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31.发明授权Method for correcting measured values resulting from the bending of a substrate 有权用于校正由基板弯曲产生的测量值的方法公开(公告)号：US07826068B2
公开(公告)日：2010-11-02
申请号：US12147974
申请日：2008-06-27
申请人： Slawomir Czerkas
发明人： Slawomir Czerkas
IPC分类号： G01B11/24
CPC分类号： G01B21/045 , G03F1/84
摘要： A method for correcting the measured values of positions of structures (3) on a substrate (2) resulting from bending of a substrate (2) is disclosed. A plurality of geometric parameters of the substrate (2) are determined. A plurality of physical parameters of the substrate (2) are determined. A degree of bending is calculated individually for each substrate (2) on the basis of the obtained geometric parameters, the physical parameters and the position of the support points (40). The measured position data of the structures (3) on the substrate (2) is corrected with the aid of each individually calculated degree of bending.
摘要翻译： 公开了一种用于校正由于基板（2）的弯曲而导致的基板（2）上的结构（3）的位置的测量值的方法。 确定衬底（2）的多个几何参数。 确定基板（2）的多个物理参数。 基于获得的几何参数，物理参数和支撑点（40）的位置，针对每个基板（2）分别计算弯曲程度。 借助于每个单独计算的弯曲度来校正衬底（2）上的结构（3）的测量位置数据。
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公开(公告)号：US07817262B2
公开(公告)日：2010-10-19
申请号：US12215273
申请日：2008-06-26
CPC分类号： G01B11/005
摘要： A device for measuring positions of structures (3) on a substrate (2) is disclosed, wherein the device is enclosed by a climatic chamber (30). An illumination and imaging means (6, 14) is also arranged in the climatic chamber (30). At least one loading station (32) for substrates is formed on an outer wall (30a) of the climatic chamber (30), wherein at least one transport means (34, 40) for transporting the substrates is provided within the climatic chamber (30). A means (36) for orienting the substrates (2) with respect to a coordinate system of the coordinate measuring machine (1) is provided, wherein the transport means (34, 40) deposits the substrates (2) on the means (36) for orienting.
摘要翻译： 公开了一种用于测量基板（2）上的结构（3）的位置的装置，其中该装置被气候室（30）包围。 照明和成像装置（6,14）也布置在气候室（30）中。 在气候室（30）的外壁（30a）上形成至少一个用于衬底的装载站（32），其中用于输送衬底的至少一个输送装置（34,40）设置在气候室（30）内 ）。 提供了一种用于相对于坐标测量机（1）的坐标系定向基板（2）的装置（36），其中输送装置（34,40）将基板（2）沉积在装置（36）上， 定向。
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公开(公告)号：US20100220339A1
公开(公告)日：2010-09-02
申请号：US12689358
申请日：2010-01-19
申请人： Klaus Rinn , Andreas Schaaf , Andre Schepp
发明人： Klaus Rinn , Andreas Schaaf , Andre Schepp
CPC分类号： G01B11/03
摘要： A method for determining the positions of structures (3) on a mask (2) is disclosed. The method is implemented in a metrology tool (1) comprising a measurement table (20) which is movable in X-coordinate direction and Y-coordinate direction. A first intensity profile (IX) is recorded along a first measurement direction (MRX), which is parallel to the X-coordinate direction. A second intensity profile (IY) is recorded along a second measurement direction (MRY), which is parallel to the Y-coordinate direction. A two-dimensional position of a centre of gravity (S) with respect to the coordinate system of the metrology tool (1) is determined from the first intensity profile (IX) and the second intensity profile (IY).
摘要翻译： 公开了一种用于确定掩模（2）上的结构（3）的位置的方法。 该方法在包括可在X坐标方向和Y坐标方向上移动的测量台（20）的计量工具（1）中实现。 沿着与X坐标方向平行的第一测量方向（MRX）记录第一强度分布（IX）。 沿着与Y坐标方向平行的第二测量方向（MRY）记录第二强度分布（IY）。 根据第一强度分布（IX）和第二强度分布（IY）确定相对于计量工具（1）的坐标系的重心（S）的二维位置。
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34.发明授权Method for correcting measuring errors caused by the lens distortion of an objective 有权用于校正由物镜的镜头失真引起的测量误差的方法公开(公告)号：US07769556B2
公开(公告)日：2010-08-03
申请号：US12231481
申请日：2008-09-03
申请人： Michael Heiden , Klaus-Dieter Adam
发明人： Michael Heiden , Klaus-Dieter Adam
CPC分类号： G01M11/0271 , G01M11/0257
摘要： A method for correcting the measuring errors caused by the lens distortion of an objective in a coordinate measuring machine is disclosed. For a plurality of different types of structures, the lens distortion caused by an objective is determined in an image field of the objective. The position of a type of structure is determined in the image field of the objective by a measuring window. The correction of the lens distortion required for the type of structure to be measured is retrieved from the database as a function of the type of structure to be measured.
摘要翻译： 公开了一种用于校正由坐标测量机中的物镜的镜头变形引起的测量误差的方法。 对于多种不同类型的结构，在目标的图像场中确定由物镜引起的透镜失真。 通过测量窗在物镜的图像场中确定一种结构的位置。 根据要测量的结构类型，从数据库中检索要测量的结构类型所需的透镜畸变的校正。
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35.发明申请DEVICE AND METHOD FOR THE INSPECTION OF DEFECTS ON THE EDGE REGION OF A WAFER 审中-公开用于检查WAF边缘区域缺陷的装置和方法公开(公告)号：US20090279080A1
公开(公告)日：2009-11-12
申请号：US12494858
申请日：2009-06-30
申请人： Lambert Danner , Michael Heiden , Wolfgang Vollrath , Alexander Buttner , Christof Krampe-Zadler
发明人： Lambert Danner , Michael Heiden , Wolfgang Vollrath , Alexander Buttner , Christof Krampe-Zadler
IPC分类号： G01N21/88
CPC分类号： G01N21/9503 , G01N2021/8825
摘要： A method, a device and the application for the inspection of defects on the edge region of a wafer (6) is disclosed. At least one illumination device (41) illuminates the edge region (6a) of the wafer (6). At least one optical unit (40) is provided, said optical unit (40) being positionable subject to the position of the defect (88) relative to a top surface (30) of the edge of the wafer (6a) or a bottom surface (31) of the edge of the wafer (6a) or a face (32) of the edge of the wafer (6a) for capturing an image of said defect.
摘要翻译： 公开了一种用于检查晶片（6）的边缘区域上的缺陷的方法，装置和应用。 至少一个照明装置（41）照亮晶片（6）的边缘区域（6a）。 提供至少一个光学单元（40），所述光学单元（40）可相对于所述晶片（6a）的边缘的顶表面（30）定位以抵抗所述缺陷（88）的位置或底表面 （6a）的边缘的边缘（31）或晶片（6a）的边缘的面（32），用于捕获所述缺陷的图像。
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公开(公告)号：US07561263B2
公开(公告)日：2009-07-14
申请号：US11644275
申请日：2006-12-22
IPC分类号： G01N21/00
CPC分类号： G02B3/0068 , G02B3/005 , G02B27/0075 , G02B27/0961
摘要： The present invention relates to an apparatus for illuminating and inspecting a specular surface, comprising a light source, a collector optics for collecting the light from the light source, a homogenizing optics for transmitting the light from the collector optics having a first micro-lens array downstream of the collector optics, and a second micro-lens array downstream of the first micro-lens array, a Fourier optics for transmitting the light from the homogenizing optics onto the specular surface, an objective optics, and a detector for receiving an image, wherein the collector optics and the first micro-lens array project the light source onto the second micro-lens array and wherein the second micro-lens array and the Fourier optics project the first micro-lens array onto the specular surface, and wherein the objective optics projects the specular surface onto the detector.
摘要翻译： 本发明涉及一种用于照明和检查镜面的装置，包括光源，用于收集来自光源的光的收集器光学元件，用于透射来自具有第一微透镜阵列的收集器光学器件的光的均匀化光学器件 在第一微透镜阵列下游的第二微透镜阵列，用于将来自均匀化光学器件的光透射到镜面上的傅立叶光学器件，物镜光学器件和用于接收图像的检测器， 其中所述收集器光学器件和所述第一微透镜阵列将所述光源投影到所述第二微透镜阵列上，并且其中所述第二微透镜阵列和所述傅立叶光学器件将所述第一微透镜阵列投射到所述镜面上，并且其中所述物镜 光学镜头将镜面投射到检测器上。
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37.发明授权公开(公告)号：US07548321B2
公开(公告)日：2009-06-16
申请号：US11803635
申请日：2007-05-15
申请人： Klaus Rinn
发明人： Klaus Rinn
IPC分类号： G01B11/02
CPC分类号： G01B11/03 , G01B11/028
摘要： A method for the high-precision measurement of coordinates on a substrate is disclosed. The substrate is placed on a stage moveable in X/Y coordinate directions. First, a plurality of images of a structure on a substrate are imaged by means of a 2-dimensional detector during the relative movement of a measuring objective in Z coordinate direction and the simultaneous movement of the stage in X and Y coordinate directions.
摘要翻译： 公开了一种用于高精度测量衬底上坐标的方法。 将基板放置在可在X / Y坐标方向上移动的台上。 首先，在测量对象在Z坐标方向的相对移动期间以及在X和Y坐标方向上的台的同时运动，通过二维检测器对基板上的结构的多个图像进行成像。
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公开(公告)号：US07545489B2
公开(公告)日：2009-06-09
申请号：US11463471
申请日：2006-08-09
申请人： Wolfgang Sulik , Michael Heiden
发明人： Wolfgang Sulik , Michael Heiden
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： An apparatus for inspecting a surface of a wafer includes an illumination device for illuminating an imaging area of the wafer with at least one broad-band spectrum, and an optical imaging device with a detector for polychromatic imaging of the imaging area of the wafer based on the illumination, wherein the imaging device includes a filter arrangement for selecting a plurality of narrow-band spectra. In addition, a method for inspecting the surface of a wafer, includes the steps of leveling a plurality of narrow-band spectra to a common intensity range, illuminating an imaging area of the wafer with at least one broad-band spectrum, and imaging a plurality of narrow-band spectra from the imaging area based on the illumination.
摘要翻译： 一种用于检查晶片表面的装置包括用于利用至少一个宽带光谱照射晶片的成像区域的照明装置，以及具有用于晶片成像区域的多色成像检测器的光学成像装置，其基于 照明，其中所述成像装置包括用于选择多个窄带光谱的滤光器装置。 此外，用于检查晶片表面的方法包括以下步骤：将多个窄带光谱调平到公共强度范围，用至少一个宽带光谱照射晶片的成像区域，并对 基于照明的来自成像区域的多个窄带光谱。
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39.发明授权公开(公告)号：US07528960B2
公开(公告)日：2009-05-05
申请号：US11803553
申请日：2007-05-15
申请人： Artur Boesser , Andreas Schaaf
发明人： Artur Boesser , Andreas Schaaf
IPC分类号： G01B11/02
CPC分类号： G01B9/02084 , G01B9/02007 , G01B2290/25 , G01B2290/60 , G01B2290/70 , G03F7/70775
摘要： A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.
摘要翻译： 一种用于高精度测量衬底上至少一个结构的坐标的方法。 提供了在X / Y坐标方向上可移动的平台，其被放置在干涉光学测量系统中。 通过其光轴（20）在Z坐标方向上排列的测量物镜（21）将基板上的结构成像在至少一个检测器（34）上。 该结构用所谓的双扫描成像。 因此可以消除系统错误。
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公开(公告)号：US20090109443A1
公开(公告)日：2009-04-30
申请号：US12290051
申请日：2008-10-27
IPC分类号： G01B11/14
CPC分类号： G03F1/84 , G01B9/02052
摘要： A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.
摘要翻译： 公开了一种用于确定衬底上结构位置的系统。 该系统包括由壳体包围的多个站。 壳体内的至少一个站被设计为可移动的。 壳体设置有在壳体中产生空气流的过滤风扇单元。 空气引导元件设置在壳体中，使得可以实现不变的流动，而不管至少一个活动台。
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