公开(公告)号：US07508487B2

公开(公告)日：2009-03-24

申请号：US10719065

申请日：2003-11-24

申请人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

发明人： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US20090072168A1

公开(公告)日：2009-03-19

申请号：US12289884

申请日：2008-11-06

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch IVANOV ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch IVANOV ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G01J3/10

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

摘要翻译： 清洁装置被配置为清洁EUV光刻设备的EUV光学元件。 部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。 它也可以配置在设备内的特定位置，以便在生产过程中清洁附近的光学元件。 在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。

公开(公告)号：US07501642B2

公开(公告)日：2009-03-10

申请号：US11319770

申请日：2005-12-29

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Alexander Matthijs Struycken

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Alexander Matthijs Struycken

IPC分类号： G21K5/10

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005

摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。

公开(公告)号：US07491951B2

公开(公告)日：2009-02-17

申请号：US11319193

申请日：2005-12-28

申请人： Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

发明人： Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70916 ,  G03F7/7095

摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.

摘要翻译： 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

公开(公告)号：US07414700B2

公开(公告)日：2008-08-19

申请号：US11239479

申请日：2005-09-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

公开(公告)号：US20080151361A1

公开(公告)日：2008-06-26

申请号：US12073128

申请日：2008-02-29

申请人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Nikolaevitch Salashchenko

发明人： Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Shmaenok ,  Nikolay Nikolaevitch Salashchenko

IPC分类号： G02B5/20

CPC分类号： G03F7/70916 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G03F7/70941

摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

公开(公告)号：US07361911B2

公开(公告)日：2008-04-22

申请号：US11007579

申请日：2004-12-09

申请人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

发明人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

IPC分类号： B21D53/84

CPC分类号： G03F7/70916 ,  G03F7/70883 ,  G03F7/70908

摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。

公开(公告)号：US07355672B2

公开(公告)日：2008-04-08

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  C23G1/00 ,  G03C5/00

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US06781673B2

公开(公告)日：2004-08-24

申请号：US09934698

申请日：2001-08-23

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B2762

CPC分类号： G03F7/70558 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

摘要翻译： 在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。 这些场可以是均匀的电场，不均匀的电场或光学微风。 颗粒屏蔽固定在面罩支架而不是面罩上。

公开(公告)号：US06597431B2

公开(公告)日：2003-07-22

申请号：US09899560

申请日：2001-07-06

申请人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

发明人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

IPC分类号： G03B2772

CPC分类号： G03F7/70483 ,  G03F7/70058 ,  G03F7/70216 ,  G03F7/708

摘要： A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.

摘要翻译： 光刻投影装置包括用于提供具有传播方向的投影射束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台 以及用于将图案化的光束投影到基板的目标部分上的投影系统，其中所述光刻投影装置还包括用于测量垂直于其传播方向的投影光束的移动的传感器，以及用于控制投影的接收剂量的控制器 响应于来自传感器的输出，在基板的目标部分上射束。