利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

430 条记录 (耗时 0.042 秒)

    TRANSPARENT ELECTRODE CAPACITANCE SENSOR AND PROCESS FOR MANUFACTURING THE SAME
    21.
    发明申请
    TRANSPARENT ELECTRODE CAPACITANCE SENSOR AND PROCESS FOR MANUFACTURING THE SAME 有权
    透明电极电容传感器及其制造方法

    公开(公告)号：US20160266707A1

    公开(公告)日：2016-09-15

    申请号：US15036633

    申请日：2014-12-12

    申请人： SHIN-ETSU POLYMER CO., LTD.

    发明人： Tomohiro NOZAKI ,  Hiroto KOMATSU ,  Takashi KAWAMURA

    IPC分类号： G06F3/041 ,  G06F3/044

    CPC分类号： G06F3/0416 ,  G01R27/00 ,  G06F3/044 ,  G06F2203/04102 ,  G06F2203/04103 ,  G06F2203/04112

    摘要： A transparent electrode capacitance sensor includes a transparent resin substrate; at least one transparent electrode formed on the transparent resin substrate; a pseudo auxiliary electrode formed in at least a portion of an outer periphery of the transparent electrode; and a lead wire connected to the pseudo auxiliary electrode, wherein the pseudo auxiliary electrode is thicker than the transparent electrode, and includes the same material as the transparent electrode.

    摘要翻译： 透明电极电容传感器包括透明树脂基板; 形成在所述透明树脂基板上的至少一个透明电极; 在所述透明电极的外周的至少一部分上形成的伪辅助电极; 以及连接到所述伪辅助电极的引线，其中所述伪辅助电极比所述透明电极厚，并且包括与所述透明电极相同的材料。

    Member for electrostatic capacitance-type sensor and electrostatic capacitance-type sensor using the same
    22.
    发明授权
    Member for electrostatic capacitance-type sensor and electrostatic capacitance-type sensor using the same 有权
    静电电容型传感器和静电电容型传感器的使用方法

    公开(公告)号：US09184747B2

    公开(公告)日：2015-11-10

    申请号：US13819921

    申请日：2011-08-30

    申请人： Toshiyuki Kawaguchi ,  Hiroto Komatsu

    发明人： Toshiyuki Kawaguchi ,  Hiroto Komatsu

    IPC分类号： H03K17/975 ,  H03K17/96

    CPC分类号： H03K17/962 ,  H03K2217/960755

    摘要： A member for an electrostatic capacitance-type sensor which suppresses a decrease in the variation amount of the electrostatic capacitance caused between an input body and the electrode through a proximate operation or a touch operation by the input body and has a metallic luster appearance which does not degrade with time, and is economical, and an electrostatic capacitance-type sensor using the same. The disclosed member includes a sheet member having an operation surface S on which a proximate operation or a touch operation by an input body is carried out and an electrode which is disposed on the opposite side of the operation surface of the sheet member, in which the sheet member includes a decorative layer having a metallic luster, and the decorative layer is a continuous film made of silicon or an alloy of silicon and a metal.

    摘要翻译： 一种静电电容式传感器的部件，其通过输入体的接近操作或触摸操作抑制输入体和电极之间引起的静电电容的变化量的降低，并且具有不会引起的金属光泽外观 随着时间的推移而降低，并且是经济的，以及使用该传感器的静电电容式传感器。 所公开的构件包括具有操作表面S的片状构件，在其上执行由输入体执行的近似操作或触摸操作以及设置在片构件的操作表面的相对侧上的电极，其中 片状构件包括具有金属光泽的装饰层，并且装饰层是由硅或硅和金属的合金制成的连续膜。

    ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM
    23.
    发明申请
    ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM 有权
    防静电剂和防静电膜

    公开(公告)号：US20150218410A1

    公开(公告)日：2015-08-06

    申请号：US14426107

    申请日：2013-09-05

    申请人： SHIN-ETSU POLYMER CO., LTD. ,  SHIN-ETSU CHEMICAL CO., LTD.

    发明人： Sou Matsubayashi ,  Kohei Kanto ,  Kazuyoshi Yoshida ,  Kenji Yamamoto ,  Shinji Irifune

    IPC分类号： C09D141/00 ,  C09D5/24

    CPC分类号： C09D141/00 ,  C08G77/16 ,  C08G77/18 ,  C08L83/04 ,  C09D5/24 ,  C09J7/40

    摘要： The invention relates to an antistatic release agent comprising: a release component that contains a condensation-curing type organopolysiloxane, a conductive component that contains a complex of a π-conjugated electrically conductive polymer and a polyanion and an organic solvent, wherein the amount of the conductive component relative to 100 parts by mass of the release component is 1 to 300 parts by mass, at least one amine-type compound selected from the group consisting of a secondary amine, a tertiary amine or a quaternary ammonium salt is coordinated to or bonded to portion of anion groups in the polyanion as an ion pair, and the amine-type compound has one or more substituent selected from the group consisting of an alkyl group having 4 or more carbon atoms, an aryl group, an aralkyl group, an alkylene group, an arylene group, an aralkylene group and an oxyalkylene group.

    摘要翻译： 本发明涉及一种抗静电脱模剂，其包含：含有缩合固化型有机聚硅氧烷的释放组分，含有共轭导电聚合物和聚阴离子与有机溶剂的络合物的导电组分，其中， 导电成分相对于100质量份的脱模成分为1〜300质量份，选自仲胺，叔胺或季铵盐中的至少一种胺型化合物与 与作为离子对的聚阴离子中的阴离子基部分结合，胺型化合物具有一个以上取代基，该取代基选自碳原子数4以上的烷基，芳基，芳烷基，芳烷基 亚烷基，亚芳基，亚芳烷基和氧化烯基。

    Electrically conductive roller and image-forming device
    24.
    发明授权
    Electrically conductive roller and image-forming device 有权
    导电辊和成像装置

    公开(公告)号：US08968168B2

    公开(公告)日：2015-03-03

    申请号：US13388398

    申请日：2009-08-21

    申请人： Tomoharu Takeuchi ,  Hiroyuki Takanashi ,  Taichi Ohkubo

    发明人： Tomoharu Takeuchi ,  Hiroyuki Takanashi ,  Taichi Ohkubo

    IPC分类号： G03G15/16 ,  G03G15/02 ,  G03G15/08 ,  G03G15/20

    CPC分类号： G03G15/0233 ,  G03G15/0818 ,  G03G15/1685 ,  G03G15/2057

    摘要： This invention provides an electrically conductive roller capable of forming an image without fogging even in a low humidity environment and an image-forming device. Specifically, the invention relates to an electrically conductive roller has an elastic layer formed on an outer circumferential surface of a shaft and a urethane coat layer formed on an outer circumferential surface of the elastic layer, wherein the urethane coat layer includes a urethane resin, and at least one ionic liquid selected from the group consisting of pyridinium ionic liquids and amine ionic liquids, in an amount from 1 to 20 parts by mass to 100 parts by mass of the urethane resin; and an image-forming device equipped with the electrically conductive roller.

    摘要翻译： 本发明提供一种即使在低湿度环境下也能够形成图像而不起雾的导电辊和图像形成装置。 具体而言，本发明涉及一种导电辊，其具有形成在轴的外周面上的弹性层和形成在弹性层的外周面上的聚氨酯涂层，其中，所述聚氨酯涂层包含聚氨酯树脂，以及 选自吡啶鎓离子液体和胺离子液体的至少一种离子液体，其量为1至20质量份至100质量份的聚氨酯树脂; 以及配备有导电辊的图像形成装置。

    Wafer storing container
    25.
    发明授权
    Wafer storing container 有权
    晶圆储存容器

    公开(公告)号：US08960442B2

    公开(公告)日：2015-02-24

    申请号：US14356852

    申请日：2011-11-08

    申请人： Takaharu Oyama ,  Chiaki Matsutori ,  Tsuyoshi Nagashima ,  Shuichi Inoue ,  Hiroyuki Shida ,  Hiroki Yamagishi ,  Kazumasa Onuki

    发明人： Takaharu Oyama ,  Chiaki Matsutori ,  Tsuyoshi Nagashima ,  Shuichi Inoue ,  Hiroyuki Shida ,  Hiroki Yamagishi ,  Kazumasa Onuki

    IPC分类号： B65D85/48 ,  H01L21/673

    CPC分类号： H01L21/67383 ,  H01L21/67386 ,  Y10S206/832

    摘要： Wafer support shelves (10, 10) are each provided with wafer support projections (A, B1, B2) on which parts of the outer margins of a semiconductor wafer (W) are to be placed. In each case, one of the support projections (A, B1, B2) is provided on the far side of the center position of the semiconductor wafer (W), and two of the support projections are provided on the near side of the center of the semiconductor wafer. By means of this structure, in a state in which a lid body (3) is not attached to a wafer extraction/insertion opening (2), the flexure amount of the semiconductor wafers placed on the support projections of multiple locations in the wafer support shelves can be reduced with a minimal number of projections, so that a hindrance is not created to an operation such as extraction by a robot arm.

    摘要翻译： 晶片支撑架（10,10）各自设置有晶片支撑突起（A，B1，B2），半导体晶片（W）的外边缘的一部分将被放置在其上。 在每种情况下，支撑突起（A，B1，B2）中的一个设置在半导体晶片（W）的中心位置的远侧，并且两个支撑突起设置在 半导体晶片。 通过这种结构，在盖体（3）未安装在晶片拔出/插入口（2）的状态下，放置在晶片支撑体中的多个位置的支撑突起上的半导体晶片的挠曲量 可以以最少数量的突起来减少搁架，从而不会对诸如由机器人臂提取的操作产生障碍。

    Method for manufacturing film for film capacitor
    26.
    发明授权
    Method for manufacturing film for film capacitor 有权
    薄膜电容薄膜的制造方法

    公开(公告)号：US08790558B2

    公开(公告)日：2014-07-29

    申请号：US12969173

    申请日：2010-12-15

    申请人： Kazuhiro Suzuki ,  Kenro Takizawa ,  Masaru Yoneyama ,  Junya Ishida

    发明人： Kazuhiro Suzuki ,  Kenro Takizawa ,  Masaru Yoneyama ,  Junya Ishida

    IPC分类号： D01D5/16

    CPC分类号： H01G4/18 ,  B29C47/0021 ,  B29C47/004 ,  B29C47/0813 ,  B29C47/14 ,  B29C47/34 ,  B29C47/8845 ,  B29C47/886 ,  B29C2947/92285 ,  B29C2947/92647 ,  H01G13/00

    摘要： A film for film capacitors having a thickness of 10 microns or less, is manufactured by the successive steps of: mixing and preparing a forming material composed of a thermoplastic resin composition; melting and extruding the forming material to a film through a T-die; pinching and cooling the film between a pressure roll and a cooling roll having a rough surface for forming a rough surface to the film, wherein the rough surface of the cooling roll has (σ/Ra) of 0.2 or less, and the rough surface of the film has (σ/Ra) of 0.2 or less, where (Ra) is an arithmetic average roughness defined by a method specified in JIS B 0601 2001, and (σ) is a standard deviation; and rolling up the cooled film onto a winding tube in a winding unit.

    摘要翻译： 通过以下连续步骤制造厚度为10微米或更小的薄膜电容器薄膜：混合并制备由热塑性树脂组合物构成的成形材料; 通过T型模头将成形材料熔融并挤出成膜; 在薄膜之间夹紧和冷却具有用于形成粗糙表面的粗糙表面的压力辊和冷却辊之间，其中冷却辊的粗糙表面具有0.2以下的粗糙表面，并且粗糙表面 （＆sgr。/ Ra）为0.2以下，其中（Ra）是由JIS B 0601 2001中规定的方法定义的算术平均粗糙度，（＆sgr。）是标准偏差; 并将冷却的膜卷绕到卷绕单元中的卷绕管上。

    ANTISTATIC RELEASE AGENT, ANTISTATIC RELEASE COATED FILM AND ANTISTATIC RELEASE BASE MATERIAL
    27.
    发明申请
    ANTISTATIC RELEASE AGENT, ANTISTATIC RELEASE COATED FILM AND ANTISTATIC RELEASE BASE MATERIAL 有权
    防静电剂，防静电涂膜和抗静电释放基材

    公开(公告)号：US20140084225A1

    公开(公告)日：2014-03-27

    申请号：US14032304

    申请日：2013-09-20

    申请人： Shin-Etsu Polymer Co., Ltd.

    发明人： Kouhei KANTO ,  Sou MATSUBAYASHI ,  Kenichi FUJITSUNA ,  Kazuyoshi YOSHIDA

    IPC分类号： C09D5/24

    CPC分类号： C09D5/24 ,  H01B1/121

    摘要： The present invention relates to an antistatic release agent comprising an aqueous solution of an electrically conductive polymer complex composed of a π-conjugated electrically conductive polymer and a polyanion having an anionic group in a molecule thereof, an alkaline compound, a silicone emulsion and a dispersion medium, wherein the alkaline compound is at least one type of compound selected from the group consisting of an inorganic alkali, as amine compound and a nitrogen-containing aromatic cyclic compound, the content of the alkaline compound in the antistatic release agent is 0.7 times or more relative to the number of moles of the neutralization equivalent of the electrically conductive polymer complex, and the pH of the antistatic release agent at 25° C. is 10 or lower. The present invention can provide an antistatic release agent having superior storage stability for forming an antistatic release coated film.

    摘要翻译： 本发明涉及一种抗静电脱模剂，其包含由共轭导电聚合物和分子中具有阴离子基团的聚阴离子组成的导电聚合物络合物的水溶液，碱性化合物，硅氧烷乳液和 分散介质，其中碱性化合物是选自无机碱，作为胺化合物和含氮芳族环状化合物的至少一种化合物，抗静电脱模剂中碱性化合物的含量为0.7倍 以上，相对于导电性聚合物配合物的中和当量的摩尔数，25℃下的抗静电脱模剂的pH为10以下。 本发明可以提供一种具有优异的防静电脱模涂膜形成保存稳定性的抗静电脱模剂。

    MANUFACTURING METHOD OF SINGLE CRYSTAL SUBSTRATE AND MANUFACTURING METHOD OF INTERNAL MODIFIED LAYER-FORMING SINGLE CRYSTAL MEMBER
    28.
    发明申请
    MANUFACTURING METHOD OF SINGLE CRYSTAL SUBSTRATE AND MANUFACTURING METHOD OF INTERNAL MODIFIED LAYER-FORMING SINGLE CRYSTAL MEMBER 审中-公开
    单晶基板的制造方法和内部改性层形成单晶构件的制造方法

    公开(公告)号：US20130312460A1

    公开(公告)日：2013-11-28

    申请号：US13984047

    申请日：2011-02-10

    申请人： Yosuke Kunishi ,  Hideki Suzuki ,  Rika Matsuo ,  Junichi Ikeno

    发明人： Yosuke Kunishi ,  Hideki Suzuki ,  Rika Matsuo ,  Junichi Ikeno

    IPC分类号： C30B30/00

    CPC分类号： C30B30/00 ,  B23K26/0665 ,  B28D5/0011 ,  C30B29/36 ,  C30B33/04 ,  C30B33/06 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268 ,  H01L21/304 ,  H01L31/18 ,  H01L31/1848 ,  H01L31/1852 ,  H01L31/1892 ,  Y02E10/544 ,  Y02P70/521

    摘要： It is an object of the present invention to provide a manufacturing method of a single crystal substrate and to provide an internal modified layer-forming single crystal member, each of which is capable of easily manufacturing a relatively large and thin single crystal substrate. The manufacturing method of a single crystal substrate includes: the step of arranging a condensing lens (15), which emits laser beams (B) and corrects aberration caused by a refractive index of a single crystal member (10), contactlessly on the single crystal member (10); the step of irradiating the laser beams onto a surface (10t) of the single crystal member (10), and condensing the laser beams into an inside of the single crystal member; the step of moving the condensing lens (15) and the single crystal member (10) relatively to each other, and forming a two-dimensional modified layer (12) in the inside of the single crystal member (10); and the step of exfoliating a single crystal layer, which is formed by being divided by the modified layer (12), from the modified layer (12), thereby forming a single crystal substrate.

    摘要翻译： 本发明的目的是提供一种单晶衬底的制造方法，并提供能够容易地制造相对大而薄的单晶衬底的内部改性层形成单晶构件。 单晶衬底的制造方法包括：配置发射激光束（B）的聚光透镜（15）和由单晶构件（10）的折射率引起的像差校正在单晶上的步骤 会员（10）; 将激光束照射到单晶构件（10）的表面（10t）上并将激光束聚光到单晶构件的内部的步骤; 使聚光透镜（15）和单晶构件（10）相对移动的步骤，在单晶构件（10）的内部形成二维改质层（12）。 以及通过被改性层（12）分割形成的单晶层从改性层（12）剥离的步骤，从而形成单晶基板。