摘要:
In a known method for bonding components made of material with a high silicic acid content by means of a substance to substance bond, a SiO2-containing bonding mass is formed between connecting surfaces of the components. In order to provide for cost-efficient manufacture of a thermally stable composite, the invention proposes to generate a SiO2-containing bonding mass that is generic with regard to the material with a high silicic acid content, comprising the following procedural steps: provision of a slurry containing amorphous SiO2 particles; formation of a slurry mass between the connecting surfaces which are fixed in position with regard to each other; drying of the slurry mass; and solidification of the slurry mass by heating under formation of the SiO2-containing bonding mass. A component assembly manufactured according to the method of the invention shows high temperature resistance and thermal fatigue resistance and can also be used in contamination-sensitive applications. The component assembly is characterized by an amorphous SiO2-containing bonding mass, whose chemical composition is generic with regard to the material with the high silicic acid content of the basic material of the components, whereby the specific density of the SiO2-containing bonding mass is at least 2.0 g/cm3.
摘要:
In a known exterior deposition method for producing synthetic quartz glass, amorphous quartz glass powder particles (13) are fed to a reaction zone (12), the quartz glass powder particles are heated in the reaction zone (12) and deposited on the exterior side of a carrier (10) rotating about an axis of rotation. In order, proceeding from this, to specify a method which is distinguished by a high deposition efficiency, according to the invention it is proposed that amorphous quartz glass powder particles having a particle size of at least 3 μm together with a silicon-containing starting substance (14) are fed to the reaction zone (12), wherein the silicon-containing starting substance (14) is converted to SiO2 particles in the reaction zone, and the SiO2 particles are deposited in Co-15 deposition with the quartz glass powder particles on the carrier to form an SiO2-containing layer (11) in which the quartz glass powder particles (13) make up a proportion by weight of SiO2 in the range of 30% to 95%.
摘要:
An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
摘要:
Based on a known process for the manufacture of opaque quartz glass, by mixing SiO2 particles and an additive which is volatile at a melting temperature, forming a body and melting said body with an advancing melt front forming in the body, it is proposed according to the invention that in order to reduce the danger of contamination, a body (1) be formed with an inner bore (6) and be heated in such a manner that the melt front (10) advances from the inner bore (6) to the outside. The article of pure opaque quartz glass according to the invention has high resistance to temperature change, high mechanical strength and good chemical durability. It is distinguished by an opening (6) enclosed by an inner wall (9), with an inner SiO2 surface layer (15) having a layer thickness ranging from 30 mm to 500 mm and a density of at least 2.15 g/cm3.
摘要翻译:基于用于制造不透明石英玻璃的已知方法,通过混合SiO 2颗粒和在熔融温度下挥发的添加剂,形成主体并且在体内形成前进的熔体前端来熔化所述主体,根据 本发明为了减少污染的危险,本体(1)形成有内孔(6)并被加热,使得熔体前部(10)从内孔(6)前进到 外。 根据本发明的纯不透明石英玻璃的制品具有高的耐温变化性,高机械强度和良好的化学耐久性。 其特征在于由内壁(9)包围的开口(6),具有层厚度范围为30mm至500mm,密度至少为2.15g / cm 3的内部SiO 2表面层(15)。
摘要:
The temperature stabilization body is made of pulverized aluminum nitride with a first additive of pulverized aluminum present between 0.05% to 2%, and a grain size of under 1 micrometer, and a second additive of from 0.1% to 10% of an oxide, preferably yttrium oxide, present at about 1%--all precentages by weight, in which the mixture is ground in a ceramic ball mill to a grain size of not over 0.1 mm, subjected to cold isostatic pressure in the order of 2500 bar to form a green, pressed body, and then sintered at a sintering temperature of between 1750.degree. C. to 2000.degree. C. The heat conductivity of the densely sintered aluminum nitride body will then be at least 140 W/m .degree.K., and a heat conductivity of twice as much can be obtained, the body being non-toxic and not subject to creep under temperatures up to at least 1700.degree. C.
摘要:
SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500 μm. The largest volume fraction is SiO2 particles with particle sizes of 1 μm-60 μm, as well as SiO2 nanoparticles with particle sizes less than 100 nm constituting 0.2-15% volume by weight of the entire solids content. To prepare the slurry for use and optimize its flow behavior for later processing by dressing or pouring the slurry mass, and for later drying and sintering without cracks, the slurry has SiO2 particles with a multimodal distribution of particle sizes, with a first maximum in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and an 83%-90% solids content by weight of the SiO2 particles and the SiO2 nanoparticles together.
摘要:
In a known method for producing quartz glass that is doped with nitrogen, an SiO2 base product is prepared in the form of SiO2 grains or in the form of a porous semi-finished product produced from the SiO2 grains and the SiO2 base product is processed into the quartz glass with the nitrogen chemically bound therein in a hot process in an atmosphere containing a reaction gas containing nitrogen. From this starting point, a method is provided for achieving nitrogen doping in quartz glass with as high a fraction of chemically bound nitrogen as possible. This object is achieved according to the invention in that a nitrogen oxide is used as the nitrogen-containing reaction gas, and that a SiO2 base product is used that in the hot process has a concentration of oxygen deficient defects of at least 2×1015 cm−3, wherein the SiO2 base product comprises SiO2 particles having an average particle size in the range of 200 nm to 300 μm (D50 value).
摘要:
In a known method for producing a raised marking on a glass object, a suspension containing SiO2 particles is applied to a surface of the glass object as a pattern, and the pattern is compacted to form the marking. Starting from this, in order to enable a cost-effective production of an optically appealing and uniform marking on an object made of quartz glass, which marking is also suited for applications at high temperature or in a contamination-sensitive environment, such as in solar cell and semiconductor production, it is suggested according to the invention that a binder-free suspension be used to create a marking on a quartz glass object, the suspension containing a dispersion liquid and amorphous SiO2 particles having particle sizes of up to a maximum of 500 μm, of which are between 0.2% by wt. and 15% by wt. SiO2 nanoparticles having particle sizes of less than 100 nm, and the solids content thereof, i.e. the weight proportion of the SiO2 particles and of the SiO2 nanoparticles together, is in the range between 60% and 90%.
摘要:
The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.
摘要:
The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.