Abstract:
Provided is a wire grid polarizer and a backlight unit using the wire grid polarizer. The wire grid polarizer comprises a first grid layer thrilled on a substrate and provided with at least one of a first grid pattern, and a second grid layer formed on the first grid pattern and provided with at least one of a second grid pattern made of metal material wherein the first grid layer is made of high molecular substance having a lower refraction index than that of the substrate.According to the present invention, by forming a first grid pattern on a substrate using a high molecular substance layer and by forming a metal grid pattern on the first grid pattern, transmission rates of respective wavelengths depending on light angles of incident light are controlled and thereby minimizing color variations depending on view angle.
Abstract:
An etchant for removing an indium oxide layer includes sulfuric acid as a main oxidizer, an auxiliary oxidizer such as H3PO4, HNO3, CH3COOH, HClO4, H2O2, and a Compound A that is obtained by mixing potassium peroxymonosulfate (2KHSO5), potassium bisulfate (KHSO4), and potassium sulfate (K2SO4) together in the ratio of 5:3:2, an etching inhibitor comprising an ammonium-based material, and water. The etchant may remove desired portions of the indium oxide layer without damage to a photoresist pattern or layers underlying the indium oxide layer.
Abstract translation:用于除去氧化铟层的蚀刻剂包括硫酸作为主要氧化剂,辅助氧化剂如H 3 PO 4,HNO 3, CH 3 COOH,HClO 4,H 2 O 2,以及通过将钾 过硫酸氢盐(2KHSO 5),硫酸氢钾(KHSO 4)和硫酸钾(K 2 SO 4) 一起以5:3:2的比例,包含铵基材料的蚀刻抑制剂和水。 蚀刻剂可以去除铟氧化物层的期望部分,而不损害光致抗蚀剂图案或氧化铟层下面的层。
Abstract:
The stackable semiconductor chip includes a semiconductor chip having pads on an upper surface thereof, and an adhesive formed on lateral surfaces of the semiconductor chip. A first insulation layer is formed over the upper surface of the semiconductor chip and the adhesive, and defines a plurality of through holes which expose the pads. Metal lines, formed on the first insulation layer, are connected to a respective one of the pads via a respective one of the through holes. A protective layer is formed on the metal lines and the first insulation layer. A plurality of stackable semiconductor chips are stacked by disposing double-sided adhesive between the stackable semiconductor chips. Then a plurality of external terminal pads are formed on one of the lateral surfaces of the stack of stackable semiconductor chips. Each external terminal pad is electrically connected to at least one of the metal lines in one of the stackable semiconductor chips. Next, a solder ball is formed on each of the plurality of external terminal pads to produce a stacked semiconductor chip package.
Abstract:
The present invention relates to an X-ray imaging apparatus, comprising: an X-ray imager including an X-ray beam generator for emitting an X-ray beam, an X-ray beam detector for detecting the X-ray beam to obtain an X-ray image of an object, and a main body unit in which the X-ray beam generator and the X-ray beam detector are installed; and a three-dimensional scanner arranged in the X-ray imager in order to obtain an image of the outer appearance of the object. According to the present invention, an X-ray image and an image of the outer appearance of an object, for example, an image of the skull and an image of the face, can be obtained at the same time, thereby minimizing image correction procedures for matching two images.
Abstract:
Embodiments of the invention provide a method of manufacturing a printed circuit board, including: mounting a strip substrate on a fixing member; separating the strip substrate into unit substrates by performing a singulation process; attaching solder balls onto the unit substrates using a jig; and fixing the solder balls on the unit substrates by performing a reflow process. The method of manufacturing a printed circuit board is advantageous in that the solder balls can be accurately formed at the predetermined positions of the strip substrate because they are attached to the unit substrates after the warpage of the strip substrate was reduced by a singulation process.
Abstract:
Provided is a nanowire manufacturing method, comprising forming a plurality of grid patterns on a substrate, forming a nanowire on the grid patterns, and separating the grid pattern and the nanowire. According to the present invention, the width and height of the nanowire can be adjusted by controlling the wet-etching process time period, and the nanowire can be manufactured at a room temperature at low cost, the nanowire can be mass-manufactured and the nanowire with regularity can be manufactured even in case of mass production.
Abstract:
The present invention relates to a method and system for providing a face adjustment image, the method comprising the steps of: (a) generating a matched image by superimposing a cephalometric image having a cranium image of a patient whose face is to be corrected with a three-dimensional facial image of the patient; and (b) displaying a predicted facial image on a screen by transforming soft skin tissues of the face according to the skeletal change in the cephalometric image. According to the present invention, the change in the soft skin tissues and the predicted facial image are displayed on a screen of a computer, a terminal or the like based on the skeletal change in cranium, teeth, prosthesis or the like supporting the soft skin tissues. Therefore, the change in the soft skin tissues can be predicted, thereby increasing the accuracy of a face correction operation, making it more accurate and convenient to plan the operation, and enhancing communication between the patient and medical staff.
Abstract:
An embedded PCB, a multi-layer PCB using the embedded PCB, and a method of manufacturing the same are provided. The method of manufacturing an embedded PCB includes a first step of patterning an insulating layer on which a photoresist layer is formed using a laser such that parts of the insulating layer are selectively etched to form a circuit pattern region and a second step of filling the circuit pattern region with a plating material to form a circuit pattern. Accordingly, the method of manufacturing an embedded PCB can simultaneously or sequentially etch a photoresist layer and an insulating layer using a laser to form a circuit pattern so as to obtain a micro pattern and simplify a manufacturing process and achieve alignment accuracy in construction of a multi-layer PCB using the embedded PCB to thereby improve product reliability and yield.
Abstract:
An etchant for removing an indium oxide layer includes sulfuric acid as a main oxidizer, an auxiliary oxidizer such as H3PO4, HNO3, CH3COOH, HClO4, H2O2, and a Compound A that is obtained by mixing potassium peroxymonosulfate (2KHSO5), potassium bisulfate (KHSO4), and potassium sulfate (K2SO4) together in the ratio of 5:3:2, an etching inhibitor comprising an ammonium-based material, and water. The etchant may remove desired portions of the indium oxide layer without damage to a photoresist pattern or layers underlying the indium oxide layer.
Abstract translation:用于除去氧化铟层的蚀刻剂包括硫酸作为主要氧化剂,辅助氧化剂如H 3 PO 4,HNO 3, CH 3 COOH,HClO 4,H 2 O 2,以及通过将钾 过硫酸氢盐(2KHSO 5),硫酸氢钾(KHSO 4)和硫酸钾(K 2 SO 4) 一起以5:3:2的比例,包含铵基材料的蚀刻抑制剂和水。 蚀刻剂可以去除铟氧化物层的期望部分,而不损害光致抗蚀剂图案或氧化铟层下面的层。