3-dimensional integrated circuit architecture, structure and method for fabrication thereof
    21.
    发明授权
    3-dimensional integrated circuit architecture, structure and method for fabrication thereof 有权
    三维集成电路体系结构及其制造方法

    公开(公告)号:US07692944B2

    公开(公告)日:2010-04-06

    申请号:US12127086

    申请日:2008-05-27

    IPC分类号: G11C5/02

    摘要: An integrated circuit design, structure and method for fabrication thereof includes at least one logic device layer and at least two additional separate memory array layers. Each of the logic device layer and the at least two memory array layers is independently optimized for a particular type of logic device or memory device disposed therein. Preferably also disposed within the logic device layer are array sense amplifiers, memory array output drivers and like higher performance circuitry otherwise generally disposed within memory array layer substrates. All layers may be independently powered to provide additional performance enhancement.

    摘要翻译: 其制造的集成电路设计,结构和方法包括至少一个逻辑器件层和至少两个额外的分开的存储器阵列层。 对于设置在其中的特定类型的逻辑设备或存储器件,逻辑器件层和至少两个存储器阵列层中的每一个被独立地优化。 优选地还设置在逻辑器件层内的是阵列读出放大器,存储器阵列输出驱动器和类似的高性能电路,否则通常设置在存储器阵列层衬底内。 所有层可以独立供电以提供额外的性能增强。

    VERTICAL THROUGH-SILICON VIA FOR A SEMICONDUCTOR STRUCTURE
    22.
    发明申请
    VERTICAL THROUGH-SILICON VIA FOR A SEMICONDUCTOR STRUCTURE 有权
    通过半导体结构的垂直硅

    公开(公告)号:US20100052108A1

    公开(公告)日:2010-03-04

    申请号:US12201580

    申请日:2008-08-29

    IPC分类号: H01L23/48 H01L21/768

    摘要: A semiconductor structure includes at least one silicon substrate having first and second planar surfaces, and at least one through silicon via filled with a conductive material and extending vertically through the first planar surface of the at least one silicon substrate to the second planar surface thereof. The through silicon via forms a vertical interconnection between a plurality of electronic circuits and an amount of dielectric insulation surrounding the through silicon via is varied based on a defined function of the through silicon via.

    摘要翻译: 半导体结构包括具有第一和第二平面表面的至少一个硅衬底,以及填充有导电材料并且至少穿过至少一个硅衬底的第一平坦表面垂直延伸到其第二平坦表面的至少一个穿硅通孔。 穿通硅通孔在多个电子电路之间形成垂直互连,并且围绕穿过硅通孔的绝缘绝缘体的量基于硅通孔的限定功能而变化。

    DEEP TRENCH ELECTROSTATIC DISCHARGE (ESD) PROTECT DIODE FOR SILICON-ON-INSULATOR (SOI) DEVICES
    23.
    发明申请
    DEEP TRENCH ELECTROSTATIC DISCHARGE (ESD) PROTECT DIODE FOR SILICON-ON-INSULATOR (SOI) DEVICES 有权
    用于硅绝缘体(SOI)器件的深度放电静电放电(ESD)保护二极管

    公开(公告)号:US20100052100A1

    公开(公告)日:2010-03-04

    申请号:US12201462

    申请日:2008-08-29

    IPC分类号: H01L29/8605 H01L21/02

    摘要: A semiconductor structure is disclosed. The semiconductor structure includes a bulk substrate of a first polarity type, a buried insulator layer disposed on the bulk substrate, an active semiconductor layer disposed on top of the buried insulator layer including a shallow trench isolation region and a diffusion region of the first polarity type, a band region of a second polarity type disposed directly beneath the buried insulator layer and forming a conductive path, a well region of the second polarity type disposed in the bulk substrate and in contact with the band region, a deep trench filled with a conductive material of the first polarity type disposed within the well region, and an electrostatic discharge (ESD) protect diode defined by a junction between a lower portion of the deep trench and the well region.

    摘要翻译: 公开了半导体结构。 半导体结构包括第一极性类型的体基板,设置在体基板上的掩埋绝缘体层,设置在包括浅沟槽隔离区域和第一极性类型的扩散区域的掩埋绝缘体层的顶部上的有源半导体层 设置在掩埋绝缘体层正下方并形成导电路径的第二极性类型的带区域,设置在本体衬底中并与带区接触的第二极性类型的阱区,填充有导电的深沟槽 设置在阱区内的第一极性类型的材料以及由深沟槽的下部和阱区之间的接合部限定的静电放电(ESD)保护二极管。

    Error correcting logic system
    24.
    发明授权
    Error correcting logic system 有权
    错误校正逻辑系统

    公开(公告)号:US07642813B2

    公开(公告)日:2010-01-05

    申请号:US11850857

    申请日:2007-09-06

    CPC分类号: H03K19/007

    摘要: The invention includes an error correcting logic system that allows critical circuits to be hardened with only one redundant unit and without loss of circuit performance. The system provides an interconnecting gate that suppresses a fault in one of at least two redundant dynamic logic gates that feed to the interconnecting gate. The system is applicable to dynamic or static logic systems. The system prevents propagation of a fault, and addresses not only soft errors, but noise-induced errors. Also, there is provided a design structure embodied in a machine readable medium used in a design process, and which includes such error correcting logic system.

    摘要翻译: 本发明包括纠错逻辑系统,其允许仅使用一个冗余单元来硬化关键电路并且不损失电路性能。 该系统提供互连门,其抑制馈送到互连门的至少两个冗余动态逻辑门之一的故障。 该系统适用于动态或静态逻辑系统。 该系统防止故障传播,不仅解决软错误,而且还会引起噪声引起的错误。 此外,提供了在设计过程中使用的机器可读介质中体现的设计结构,并且包括这种纠错逻辑系统。

    APPARATUS AND METHOD FOR IMPLEMENTING MATRIX-BASED SEARCH CAPABILITY IN CONTENT ADDRESSABLE MEMORY DEVICES
    25.
    发明申请
    APPARATUS AND METHOD FOR IMPLEMENTING MATRIX-BASED SEARCH CAPABILITY IN CONTENT ADDRESSABLE MEMORY DEVICES 有权
    在内容可寻址存储器件中实现基于矩阵的搜索能力的装置和方法

    公开(公告)号:US20090141527A1

    公开(公告)日:2009-06-04

    申请号:US11949063

    申请日:2007-12-03

    IPC分类号: G11C15/04

    CPC分类号: G11C15/04

    摘要: A content addressable memory (CAM) device includes an array of memory cells arranged in rows in a word line direction and columns arranged in a bit line direction, and compare circuitry configured to compare data presented to the array with data stored in each row and column of the array, and simultaneously indicate match results on each row and column of the array, thereby resulting in a two-dimensional, matrix-based data comparison operation.

    摘要翻译: 一种内容可寻址存储器(CAM)装置,包括排列成字线方向的存储单元阵列和排列在位线方向上的列,以及比较电路,被配置为将呈现给阵列的数据与存储在每行和列中的数据进行比较 并且同时指示阵列的每一行和列上的匹配结果,从而导致二维的基于矩阵的数据比较操作。

    THREE DIMENSIONAL VERTICAL E-FUSE STRUCTURES AND METHODS OF MANUFACTURING THE SAME
    26.
    发明申请
    THREE DIMENSIONAL VERTICAL E-FUSE STRUCTURES AND METHODS OF MANUFACTURING THE SAME 失效
    三维垂直电子熔断器结构及其制造方法

    公开(公告)号:US20090085152A1

    公开(公告)日:2009-04-02

    申请号:US11865079

    申请日:2007-10-01

    IPC分类号: H01L23/62 H01L21/44

    摘要: Three dimensional vertical e-fuse structures and methods of manufacturing the same are provided herein. The method of forming a fuse structure comprises providing a substrate including an insulator layer and forming an opening in the insulator layer. The method further comprises forming a conductive layer along a sidewall of the opening and filling the opening with an insulator material. The vertical e-fuse structure comprises a first contact layer and a second contact layer. The structure further includes a conductive material lined within a via and in electrical contact with the first contact layer and the second contact layer. The conductive material has an increased resistance as a current is applied thereto.

    摘要翻译: 本文提供三维垂直电子熔丝结构及其制造方法。 形成熔丝结构的方法包括提供包括绝缘体层并在绝缘体层中形成开口的衬底。 该方法还包括沿着开口的侧壁形成导电层并用绝缘体材料填充开口。 垂直e熔丝结构包括第一接触层和第二接触层。 该结构还包括衬里在通孔内并与第一接触层和第二接触层电接触的导电材料。 当施加电流时,导电材料具有增加的电阻。

    MULTI-WAFER 3D CAM CELL
    27.
    发明申请
    MULTI-WAFER 3D CAM CELL 审中-公开
    多画面三维CAMCELL

    公开(公告)号:US20080288720A1

    公开(公告)日:2008-11-20

    申请号:US11750676

    申请日:2007-05-18

    摘要: A multi-wafer CAM cell in which the negative effects of increased travel distance have been substantially reduced is provided. The multi-wafer CAM cell is achieved in the present invention by utilizing three-dimensional integration in which multiple active circuit layers are vertically stack and vertically aligned interconnects are employed to connect a device from one of the stacked layers to another device in another stack layer. By vertically stacking multiple active circuit layers with vertically aligned interconnects, each compare port of the inventive CAM cell can be implemented on a separate layer above or below the primary data storage cell. This allows the multi-wafer CAM structure to be implemented within the same area footprint as a standard Random Access Memory (RAM) cell, minimizing data access and match compare delays.

    摘要翻译: 提供了一种多晶圆CAM单元,其中增加行程距离的负面影响已经大大减少。 本发明通过利用三维积分实现多晶片CAM单元,其中多个有源电路层是垂直堆叠的并且垂直排列的互连件用于将来自堆叠层之一的器件连接到另一堆叠层中的另一器件 。 通过垂直堆叠具有垂直排列的互连的多个有源电路层,可以在主数据存储单元上方或下方的单独的层上实现本发明的CAM单元的每个比较端口。 这允许多晶片CAM结构在与标准随机存取存储器(RAM)单元相同的区域覆盖范围内实现,从而最小化数据访问并匹配比较延迟。

    3-dimensional integrated circuit architecture, structure and method for fabrication thereof
    29.
    发明授权
    3-dimensional integrated circuit architecture, structure and method for fabrication thereof 有权
    三维集成电路体系结构及其制造方法

    公开(公告)号:US07408798B2

    公开(公告)日:2008-08-05

    申请号:US11278189

    申请日:2006-03-31

    IPC分类号: G11C5/02

    摘要: An integrated circuit design, structure and method for fabrication Thereof includes at least one logic device layer and at least two additional separate memory array layers. Each of the logic device layer and the at least two memory array layers is independently optimized for a particular type of logic device or memory device disposed therein. Preferably also disposed within the logic device layer are array sense amplifiers, memory array output drivers and like higher performance circuitry otherwise generally disposed within memory array layer substrates. All layers may be independently powered to provide additional performance enhancement.

    摘要翻译: 其制造的集成电路设计,结构和方法包括至少一个逻辑器件层和至少两个附加的独立存储器阵列层。 对于设置在其中的特定类型的逻辑设备或存储器件,逻辑器件层和至少两个存储器阵列层中的每一个被独立地优化。 优选地还设置在逻辑器件层内的是阵列读出放大器,存储器阵列输出驱动器和类似的高性能电路,否则通常设置在存储器阵列层衬底内。 所有层可以独立供电以提供额外的性能增强。

    ERROR CORRECTING LOGIC SYSTEM
    30.
    发明申请
    ERROR CORRECTING LOGIC SYSTEM 有权
    错误修正逻辑系统

    公开(公告)号:US20080048711A1

    公开(公告)日:2008-02-28

    申请号:US11926386

    申请日:2007-10-29

    IPC分类号: H03K19/003

    CPC分类号: H03K19/007

    摘要: The invention includes an error correcting logic system that allows critical circuits to be hardened with only one redundant unit and without loss of circuit performance. The system provides an interconnecting gate that suppresses a fault in one of at least two redundant dynamic logic gates that feed to the interconnecting gate. The system is applicable to dynamic or static logic systems. The system prevents propagation of a fault, and addresses not only soft errors, but noise-induced errors.

    摘要翻译: 本发明包括纠错逻辑系统,其允许仅使用一个冗余单元来硬化关键电路并且不损失电路性能。 该系统提供互连门,其抑制馈送到互连门的至少两个冗余动态逻辑门之一的故障。 该系统适用于动态或静态逻辑系统。 该系统防止故障传播,不仅解决软错误,而且还会引起噪声引起的错误。