摘要:
Process for preparing polycondensates of citric acid and/or isocitric acid, by converting(a) citric acid, isocitric acid or mixtures thereof in an organic solvent in the presence of a water-withdrawing agent at least partially into the anhydride form and then condensing the reaction mixture, if desired after addition of two cocondensable compounds selected from the group consisting of(b) other hydroxycarboxylic acids and/or(c) amino acids, alcohols, amines and/or at least dibasic carboxylic acids other than carboxylic acids (a) and (b), at temperatures of at least 80.degree. C. to form polycarboxylates which have an average molecular weight of at least 500, polycondensates of citric acid and/or isocitric acid obtainable thereby, anduse of said polycondensates as ingredients in phosphate-free and reduced-phosphate detergents and cleaners, and also detergents and cleaners which contain at least one surfactant and optionally builders and other customary constituents with from 0.1 to 30% by weight of an abovementioned polyestercarboxylate.
摘要:
Bismaleimide resin systems containing one or more bismaleimides and an alkenyl and/or alkynyl substituted phenylated dicyclopentadiene comonomer have high glass transition temperatures and impact resistance.
摘要:
Mixtures which are curable by heating or irradiation with actinic light contain one or more cationically curable compounds, such as an epoxy, an olefinically unsaturated monomer, amino resin or phenolic resin, and as a cationically active curing catalyst one or more N-sulfonylamino-sulfonium salts of the formula ##STR1## such as N-p-toluenesulfonyl-N-methylaminodiphenylsulfonium hexafluorophosphate with or without quinones or peroxides are suitable, inter alia, for producing moldings, coatings, relief images and resist patterns.
摘要:
In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.
摘要:
Photocured layers possessing a defined controllable hardness are produced by exposing a layer of a photopolymerizable or photocrosslinkable mixture, which contains a partially crystalline polymeric binder possessing olefinic double bonds capable of undergoing polymerization, to actinic light, by a method in which the photocurable layer, prior to exposure to actinic light, is subjected to a heat treatment in which the partially crystalline parts of the polymeric binder are partially or completely fused.
摘要:
Acylphosphine sulfides of the formula ##STR1## where R.sup.1 is alkyl, cycloalkyl or an unsubstituted or substituted phenyl, naphthyl or heterocyclic radical; R.sup.2 has the meaning of R.sup.1 and can be identical to or different from R.sup.1, or is alkoxy, unsubstituted or substituted phenoxy or phenoxyalkyl, or R.sup.1 or R.sup.2 are linked together to form a ring, which may contain further alkyl substituents and fused-on benzene rings; R.sup.3 is alkyl, a cycloaliphatic radical, substituted phenyl, an unsubstituted or substituted naphthyl or heterocyclic radical or the group ##STR2## where X is unsubstituted or substituted phenylene or an aliphatic or cycloaliphatic divalent radical; and where one or more of R.sup.1, R.sup.2 and R.sup.3 may be olefinically unsaturated.These acylphosphine sulfides can be prepared from acylphosphines and sulfur and can be used as photoinitiators in photopolymerizable compositions.
摘要:
The present invention relates to a composition for coating metallic surfaces, comprising a binder component; a corrosion inhibitor polymer based on an ethylenically monocarboxylic and dicarboxylic acid and, if appropriate, further ethylenical monomers, a solvent component, and, if appropriate, crosslinkable components, and also pigment/filler components. The invention further relates to processes for its preparation and also to methods of coating a metallic surface using the composition, to coated metallic surfaces thus obtained, and to the use of the composition as a primer, particularly in coil coating or in atmospheric corrosion control. After drying, the applied layer preferably has a thickness of at least 3.1 μm and is therefore thicker than a typical pretreatment layer.
摘要:
Process for the passivation of metallic surfaces by treatment of the surface with an acidic, aqueous preparation which comprises at least one water-soluble acid group-containing polymer and Zn, Ca, Mg or Al ions, said process being in particular a continuous process for the passivation of strip metals.
摘要:
A method for controlling the thickening of aqueous systems comprising silicates, which comprises adding to the aqueous system at least one copolymer of a mean molecular weight Mw of greater than 60 000 g/mol and the copolymer being made up essentially randomly from monoethylenically unsaturated monocarboxylic acids, monoethylenically unsaturated dicarboxylic acids and optionally other ethylenically unsaturated comonomers, the quantitative figures being respectively based on the total amount of all monomers used.
摘要:
A process for passivating a metallic surface by treating it with an acidic aqueous preparation comprising at least one itaconic acid homo- or copolymer. Passivating layers and metallic surfaces obtainable by means of the process.