公开(公告)号：US10247683B2

公开(公告)日：2019-04-02

申请号：US15829947

申请日：2017-12-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G01N23/223 ,  G01N23/2204 ,  G01N23/20025 ,  G01N23/2055

Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.

公开(公告)号：US20170261442A1

公开(公告)日：2017-09-14

申请号：US15605957

申请日：2017-05-26

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Srivatsan Seshadri ,  Alan Francis Lyon ,  David Charles Reynolds

IPC: G01N23/04 ,  G21K1/06 ,  G21K7/00 ,  G01N23/20

CPC classification number: G01N23/04 ,  A61B6/4007 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/508 ,  G01N23/20075 ,  G01N2223/3306 ,  G21K1/02 ,  G21K7/00 ,  G21K2207/005 ,  H01J35/08 ,  H01J2235/086 ,  H01J2235/1291

Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.

公开(公告)号：US20170052128A1

公开(公告)日：2017-02-23

申请号：US15240972

申请日：2016-08-18

Applicant: SIGRAY, INC.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Benjamin Donald Stripe

IPC: G01N23/22 ,  G01N23/223 ,  G01N23/20

CPC classification number: G01N23/223 ,  G01N23/04 ,  G01N23/20058 ,  G01N2223/052 ,  G01N2223/056 ,  G01N2223/076

Abstract: An x-ray spectrometer system comprising an x-ray imaging system with at least one achromatic imaging x-ray optic and an x-ray detection system. The optical train of the imaging system is arranged so that its object focal plane partially overlaps an x-ray emitting volume of an object. An image of a portion of the object is formed with a predetermined image magnification at the x-ray detection system. The x-ray detection system has both high spatial and spectral resolution, and converts the detected x-rays to electronic signals. In some embodiments, the detector system may have a small aperture placed in the image plane, and use a silicon drift detector to collect x-rays passing through the aperture. In other embodiments, the detector system has an energy resolving pixel array x-ray detector. In other embodiments, wavelength dispersive elements may be used in either the optical train or the detector system.

Abstract translation: 一种X射线光谱仪系统，包括具有至少一个消色差成像x射线光学元件和x射线检测系统的x射线成像系统。 成像系统的光学系列被布置成使得其物体焦平面部分地与物体的x射线发射体积重叠。 物体的一部分的图像在x射线检测系统处以预定的图像倍率形成。 x射线检测系统具有高空间和光谱分辨率，并将检测到的x射线转换为电子信号。 在一些实施例中，检测器系统可以具有放置在图像平面中的小孔，并且使用硅漂移检测器来收集穿过孔的x射线。 在其他实施例中，检测器系统具有能量分辨像素阵列x射线检测器。 在其他实施例中，波长色散元件可以用于光学列车或检测器系统中。

公开(公告)号：US20160351370A1

公开(公告)日：2016-12-01

申请号：US15166274

申请日：2016-05-27

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon ,  David Charles Reynolds

IPC: H01J35/10 ,  H01J35/18 ,  H01J35/06

CPC classification number: H01J35/08 ,  G21K1/06 ,  H01J2235/081 ,  H01J2235/086 ,  H01J2235/1204

Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.

Abstract translation: 公开了用于高亮度x射线产生的紧凑源。 通过彼此对准的多个区域的电子束轰击实现较高的亮度，以实现x射线的线性积累。 这可以通过使用包括与具有高导热性的基板紧密热接触制造的x射线产生材料的微结构的x射线靶来实现。 这使得能够更有效地从X射线产生材料中引出热量，并且允许以较高电子密度和/或更高能量的电子轰击x射线产生材料，导致更大的x射线亮度。 微结构的方向允许使用在0°或接近0°的起飞角度，允许来自几个微结构的X射线的积聚被对准并且用于形成环形锥形的束。

公开(公告)号：US20160320320A1

公开(公告)日：2016-11-03

申请号：US15173711

申请日：2016-06-05

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G01N23/20

CPC classification number: G01N23/20075 ,  A61B6/4007 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/508 ,  G01N23/201 ,  G01N23/223 ,  G21K1/02 ,  G21K2207/005 ,  H01J35/08 ,  H01J2235/086 ,  H01J2235/1291

Abstract: This invention discloses a method and apparatus for x-ray techniques using structured x-ray illumination for examining material properties of an object. In particular, an object with one or more regions of interest (ROIs) having a particular shape, size, and pattern may be illuminated with an x-ray beam whose cross sectional beam profile corresponds to the shape, size and pattern of the ROIs, so that the x-rays of the beam primarily interact only with the ROIs. This allows a greater x-ray flux to be used, enhancing the signal from the ROI itself, while reducing unwanted signals from regions not in the ROI, improving signal-to-noise ratios and/or measurement throughputThis may be used with a number of x-ray measurement techniques, including x-ray fluorescence (XRF), x-ray diffraction (XRD), small angle x-ray scattering (SAXS), x-ray absorption fine-structure spectroscopy (XAFS), x-ray near edge absorption spectroscopy, and x-ray emission spectroscopy.

Abstract translation: 这可以与许多x射线测量技术一起使用，包括x射线荧光（XRF），x射线衍射（XRD），小角度X射线散射（SAXS），x射线吸收精细结构光谱学 XAFS），x射线近边缘吸收光谱和X射线发射光谱。

公开(公告)号：US20160066870A1

公开(公告)日：2016-03-10

申请号：US14943445

申请日：2015-11-17

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  Alan Francis Lyon

IPC: A61B6/00

CPC classification number: A61B6/484 ,  A61B6/032 ,  A61B6/035 ,  A61B6/4007 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/502 ,  A61B6/508 ,  G21K2207/005 ,  H01J35/08 ,  H01J35/12

Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The structures may be microstructures with lateral dimensions measured on the order of microns, and in some embodiments, the structures are arranged in a regular array.The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π or π/2 phase-shifting grating, an x-ray detector to convert two-dimensional x-ray intensities into electronic signals, and in some embodiments, also comprises an additional analyzer grating G2 that may be placed in front of the detector to form additional interference fringes. Systems may also include a means to translate and/or rotate the relative positions of the x-ray source and the object under investigation relative to the beam splitting grating and/or the analyzer grating for tomography applications.

Abstract translation: 一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个X射线结构化相干子源的靶。 该结构可以是具有在微米数量级上测量的横向尺寸的微结构，并且在一些实施例中，结构以正规阵列排列。 该系统还包括分束光栅G1，其形成Talbot干涉图案，其可以是“ 或＆pgr / / 2移相光栅，X射线检测器将二维x射线强度转换为电子信号，并且在一些实施例中还包括可以放置在检测器前面的附加分析器光栅G2 形成额外的干涉条纹。 系统还可以包括相对于用于层析成像应用的分束光栅和/或分析器光栅来平移和/或旋转x射线源和被研究对象的相对位置的装置。

公开(公告)号：US20150357069A1

公开(公告)日：2015-12-10

申请号：US14636994

申请日：2015-03-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G21K1/06 ,  G21K1/02 ,  G01N23/207

CPC classification number: G01N23/2076 ,  G01N23/085 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy.The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux.The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

Abstract translation: 本公开提供了x射线吸收精细结构（XAFS）测量的系统，其具有比现有紧凑系统大几个数量级的x射线通量和通量密度。 这些对于x射线吸收近边缘光谱（XANES）或扩展X射线精细吸收结构（EXFAS）光谱的实验室或现场应用是有用的。 通过使用X射线靶的设计来实现更高的亮度，所述X射线靶包括与具有高导热性的基底紧密热接触制造的x射线产生材料的多个对准微结构。 这允许用更高电子密度和/或更高能量的电子进行轰击，导致更大的x射线亮度和高通量。 然后将高亮度x射线源耦合到X射线反射光学系统以准直x射线，以及选择曝光能量的单色仪。 使用高通量单色x射线的样品的吸收光谱可以使用标准检测技术进行。

公开(公告)号：US20150247811A1

公开(公告)日：2015-09-03

申请号：US14634834

申请日：2015-03-01

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G01N23/223 ,  G01B15/02

CPC classification number: G01N23/223 ,  G01B15/02 ,  G01N23/085 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for total reflection x-ray fluorescence measurements that have x-ray flux and x-ray flux density several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection and/or for total-reflection fluorescence analysis.The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray brightness and therefore greater x-ray flux.The high brightness/high flux source may then be coupled to an x-ray reflecting optical system, which can focus the high flux x-rays to a spots that can be as small as one micron, leading to high flux density.

Abstract translation: 本公开提供了具有x射线通量和x射线通量密度比现有x射线技术大几个数量级的全反射x射线荧光测量的系统。 因此，这些可用于诸如微量元素检测和/或全反射荧光分析的应用。 较高的亮度部分地通过使用x射线靶的设计来实现，所述X射线靶包括与具有高导热性的衬底紧密热接触制造的一个或多个选定的x射线产生材料的多个微结构。 这允许用更高电子密度或更高能量电子轰击靶，这导致更大的x射线亮度和因此更大的x射线通量。 然后，高亮度/高通量源可以耦合到x射线反射光学系统，其可将高通量x射线聚焦到可以小至1微米的点，导致高通量密度。

公开(公告)号：US12181423B1

公开(公告)日：2024-12-31

申请号：US18406851

申请日：2024-01-08

Applicant: Sigray, Inc.

Inventor： Sylvia Jia Yun Lewis ,  Sheraz Gul ,  Wenbing Yun

IPC: G01N23/00 ,  G01N23/04 ,  G01N23/083

Abstract: An apparatus includes a transmission x-ray source having a window including a target layer of at least one x-ray generating material and an internal aperture configured to allow a first portion of an electron beam to bombard the target layer and to block a second portion of the electron beam from bombarding the target. The first portion of the electron beam has a full-width-at-half-maximum width at the target less than or equal to 1 micron. The window is spaced from the internal aperture by a first distance D1. The apparatus further includes an x-ray detector system having a scintillator, an optical assembly, at least one image sensor configured to receive and respond to visible light by generating electrical signals, and a motorized stage configured to controllably adjust a position of the scintillator such that the scintillator is spaced from the window by a second distance D2, wherein D22/(D1+D2)2 is less than 0.2.

公开(公告)号：US20240280515A1

公开(公告)日：2024-08-22

申请号：US18439625

申请日：2024-02-12

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Janos Kirz

IPC: G01N23/20008 ,  G01N23/085 ,  G01N23/20091 ,  G01N23/207

CPC classification number: G01N23/20008 ,  G01N23/085 ,  G01N23/20091 ,  G01N23/2076 ,  G01N23/2209 ,  G21K1/06 ,  G21K1/062 ,  G01N2223/041 ,  G01N2223/0563 ,  G01N2223/0568 ,  G01N2223/076 ,  G01N2223/1016 ,  G01N2223/315

Abstract: An apparatus includes a plurality of stacked flat Bragg diffractors having at least a first flat Bragg diffractor and a second flat Bragg diffractor. The first and second flat Bragg diffractors are positioned sequentially along an x-ray propagation axis of an x-ray beam. The x-ray beam includes x-rays and has an angular beam divergence less than 30 mrad in at least one direction.