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公开(公告)号:US20070095677A1
公开(公告)日:2007-05-03
申请号:US11554928
申请日:2006-10-31
申请人: You Wang , Stan Tsai , Lakshmanan Karuppiah , Jie Diao , Renhe Jia , Alpay Yilmaz
发明人: You Wang , Stan Tsai , Lakshmanan Karuppiah , Jie Diao , Renhe Jia , Alpay Yilmaz
IPC分类号: B23H3/00
CPC分类号: B23H5/08 , B24B37/042 , B24B37/046 , B24B53/017 , C25F1/00 , H01L21/32125
摘要: A method for conditioning an Ecmp pad is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of providing an electrical bias voltage between the top surface of the pad assembly and an electrode, and electrochemically removing contaminants from the top surface of the pad.
摘要翻译: 提供了一种调节Ecmp垫的方法。 在一个实施例中,用于电化学处理衬底的方法包括以下步骤:在衬垫组件的顶表面和电极之间提供电偏置电压,以及电化学去除衬垫顶表面的污染物。
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公开(公告)号:US07504018B2
公开(公告)日:2009-03-17
申请号:US11554928
申请日:2006-10-31
申请人: You Wang , Stan D. Tsai , Lakshmanan Karuppiah , Jie Diao , Renhe Jia , Alpay Yilmaz
发明人: You Wang , Stan D. Tsai , Lakshmanan Karuppiah , Jie Diao , Renhe Jia , Alpay Yilmaz
CPC分类号: B23H5/08 , B24B37/042 , B24B37/046 , B24B53/017 , C25F1/00 , H01L21/32125
摘要: A method for conditioning an Ecmp pad is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of providing an electrical bias voltage between the top surface of the pad assembly and an electrode, and electrochemically removing contaminants from the top surface of the pad.
摘要翻译: 提供了一种调节Ecmp垫的方法。 在一个实施例中,用于电化学处理衬底的方法包括以下步骤:在衬垫组件的顶表面和电极之间提供电偏置电压,以及电化学去除衬垫顶表面的污染物。
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公开(公告)号:US20080014709A1
公开(公告)日:2008-01-17
申请号:US11483843
申请日:2006-07-07
申请人: You Wang , Jie Diao , Stan D. Tsai , Lakshmanan Karuppiah
发明人: You Wang , Jie Diao , Stan D. Tsai , Lakshmanan Karuppiah
IPC分类号: H01L21/76
摘要: A method and apparatus for electroprocessing a substrate is provided. In one embodiment, a method for electroprocessing a substrate includes the steps of biasing a first electrode to establish a first electroprocessing zone between the electrode and the substrate, and biasing a second electrode disposed radially inward of the first electrode with a bias that is different than the bias applied to the first electrode. In one embodiment, the first electrode is coated with an inert material and in this way the same polish rate is obtained with a lower potential level applied to the first electrode.
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公开(公告)号:US09646859B2
公开(公告)日:2017-05-09
申请号:US12771969
申请日:2010-04-30
申请人: Hui Chen , Allen L. D'Ambra , Sen-Hou Ko , Yufei Chen , Adrian Blank , Mario D. Silvetti , Gerald J. Alonzo , Lakshmanan Karuppiah
发明人: Hui Chen , Allen L. D'Ambra , Sen-Hou Ko , Yufei Chen , Adrian Blank , Mario D. Silvetti , Gerald J. Alonzo , Lakshmanan Karuppiah
IPC分类号: H01L21/67
CPC分类号: H01L21/67046 , H01L21/67051
摘要: Embodiments of the present invention relates to an apparatus and method for cleaning a substrate using a disk brush. One embodiment provides a substrate cleaner comprising a substrate chuck disposed in the processing volume, and a brush assembly disposed in the processing volume, wherein the brush assembly comprises a disk brush movably disposed opposing the substrate chuck, and a processing surface of the disk brush contacts a surface of the substrate on the substrate chuck.
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公开(公告)号:US20130185884A1
公开(公告)日:2013-07-25
申请号:US13749116
申请日:2013-01-24
申请人: Sen-Hou Ko , Lakshmanan Karuppiah
发明人: Sen-Hou Ko , Lakshmanan Karuppiah
IPC分类号: B08B1/00
CPC分类号: B08B1/006 , B08B1/04 , H01L21/67046 , H01L21/67051
摘要: A method and apparatus for cleaning a substrate are provided. In one embodiment, a particle cleaning module is provided that includes a substrate holder and a pad holder disposed in a housing, and an actuator operable to move the pad holder relative to the substrate holder. The substrate holder is configured to retain and rotate a substrate in a substantially vertical orientation. The pad holder has a pad retaining surface that faces the substrate holder in a parallel and spaced apart relation. The pad holder is rotatable on an axis parallel to an axis on which the substrate holder rotates. The actuator is operable to move the pad holder relative to the substrate holder as to change a distance defined between the first axis and the second axis.
摘要翻译: 提供了一种用于清洁基板的方法和装置。 在一个实施例中,提供了一种颗粒清洁模块,其包括衬底保持器和设置在壳体中的衬垫保持器,以及可操作以相对于衬底保持器移动衬垫保持器的致动器。 衬底保持器被构造成以基本垂直的方向保持和旋转衬底。 焊盘保持器具有以平行和间隔的关系面对衬底保持器的焊盘保持表面。 衬垫支架可以在平行于衬底支架旋转的轴线的轴线上旋转。 致动器可操作以相对于基板保持器移动焊盘保持器,以改变限定在第一轴线和第二轴线之间的距离。
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公开(公告)号:US20130111678A1
公开(公告)日:2013-05-09
申请号:US13291945
申请日:2011-11-08
CPC分类号: H01L21/67046
摘要: Embodiments of the invention generally relate to a method and apparatus for cleaning a substrate. Particularly, embodiments of the invention relate to an apparatus and method for cleaning a substrate using a scrub brush. One embodiment provides a brush box assembly for cleaning a substrate. The assembly comprises a chamber body having a cleaning chamber disposed therein, a rotatable chuck disposed in the cleaning chamber, and an edge cleaner module positioned adjacent the chuck.
摘要翻译: 本发明的实施例一般涉及一种用于清洁衬底的方法和装置。 特别地,本发明的实施例涉及一种使用擦洗刷清洁衬底的装置和方法。 一个实施例提供了一种用于清洁基底的刷盒组件。 该组件包括一个室主体,其具有设置在其中的清洁室,设置在清洁室中的可旋转卡盘以及邻近卡盘定位的边缘清洁器模块。
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27.
公开(公告)号:US08250695B2
公开(公告)日:2012-08-28
申请号:US12573500
申请日:2009-10-05
申请人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
发明人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
IPC分类号: A47L25/00
CPC分类号: B08B1/04
摘要: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
摘要翻译: 本文所述的实施例涉及可用于刷清洁模块中的用于辊组件的装置和方法。 在一个实施例中,描述了辊组件。 辊组件包括具有至少两个基本上平行的相对侧壁的环形凹槽,所述至少两个基本上平行的相对侧壁适于沿着衬底的周边接触衬底的主表面,每个相对的侧壁包括具有预压缩尺寸小于 衬底的周边的厚度。
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公开(公告)号:US20110294400A1
公开(公告)日:2011-12-01
申请号:US13193011
申请日:2011-07-28
申请人: Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
发明人: Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
IPC分类号: B24B51/00
CPC分类号: G01B11/0683 , G01B11/0625 , Y10S707/99936
摘要: A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
摘要翻译: 确定基板的物理性质的方法包括记录从基板获得的第一光谱,第一光谱是在改变基板的物理性质的抛光工艺期间获得的第一光谱。 该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。 数据库中的每个光谱具有与之相关联的物理属性值。 该方法包括产生指示物理属性的第一值与第一频谱相关联的信号,第一值使用与数据库中所识别的先前记录的频谱相关联的物理属性值来确定。 用于确定基板的物理性质的系统包括抛光机,端点确定模块和数据库。
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公开(公告)号:US20110265816A1
公开(公告)日:2011-11-03
申请号:US12771969
申请日:2010-04-30
申请人: Hui Chen , Allen L. D'Ambra , Sen-Hou Ko , Yufei Chen , Adrian Blank , Mario D. Silvetti , Gerald J. Alonzo , Lakshmanan Karuppiah
发明人: Hui Chen , Allen L. D'Ambra , Sen-Hou Ko , Yufei Chen , Adrian Blank , Mario D. Silvetti , Gerald J. Alonzo , Lakshmanan Karuppiah
IPC分类号: B08B7/00
CPC分类号: H01L21/67046 , H01L21/67051
摘要: Embodiments of the present invention relates to an apparatus and method for cleaning a substrate using a disk brush. One embodiment provides a substrate cleaner comprising a substrate chuck disposed in the processing volume, and a brush assembly disposed in the processing volume, wherein the brush assembly comprises a disk brush movably disposed opposing the substrate chuck, and a processing surface of the disk brush contacts a surface of the substrate on the substrate chuck.
摘要翻译: 本发明的实施例涉及使用盘刷清洁衬底的装置和方法。 一个实施例提供一种基板清洁器,其包括设置在处理体积中的基板卡盘和设置在处理容积中的刷子组件,其中刷子组件包括可移动地布置成与基板卡盘相对的盘刷,以及盘刷触头的处理表面 基板卡盘上的基板的表面。
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30.
公开(公告)号:US20110079245A1
公开(公告)日:2011-04-07
申请号:US12573500
申请日:2009-10-05
申请人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
发明人: Lakshmanan Karuppiah , Dan Zhang , Simon Yavelberg , Jim K. Atkinson , Hung Chih Chen , Noel Manto , Jonathan Domin
CPC分类号: B08B1/04
摘要: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
摘要翻译: 本文所述的实施例涉及可用于刷清洁模块中的用于辊组件的装置和方法。 在一个实施例中,描述了辊组件。 辊组件包括具有至少两个基本上平行的相对侧壁的环形凹槽,所述至少两个基本上平行的相对侧壁适于沿着衬底的周边接触衬底的主表面,每个相对的侧壁包括具有预压缩尺寸小于 衬底的周边的厚度。
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