公开(公告)号：US20190189391A1

公开(公告)日：2019-06-20

申请号：US16279538

申请日：2019-02-19

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/024 ,  H01J2237/2445 ,  H01J2237/2807

Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

公开(公告)号：US09958501B1

公开(公告)日：2018-05-01

申请号：US15060245

申请日：2016-03-03

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Amir Wachs ,  Alon Litman ,  Efim Vinnitsky

IPC: H01J37/26 ,  G01R31/305 ,  G01R1/07 ,  G01R1/18

CPC classification number: G01R31/305 ,  G01R1/07 ,  G01R1/18

Abstract: A system for electrically testing an object, the system may include a scanning electron microscope that comprises a column; and nano-probe modules that are mechanically connected to the column; wherein the column is configured to illuminate areas of the object, with a beam of charged particles; wherein nano-probes of the nano-probe modules are configured to electrically contact elements of the object, during electrical tests of the object, wherein the elements of the object are located within the areas of the object.

公开(公告)号：US09818577B2

公开(公告)日：2017-11-14

申请号：US15005949

申请日：2016-01-25

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky

IPC: H01J37/244 ,  H01J37/285 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/024 ,  H01J2237/2445 ,  H01J2237/2807

Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

公开(公告)号：US09805911B2

公开(公告)日：2017-10-31

申请号：US15207024

申请日：2016-07-11

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Benzion Sender ,  Alon Litman

IPC: H01J37/26

Abstract: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprises: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.

公开(公告)号：US09666412B1

公开(公告)日：2017-05-30

申请号：US15005679

申请日：2016-01-25

Applicant: Applied Materials Israel, Ltd.

Inventor： Alon Litman ,  Yoram Uziel ,  Benzion Sender

IPC: H01J37/28 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/0048 ,  H01J2237/15 ,  H01J2237/20285

Abstract: A system that may include a first mechanical stage, a second mechanical stage, charged particle beam optics and a controller. The system may charge, with a charged particle beam, a slice of the object. During the charging of the slice the first mechanical stage may introduce a first movement along a first direction, between the object and charged particle beam optics. The charged particle beam optics may scan the slice with the charged particle beam. The scanning of the slice includes performing, by the charged particle optics, a first counter-movement deflection of the charged particle beam to at least partially counter the first movement. The second mechanical stage is configured to introduce a second movement along a second direction, between the object and the charged particle beam optics. Upon a completion of the charging of the slice, the second mechanical stage is configured to perform a first flyback operation.

公开(公告)号：US09448253B2

公开(公告)日：2016-09-20

申请号：US14719193

申请日：2015-05-21

Applicant: Applied Materials Israel, Ltd.

Inventor： Konstantin Chirko ,  Alon Litman

IPC: H01J37/00 ,  G01Q60/30 ,  G01Q30/02 ,  H01J37/28

CPC classification number: G01Q60/30 ,  G01Q30/02 ,  H01J37/28 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.

Abstract translation: 一种用于评估具有纳米尺度宽度并形成在衬底中的高纵横比（HAR）孔的系统，方法和非暂时计算可读介质，包括在照明周期期间通过静电测量装置获得多个测量结果， 包括放置在靠近HAR孔的探针尖端; 其中所述HAR孔内的多个位置在照明周期期间用带电粒子束照射; 并处理多个测量结果以确定HAR孔的状态。

公开(公告)号：US20150200071A1

公开(公告)日：2015-07-16

申请号：US14153923

申请日：2014-01-13

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Benzion Sender ,  Alon Litman

IPC: H01J37/30 ,  H01J37/304 ,  H01J37/20

CPC classification number: H01J37/265 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/28

Abstract: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system may include: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.

Abstract translation: 一种用于使用一个或多个带电粒子束扫描衬底的多个感兴趣区域的系统，所述系统可以包括：具有带电粒子光学器件的照射模块; 用于在衬底和带电粒子光学器件之间引入相对运动的阶段; 成像模块，用于响应于所述一个或多个带电粒子束对感兴趣区域的扫描，收集从衬底发射的电子; 并且其中带电粒子光学器件被布置成在感兴趣区域的扫描期间执行带电粒子束的反向运动，从而抵抗在感兴趣区域的扫描期间在衬底和带电粒子光学器件之间引入的相对运动。

公开(公告)号：US20150028203A1

公开(公告)日：2015-01-29

申请号：US13948975

申请日：2013-07-23

Applicant: Applied Materials Israel, Ltd.

Inventor： Alon Litman ,  Nir Ben-David Dodzin ,  Albert Karabekov ,  Alex Goldenshtein

IPC: G03F1/86 ,  H01J37/26

CPC classification number: G03F1/86 ,  G03F1/62 ,  G21K1/062 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/2002 ,  H01J2237/244 ,  H01J2237/2449 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask

Abstract translation: 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子表现出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器