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104 条记录 (耗时 0.028 秒)

    CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
    22.
    发明申请
    CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD 有权

    公开(公告)号：US20230096574A1

    公开(公告)日：2023-03-30

    申请号：US17798538

    申请日：2021-02-11

    申请人： ASML NETHERLANDS B.V.

    发明人： Marco Jan-Jaco WIELAND

    IPC分类号： G01N23/2206 ,  G01N23/2251 ,  G01N23/203

    摘要： Charged particle assessment tools and inspection methods are disclosed. In one arrangement, a condenser lens array divides a beam of charged particles into a plurality of sub-beams. Each sub-beam is focused to a respective intermediate focus. Objective lenses downstream from the intermediate foci project sub-beams from the condenser lens array onto a sample. A path of each sub-beam is substantially a straight line from each condenser lens to a corresponding objective lens.

    LATERAL RECESS MEASUREMENT IN A SEMICONDUCTOR SPECIMEN
    23.
    发明申请
    LATERAL RECESS MEASUREMENT IN A SEMICONDUCTOR SPECIMEN 有权

    公开(公告)号：US20230023363A1

    公开(公告)日：2023-01-26

    申请号：US17382280

    申请日：2021-07-21

    申请人： Applied Materials Israel Ltd.

    发明人： Michael CHEMAMA ,  Ron MEIRY ,  Moshe ELIASOF ,  Lior YARON ,  Guy EYTAN ,  Konstantin CHIRKO ,  Rafael BISTRITZER

    IPC分类号： G01N23/2206 ,  H01L21/66 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28

    摘要： There is provided a system and method of measuring a lateral recess in a semiconductor specimen, comprising: obtaining a first image acquired by collecting SEs emitted from the surface of the specimen, and a second image acquired by collecting BSEs scattered from an interior region of the specimen between the surface and a target second layer, the specimen scanned using an electron beam with a landing energy selected to penetrate to a depth corresponding to the target second layer; generating a first GL waveform based on the first image, and a second GL waveform based on the second image; estimating a first width of the first layers based on the first GL waveform, and a second width with respect to at least the target second layer based on the second GL; and measuring a lateral recess based on the first width and the second width.

    X-ray analyzer
    25.
    发明授权
    X-ray analyzer 有权

    公开(公告)号：US11467103B2

    公开(公告)日：2022-10-11

    申请号：US17059838

    申请日：2020-01-24

    申请人： APPLIED SCIENCE LABORATORY CO., LTD

    发明人： Hiroyoshi Soejima

    IPC分类号： G01N23/085 ,  G01N23/20008 ,  G01N23/207 ,  G01N23/223 ,  G01N23/2273 ,  G01N23/2206 ,  G01N23/2209 ,  G21K1/06

    摘要： An X-ray analyzer includes an X-ray source, a straight tube type multi-capillary, a flat plate spectroscopic crystal, a parallel/point focus type multi-capillary X-ray lens, and a Fresnel zone plate. A qualitative analysis is performed over an area on the sample, the flat plate spectroscopic crystal and the Fresnel zone plate are removed from the X-ray optical path, and X-rays are collected by the multi-capillary lens and the sample is irradiated. When analyzing the chemical morphology of an element, the multi-capillary lens retracts from the optical path, the source rotates, and the flat plate spectroscopic crystal and the Fresnel zone plate are inserted on the optical path. A narrow sample area is irradiated by the Fresnel zone plate with X-rays having energy extracted from the flat plate spectroscopic crystal. This makes it possible to carry out accurate qualitative analysis on the sample and perform detailed analysis of more minute parts.

    Electron beam inspection apparatus and electron beam inspection method
    28.
    发明授权
    Electron beam inspection apparatus and electron beam inspection method 有权

    公开(公告)号：US10775326B2

    公开(公告)日：2020-09-15

    申请号：US16292466

    申请日：2019-03-05

    申请人： NuFlare Technology, Inc.

    发明人： Hideo Tsuchiya ,  Masataka Shiratsuchi ,  Ryoichi Hirano ,  Hideaki Hashimoto ,  Riki Ogawa

    IPC分类号： G01N23/22 ,  G01N23/2251 ,  G01N23/2206 ,  H01J37/26 ,  H01J37/28

    摘要： An electron beam inspection apparatus includes an acquisition processing circuitry to acquire surface material information presenting a surface material of the substrate and a value of an acceleration voltage of an electron beam; a sequence determination processing circuitry to determine a scan sequence of a plurality of stripe regions on the basis of the surface material of the substrate and the value of the acceleration voltage, the plurality of stripe regions obtained by virtually dividing an inspection region of the substrate in a stripe shape; a secondary electron image acquisition mechanism including a detector for detecting a secondary electron and configured to scan the plurality of stripe regions of the substrate according to a determined scan sequence and to acquire a secondary electron image of the substrate; and a comparison processing circuitry to compare the secondary electron image with a corresponding reference image.

    System and method for calibrating a PET scanner
    29.
    发明授权
    System and method for calibrating a PET scanner 有权

    公开(公告)号：US10663608B2

    公开(公告)日：2020-05-26

    申请号：US15171877

    申请日：2016-06-02

    申请人： SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.

    发明人： Xinyu Lyu ,  Qixiang Zhang ,  Wenbing Song ,  Zijun Ji ,  Weiping Liu

    IPC分类号： G01T7/00 ,  G01T1/29 ,  G01N23/2206

    摘要： A method and system for calibrating a PET scanner are described. The PET scanner may have a field of view (FOV) and multiple detector rings. A detector ring may have multiple detector units. A line of response (LOR) connecting a first detector unit and a second detector unit of the PET scanner may be determined. The LOR may correlate to coincidence events resulting from annihilation of positrons emitted by a radiation source. A first time of flight (TOF) of the LOR may be calculated based on the coincidence events. The position of the radiation source may be determined. A second TOF of the LOR may be calculated based on the position of the radiation source. A time offset may be calculated based on the first TOF and the second TOF. The first detector unit and the second detector unit may be calibrated based on the time offset.