公开(公告)号：US6012428A

公开(公告)日：2000-01-11

申请号：US912575

申请日：1997-08-18

申请人： Toru Yano ,  Eisuke Kimura ,  Masanori Hayashi ,  Yusuke Tatara ,  Toshio Yokoyama ,  Kenichiro Kinoshita

发明人： Toru Yano ,  Eisuke Kimura ,  Masanori Hayashi ,  Yusuke Tatara ,  Toshio Yokoyama ,  Kenichiro Kinoshita

IPC分类号： F02D31/00 ,  F02D41/00 ,  F02D41/14 ,  F02D41/34 ,  F02D43/00 ,  F02D41/04

CPC分类号： F02D41/008 ,  F02D31/005 ,  F02D41/0072 ,  F02D41/1456 ,  F02D41/1474 ,  F02D41/1475 ,  F02D43/00 ,  F02D2041/0017 ,  F02D2250/18 ,  F02D2250/21 ,  Y02T10/47

摘要： A system for controlling fuel injection in an internal combustion engine such that when the target air-fuel ratio is switched from a rich value to a lean value, the air-fuel ratios are switched to the lean value by sequentially decreasing the amount of fuel injected into the cylinders, for example in a four cylinder engine into the #1, #2, #3 and #4 cylinders, with predetermined time differences. During this time, an electronic air control valve (EACV) is controlled in such a manner that it is stepwise opened with the switching of the air-fuel ratio s for the #1, #2, #3 and #4 cylinders, thereby causing the engine torque to remain the same to prevent the generation of a torque shock. When the target air-fuel ratio has been switched from the lean level to the rich level, the amounts of fuel injected into the #1, #2, #3 and #4 cylinders are controlled in such a manner that they are sequentially increased with predetermined time differences, and the EACV is controlled in such a manner that it is stepwise closed. Thus, it is possible to avoid the generation of a torque shock, while preventing the degradation of the emission during switching of the air-fuel ratio.

摘要翻译： 一种用于控制内燃机中的燃料喷射的系统，使得当目标空燃比从浓值切换到稀薄值时，通过依次减少喷射的燃料量将空燃比转换为稀薄值 进入气缸，例如在四缸发动机中进入＃1，＃2，＃3和＃4气缸，具有预定的时间差。 在此期间，以＃1，＃2，＃3和＃4气缸的空燃比s的转换为顺序打开电子空气调节阀（EACV），从而使 发动机扭矩保持不变，以防止产生扭矩冲击。 当目标空燃比从稀薄水平切换到浓水平时，喷射到＃1，＃2，＃3和＃4气缸中的燃料量以这样的方式被控制： 预定时间差，并且以逐步关闭的方式控制EACV。 因此，可以避免产生转矩冲击，同时防止在空燃比切换期间发射的劣化。

公开(公告)号：US5258375A

公开(公告)日：1993-11-02

申请号：US3689

申请日：1993-01-13

申请人： Masami Moroi ,  Toshio Yokoyama ,  Akira Iwasa

发明人： Masami Moroi ,  Toshio Yokoyama ,  Akira Iwasa

IPC分类号： A61K9/14 ,  A61K31/59 ,  A61K47/32 ,  A61K47/38 ,  A61K31/595 ,  A61K47/00 ,  C07J172/00

CPC分类号： A61K31/59 ,  A61K47/32 ,  A61K47/38 ,  A61K9/146

摘要： Compositions suitable for use in the preparation of dosage-form active vitamins D.sub.3 are disclosed. Each composition comprises an active vitamin D.sub.3 and a stabilizer selected from polyvinylacetal diethylaminoacetate and hydroxypropylcellulose. Also disclosed are processes for the preparation of stable dosage-form active vitamins D.sub.3. Each process comprises adding the above stabilizer to an active vitamin D.sub.3 and then adding a pharmaceutically-acceptable carrier to the resultant mixture.

摘要翻译： 公开了适用于制剂剂型活性维生素D3的组合物。 每种组合物包含活性维生素D3和选自聚乙烯醇缩乙醛二乙基氨基乙酸酯和羟丙基纤维素的稳定剂。 还公开了制备稳定剂型活性维生素D3的方法。 每个方法包括将上述稳定剂加入到活性维生素D3中，然后向所得混合物中加入药学上可接受的载体。

公开(公告)号：US5176504A

公开(公告)日：1993-01-05

申请号：US820868

申请日：1992-01-17

申请人： Yukio Moriya ,  Shigeru Kinoshita ,  Takumi Onoda ,  Toshio Yokoyama

发明人： Yukio Moriya ,  Shigeru Kinoshita ,  Takumi Onoda ,  Toshio Yokoyama

IPC分类号： E02F9/22 ,  F04B49/06

CPC分类号： E02F9/2235 ,  E02F9/2292 ,  E02F9/2296 ,  F04B49/065 ,  F04B2203/0209 ,  F04B2205/05 ,  F04B2207/041

摘要： An apparatus for controlling hydraulic pumps for a construction machine wherein the construction machine includes first and second hydraulic pumps adapted to be driven by an engine and hydraulic actuators hydraulically connected to the first and second hydraulic pumps via first and second actuating valves is disclosed. A controlling section calculates extra horse powers .DELTA.HP.sub.1 and .DELTA.HP.sub.2 based on reference allowable absorptive horse powers set relative to the first and second hydraulic pumps and actual absorptive horse powers (HP.sub.01) and (HP.sub.02) derived from the first and second hydraulic pumps. In addition, the controlling section calculates allowable discharge capacities (V.sub.1P) and (V.sub.2P) based on the number (N) of revolutions of the engines, pressures (P.sub.1) and (P.sub.2) of hydraulic oils discharged from the first and second hydraulic pumps, the extra horse powers .DELTA.HP.sub.1 and .DELTA.HP.sub.2 and allowable discharge capacities (V.sub.1P) and (V.sub.2P). Then, the controlling section selects a smaller one of a target discharge capacity and the allowable discharge capacity (V.sub.1P) and a smaller one of another target discharge capacity and the allowable discharge capacity (V.sub.2P) as minimum target discharge capacities (V.sub.1) and (V.sub.2). Thereafter, the controlling section controls swash plate angles of the first and second hydraulic pumps such that the minimum target discharge capacities (V.sub.1) and (V.sub.2) are correctly set corresponding to the first and second hydraulic pumps. Consequently, absorptive horse powers to be derived from the first and second hydraulic pumps can properly be controlled while a sum of the reference allowable absorptive horse powers is kept constant.

摘要翻译： PCT No.PCT / JP90 / 00964 Sec。 371日期：1992年1月17日 102（e）日期1992年1月17日PCT提交1990年7月27日PCT公布。 公开号WO91 / 02162 日本1991年2月21日。一种用于控制建筑机械的液压泵的设备，其中建筑机械包括适于由发动机驱动的第一和第二液压泵和通过第一和第二液压连接到第一和第二液压泵的液压致动器 公开了致动阀。 控制部分基于相对于从第一和第二液压泵获得的第一和第二液压泵和实际吸收马力（HP01）和（HP02）设定的参考允许吸收马力来计算额外的马力DELTA HP1和DELTA HP2。 此外，控制部基于从第一和第二液压泵排出的液压油的发动机数量（N），压力（P1）和（P2），计算容许排放容量（V1P）和（V2P） 额外的马力DELTA HP1和DELTA HP2和容许放电容量（V1P）和（V2P）。 然后，控制部选择目标放电容量和容许放电容量（V1P）中较小的一个，另一个目标放电容量和容许放电容量（V2P）中的较小一个作为最小目标放电容量（V1）和（V2 ）。 此后，控制部分控制第一和第二液压泵的斜盘角度，使得对应于第一和第二液压泵正确地设定最小目标排出容量（V1）和（V2）。 因此，可以适当地控制从第一和第二液压泵得到的吸收马力，同时参考允许吸收马力的总和保持恒定。

公开(公告)号：US5029067A

公开(公告)日：1991-07-02

申请号：US269834

申请日：1988-11-22

申请人： Kimio Nishida ,  Toshio Yokoyama ,  Yukio Moriya ,  Takeshi Kobayashi

发明人： Kimio Nishida ,  Toshio Yokoyama ,  Yukio Moriya ,  Takeshi Kobayashi

IPC分类号： E02F9/20 ,  E02F9/22 ,  F15B11/16 ,  F15B11/17 ,  F15B21/08 ,  G05B19/40

CPC分类号： E02F9/2242 ,  E02F9/2004 ,  E02F9/2235 ,  E02F9/2292 ,  E02F9/2296 ,  F15B11/165 ,  F15B11/17 ,  F15B21/087 ,  G05B19/40 ,  F15B2211/20553 ,  F15B2211/20576 ,  F15B2211/30505 ,  F15B2211/327 ,  F15B2211/40507 ,  F15B2211/41572 ,  F15B2211/426 ,  F15B2211/428 ,  F15B2211/45 ,  F15B2211/50563 ,  F15B2211/5159 ,  F15B2211/528 ,  F15B2211/6323 ,  F15B2211/6326 ,  F15B2211/633 ,  F15B2211/6333 ,  F15B2211/6346 ,  F15B2211/6652 ,  F15B2211/7135 ,  G05B2219/35438 ,  G05B2219/41309 ,  G05B2219/45012

摘要： An operation control device is disclosed. According to a drive command value generated depending on the manipulated amount of a plurality of operating means (11, 12, 13, 14, 15, 16), the operation control device controls the drive amount of actuators (BMS, AMS, BKS, LDM, RDM, TNM) associated with the operated actuator. In the drive amount control, the operation control device changes a ratio of the manipulated amount and the drive amount command value by work accuracy flow rate data (41), weights the drive command values based on the same manipulated values of said operating means by priority mode weight data (42), and/or controls the timing of supply of the drive energy from at least two separate energy sources (FFP, RP) as a drive energy source for the respective actuators, and the supply amount of the drive energy, under control of pump utilization data (43) and pump swash plate control data (44). Every time the operating means are operated, these pieces of the control data are properly determined through proper operations (including the look-up table processing) according to the operations of the operating means, the selections of the work accuracy mode select switch (21) and the priority mode select switch (22).

公开(公告)号：US20110203518A1

公开(公告)日：2011-08-25

申请号：US13100484

申请日：2011-05-04

申请人： Seiji KATSUOKA ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

发明人： Seiji KATSUOKA ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

IPC分类号： B05C11/00

CPC分类号： H01L21/68721 ,  C23C18/163 ,  C23C18/1632 ,  C23C18/1886 ,  C25D7/123 ,  C25D17/001 ,  H01L21/67126 ,  H01L21/67766 ,  Y10S134/901

摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

公开(公告)号：US20100221432A1

公开(公告)日：2010-09-02

申请号：US12771176

申请日：2010-04-30

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

IPC分类号： B05D3/10

CPC分类号： H01L21/68721 ,  C23C18/163 ,  C23C18/1632 ,  C23C18/1886 ,  C25D7/123 ,  C25D17/001 ,  H01L21/67126 ,  H01L21/67766 ,  Y10S134/901

摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

公开(公告)号：US20090092469A1

公开(公告)日：2009-04-09

申请号：US11996432

申请日：2006-08-25

申请人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

发明人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

IPC分类号： H01L21/677 ,  B08B7/00 ,  C25D17/06

CPC分类号： H01L21/68707 ,  H01L21/6723 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68728

摘要： To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position. The substrate holding mechanism has a plural number of rollers 14 on an outer periphery of the holding position of the substrate, with the plural number of rollers adapted to hold the substrate by supporting the periphery of the substrate from sides thereof in the vicinity of the holding position, and the roller has an integral structure made up of a large diameter portion and a small diameter portion formed above the large diameter portion, with an upper portion of the large diameter portion having a shoulder portion for the substrate in transfer to be temporarily placed on, and with the shoulder portion formed with a sloped surface sloping down toward its periphery.

摘要翻译： 为了提供一种基板处理单元，基板转印方法，基板清洁处理单元和基板电镀设备，其使得诸如机器人臂之类的基板输入机构可以在携带该基板处理单元之后快速地释放保持在基板上 以缩短保持基板的时间并提高生产量。 基板处理单元10包括用于将基板11保持在指定的保持位置的基板保持机构10和用于对被设置有基板引导机构20的基板保持机构保持的基板进行规定处理的处理机构32 具有用于将基板引导到保持位置附近的引导销15。 基板保持机构在基板的保持位置的外周具有多个辊14，多个辊适于通过从保持基板附近的侧面支撑基板的周边来保持基板 并且所述辊具有由形成在所述大直径部分上方的大直径部分和小直径部分构成的整体结构，所述大直径部分的上部具有用于传送的基板的肩部临时放置 并且肩部形成有朝向其周边倾斜的倾斜表面。

公开(公告)号：US07466337B2

公开(公告)日：2008-12-16

申请号：US10170231

申请日：2002-06-13

申请人： Hiroshi Sawada ,  Hajime Katou ,  Seiya Haga ,  Toshio Yokoyama

发明人： Hiroshi Sawada ,  Hajime Katou ,  Seiya Haga ,  Toshio Yokoyama

IPC分类号： H04N7/18

CPC分类号： H04N7/183 ,  E02F9/0858 ,  E02F9/261

摘要： A construction machine comprises a lower traveling body and an upper revolving body rotatably attached to the lower traveling body via a revolving mechanism 2, wherein a rear surveillance camera is arranged on a back surface side of the upper revolving body between a counter weight of the upper revolving body and a swing circle of the revolving mechanism, and right and left crawler end portions of the lower traveling body 1 can be simultaneously visually checked by means of the rear surveillance camera.

摘要翻译： 一种施工机械，包括下行进体和经由旋转机构2可旋转地安装在下行走体上的上旋转体，其中后监视摄像机设置在上旋转体的背面侧， 旋转体的旋转体和摆动圆环，并且可以通过后部监视摄像机同时目视检查下行进体1的左右履带端部。

公开(公告)号：US07368016B2

公开(公告)日：2008-05-06

申请号：US11115214

申请日：2005-04-27

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Ryo Kato ,  Toshio Yokoyama ,  Kenichi Suzuki ,  Kenichi Kobayashi

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Ryo Kato ,  Toshio Yokoyama ,  Kenichi Suzuki ,  Kenichi Kobayashi

IPC分类号： B05B15/04 ,  B05B7/06 ,  B05C3/00 ,  B05C13/02 ,  B08B3/00 ,  B08B3/02

CPC分类号： H01L21/288 ,  C23C2/003 ,  C23C18/1619 ,  C23C18/163 ,  C23C18/1642 ,  H01L21/6708 ,  H01L21/67742 ,  H01L21/6838 ,  H01L21/76849

摘要： A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.

摘要翻译： 基板处理单元包括：用于保持基板的可垂直移动的基板保持器; 围绕衬底保持器的周边的平底锅; 位于基板保持器下方并在锅内的电池，在其内部具有化学处理部分; 以及能够封闭电池的顶部开口的电池盖，具有用于分别喷射至少两种类型的处理液体的多个喷嘴，其中锅和电池单元各自具有单独的液体排出管线。

公开(公告)号：US20050158478A1

公开(公告)日：2005-07-21

申请号：US10514030

申请日：2003-05-30

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima ,  Toshio Yokoyama

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima ,  Toshio Yokoyama

IPC分类号： C23C18/16 ,  C25D7/12 ,  C25D17/00 ,  C25D17/02 ,  H01L21/00 ,  B05D1/18 ,  B05C3/00

CPC分类号： H01L21/67051 ,  C23C18/1619 ,  C25D7/123 ,  C25D17/001 ,  C25D17/02

摘要： A substrate processing apparatus has a processing tank (10) for plating a substrate (W) in a plating solution (Q) holds therein, a cover (40) for selectively opening and closing an opening (11) of the processing tank (10), a spraying nozzle (60) mounted on an upper surface of the cover (40), and a substrate head (80) for attracting a reverse side of the substrate (W) to hold the substrate (W). With the cover (40) removed from the opening (11) of the processing tank (10), the substrate head (80) is lowered to dip the substrate (W) in the plating solution (Q) for thereby plating the substrate (W). When the substrate head (80) is lifted and the opening (11) of the processing tank (10) is closed by the cover (40), the substrate (W) is cleaned by the spraying nozzle (60).

摘要翻译： 基板处理装置具有用于对电镀液（Q）中保持的基板（W）进行电镀的处理槽（10），用于选择性地打开和关闭处理槽（10）的开口（11）的盖（40） ，安装在所述盖（40）的上表面上的喷嘴（60），以及用于吸引所述基板（W）的背面以保持所述基板（W）的基板头（80）。 在从处理槽（10）的开口（11）移除盖（40）的同时，将基板头（80）下降以将基板（W）浸入电镀液（Q）中，从而对基板（W ）。 当基板头（80）抬起并且处理槽（10）的开口（11）被盖（40）封闭时，基板（W）被喷嘴（60）清洁。