摘要:
Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion, containing 5 to 60% by weight cerium oxide. It can be used to polish SiO2 in the semiconductor industry.
摘要:
Compositions comprising an organic polymer as the matrix and inorganic particles as the filler and exhibiting in mixture a) 20 to 99.9% by wt. of an organic polymer and b) 0.1 to 80% by wt. of inorganic particles, where the sum of the constituents a) and b) amounts to 100% by wt.; and optionally c) 0 to 100 parts by weight of b) of various additives, in which case the content of the additives c) relates to the sum of a) and b), calculated as 100 parts by weight. characterized in that the composition can be obtained by incorporating particles and optionally other additives into the polymer matrix, in which case the particles to be incorporated i) are aggregates of globular primary particles; ii) the size of the primary particles is in a range of 0.5 nm to less than 100 nm; iii) the volume-weighted median value d50 of the particles is in a range of greater than 0.50 μm to 0.5 μm, determined by means of static light scattering; and iv) the inorganic particles are modified with functional groups, the inorganic particles exhibiting at least three types of functional groups of varying reactivity. The compositions can be prepared in a number of way, for example, by reprecipitation from the dissolved state or by mixing in an extruder and are used for preparing fibers, films and shaped articles with improved mechanical properties.
摘要:
Aqueous dispersion which comprises hydrophobized silicon dioxide particles and in each case one or more dispersing additives, a basic composition, and which is free of colour pigments, inactive fillers and binders, in which the hydrophobized silicon dioxide particles have a methanol wettability of 30 to 60 and are present in the dispersion with a proportion of 0.1 to 50% by weight,—the proportion of water is 30 to 90% by weight based on the dispersion,—the dispersing additive is at least one phosphate ester of an ethoxylated alcohol having 8 to 18 carbon atoms, the proportion of which is 3 to 25% by weight based on the proportion of the hydrophobized silicon dioxide particles,—the basic composition comprises or consists of one or more amines of the general formula RNH2, R2NH and R3N, where R is an alkyl group or a hydroxyl-substituted alkyl group having in each case 2 to 10 carbon atoms, and is present with a proportion of 5 to 30% by weight based on the proportion of hydrophobized silicon dioxide particles,—the dispersion further comprises one or more polyols having 2 to 15 carbon atoms, the proportion of which is 1 to 10% by weight based on the proportion of hydrophobized silicon dioxide particles,—the pH of the dispersion being 9 to 11.
摘要:
A dispersion containing aluminum oxide of pyrogenic origin and water, where the aluminum oxide is present in the form of aggregated primary particles with a BET surface area of 20 to 200 m2/g and has a mean, volume-based aggregate diameter in the dispersion of less than 100 nm, and is surface-modified with (i) organophosphonic acids, or salts thereof, and (ii) at least one hydroxycarboxylic acids or salts thereof.
摘要:
A method and device for producing a finely divided dispersion of solids having a mean particle size of 10 nm to 10 µm, in which at least two flows of a predispersion are sprayed by means of pumps, preferably high-pressure pumps, through one nozzle each into a grinding chamber enclosed by a reactor housing onto a collision point, wherein the grinding chamber is flooded with the predispersion and the finally divided dispersion is removed from the grinding chamber by the overpressure of the predispersion continuing to flow into the grinding chamber.
摘要:
Compositions comprising an organic polymer as the matrix and inorganic particles as the filler and exhibiting in mixture a) 20 to 99.9% by wt. of an organic polymer and b) 0.1 to 80% by wt. of inorganic particles, where the sum of the constituents a) and b) amounts to 100% by wt.; and optionally c) 0 to 100 parts by weight of b) of various additives, in which case the content of the additives c) relates to the sum of a) and b), calculated as 100 parts by weight. characterized in that the composition can be obtained by incorporating particles and optionally other additives into the polymer matrix, in which case the particles to be incorporated i) are aggregates of globular primary particles; ii) the size of the primary particles is in a range of 0.5 nm to less than 100 nm; iii) the volume-weighted median value d50 of the particles is in a range of greater than 0.50 μm to 0.5 μm, determined by means of static light scattering; and iv) the inorganic particles are modified with functional groups, the inorganic particles exhibiting at least three types of functional groups of varying reactivity. The compositions can be prepared in a number of way, for example, by reprecipitation from the dissolved state or by mixing in an extruder and are used for preparing fibers, films and shaped articles with improved mechanical properties.
摘要:
An aqueous dispersion having a pH value of between 3 and 7 containing 1 to 35 wt. % of a pyrogenically produced silicon-aluminium mixed oxide powder with a specific surface area of 5 to 400 m2/g, wherein the proportion of aluminium oxide in the powder is between 90 and 99.9 wt. % or between 0.01 and 10 wt. %, the surface of the powder comprises zones of aluminium oxide and silicon dioxide and the powder exhibits no signals for crystalline silicon dioxide in an X-ray diffractogram. Said dispersion may be used for the chemical-mechanical polishing of conductive, metallic films.
摘要:
Aqueous dispersion containing a silicon-aluminum mixed oxide powder, the powder containing 0.1 to 99.9 wt. % Al2O3 and Si—O—Al-bonds. The dispersion can be produced using dispersing and/or grinding devices which a achieve an energy input of at least 200 KJ/m3. The dispersion can be used for the chemical-mechanical polishing of semiconductor substrates.
摘要翻译:含有硅铝混合氧化物粉末的水分散体,该粉末含有0.1〜99.9重量% %的Al 2 O 3和Si-O-Al键。 分散体可以使用达到至少200KJ / m 3的能量输入的分散和/或研磨装置来生产。 该分散体可用于半导体衬底的化学机械抛光。
摘要:
A pyrogenic process is used to prepare alkali-doped silica particles. Particles produced by this process exhibit homogeneous doping, reduced agglomeration, greater stability and higher removal rates. Aqueous dispersions containing alkali-doped pyrogenic silica with average particle size less than 100 nm are used for polishing surfaces (CMP).
摘要:
The ink mixture contains at least one organosilane and optionally at least one hydrophobic silicic acid. The ink mixture can be used as a printing ink, especially as an ink for ink-jet printing.