Magnetoresistive Structures and Fabrication Methods
    22.
    发明申请
    Magnetoresistive Structures and Fabrication Methods 有权
    磁阻结构及制作方法

    公开(公告)号:US20060238925A1

    公开(公告)日:2006-10-26

    申请号:US10907974

    申请日:2005-04-22

    CPC classification number: G11B5/3929 B82Y10/00 G11B2005/3996

    Abstract: Disclosed herein is a magnetoresistive structure, for example useful as a spin-valve or GMR stack in a magnetic sensor, and a fabrication method thereof. The magnetoresistive structure uses twisted coupling to induce a perpendicular magnetization alignment between the free layer and the pinned layer. Ferromagnetic layers of the free and pinned layers are exchange-coupled using antiferromagnetic layers having substantially parallel exchange-biasing directions. Thus, embodiments can be realized that have antiferromagnetic layers formed of a same material and/or having a same blocking temperature. At least one of the free and pinned layers further includes a second ferromagnetic layer and an insulating layer, such as a NOL, between the two ferromagnetic layers. The insulating layer causes twisted coupling between the two ferromagnetic layers, rotating the magnetization direction of one 90 degrees relative to the magnetization direction of the other.

    Abstract translation: 这里公开了一种例如在磁传感器中用作自旋阀或GMR堆叠的磁阻结构及其制造方法。 磁阻结构使用扭转耦合来引起自由层和被钉扎层之间的垂直磁化对准。 使用具有基本平行的交换偏压方向的反铁磁层来交换耦合自由和被钉扎层的铁磁层。 因此,可以实现具有由相同材料形成的反铁磁层和/或具有相同阻挡温度的实施例。 自由和被钉扎层中的至少一个还包括在两个铁磁层之间的第二铁磁层和绝缘层,例如NOL。 绝缘层引起两个铁磁层之间的扭转耦合,使相对于另一个的磁化方向旋转90度的磁化方向。

    MRAM arrays and methods for writing and reading magnetic memory devices
    23.
    发明申请
    MRAM arrays and methods for writing and reading magnetic memory devices 有权
    MRAM阵列和写入和读取磁存储器件的方法

    公开(公告)号:US20050243598A1

    公开(公告)日:2005-11-03

    申请号:US11115422

    申请日:2005-04-27

    CPC classification number: G11C11/1673

    Abstract: A non-destructive technique and related array for writing and reading magnetic memory cells, including sampling a first signal of a selected read line corresponding to select memory cells, applying a magnetic field to the select memory cells, sampling a second signal of the selected read line, and comparing the first and second signals to determine a logic state of the select memory cells.

    Abstract translation: 一种用于写入和读取磁存储单元的非破坏性技术和相关阵列,包括对与选择存储器单元相对应的所选读取行的第一信号进行采样,向选择存储单元施加磁场,对所选择的读取的第二信号 并且比较第一和第二信号以确定选择存储器单元的逻辑状态。

    Segmented MRAM memory array
    24.
    发明申请
    Segmented MRAM memory array 有权
    分段MRAM存储器阵列

    公开(公告)号:US20050180203A1

    公开(公告)日:2005-08-18

    申请号:US10780171

    申请日:2004-02-16

    CPC classification number: G11C11/16 G11C2213/72 G11C2213/74

    Abstract: In one example, an MRAM memory array includes a plurality of word lines, a plurality of bit lines crossing the word lines, and a plurality of first and second diodes, and magnetic tunnel junction memories. Each first diode includes a cathode, and an anode coupled to each bit line. Each second diode includes an anode, and a cathode coupled to each word line. The magnetic tunnel junction memories include a pinned layer, a free layer, and a non-magnetic layer. The non-magnetic layer is located between the pinned layer and the free layer. Each diode is positioned at crossing points of the bit lines and the word lines and connected between the first diode at the corresponding crossing bit line and the second diode at the corresponding crossing word line.

    Abstract translation: 在一个示例中,MRAM存储器阵列包括多个字线,与字线交叉的多个位线,以及多个第一和第二二极管以及磁性隧道结存储器。 每个第一二极管包括阴极和耦合到每个位线的阳极。 每个第二二极管包括阳极和耦合到每个字线的阴极。 磁性隧道结存储器包括钉扎层,自由层和非磁性层。 非磁性层位于被钉扎层和自由层之间。 每个二极管位于位线和字线的交叉点处,并连接在相应交叉位线处的第一二极管和相应交叉字线处的第二二极管之间。

    Semiconductor device with semi-insulating substrate portions and method for forming the same
    27.
    发明授权
    Semiconductor device with semi-insulating substrate portions and method for forming the same 失效
    具有半绝缘基板部分的半导体器件及其形成方法

    公开(公告)号:US07622358B2

    公开(公告)日:2009-11-24

    申请号:US11241574

    申请日:2005-09-30

    Abstract: A method for forming semi-insulating portions in a semiconductor substrate provides depositing a hardmask film over a semiconductor substructure to a thickness sufficient to prevent charged particles from passing through the hardmask. The hardmask is patterned creating openings through which charged particles pass and enter the substrate during an implantation process. The semi-insulating portions may extend deep into the semiconductor substrate and electrically insulate devices formed on opposed sides of the semi-insulating portions. The charged particles may advantageously be protons and further substrate portions covered by the patterned hardmask film are substantially free of the charged particles.

    Abstract translation: 在半导体衬底中形成半绝缘部分的方法提供了将半导体衬底上的硬掩模膜沉积到足以防止带电粒子穿过硬掩模的厚度。 硬掩模被图案化以产生开孔,在注入过程中带电粒子通过该开口进入衬底。 半绝缘部分可以深深地延伸到半导体衬底中并且电绝缘形成在半绝缘部分的相对侧上的器件。 带电粒子可以有利地是质子,并且由图案化的硬掩模膜覆盖的另外的基底部分基本上没有带电粒子。

    Advanced MRAM design
    29.
    发明申请
    Advanced MRAM design 有权
    先进的MRAM设计

    公开(公告)号:US20080186757A1

    公开(公告)日:2008-08-07

    申请号:US11743453

    申请日:2007-05-02

    CPC classification number: G11C11/16 G11C11/005 H01L2924/0002 H01L2924/00

    Abstract: Disclosed herein is a technique for created an advanced MRAM array for constructing a memory integrated circuit chip. More specifically, the disclosed principles provide for an integrated circuit memory chip comprised of a combination of at least one of an array of high-speed magnetic memory cells, and at least one of an array of high-density magnetic memory cells. Accordingly, a memory chip constructed as disclosed herein provides the benefit of both high-speed and high-density memory cells on the same memory chip. As a result, applications benefiting from the use of (or perhaps even needing) high-speed memory cells are provided by the memory cells in the high-speed memory cell array.

    Abstract translation: 这里公开了一种用于创建用于构建存储器集成电路芯片的高级MRAM阵列的技术。 更具体地,所公开的原理提供了由高速磁存储器单元的阵列中的至少一个和高密度磁存储单元阵列中的至少一个的组合构成的集成电路存储器芯片。 因此,如本文所公开的构造的存储器芯片提供了在相同存储器芯片上的高速和高密度存储器单元的益处。 结果,受益于使用(或甚至需要的)高速存储器单元的应用由高速存储单元阵列中的存储单元提供。

    Yellow dye compound and the ink composition thereof
    30.
    发明授权
    Yellow dye compound and the ink composition thereof 失效
    黄色染料化合物及其油墨组合物

    公开(公告)号:US07270702B1

    公开(公告)日:2007-09-18

    申请号:US11452909

    申请日:2006-06-15

    CPC classification number: C09D11/32 C09B29/363

    Abstract: The present invention discloses a yellow dye compound having a structure of the following formula (I): wherein M is H, Li, NH4 or Na. The dye compound of the present invention is particularly applied to yellow dye compound for paper-printing ink jet ink and can be made into yellow ink jet ink with greenish yellow, wide color gamut, and excellent solubility.

    Abstract translation: 本发明公开了具有下式(I)结构的黄色染料化合物:其中M为H,Li,NH 4或Na。 本发明的染料化合物特别适用于纸张喷墨油墨的黄色染料化合物,并且可以制成具有黄绿色,宽色域和优异溶解性的黄色喷墨油墨。

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