Abstract:
Measures for reducing parasitic capacitances in the layer structure of capacitive MEMS sensor elements, in which parasitic capacitances between bond pads for electrically contacting measuring capacitor electrodes and an electrically conductive layer lying underneath are reduced by these measures. The sensor structure having the measuring capacitor electrodes and bond pads of such MEMS components are in a layer structure on a semiconductor substrate. The carrier layer directly underneath the bond pad structure is uninterrupted in the bond pad region, and the layer structure includes at least one insulation layer by which at least one of the bond pads is electrically insulated from an electrically conductive layer lying underneath. At least one layer under the carrier layer is structured in the region of this bond pad, so that hollow spaces are situated in the layer structure underneath this bond pad, by which the parasitic capacitance between this bond pad and the conductive layer lying underneath is reduced. Alternatively/additionally, the material of the conductive layer in the region underneath this bond pad is replaced by electrically conductive material at least in the upper layer region, so that the insulation layer in the region of this bond pad is considerably thicker than outside the bond pad region.
Abstract:
The disclosure relates to a micro-electromechanical membrane arrangement with a substrate, which has a multiplicity of recesses on a surface, a first electrically conductive electrode layer, which is arranged on the surface of the substrate and has a multiplicity of first depressions coinciding with the recesses, and an electrically conductive membrane layer, which can be deflected in a direction perpendicular to the active surface of the substrate, is arranged over the first electrode layer and is kept at a distance therefrom by a first distance value.
Abstract:
Measures for reducing parasitic capacitances in the layer structure of capacitive MEMS sensor elements, in which parasitic capacitances between bond pads for electrically contacting measuring capacitor electrodes and an electrically conductive layer lying underneath are reduced by these measures. The sensor structure having the measuring capacitor electrodes and bond pads of such MEMS components are in a layer structure on a semiconductor substrate. The carrier layer directly underneath the bond pad structure is uninterrupted in the bond pad region, and the layer structure includes at least one insulation layer by which at least one of the bond pads is electrically insulated from an electrically conductive layer lying underneath. At least one layer under the carrier layer is structured in the region of this bond pad, so that hollow spaces are situated in the layer structure underneath this bond pad, by which the parasitic capacitance between this bond pad and the conductive layer lying underneath is reduced. Alternatively/additionally, the material of the conductive layer in the region underneath this bond pad is replaced by electrically conductive material at least in the upper layer region, so that the insulation layer in the region of this bond pad is considerably thicker than outside the bond pad region.
Abstract:
A MEMS component for generating pressure pulses is provided, its micromechanical structure including at least three function levels: a first function level in which at least one stationary trench structure is implemented, a second function level, which is implemented above the first function level and includes at least one triggerable displacement element as well as through-openings as pressure outlet openings, the displacement element protruding into the trench structure and being movable in parallel with the function levels, whereby positive and negative pressure pulses are generated, and a third function level, which is implemented above the second function level and includes at least one triggerable cover element for at least one part of the pressure outlet openings in the second function level.
Abstract:
An energy source for supplying an autonomous electrical load system with electrical energy includes a thermogenerator device configured to generate a thermoelectric voltage to be fed to the electrical load system. The thermogenerator device is under the influence of a temperature difference between a warmer first thermal coupling device and a colder second thermal coupling device. The energy source further includes a microfluidic cooling device having a heat-absorption region, a heat-emission region, and a closed microfluidic circulation system configured to circulate a fluid between the heat-absorption region and the heat-emission region. The heat-absorption region has a thermally conductive connection to the second thermal coupling device. The heat-emission region is configured to be coupled to an external heat sink using a thermally conductive connection such that the circulating fluid carries thermal energy away from the second thermal coupling device and transports the thermal energy to the external heat sink.
Abstract:
An energy source for supplying an autonomous electrical load system with electrical energy includes a thermogenerator device configured to generate a thermoelectric voltage to be fed to the electrical load system. The thermogenerator device is under the influence of a temperature difference between a warmer first thermal coupling device and a colder second thermal coupling device. The energy source further includes a microfluidic cooling device having a heat-absorption region, a heat-emission region, and a closed microfluidic circulation system configured to circulate a fluid between the heat-absorption region and the heat-emission region. The heat-absorption region has a thermally conductive connection to the second thermal coupling device. The heat-emission region is configured to be coupled to an external heat sink using a thermally conductive connection such that the circulating fluid carries thermal energy away from the second thermal coupling device and transports the thermal energy to the external heat sink.
Abstract:
A micromechanical inertial sensor and a method for its operation. The micromechanical inertial sensor includes: a sensor element; a substrate having a substrate plane; a detection device for detecting a mechanical deflection due to tilting or deformation of the sensor element about a rotation axis substantially parallel to the substrate plane, wherein the mechanical deflection due to the tilting or deformation takes place along a detection direction substantially perpendicular to the substrate plane, wherein the detection device includes a first electrode structure and a second electrode structure that are firmly anchored to the substrate, wherein the detection device generates a measurement signal from the detected mechanical tilting or deformation of the sensor element about the rotation axis.
Abstract:
A micromechanical component for a rotation rate sensor. The micromechanical component includes two rotor masses, mirror symmetrical with respect to a first plane of symmetry aligned perpendicularly to a substrate surface and passing through the center of the two rotor masses, which may be set in rotational vibrating motion about rotational axes aligned perpendicularly to the substrate surface, and four seismic masses, mirror symmetrical with respect to the first plane of symmetry, deflectable in parallel to the first plane of symmetry using the two rotor masses set in their respective rotational vibrating motion. The first rotor mass and a first pair of the four seismic masses connected thereto are mirror symmetrical to the second rotor mass and to a second pair of the four seismic masses connected thereto with respect to a second plane of symmetry aligned perpendicularly to the substrate surface and to the first plane of symmetry.
Abstract:
A micromechanical yaw rate sensor includes a substrate and a rotationally oscillating mass having a rotationally oscillating mass bearing. The rotationally oscillating mass bearing includes a rocker bar, a rocker spring rod which resiliently connects the rocker bar to the substrate, and two support spring rods which resiliently connect, on opposite sides of the rocker spring rod, the rocker bar to the rotationally oscillating mass.
Abstract:
A sensor drive includes at least one first seismic mass and an operating apparatus. The operating apparatus is configured to put the first seismic mass into oscillatory motion such that (i) a projection of the oscillatory motion of the first seismic mass onto a first spatial direction is a first harmonic oscillation of the first seismic mass at a first frequency, and (ii) a projection of the oscillatory motion of the first seismic mass onto a second spatial direction oriented at an angle to the first spatial direction is a second harmonic oscillation of the first seismic mass at a second frequency not equal to the first frequency. A method includes operating such a sensor device having at least one seismic mass.