公开(公告)号：US5450201A

公开(公告)日：1995-09-12

申请号：US193568

申请日：1994-02-08

Applicant: Yigal Katzir ,  Moshe Finarov

Inventor： Yigal Katzir ,  Moshe Finarov

IPC: G02B21/06 ,  G01N21/88 ,  G02B21/00 ,  G02B27/28 ,  G01N21/21

CPC classification number: G02B27/28 ,  G01N21/8806 ,  G02B21/0016

Abstract: Apparatus for optically inspecting an article, includes an illuminating system, an imaging system, and portable polarizing devices including a polarizer in the illuminating system, an analyzer in the imaging system, and a phase compensator in one of the systems. The illuminating system directs the light from the light source to the objective lens along an axis which is parallel to, but is laterally displaced from, the axis of the objective lens, such as to illuminate the inspected article with a cone of light which is tilted at an angle relative to the axis of the objective lens to thereby permit contrast enhancement of the illuminated inspected article by the null-ellipsometric effect.

Abstract translation: 用于光学检查制品的装置包括照明系统，成像系统和包括照明系统中的偏振器的便携式偏振装置，成像系统中的分析器以及系统之一中的相位补偿器。 照明系统将光从光源引导到物镜沿着与物镜的轴线平行但横向移位的轴线，以便用倾斜的锥形光照射被检查物品 以相对于物镜的轴线成一定角度，从而允许被照射的被检查物品的对比度增强为零椭圆效应。

公开(公告)号：US5333052A

公开(公告)日：1994-07-26

申请号：US796954

申请日：1991-11-25

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01B11/06 ,  G01J4/00 ,  G01N21/21 ,  G01N21/41 ,  G01N21/55 ,  G01N21/84 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/88 ,  G01B11/0641 ,  G01N21/41 ,  G01J4/00 ,  G01N2021/9513 ,  G01N2021/95638 ,  G01N21/211 ,  G01N21/8422

Abstract: An inspection system for providing high contrast images of two materials of an article to be inspected is disclosed. Light with variable spectral range and large angular coverage is passed from the source through a polarizer, reflects from or is transmitted through the article to be inspected, passes through an analyzer and is detected by a sensor. A phase compensator is disposed either between the polarizer and the sample or the sample and the analyzer. Two of the three polarization optical components, that is, the polarizer, the compensator and the analyzer, are separately adjusted until the maximum contrast is found in the image. This enables high contrast imaging of surfaces of objects of similar optical reflectivity, (such as surfaces consisting of two similar specular materials, or surfaces partly covered with transparent films) which cannot be imaged using normal reflective image forming techniques. The system of the invention can also be operated to measure the thickness or index of refraction of transparent thin films.

Abstract translation: 公开了一种用于提供待检查物品的两种材料的高对比度图像的检查系统。 具有可变光谱范围和大角度覆盖的光从光源通过偏振器，从或被透射通过待检查物品，通过分析器并由传感器检测。 相位补偿器设置在偏振器和样品或样品和分析仪之间。 三个偏振光学部件中的两个，即偏振器，补偿器和分析器，分别调整直到在图像中发现最大对比度。 这使得能够使用普通反射成像技术不能成像的具有相似光学反射率的物体的表面（例如由两个相似的镜面材料组成的表面或部分被透明膜部分覆盖的表面）进行高对比度成像。 也可以操作本发明的系统来测量透明薄膜的厚度或折射率。

公开(公告)号：US08040532B2

公开(公告)日：2011-10-18

申请号：US12585593

申请日：2009-09-18

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G01B11/28

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of the following: a thickness of the process structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the process structure. This determined thickness is thus indicative of the quality of the processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 处理前的结构表面轮廓。 在处理之后至少对结构的所选位置进行光学测量，并且生成第二测量数据以指示以下中的至少一个：处理结构（d'）的厚度和处理结构的表面轮廓 。 通过使用第一测量数据解释第二测量数据，从而确定至少一层工艺结构的厚度（d'1或d'2）。 因此，该确定的厚度表示处理的质量。

公开(公告)号：US20110097550A1

公开(公告)日：2011-04-28

申请号：US12999313

申请日：2009-06-18

Applicant: Mikhael Matusovsky ,  Amir Noy ,  Moshe Finarov ,  Giora Dishon

Inventor： Mikhael Matusovsky ,  Amir Noy ,  Moshe Finarov ,  Giora Dishon

IPC: B32B3/30 ,  C23C14/04 ,  C23C14/28 ,  B32B3/00

CPC classification number: B23K26/0738 ,  B23K26/0006 ,  B23K26/0821 ,  B23K26/352 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/56 ,  B41M5/38207 ,  B41M5/38221 ,  B41M2205/02 ,  C23C14/04 ,  C23C14/28 ,  H01L31/022425 ,  H05K3/0097 ,  H05K3/207 ,  H05K2201/0108 ,  H05K2203/107 ,  Y02E10/50 ,  Y10T428/24479 ,  Y10T428/2457

Abstract: A method of depositing a material on a receiving substrate, the method comprising: providing a source substrate having a back surface and a front surface, the back surface carrying at least one piece of coating material; providing a receiving substrate positioned adjacent to the source substrate and facing the coating material; and radiating light towards the front surface of the source substrate, to remove at least one piece of the coating material from the source substrate and deposit said removed at least one piece onto the receiving substrate as a whole.

Abstract translation: 一种在接收衬底上沉积材料的方法，所述方法包括：提供具有背面和前表面的源衬底，所述后表面承载至少一片涂层材料; 提供邻近所述源基板定位并面向所述涂层材料的接收基板; 并且朝向源基板的前表面辐射光，以从源基板去除至少一片涂层材料，并将所述去除的至少一块整体沉积到接收基板上。

公开(公告)号：US20110089348A1

公开(公告)日：2011-04-21

申请号：US12966595

申请日：2010-12-13

Applicant: Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

Inventor： Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

IPC: G01N21/86

CPC classification number: G01N21/31 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/8422 ,  G01N21/8901 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/8908 ,  G01N2201/0826 ,  G01N2201/0833 ,  G01N2201/1085

Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The illumination is positioned in certain locations including locations where the layer stack includes a reduced number of thin film layers. Such locations may be discrete sampled points located within scribe lines, contact frames or dedicated measurement targets. The light collected from such discrete sampled points is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor and processed by a controller in such a way that parameters of simplified stacks are used for accurate determination of desired parameters of the full cell stack. In this way the photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.

Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 照明被定位在某些位置，包括层堆叠减少数量的薄膜层的位置。 这些位置可以是位于划线，接触框架或专用测量目标内的离散采样点。 从这些离散采样点收集的光通过光学开关传送到光敏传感器。 由采样点反射，传播或散射的光的光谱信号由传感器收集并由控制器进行处理，使得简化堆栈的参数用于精确确定全单元堆栈的期望参数。 以这种方式，可以使用适用于质量控制的光伏薄膜参数。 薄膜厚度，折射率，消光系数，吸收系数，能隙，导电率，结晶度，表面粗糙度，结晶相，材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数，以提供具有预定特性的均匀薄膜层。

公开(公告)号：US07791740B2

公开(公告)日：2010-09-07

申请号：US12389890

申请日：2009-02-20

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US20100220316A1

公开(公告)日：2010-09-02

申请号：US12775293

申请日：2010-05-06

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01N21/86 ,  G06F19/00 ,  G01N21/00 ,  G01J1/10

CPC classification number: G01B11/06 ,  G01B11/0625 ,  G01N21/31 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/8422 ,  G01N21/8901 ,  G01N2021/3568 ,  G01N2021/8908 ,  G01N2201/0826 ,  G01N2201/0833 ,  G01N2201/1085

Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The source forms on the thin film an illuminated line. The light collected from discrete sampled points located on the illuminated line is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor, processed and photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.

Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 源在薄膜上形成一条照明线。 从位于照明线上的离散采样点收集的光通过光学开关转移到光敏传感器。 由采样点反射，传播或散射的光的光谱信号由传感器收集，处理和适用于质量控制的光伏薄膜参数例如被导出。 薄膜厚度，折射率，消光系数，吸收系数，能隙，导电率，结晶度，表面粗糙度，结晶相，材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数，以提供具有预定特性的均匀薄膜层。

公开(公告)号：US07715007B2

公开(公告)日：2010-05-11

申请号：US11945058

申请日：2007-11-26

Applicant: Boaz Brill ,  Moshe Finarov ,  David Schiener

Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

IPC: G01B11/00 ,  G02B5/18 ,  G02B27/42 ,  G01D5/36 ,  H01L23/544 ,  H01L21/76

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造过程中层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US20100010659A1

公开(公告)日：2010-01-14

申请号：US12585593

申请日：2009-09-18

Applicant: Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

Inventor： Yoel Cohen ,  Moshe Finarov ,  Klara Vinokur

IPC: G06F19/00 ,  G01B11/06

CPC classification number: G01B11/0625 ,  G01B11/0683 ,  H01L22/12

Abstract: A method and system are presented for use in controlling the processing of a structure. First measured data is provided being indicative of at least one of the following: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to the processing of the structure, and a surface profile of the structure prior to said processing. An optical measurement is applied to at least the selected sites of the structure after said processing and second measured data is generated being indicative of at least one of the following: a thickness of the processed structure (d′) and a surface profile of the processed structure, The second measured data is analyzed by interpreting it using the first measured data to thereby determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is thus indicative of the quality of said processing.

Abstract translation: 提出了一种用于控制结构处理的方法和系统。 第一测量数据被提供指示以下中的至少一个：在结构处理之前的结构的至少一些选定位置中的结构W的至少一个层（L2）的厚度（d2），以及 所述处理之前的结构的表面轮廓。 在所述处理之后，对至少所述结构的所选位置进行光学测量，并且生成第二测量数据，以指示以下至少之一：处理结构（d'）的厚度和所处理的结构的表面轮廓 结构，通过使用第一测量数据解释第二测量数据，从而确定至少一层处理结构的厚度（d'1或d'2）。 因此，所确定的厚度表示所述处理的质量。

公开(公告)号：US20100006785A1

公开(公告)日：2010-01-14

申请号：US12410878

申请日：2009-03-25

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01N21/86 ,  G06F19/00

CPC classification number: G01N21/8422 ,  G01N21/31 ,  G01N21/6489 ,  G01N21/8901 ,  G01N2021/3568 ,  G01N2021/8908 ,  G01N2201/0826 ,  G01N2201/0833 ,  G01N2201/1085

Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic illumination source. The source forms on the thin film a continuous illuminated line. Discrete sampled points located on the illuminated line are imaged onto a two dimensional optical switch. A concordance look-up-table between the coordinates of the above sampled points on the thin film and their coordinates on the two dimensional optical switch are generated. The spectral composition of the illumination reflected by the sampled points is determined and photovoltaic thin film parameters applicable to the quality control are derived from the spectral composition of reflected or transmitted by the photovoltaic thin film illumination.

Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色照明源照射。 源在薄膜上形成连续的照明线。 位于照明线上的离散采样点成像到二维光学开关上。 产生薄膜上面的采样点的坐标与二维光开关上的坐标之间的一致性查找表。 确定由采样点反射的照明的光谱组成，并且适用于质量控制的光电薄膜参数是从光电薄膜照射反射或透射的光谱组成得出的。