公开(公告)号：US06914920B2

公开(公告)日：2005-07-05

申请号：US10360372

申请日：2003-02-07

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S3/097 ,  H01S3/225 ,  H01S3/10 ,  G05F1/00 ,  H01S3/13 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/09705 ,  H01S3/225

摘要： The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve. In a method with proportional regulation of the charging voltage as a function of the measured pulse energy, the object stated above is met according to the invention in that the pulse energy En(p) to be adjusted for a current pulse in the current burst is calculated from the pulse energy of the preceding pulse in the current burst and an identical pulse En(p-1) of a preceding precursor burst, wherein the precursor burst is an unregulated model burst and the high voltage which is to be adjusted currently for the current pulse is calculated from the current pulse energy En(p) by dividing by the rise dE/dU of the function of the pulse energy depending on the charging voltage in the linear operating range of the radiation source.

摘要翻译： 本发明涉及一种用于以限定的脉冲序列操作的气体放电泵浦辐射源的能量稳定的方法，特别是用于在突发操作中抑制准分子激光器和EUV辐射源的过冲和下冲。 本发明的目的是找到一种新颖的可能性，用于稳定以限定的脉冲序列（脉冲串）操作的气体放电泵浦辐射源的能量发射，这使得有可能考虑到 辐射源在每次突发开始时不会重复重新校准能量 - 电压曲线。 在根据本发明的充电电压成比例地调节作为测量脉冲能量的函数的方法中，符合上述目的，因为脉冲能量E（p）< 根据当前脉冲串中的先前脉冲的脉冲能量和相同的脉冲E（n-1）来计算当前脉冲串中的电流脉冲的“/ SUP” / SUP>，其中前兆脉冲串是未调节的模型脉冲串，并且根据当前脉冲能量E SUP计算当前针对当前脉冲要调整的高电压 >（p）除以脉冲能量的函数的上升dE / dU，这取决于在辐射源的线性工作范围内的充电电压。

公开(公告)号：US06667804B1

公开(公告)日：2003-12-23

申请号：US09686483

申请日：2000-10-10

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： G01J328

CPC分类号： G01J9/0246

摘要： A wavemeter for monitoring a wavelength of emission from a tunable laser includes a spectrometer disposed within a housing having a controlled pressure, and a temperature sensor and/or a pressure sensor for sensing the temperature and/or pressure, respectively, within the housing. The temperature and/or pressure are controlled such that they have relative values, and materials are selected, each for substantially minimizing temperature sensitivity of the spectrometer, such as for providing a temperature sensitivity of the spectrometer within ±0.1 pm/°K.

摘要翻译： 用于监测来自可调谐激光器的发射波长的波长计包括设置在具有受控压力的壳体内的光谱仪，以及分别用于感测壳体内的温度和/或压力的温度传感器和/或压力传感器。 控制温度和/或压力使得它们具有相对值，并且选择材料，每个用于基本上最小化光谱仪的温度敏感性，例如用于将光谱仪的温度敏感度提供在±0.1pm /°K内。

公开(公告)号：US06553050B1

公开(公告)日：2003-04-22

申请号：US10081883

申请日：2002-02-21

申请人： Juergen Kleinschmidt ,  Peter Lokai

发明人： Juergen Kleinschmidt ,  Peter Lokai

IPC分类号： H01S322

CPC分类号： H01S3/08068 ,  H01S3/0805 ,  H01S3/105 ,  H01S3/225

摘要： An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. The resonator includes an interferometric device, which may be a resonator reflector such as an output coupling interferometer or HR reflector, or a transmissive intracavity component, including a pair of opposing reflecting surfaces tuned to produce a response maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is preferably configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress at least one side band or outer portions of the response maximum to reduce spectral purity. Preferably, this surface is non-planar, and may include a step, a recess or a raised or recessed curved portion of a quarter wavelength in height or depth, respectively, and may be cylindrical, Gaussian or spherical, and the curvature may extend over the entire reflecting surface or diameter of the incident beam. The curved surface may be part of a component that couples with a base optical block at a surface opposing the other reflecting surface, such as by a slot defined in the optical block or using an adhesive.

摘要翻译： 准分子或分子氟激光器包括填充有气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的电源电路，以及包括放电室的谐振器和一对谐振器反射器，用于产生 输出激光束。 谐振器包括干涉仪，其可以是谐振器反射器，例如输出耦合干涉仪或HR反射器，或透射腔内分量，包括一对相对的反射表面，其被调谐以在选定波长处产生响应最大值以使线宽变窄 的输出激光束。 一对相对的反射表面中的一个优选地被配置为使得干涉仪的相对的反射表面在入射光束横截面之间具有变化的光学距离，其用于抑制响应最大值的至少一个边带或外部部分 降低光谱纯度。 优选地，该表面是非平面的，并且可以分别包括高度或深度为四分之一波长的台阶，凹陷或凸起或凹陷的弯曲部分，并且可以是圆柱形，高斯或球形，并且曲率可以延伸超过 入射光束的整个反射面或直径。 弯曲表面可以是组件的一部分，其在与另一个反射表面相对的表面处与基底光学块耦合，例如通过在光学块中限定的狭槽或使用粘合剂。

公开(公告)号：US09464119B2

公开(公告)日：2016-10-11

申请号：US13203442

申请日：2010-03-04

申请人： Florian Sonntag ,  Juergen Kleinschmidt ,  Markus Hoerer ,  Kerstin Lux

发明人： Florian Sonntag ,  Juergen Kleinschmidt ,  Markus Hoerer ,  Kerstin Lux

IPC分类号： C12N7/00 ,  A61K39/23 ,  C07K14/005 ,  A61K39/00

CPC分类号： C07K14/005 ,  A61K39/0005 ,  A61K2039/5256 ,  A61K2039/5258 ,  C12N7/00 ,  C12N2750/14122 ,  C12N2750/14123 ,  C12N2750/14143

摘要： The present invention relates to nucleic acids encoding the novel parvoviral protein “assembly activating protein” (AAP), the encoded polypeptides, methods of producing the polypeptides, antibodies specific for AAP, the use of the nucleic acids for the preparation of the polypeptides, the use of the nucleic acids or the polypeptides for the preparation of the parvoviral particle and methods of producing parvoviral particles essentially consisting of VP3. Furthermore, the invention relates to parvoviral particles essentially consisting of VP3 and/or obtainable by the above method as well as expression cassettes comprising (i) a heterologous promoter and (ii) VP3 coding sequence and/or fragment Z. The invention further relates to a medicament, particularly a vaccine, comprising the parvoviral particles or expression cassettes and their use.

摘要翻译： 本发明涉及编码新型细小病毒蛋白“装配激活蛋白”（AAP）的核酸，编码多肽，产生多肽的方法，对AAP特异的抗体，使用该核酸来制备多肽， 使用核酸或多肽来制备细小病毒颗粒以及生产基本上由VP3组成的细小病毒颗粒的方法。 此外，本发明涉及基本由VP3组成和/或可通过上述方法获得的细小病毒颗粒以及包含（i）异源启动子和（ii）VP3编码序列和/或片段Z的表达盒。本发明还涉及 包括细小病毒颗粒或表达盒的药物，特别是疫苗及其用途。

公开(公告)号：US20120112101A1

公开(公告)日：2012-05-10

申请号：US13291171

申请日：2011-11-08

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： G21K5/00

CPC分类号： H05G2/008 ,  H05G2/003

摘要： The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit (7), a second beam aligning unit (4), and a beam focusing unit (5) are arranged in the vaporization beam (3) and are connected to first to third measuring devices (8, 9, 10) and can be adjusted in order to acquire and compensate for direction deviations and divergence deviations of the vaporization beam (3) with respect to reference values.

摘要翻译： 本发明涉及一种用于在基于放电等离子体的EUV辐射的产生期间稳定源位置的方法和装置。 在EUV辐射的产生期间找到用于稳定源位置的新颖可能性的目的是根据本发明满足在辐射源的操作期间能够以简单的方式补偿源位置的位置的变化的原因在于， 第一光束对准单元（7），第二光束对准单元（4）和光束聚焦单元（5）布置在蒸发光束（3）中并连接到第一至第三测量装置（8,9,10） 并且可以调节以便相对于参考值获取和补偿气化梁（3）的方向偏差和发散偏差。

公开(公告)号：US07488962B2

公开(公告)日：2009-02-10

申请号：US11421144

申请日：2006-05-31

申请人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

发明人： Vladimir Korobochko ,  Alexander Keller ,  Juergen Kleinschmidt

IPC分类号： G21K5/02

CPC分类号： H05G2/003 ,  H05G2/005

摘要： The invention is directed to an arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma. It is the object of the invention to find a novel possibility for generating intensive short-wavelength radiation, particularly EUV radiation, based on a gas discharge plasma which achieves a long life of the electrode system along with a high total efficiency of the radiation source without substantially increasing the dimensions of the discharge unit. This object is met, according to the invention, in that exclusively suitably shaped vacuum insulation areas which have the shape of an annular gap and which are formed depending on the product of gas pressure (p) and interelectrode distance (d) between the cathode and anode are provided for insulating the cathode and anode from one another in a cylindrically symmetric electrode arrangement for reliable suppression of electron arcing.

摘要翻译： 本发明涉及一种用于产生基于气体放电等离子体的强烈的短波长辐射的装置。 本发明的目的是发现基于气体放电等离子体产生强烈的短波长辐射，特别是EUV辐射的新型可能性，其能够实现电极系统的长寿命以及辐射源的高总效率而没有 大大增加了放电单元的尺寸。 根据本发明，符合本发明的目的在于，具有环形间隙形状的完全合适形状的真空绝缘区域，其取决于气体压力（p）和阴极和（d）之间的电极间距离（d）的乘积而形成 阳极被提供用于将阴极和阳极彼此隔离成圆柱形对称电极布置，以可靠地抑制电子弧。

公开(公告)号：US07476884B2

公开(公告)日：2009-01-13

申请号：US11354324

申请日：2006-02-14

申请人： Kai Gaebel ,  Juergen Kleinschmidt

发明人： Kai Gaebel ,  Juergen Kleinschmidt

IPC分类号： H05H1/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a source materials for the electric discharge serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

摘要翻译： 产生极紫外（EUV）辐射的装置和方法的目的是克服先前使用有效的金属发射体造成的障碍，从而可以优化转换效率，结果可以增加辐射输出 而不会缩短集光器和电极系统的使用寿命。 注射装置的注射喷嘴被引导到位于排放室中的排放区域。 注射喷嘴提供一系列单独体积的用于放电的源材料，用于以对应于气体放电频率的重复率产生辐射。 此外，提供了在排出区域中连续蒸发各个体积。

公开(公告)号：US07266137B2

公开(公告)日：2007-09-04

申请号：US11263626

申请日：2005-10-31

申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

摘要： Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.

摘要翻译： 气体放电激光器的输出光束参数通过使用气体供应单元和处理器将分子氟成分保持在预定的分压来稳定。 分子氟在放电室内会耗尽。 包括分子氟在内的气体注入可以将分子氟的分压提高一定量。 注射可以以选定的间隔进行，以使构成气体基本保持在初始分压。 基于诸如驱动电压和排放室中分子量的计算量的因素，可以改变每次注入的量和/或注射间隔。 驱动电压可以是根据系统老化进行调整的多个驱动电压范围之一。 在每个范围内，可以基于例如总施加的电能或时间/脉冲计数进行气体注入和气体替换。

公开(公告)号：US20070045573A1

公开(公告)日：2007-03-01

申请号：US11504957

申请日：2006-08-16

申请人： Juergen Kleinschmidt ,  Jens Ringling ,  Alexander Geier

发明人： Juergen Kleinschmidt ,  Jens Ringling ,  Alexander Geier

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.

摘要翻译： 本发明涉及一种基于具有12nm至14nm范围内的高辐射发射的气体放电等离子体产生EUV辐射的装置。 本发明的目的是在EUV光谱区（12nm和14nm）之间找到具有高辐射输出的等离子体辐射产生的新颖可能性，这使得可以使用锡作为EUV气体放电中的工作介质 工业应用来源。 根据本发明，满足本发明的目的在于提供一种气体制备单元，用于限定含锡工作介质的温度和压力及其在气态下进入真空室的流量。 提供至少一个隔热储存器容器和绝热供应管线，用于将气态含锡工作介质从气体制备单元转移到位于电极壳体内的预电离单元。

公开(公告)号：US06965624B2

公开(公告)日：2005-11-15

申请号：US10338779

申请日：2003-01-06

申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

IPC分类号： G02B5/18 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H01S3/00 ,  H01S3/09 ,  H01S3/097 ,  H01S3/22

CPC分类号： G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

摘要翻译： 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的分子氟成分维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 分子氟以初始分压提供，并在激光放电室内耗尽。 每次喷射包括分子氟的气体，以在激光室中选择的量增加分子氟的分压，优选地每次注射小于0.2毫巴，或者已经在其中的2％的量的7％ 在激光室内。 可以以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。 每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中分子氟的计算量而变化。 驱动电压优选地被确定为基于系统的老化而被调整的多个驱动电压范围之一。 在每个范围内，气体注入和气体替换优选基于对放电的总施加电能和/或时间和/或脉冲计数进行。