Process for producing rubber-based composite material
    21.
    发明授权
    Process for producing rubber-based composite material 失效
    生产橡胶基复合材料的方法

    公开(公告)号:US07172681B2

    公开(公告)日:2007-02-06

    申请号:US10771117

    申请日:2004-02-04

    IPC分类号: C23C14/34

    摘要: Disclosed is a process for producing a rubber-based composite material, including the steps of forming, by sputtering, an adhesion film on a substrate to be mated with a rubber for constituting the composite material, laminating a rubber composition on the adhesion film, and vulcanizing the rubber composition, the sputtering is conducted by using a first target and a second target, composed of different metallic components and provided in a chamber, while moving the substrate in sputtering atmospheres formed by applying electric power simultaneously to the first and second targets. Also disclosed is a process for producing a rubber-based composite material, including the steps of forming, by sputtering, an adhesion film on a substrate to be mated with a rubber for constituting the composite material, laminating a rubber composition on the adhesion film, and vulcanizing the rubber composition, wherein the sputtering is conducted by using a plurality of targets, composed of metals or metallic compounds containing different metallic elements and provided in a chamber, while rotating the substrate in sputtering atmospheres formed by applying electric power simultaneously to the targets.

    摘要翻译: 公开了一种橡胶系复合材料的制造方法,其特征在于,包括以下步骤:通过溅射形成与用于构成所述复合材料的橡胶配合的基板上的粘合膜,在所述粘合膜上层叠橡胶组合物,以及 硫化橡胶组合物时,通过使用由不同的金属组分构成并设置在室中的第一靶和第二靶进行同时在通过向第一靶和第二靶施加电力而形成的溅射气氛中移动衬底的同时进行溅射。 还公开了一种橡胶类复合材料的制造方法,包括以下步骤:通过溅射形成与用于构成复合材料的橡胶配合的基材上的粘合膜,在粘合膜上层压橡胶组合物, 并且对橡胶组合物进行硫化,其中通过使用由金属或包含不同金属元素的金属化合物构成并设置在室中的多个靶进行溅射,同时在通过向目标施加电力而形成的溅射气氛中旋转衬底 。

    ITO thin film, method of producing the same, transparent conductive film, and touch panel
    23.
    发明申请
    ITO thin film, method of producing the same, transparent conductive film, and touch panel 审中-公开
    ITO薄膜,其制造方法,透明导电膜和触摸面板

    公开(公告)号:US20060003188A1

    公开(公告)日:2006-01-05

    申请号:US11184811

    申请日:2005-07-20

    IPC分类号: H01L21/44 B32B19/00

    摘要: A crystalline ITO transparent conductive thin film is formed by heating a substrate at low temperature during the sputtering film formation. The crystalline ITO transparent conductive thin film is formed by using an ITO target comprising In2O3 and SnO2 where a weight percentage of SnO2 is 6% or less based on the total weight of In2O3 and SnO2 in the ITO target, and heating the substrate at 90 to 170° C. during the sputtering film formation. The crystalline ITO film with high strength and mechanical durability can be formed by heating at low temperature, which meets heat resistance of the substrate, without requiring annealing after the film formation. There are provided a transparent conductive film comprising a polymer film 4 and an ITO transparent conductive film 5 formed thereon, and a touch panel comprising the transparent conductive film.

    摘要翻译: 通过在溅射成膜期间在低温下加热基板来形成结晶ITO透明导电薄膜。 结晶ITO透明导电薄膜通过使用包含In 2 N 3 O 3和SnO 2 2的ITO靶形成,其中SnO 2的重量百分比 基于ITO靶中的In 2 N 3 O 3和SnO 2 N 2的总重量,SUB> 2 <6%或更小 在溅射成膜期间在90〜170℃下加热基板。 具有高强度和机械耐久性的结晶ITO膜可以通过在低温下加热而形成,其满足基板的耐热性,而不需要在成膜后退火。 提供了包含聚合物膜4和形成在其上的ITO透明导电膜5的透明导电膜,以及包括透明导电膜的触摸面板。

    Method for forming porous thin film
    27.
    发明申请
    Method for forming porous thin film 审中-公开
    形成多孔薄膜的方法

    公开(公告)号:US20060189132A1

    公开(公告)日:2006-08-24

    申请号:US10553190

    申请日:2004-04-15

    IPC分类号: H01L21/44

    摘要: A method for forming a porous thin film is characterized by formation of a composite thin film on a substrate, in which film a metal portion composed of a first metal component and a metal compound portion composed of a compound of a second metal component which is different from the first metal component are mixed-dispersed, and following lo removal of the metal portion from the composite thin film. A method for forming a porous thin film is alternatively characterized by formation of a composite thin film on a substrate, in which film a first metal portion composed of a first metal component and a second metal portion composed of a second metal component which is different from the first metal component are mixed-dispersed, and following removal of either one of the metal portions from the composite thin film.

    摘要翻译: 一种形成多孔薄膜的方法的特征在于在基片上形成复合薄膜,其中薄膜由第一金属组分构成的金属部分和由不同的第二金属组分的化合物组成的金属化合物部分 从第一金属组分混合分散,并且随后从复合薄膜中去除金属部分。 形成多孔薄膜的方法或者其特征在于在基底上形成复合薄膜,其中薄膜由第一金属组分构成的第一金属部分和由不同于第一金属组分的第二金属组分组成的第二金属部分 第一金属组分被混合分散,并且在从复合薄膜中去除任一金属部分之后。

    Antireflection film, electromagnetic wave shielding light transmitting window material, gas discharge type light emitting panel, flat display panel, show window material and solar cell module
    29.
    发明申请
    Antireflection film, electromagnetic wave shielding light transmitting window material, gas discharge type light emitting panel, flat display panel, show window material and solar cell module 审中-公开
    防反射膜,电磁波屏蔽透光窗材料,气体放电型发光面板,平板显示屏,展示窗材料和太阳能电池组件

    公开(公告)号:US20060269731A1

    公开(公告)日:2006-11-30

    申请号:US11449811

    申请日:2006-06-09

    IPC分类号: B32B7/02

    摘要: An antireflection film is formed by laminating a hard coat layer 2, a high refractive index layer 3, and a low refractive index layer 4 in that order on a transparent base film 1. Alternatively, an antireflection film is formed by laminating an electrically conductive high refractive index hard coat layer and a low refractive index layer in that order on a transparent base film. The low refractive index layer 4 is composed of a coating film cured by ultraviolet irradiation in an atmosphere having an oxygen concentration of 0 to 10,000 ppm, the coating film containing hollow silica fine particles, a polyfunctional (meth)acrylic compound, and a photopolymerization initiator.

    摘要翻译: 通过在透明基膜1上依次层叠硬涂层2,高折射率层3和低折射率层4而形成防反射膜。或者,通过层叠导电性高 折射率硬涂层和低折射率层。 低折射率层4由在氧浓度为0〜10,000ppm的气氛中通过紫外线照射而固化的涂膜,含有中空二氧化硅微粒的涂膜,多官能(甲基)丙烯酸类化合物和光聚合引发剂 。

    Antireflective film
    30.
    发明申请
    Antireflective film 审中-公开
    防反射膜

    公开(公告)号:US20050233131A1

    公开(公告)日:2005-10-20

    申请号:US11091505

    申请日:2005-03-29

    摘要: An antireflective film includes a base film, a hard coat layer provided on the base film, a layer having a relatively high refractive index and provided on the hard coat layer, and an outermost layer having a low refractive index and provided on the layer having the relatively high refractive index. In the antireflective film, the layer disposed adjacent to the outermost layer has a light-absorbing property. The layer disposed adjacent to the outermost layer includes carbon black, titanium black, fine metal particles, or an organic dye. The attenuation coefficient k at light having a wavelength of 550 nm of the layer disposed adjacent to the outermost layer is represented by 0.1

    摘要翻译: 防反射膜包括基膜,设置在基膜上的硬涂层,具有较高折射率并设置在硬涂层上的层和具有低折射率的最外层,并且设置在具有 折射率相对较高。 在防反射膜中,与最外层相邻设置的层具有光吸收性。 邻近最外层设置的层包括炭黑,钛黑,细金属颗粒或有机染料。 在与最外层相邻布置的层中具有550nm波长的光的衰减系数k由0.1