Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes
for their preparation and use
    31.
    发明授权
    Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use 失效
    取代的1,2-萘醌-2-二氮杂-4-磺酸及其制备和使用的方法

    公开(公告)号:US5077395A

    公开(公告)日:1991-12-31

    申请号:US564612

    申请日:1990-08-09

    CPC分类号: C07C309/26 G03F7/022

    摘要: Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group andX is hydrogen, a metal or an ammonium group.A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.

    摘要翻译: 公开了具有通式A A的取代的1,2-萘醌-2-二叠氮-4-磺酸,其中R是烷基,环氧烷基,烷基羰基或烷基磺酰基,其碳链可被氧中断 原子或取代或未取代的芳烷基,芳基羰基或芳基磺酰基,X是氢,金属或铵基。 还公开了制备化合物的方法。 化合物可以原样使用,或优选在其磺酰氯与芳族羟基化合物或胺缩合后得到相应的酯或酰胺,作为辐射敏感混合物或材料中的光敏化合物。

    Process for the preparation of relief copies
    35.
    发明授权
    Process for the preparation of relief copies 失效
    编制救济文件的程序

    公开(公告)号:US4421844A

    公开(公告)日:1983-12-20

    申请号:US310276

    申请日:1981-10-09

    摘要: Disclosed is a process for the preparation of relief copies, comprising the steps of imagewise irradiating a radiation-sensitive copying material comprising a layer support and a radiation-sensitive layer comprising (a) a compound which upon irradiation splits off acid, and (b) a compound possessing at least one acid-cleavable C--O--C group; heating the imagewise irradiated copying material to a temperature above room temperature for a period of time sufficient to produce an increase in radiation sensitivity of the radiation-sensitive layer; and washing out the irradiated layer areas by means of a developer.

    摘要翻译: 公开了一种用于制备浮雕副本的方法,包括以下步骤:成像照射包含层载体和辐射敏感层的辐射敏感性复印材料,所述辐射敏感性复合材料包含(a)在照射时分解出酸的化合物,和(b) 具有至少一个可酸切割的COC基团的化合物; 将图像照射的复印材料加热到高于室温的温度足以产生辐射敏感层的辐射敏感性的增加的时间; 并通过显影剂清洗辐射的层区域。

    Acid degradable radiation-sensitive mixture
    36.
    发明授权
    Acid degradable radiation-sensitive mixture 失效
    酸降解辐射敏感性混合物

    公开(公告)号:US4248957A

    公开(公告)日:1981-02-03

    申请号:US54808

    申请日:1979-07-05

    摘要: This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one enol ether group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.

    摘要翻译: 本发明涉及辐射敏感性混合物的改进,其包含(a)在光化辐射影响下形成酸的化合物和(b)具有至少一个可酸切割的COC基团并且其溶解度在 通过酸的作用使液体显影剂增加,改善了能够被酸裂解的化合物含有至少一个烯醇醚基团作为酸可裂解基团。 本发明还涉及使用该辐射敏感性混合物产生浮雕图像的方法。

    Positive-working recording material containing aluminum base and
mat-finished quinone diazide layer developable in weak alkaline
developers
    38.
    发明授权
    Positive-working recording material containing aluminum base and mat-finished quinone diazide layer developable in weak alkaline developers 失效
    含有铝基和正电子醌二叠氮化物层的正性记录材料可在弱碱性显影剂中显影

    公开(公告)号:US5753405A

    公开(公告)日:1998-05-19

    申请号:US674971

    申请日:1996-07-03

    摘要: A positive-working recording material is disclosed that has an aluminum base and a mat-finished radiation-sensitive layer that contains a 1,2-naphthoquinone-2-diazide as radiation-sensitive compound and a binder which is insoluble in water but soluble or swellable in aqueous alkali. The radiation-sensitive 1,2-naphthoquinone-2-diazide is an ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a phenolic compound that contains at least 2, preferably at least 3, phenolic hydroxyl groups, which ester has a phenolic hydroxyl group content of at least 0.5 mmol/g and a diazo unit content of at least 1.5 mmol/g. The binder is a phenol/formaldehyde novolak that contains at least 5 mmol/g phenolic hydroxyl groups, the phenol component of which contains at least 30 mol percent m-cresol and at least 10 mol percent of at least one xylenol and which has a weight-average M.sub.w of 2,000 to 12,000 (determined by means of GPC with polystyrene as standard). The radiation-sensitive layer additionally contains at least one phenolic additive which has a molecular weight M.sub.w of not more than 600 and contains 2 to 4 uncondensed phenyl nuclei and at least 6 mmol/g phenolic hydroxyl groups.

    摘要翻译: 公开了一种正面工作的记录材料,其具有铝基材和成品辐射敏感层,其包含作为辐射敏感性化合物的1,2-萘醌-2-二叠氮化合物和不溶于水但可溶于水的粘合剂, 在碱性水溶液中溶胀。 辐射敏感的1,2-萘醌-2-二叠氮化物是1,2-萘醌-2-重氮基-4-或-5-磺酸的酯,和含有至少2个,优选至少3个, 酚羟基,该酯的酚羟基含量为至少0.5mmol / g,重氮单元含量至少为1.5mmol / g。 粘合剂是含有至少5mmol / g酚羟基的苯酚/甲醛酚醛清漆,其酚组分含有至少30摩尔%间甲酚和至少10摩尔%的至少一种二甲苯酚,其重量 - 平均Mw为2,000〜12,000(通过使用聚苯乙烯作为标准的GPC测定)。 辐射敏感层另外含有至少一种酚类添加剂,其分子量Mw不大于600,并含有2至4个未稠化的苯基核和至少6mmol / g酚羟基。

    Radiation-sensitive mixture
    39.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号:US5705317A

    公开(公告)日:1998-01-06

    申请号:US567775

    申请日:1995-12-05

    IPC分类号: G03F7/004 G03F7/039

    CPC分类号: G03F7/0045

    摘要: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

    摘要翻译: 一种辐射敏感性混合物,其包含(a)式(I)化合物其中R 1是任选取代的烷基,R 2是氢原子或含有1至4个碳原子的任选取代的烷基 ,R3是n价,任选聚合的脂族或芳族基,n是1至100的数; 和b)在暴露于光化辐射下形成强酸的化合物。

    Peel-apart process for the production of a colored image and imaged
product produced through the process
    40.
    发明授权
    Peel-apart process for the production of a colored image and imaged product produced through the process 失效
    用于生产通过该过程生产的彩色图像和成像产品的剥离过程

    公开(公告)号:US5534373A

    公开(公告)日:1996-07-09

    申请号:US424800

    申请日:1995-04-19

    CPC分类号: G03F3/10

    摘要: A photosensitive material comprising (A) a flexible transparent film support, (B) a colored photosensitive layer which contains an organic binder (B1) a dye or a colored pigment (B2), a compound (B3), which forms a strong acid on exposure to radiation, and a compound (B4) which has at least one group cleavable by the acid, and (C) an adhesion-promoting layer which contains a thermoplastic polymer which has a softening temperature in the range from 40.degree. to 200.degree. C., wherein the adhesion (a.sub.1) of the unexposed photosensitive layer (B) to the adhesion-promoting layer (C) is less than the adhesion (a.sub.3) of the unexposed photosensitive layer (B) to the film support (A) and than the cohesions of the layers (B) and (C), and the adhesion (a.sub.3 ') of the exposed photosensitive layer (B) to the film support (A) is less than the adhesion (a.sub.1 ') of the exposed photosensitive layer (B) to the adhesion-promoting layer (C) and than the cohesions of the adhesion-promoting layer (C) and of the exposed photosensitive layer (B) is useful for the production of a colored image, in particular, is useful in a color proofing method for multicolor printing, which process gives images having high resolution.

    摘要翻译: 一种感光材料,其包含(A)柔性透明膜载体,(B)含有有机粘合剂(B1)染料或着色颜料(B2)的着色感光层,在其上形成强酸的化合物(B3) 以及具有至少一个可被酸裂解的基团的化合物(B4),和(C)含有软化温度在40〜200℃的热塑性聚合物的粘合促进层 其中未曝光的感光层(B)对粘合促进层(C)的粘合力(a1)小于未曝光的感光层(B)对膜载体(A)的粘附(a3),而不是 层(B)和(C)的粘合力和曝光的感光层(B)对膜支撑体(A)的粘合力(a3')小于曝光的感光层( B)与粘附促进层(C)的粘合力和粘附促进层(C)和暴露的ph 感光层(B)对于彩色图像的制备是有用的,特别是在多色打印的彩色打样方法中是有用的,该方法给出了具有高分辨率的图像。