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公开(公告)号：US4488886A
公开(公告)日：1984-12-18
申请号：US509624
申请日：1982-06-30
申请人： Anthony Zampini
发明人： Anthony Zampini
CPC分类号： D01D5/24 , B01D69/08 , B01D71/52 , Y10T428/2975
摘要： Asymmetric polymeric gas separation membranes comprise amorphous aryl substituted arylene oxide polymer. Such amorphous polymer is capable of forming hollow fiber membranes by wet spinning procedures utilizing coagulation baths and bore injection fluids comprising water. Desirable aryl substituents include halogens, nitro, lower alkyls and lower acyls.
摘要翻译： 非对称聚合物气体分离膜包括无定形芳基取代的亚芳基氧化物聚合物。 这种无定形聚合物能够通过使用凝结浴和包含水的孔注射液的湿法纺丝方法形成中空纤维膜。 理想的芳基取代基包括卤素，硝基，低级烷基和低级酰基。
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公开(公告)号：US4468502A
公开(公告)日：1984-08-28
申请号：US509629
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
CPC分类号： C08G65/485 , B01D69/08 , B01D71/52
摘要： Cross-linked polyphenylene oxides comprise the reaction product of alkyl halogenated phenylene oxide polymer and primary monoamines, such as methylamine, ethylamine, propylamine, butylamine and aniline. Such cross-linked polyphenylene oxide compositions are useful as membranes.
摘要翻译： 交联聚苯醚包括烷基卤代苯醚聚合物与一元一胺如甲胺，乙胺，丙胺，丁胺和苯胺的反应产物。 这种交联聚苯醚组合物可用作膜。
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公开(公告)号：US4323453A
公开(公告)日：1982-04-06
申请号：US209806
申请日：1980-11-25
申请人： Anthony Zampini
发明人： Anthony Zampini
CPC分类号： B01D63/023 , C08G59/5073
摘要： Tube sheets having a plurality of hollow fiber membranes suitable for fluid separations which are adapted to be provided in a fluid tight relationship within a permeator comprise a cured epoxy resin comprising polyglycidyl resin and imidazole curing agent. Methods are provided for making tube sheets.
摘要翻译： 适合于在渗透器内以流体密封关系提供的适于流体分离的多个中空纤维膜的管片包括含有聚缩水甘油树脂和咪唑固化剂的固化环氧树脂。 提供制造管板的方法。
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公开(公告)号：US20100297539A1
公开(公告)日：2010-11-25
申请号：US12582673
申请日：2009-10-20
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
摘要翻译： 本发明包括可用作外涂光致抗蚀剂的抗反射层的新的含有机组合物。 通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。 本发明的优选组合物具有高Si含量并且包含不同树脂的共混物。
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公开(公告)号：US20070264580A1
公开(公告)日：2007-11-15
申请号：US11712160
申请日：2007-02-28
申请人： Anthony Zampini , Gerald Wayton
发明人： Anthony Zampini , Gerald Wayton
IPC分类号： G03F5/00
CPC分类号： G03F7/091 , C08L33/066 , C08L35/00 , C08L67/00 , C08L2312/00 , C09D133/064 , C09D133/066 , C09D133/12 , C09D135/00 , C09D145/00 , C09D167/02 , G03F7/094 , G03F7/2004 , G03F7/2041 , H01L21/0276 , C08L2666/18 , C08L2666/04
摘要： Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
摘要翻译： 提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。 本发明的优选的有机涂料组合物包含一种或多种可以在不产生裂解产物的情况下硬化的树脂。 本发明特别优选的有机涂料组合物包含一种或多种包含酸酐和羟基部分的组分。
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公开(公告)号：US06858379B2
公开(公告)日：2005-02-22
申请号：US10101768
申请日：2002-03-20
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.
摘要翻译： 提供了适用于短波长成像的新型光致抗蚀剂，包括亚200nm，例如157nm。 一方面，本发明的抗蚀剂包含含氟聚合物，光活性组分和胺或其它碱性组合物的一种或多种另外的组分，溶解抑制剂化合物，表面活性剂或流平剂或增塑剂材料。 在另一方面，本发明的抗蚀剂含有含氟树脂和一种或多种光酸产生剂化合物，特别是非芳族鎓盐和亚氨磺酸盐，以及其它非离子光酸产生剂化合物。
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公开(公告)号：US06645695B2
公开(公告)日：2003-11-11
申请号：US09948528
申请日：2001-09-07
申请人： Anthony Zampini
发明人： Anthony Zampini
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0392 , Y10T428/2989
摘要： Disclosed are new photoresist compositions including polymeric particles as binders and a photoactive component. Also disclosed are methods of forming relief images using these photoresist compositions.
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公开(公告)号：US06596405B2
公开(公告)日：2003-07-22
申请号：US10192893
申请日：2002-07-11
IPC分类号： C08J902
CPC分类号： H01L21/31695 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/70 , C08L83/04 , C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H05K1/0313 , H05K3/0011 , Y10T428/249958 , Y10T428/31663 , C08L2666/04 , C08L2666/28
摘要： Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices containing such porous organo polysilica dielectric materials without the use of antiretlective coatings.
摘要翻译： 公开了具有用于电子部件制造的低介电常数的有机聚硅氧烷介电材料以及制备多孔有机聚硅氧烷介电材料的方法。 还公开了形成含有这种多孔有机聚硅氧烷介电材料的电子器件的方法，而不使用抗反射涂层。
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公开(公告)号：US5789522A
公开(公告)日：1998-08-04
申请号：US709340
申请日：1996-09-06
申请人： Anthony Zampini , Suzanne M. Coley
发明人： Anthony Zampini , Suzanne M. Coley
CPC分类号： G03F7/0236 , C08G8/04 , C08G8/08
摘要： The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.
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公开(公告)号：US5723254A
公开(公告)日：1998-03-03
申请号：US706096
申请日：1996-09-04
申请人： Anthony Zampini , Peter Trefonas, III , Pamela Turci , Catherine C. Meister , Gerald C. Vizvary
发明人： Anthony Zampini , Peter Trefonas, III , Pamela Turci , Catherine C. Meister , Gerald C. Vizvary
IPC分类号： C08G8/28 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/023 , C08G8/28 , G03F7/022 , G03F7/0236
摘要： The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.
摘要翻译： 本发明涉及含有光活性化合物混合物的正性光致抗蚀剂组合物。 该混合物的一个组分是邻醌二叠氮化物磺酰化合物与酚醛树脂的酯化产物。 该混合物的另一成分是邻醌二叠氮化物磺酰化合物与具有1至3个芳基和1至3个羟基的低分子量苯酚的酯化产物。 可能存在于制剂中的第三种光活性组分是邻醌二叠氮化物磺酰化合物与相对高分子量的多羟基多酚苯酚的酯化产物。
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