摘要:
One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.
摘要:
The invention provides a miniaturized optical column for a charged particle beam apparatus for examining a specimen (14). The column is constituted by, among other things, a charged particle source (2) for providing a beam of charged particles (10); a lens system for guiding the beam of charged particles (10) from the source (2) onto the specimen (14); and a housing (40) which, during operation, is set on beam boost potential.
摘要:
The invention relates to a device for corpuscular-optical examination and/or processing of material samples in which the column and the table system are rotatable relative to one another about a first axis of rotation which encloses a specific angle of inclination with a perpendicular to the object plane, the column being arranged in such a way that its optical axis forms the same angle of inclination with the first axis of rotation. A device of this type is distinguished over known constructions by a substantially simpler construction.
摘要:
A spectrometer objective includes a generally asymmetrical objective lens having a short focal length, a deflection system disposed within the objective lens symmetrically relative to an optical axis, and an electrostatic retarding field spectrometer including an electrode arrangement for accelerating the secondary electrons generated on the specimen. The electrode arrangement of the retarding field spectrometer includes an electrode pair for establishing a spherically symmetrical retarding field. The electrode arrangement for extracting and accelerating the secondary particles includes a grid electrode disposed in a region of the lower pole piece of the objective lens and of a planar electrode disposed in the particle beam path immediately above the specimen, wherein the planar electrode is charged with a potential lying between the potential of the specimen and the potential of the grid electrode.
摘要:
There is disclosed a scanning particle microscope in which the adverse influence of the Boersch effect is reduced. This is achieved by providing an elastrostatic retardation element in the particle optics unit to decelerate the particle from a first energy, at which the particles are generated, to a second energy which is less than half of the first energy.
摘要:
A method for setting voltage resolution in particle beam measuring devices wherein band width of a measured signal processing is modified. In order to set a desired voltage resolution simply, reliably, and with high precision, a signal noise of the measured signal is measured. This signal noise is compared to a desired value for the measured signal resolution, and the band width of the measured signal processing is modified such that the signal noise of the measured signal is less than or equal to the desired value for the measured signal resolution.
摘要:
A method for representing logic changes of state occurring at a plurality of adjacent circuit nodes in an integrated circuit in the form of a logic image employs a pulsed electron probe which always scans a same path in the x-direction on the integrated circuit and the phase of the electron pulses comprising the pulsed electron probe is continuously shifted for each new scanning operation. The integrated circuit can be imaged up to the edge of a recording or field of view limit and it is only at this limit that the y-deflection of the pulsed electron probe is fixed. Very small spacings, such as those occurring between adjacent integrated circuit tracks, can thus be reliably imaged on the picture screen of the scanning electron microscope.
摘要:
A method for measuring a resistance and a capacitance of an electronic component utilizes electron beam measuring technology to impress a current I.sub.A by means of a pulsed electron beam on the component. A potential curve U(t) which arises during the pulse on the electronic component as a result of the impressed current is utilized together with the known current to determine the resistance R and the capacitance C by means of an appropriate selection of two measuring points U(t.sub.1) and U(t.sub.2) on the potential curve.BACKGROUND OF THE INVENTIONThe invention relates to a method for measuring resistances and capacitances of eletronic components.Up to now, the measurement of resistances and capacitances of electronic components was carried out with a mechanical probe. The smallest measurable capacitance according to this method amounted to 1 pF. The loading effects associated with such probes affects accurate measurement.
摘要:
An electron beam testing device system for stroboscopic potential measurements of a test subject utilizes a scanning electron microscope having a beam suppression or blanking system. The blanking system deflects the electron beam across an aperture during each edge of a blanking pulse connected to control the blanking system so that two electron pulses are generated for each blanking pulse. A detector produces a signal responsive to a secondary electron beam resulting from impact of each of the electron pulses on the test subject. A signal processing unit with an associated gate circuit all preferably incorporated in a boxcar integrator processes only one of the two electron pulses associated with each blanking pulse. A phase control preferably within the boxcar integrator is connected to control the gate circuit and a blanking pulse generator for producing the blanking pulse.
摘要:
The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.