Laser diode
    22.
    发明申请
    Laser diode 审中-公开
    激光二极管

    公开(公告)号:US20110249696A1

    公开(公告)日:2011-10-13

    申请号:US13064524

    申请日:2011-03-30

    IPC分类号: H01S5/00

    摘要: There is provided a laser diode capable of setting a mesa diameter small without use of a method which loses reliability of a device, and is not easily controlled. The laser diode includes: a columnar mesa including a first multilayer film reflecting mirror, an active layer, and a second multilayer film reflecting mirror in this order, including an oxide confined layer having an unoxidized region in middle of a plane, and having a cross-sectional shape in a plane direction different from a cross-sectional shape of the unoxidized region in a plane direction; and a plurality of metal electrodes formed in regions on a top face of the mesa not facing the unoxidized region.

    摘要翻译: 本发明提供一种激光二极管,能够将台面直径设定得较小,而不使用失去设备可靠性的方法,不容易控制。 激光二极管包括:包括第一多层膜反射镜,有源层和第二多层膜反射镜的柱状台面,其包括在平面中间具有未氧化区域的氧化物限制层,并且具有十字形 在与平面方向上的非氧化区域的横截面形状不同的平面方向上的截面形状; 以及形成在不面向未氧化区域的台面的顶面的区域中的多个金属电极。

    Semiconductor layer, method of manufacturing the same, laser diode, and method of manufacturing the same
    24.
    发明授权
    Semiconductor layer, method of manufacturing the same, laser diode, and method of manufacturing the same 有权
    半导体层及其制造方法,激光二极管及其制造方法

    公开(公告)号:US08658449B2

    公开(公告)日:2014-02-25

    申请号:US12662099

    申请日:2010-03-31

    IPC分类号: H01L21/18 C30B25/14

    摘要: A method of manufacturing a semiconductor layer with which inactivation of impurity is able to be inhibited by a simple method, a semiconductor layer in which inactivation of impurity is inhibited, a method of manufacturing a laser diode with which inactivation of impurity is able to be inhibited by a simple method, and a laser diode including a semiconductor layer in which inactivation of impurity is inhibited are provided. In the method of manufacturing a semiconductor layer, after a semiconductor layer is formed by epitaxial growth with the use of AsH3, supply of AsH3 is stopped without separately supplying new gas when process temperature is 500 deg C. or more.

    摘要翻译: 通过简单的方法制造能够抑制杂质失活的半导体层的制造方法,抑制杂质失活的半导体层,能够抑制杂质失活的激光二极管的制造方法 通过简单的方法,提供了包含抑制杂质失活的半导体层的激光二极管。 在制造半导体层的方法中,在使用AsH3通过外延生长形成半导体层之后,当处理温度为500℃以上时,不间断地供给新气体而停止供给AsH3。

    Semiconductor layer, method of manufacturing the same, laser diode, and method of manufacturing the same
    25.
    发明申请
    Semiconductor layer, method of manufacturing the same, laser diode, and method of manufacturing the same 有权
    半导体层及其制造方法,激光二极管及其制造方法

    公开(公告)号:US20100260222A1

    公开(公告)日:2010-10-14

    申请号:US12662099

    申请日:2010-03-31

    IPC分类号: H01L29/20 H01L21/20 H01S5/323

    摘要: A method of manufacturing a semiconductor layer with which inactivation of impurity is able to be inhibited by a simple method, a semiconductor layer in which inactivation of impurity is inhibited, a method of manufacturing a laser diode with which inactivation of impurity is able to be inhibited by a simple method, and a laser diode including a semiconductor layer in which inactivation of impurity is inhibited are provided. In the method of manufacturing a semiconductor layer, after a semiconductor layer is formed by epitaxial growth with the use of AsH3, supply of AsH3 is stopped without separately supplying new gas when process temperature is 500 deg C. or more.

    摘要翻译: 通过简单的方法制造能够抑制杂质失活的半导体层的制造方法,抑制杂质失活的半导体层,能够抑制杂质失活的激光二极管的制造方法 通过简单的方法,提供了包含抑制杂质失活的半导体层的激光二极管。 在制造半导体层的方法中,在使用AsH3通过外延生长形成半导体层之后,当处理温度为500℃以上时,不间断地供给新气体而停止供给AsH3。