternative embodiment, the evanescent coupling layer may be tapered to improve coupling efficiency between the prism and the waveguide. Methods of making the coupling arrangement are also disclosed.

摘要翻译： 形成梯形形状的单晶硅棱镜，并且永久地附着到SOI晶片或包括硅光波导的任何结构。 为了提供有效的光耦合，选择硅波导内的掺杂物种类和浓度使得硅波导的折射率略小于棱镜耦合器的折射率（硅折射率为0.35）。 设置在波导和棱镜耦合器之间的中间消逝耦合层包括小于棱镜和波导两者的折射率。 在一个实施例中，ev逝耦合层包括恒定的厚度。 在替代实施例中，渐逝耦合层可以是锥形的，以提高棱镜和波导之间的耦合效率。 还公开了制造耦合装置的方法。