Electrostatically driven lithography
    35.
    发明授权
    Electrostatically driven lithography 失效
    静电驱动光刻

    公开(公告)号:US07102656B2

    公开(公告)日:2006-09-05

    申请号:US10442188

    申请日:2003-05-21

    IPC分类号: G01D15/16

    摘要: A method of nanolithography includes transporting a patterning compound from a nanoscopic tip to a substrate to form a pattern on the substrate. The patterning compound has a first electrostatic charge and the substrate has a second electrostatic charge which is opposite to the first electrostatic charge. The patterning compound can be an electrically conductive polymer having a charged polymer backbone. The patterns can be dots and lines having lateral dimensions of less than one micron. No electrical bias from an external voltage source between the tip and the substrate is needed.

    摘要翻译: 纳米光刻的方法包括将图案化化合物从纳米尖端转移到基底以在基底上形成图案。 图案化化合物具有第一静电电荷,并且衬底具有与第一静电电荷相反的第二静电电荷。 图案化化合物可以是具有带电聚合物主链的导电聚合物。 图案可以是具有小于1微米的横向尺寸的点和线。 不需要在尖端和衬底之间的外部电压源的电偏压。