Method of providing desirable wetting and release characterstics between a mold and a polymerizable composition
    23.
    发明申请
    Method of providing desirable wetting and release characterstics between a mold and a polymerizable composition 有权
    在模具和可聚合组合物之间提供所需的润湿和释放特性的方法

    公开(公告)号:US20060175736A1

    公开(公告)日:2006-08-10

    申请号:US11244428

    申请日:2005-10-05

    Abstract: The present invention provides a method that features improved wetting characteristics while allowing preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. The method includes coating a surface of the mold with a volume of surfactant containing solution. The surfactant in the solution includes a hydrophobic component consisting essentially of a plurality of fluorine-containing molecules. The distribution of the plurality of the fluorine atoms in the fluorine-containing molecules, as well as the fluorine-containing molecules throughout the volume provides a desired contact angle with respect to a polymerizable composition disposed on the substrate. The contact angle is in a range of 50° or less.

    Abstract translation: 本发明提供了一种具有改进的润湿特性的方法,同时允许相对于基材和在其之间设置有压印材料的模具的优先粘合和释放特性。 该方法包括用一定体积的含表面活性剂的溶液涂覆模具的表面。 溶液中的表面活性剂包括基本上由多个含氟分子组成的疏水组分。 含氟分子中的多个氟原子的分布以及整个体积中的含氟分子相对于设置在基材上的可聚合组合物提供期望的接触角。 接触角在50°以下的范围内。

    Low-k dielectric functional imprinting materials
    24.
    发明申请
    Low-k dielectric functional imprinting materials 审中-公开
    低k介质功能压印材料

    公开(公告)号:US20060081557A1

    公开(公告)日:2006-04-20

    申请号:US10967740

    申请日:2004-10-18

    Abstract: In a substantially planar circuit, the conductors are separated by an inorganic material with a dielectric constant of less than about 3.0. The dielectric layers are formed in a process that includes defining trenches and/or vias for the conductors by imprinting an initially planar layer of a radiation curable composition. The imprinting die is preferably UV transparent such that the composition is UV cured while the imprint die is in place. The curable composition includes an organic modified silicate compound and a second decomposable organic component, the latter forming nanometer scale pores as the organic compounds are subsequently decomposed to provide a polysilicate matrix. The pores reduce the effective dielectric constant from that of otherwise dense silicon dioxide.

    Abstract translation: 在基本上平面的电路中,导体由介电常数小于约3.0的无机材料分开。 介电层的形成方法包括:通过压印可辐射固化组合物的初始平面层来为导体限定沟槽和/或通路。 压印模具优选是UV透明的,使得组合物在压印模具就位时被UV固化。 可固化组合物包括有机改性硅酸盐化合物和第二可分解有机组分,后者形成随着有机化合物分解的纳米尺度孔以提供聚硅酸盐基质。 孔隙比其他致密二氧化硅的孔隙有效介电常数降低。

    Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
    25.
    发明申请
    Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom 有权
    补偿设置在基板上的材料的体积收缩以从其形成基本上平面的结构的方法

    公开(公告)号:US20060068120A1

    公开(公告)日:2006-03-30

    申请号:US10951014

    申请日:2004-09-27

    Abstract: The present invention provides a method of planarizing a substrate with a template spaced-apart from the substrate having a liquid disposed therebetween, the method including: contacting the liquid with the template forming a first shape therein; and impinging radiation upon the liquid causing a reduction in volume of the liquid, with the first shape compensating for the reduction in volume such that upon impinging the actinic radiation upon the liquid, the liquid forms a contoured layer having a substantially planar shape.

    Abstract translation: 本发明提供了一种使衬底平面化的方法,该衬底具有与衬底间隔开的具有设置在其间的液体的模板,该方法包括:使液体与在其中形成第一形状的模板接触; 并且将液体的辐射照射在液体上,导致液体的体积减小,第一形状补偿了体积的减小,使得在将光化辐射照射在液体上时,液体形成具有基本上平面形状的轮廓层。

    Materials for imprint lithography
    26.
    发明申请
    Materials for imprint lithography 有权
    压印光刻材料

    公开(公告)号:US20050187339A1

    公开(公告)日:2005-08-25

    申请号:US10784911

    申请日:2004-02-23

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 C09D11/101

    Abstract: The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

    Abstract translation: 本发明涉及一种用于压印光刻的材料,其特征在于具有与之相关的粘度的组合物,并且包括表面活性剂,可聚合组分和响应于刺激物的引发剂以响应于其而改变粘度, 在液体状态下,其粘度低于约100厘泊,蒸气压小于约20托,并且在固体固化状态下,拉伸模量大于约100MPa,断裂应力大于约3MPa 并且断裂伸长率大于约2%。

    Thermal processing system for imprint lithography
    27.
    发明申请
    Thermal processing system for imprint lithography 审中-公开
    用于压印光刻的热处理系统

    公开(公告)号:US20050158419A1

    公开(公告)日:2005-07-21

    申请号:US10758384

    申请日:2004-01-15

    CPC classification number: B82Y10/00 B82Y40/00 G03F7/0002

    Abstract: The present invention is a system that selectively directs radiation of multiple wavelengths at a substrate to facilitate pattern formation. The system may include a wavelength discriminator to filter the radiation and an absorption layer to develop a localized heat source. The localized heat source may be employed to raise a temperature of an imprinting layer. This improves the flow rate and the fill factor of the material disposed within the imprinting layer, thus reducing the time required to fill the features defined on a mold.

    Abstract translation: 本发明是一种系统,其选择性地引导衬底上的多个波长的辐射以促进图案形成。 该系统可以包括用于过滤辐射的波长鉴别器和吸收层以形成局部热源。 可以采用局部热源来提高压印层的温度。 这改善了设置在压印层内的材料的流速和填充因子,从而减少了填充模具上限定的特征所需的时间。

    Method to improve the flow rate of imprinting material
    28.
    发明申请
    Method to improve the flow rate of imprinting material 审中-公开
    提高压印材料流动速率的方法

    公开(公告)号:US20050156353A1

    公开(公告)日:2005-07-21

    申请号:US10757778

    申请日:2004-01-15

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00

    Abstract: The present invention is a method of increasing the flow rate of an imprinting layer disposed between a source of radiation and a target to facilitate pattern formation. Infrared radiation is directed toward the target with the imprinting layer substantially transparent to infrared radiation. The target substantially absorbs the infrared radiation to create a thermal energy in the same, and the thermal energy is subsequently transferred to the liquid, causing a temperature rise of the liquid, and thus improving a flow rate of the imprinting layer and reducing the time required to fill the features defined on a mold.

    Abstract translation: 本发明是一种增加设置在辐射源和靶之间的压印层的流速以促进图案形成的方法。 红外辐射指向靶,其中压印层对于红外辐射基本上是透明的。 目标基本上吸收红外辐射以在其中产生热能,并且热能随后转移到液体中,引起液体的温度上升,从而改善压印层的流速并减少所需的时间 填补模具上定义的特征。

    Composition to Reduce Adhesion Between a Conformable Region and a Mold
    29.
    发明申请
    Composition to Reduce Adhesion Between a Conformable Region and a Mold 审中-公开
    降低适形区域和模具之间粘合性的成分

    公开(公告)号:US20070272825A1

    公开(公告)日:2007-11-29

    申请号:US11837757

    申请日:2007-08-13

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00

    Abstract: The present invention provides compositions that feature improved preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. To that end, the compositions facilitate bifurcation of the imprinting into a surfactant-component-rich sub-portion and a surfactant-component-depleted sub-portion located between said surfactant-component-rich sub-portion and said substrate. This surfactant-component-rich sub-portion attenuates the adhesion forces between the mold and the imprinting material, once solidified.

    Abstract translation: 本发明提供了相对于基底和具有设置在其间的压印材料的模具具有改进的优先粘附和释放特性的组合物。 为此,组合物有利于将压印物分成富含表面活性剂组分的亚部分和位于所述富表面活性剂组分的子部分和所述底物之间的表面活性剂组分贫乏的子部分。 该表面活性剂成分丰富的子部分一旦固化,就会使模具和压印材料之间的粘合力衰减。

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