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公开(公告)号：US20240312772A1
公开(公告)日：2024-09-19
申请号：US18122509
申请日：2023-03-16
Applicant: MKS Instruments, Inc.
Inventor： Chiu-Ying Tai , Michael Harris , Ilya Pokidov , Joseph Desjardins , Gordon Hill
IPC: H01J37/32
CPC classification number: H01J37/32935 , H01J37/32357 , H01J2237/24564
Abstract: An in-situ current sensing apparatus for a plasma processing system has one or more sections defining a plasma channel, the plasma processing system configured to form a plasma in the plasma channel using a process gas. The in-situ current sensing apparatus includes an assembly including an electrically conductive housing coupled to a dielectric coating layer, wherein a surface of the dielectric coating layer is configured to physically contact at least one of the process gas or the plasma in the plasma channel. The in-situ current sensing apparatus also includes a current probe, inductively or electrically connected to the assembly, for sensing a capacitively-coupled current within the assembly caused by the formation of plasma in the plasma channel. The in-situ current-sensing apparatus further includes at least one dielectric break for electrically isolating the assembly from the one or more sections. The assembly may include an electrode embedded within the housing.
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公开(公告)号：US20240079209A1
公开(公告)日：2024-03-07
申请号：US17902208
申请日：2022-09-02
Applicant: MKS Instruments, Inc.
Inventor： Ron Collins , Andrew Cowe , Gordon Hill
IPC: H01J37/32
CPC classification number: H01J37/321 , H01J37/32513 , H01J37/32522 , H01J37/32568
Abstract: A plasma source is provided that is configured to form a section of a wall of a vacuum component. The plasma source comprises a body including a dielectric member, a first surface exposed to an exterior region of the vacuum component, and a second surface exposed to an interior region of the vacuum component. The plasma source also comprises at least one electrode disposed in a receiving channel of the body with at least a portion of the dielectric member located adjacent to the at least one electrode in the receiving channel. The plasma source further comprise at least one discharge region adjacent to the receiving channel within the body. The at least one discharge region is exposed to the interior region of the vacuum component via an opening on the second surface of the body.
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公开(公告)号：US11745229B2
公开(公告)日：2023-09-05
申请号：US16990396
申请日：2020-08-11
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill
IPC: B08B9/027 , G01N21/31 , G01N33/00 , B08B13/00 , B08B9/08 , B08B9/46 , C23C16/44 , H01J37/32 , B08B5/00
CPC classification number: B08B9/027 , B08B5/00 , B08B9/08 , B08B9/46 , B08B13/00 , C23C16/4405 , G01N21/31 , G01N33/0036 , H01J37/32963 , B08B2209/027 , B08B2209/08
Abstract: A method is provided for cleaning of a processing system comprising a wafer processing chamber and a pumping line in fluid connection with the wafer processing chamber. The method includes initiating cleaning of the wafer processing chamber by activating a chamber cleaning source and initiating cleaning of at least a portion of the pumping line by activating a foreline cleaning source coupled to the pumping line. The method also includes monitoring, at a downstream endpoint detector coupled to the pumping line, a level of a signature substance. The method further includes determining, by the downstream endpoint detector, at least one of a first endpoint of the cleaning of the wafer processing chamber or a second endpoint of the cleaning of the pumping line based on the monitoring.
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公开(公告)号：US11367598B2
公开(公告)日：2022-06-21
申请号：US17107146
申请日：2020-11-30
Applicant: MKS INSTRUMENTS, INC.
Inventor： Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号：US20210327727A1
公开(公告)日：2021-10-21
申请号：US16849871
申请日：2020-04-15
Applicant: MKS Instruments, Inc.
Inventor： Andrew B. Cowe , Gordon Hill
Abstract: An isolation valve assembly including a valve body having an inlet and an outlet. The isolation valve includes a seal plate disposed within an interior cavity of the valve body. The seal plate is movable between a first position allowing gas flow from the inlet to the outlet, and a second position preventing gas flow from the inlet to the outlet. The isolation valve includes a closure element disposed within the valve body. The closure element is configured to retain the seal plate stationary in the first position or the second position. The closure element includes a first sealing element positioned adjacent to a first surface of the seal plate. A working surface of the first sealing element is substantially obscured from the gas flow when the seal plate is stationary.
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Patent Agency Ranking
公开(公告)号：US11054058B2
公开(公告)日：2021-07-06
申请号：US16408752
申请日：2019-05-10
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , David F. Broyer , David C. Neumeister , Bradly Raymond Lefevre
Abstract: A cooled isolation valve includes a valve body, a stationary element coupled to the valve body, and a movable closure element movable with respect to the stationary element between a closed position in which the movable closure element and the stationary element are brought together and an open position. One of the movable closure element and the stationary element includes a sealing element. In the closed position of the movable closure element, the sealing element provides a seal between the movable closure element and the stationary element. A fluid channel is formed in contact with the movable closure element and movable with the movable closure element with respect to the stationary element, such that a fluid in the fluid channel effects heat transfer in the movable closure element. A bellows of the isolation valve can include a metallic substrate with a ceramic coating.
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公开(公告)号：US20210082672A1
公开(公告)日：2021-03-18
申请号：US17107146
申请日：2020-11-30
Applicant: MKS INSTRUMENTS, INC.
Inventor： Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号：US10535506B2
公开(公告)日：2020-01-14
申请号：US15404457
申请日：2017-01-12
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill , Scott Benedict , Kevin Wenzel
Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.
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公开(公告)号：US09945486B2
公开(公告)日：2018-04-17
申请号：US14995727
申请日：2016-01-14
Applicant: MKS Instruments, Inc.
Inventor： Gordon Hill
CPC classification number: F16K1/2261 , F16K1/226 , F16K1/2263 , F16K1/2265 , F16K1/2266
Abstract: A valve assembly having a valve housing, the valve housing defining a passageway. A flapper valve arranged within the passageway is coupled to a rotatable valve shaft. A flexible wall, sealed along opposed edges to the valve housing, is controllable to at least two positions. The first position seals against the flapper valve and the second position releases the flapper valve allowing for ready movement of the valve.
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公开(公告)号：US20170328756A1
公开(公告)日：2017-11-16
申请号：US15581875
申请日：2017-04-28
Applicant: MKS Instruments, Inc.
Inventor： David Brian Chamberlain , Vladislav Davidkovich , Scott Benedict , Gordon Hill
CPC classification number: G01F9/001 , F16K37/0083 , F16K37/0091 , F16K51/02 , G01N17/008
Abstract: Calibration of a valve in a vacuum system and providing a diagnostic indication in the vacuum system using the calibration includes measuring conductance of the valve as a function of angular valve position and generating a conductance calibration map or function for use during operation of the valve. An actual angular valve position is set based on the received set point angular valve position and a difference between the measured valve conductance and a predefined metric of conductance versus angular valve position. An actual system conductance and a difference between the actual system conductance and a reference system conductance for the system are determined. The diagnostic indication of a fault in the system is generated based on the actual angular valve position of the valve and the difference between the actual system conductance and the reference system conductance for the system.
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