公开(公告)号：US11638980B2

公开(公告)日：2023-05-02

申请号：US16825799

申请日：2020-03-20

Applicant: EBARA CORPORATION

Inventor： Kenichi Kobayashi ,  Asagi Matsugu ,  Makoto Kashiwagi ,  Manao Hoshina

IPC: B24B37/32 ,  B24B37/005

Abstract: An elastic member that includes a plurality of pressure chambers is manufactured without using a mold having a complicated shape. According to one embodiment, a laminated membrane used in a substrate holder of a substrate processing apparatus is provided. Such a laminated membrane includes a first sheet material and a second sheet material disposed on the first sheet material. A part of the first sheet material is secured to a part of the second sheet material.

公开(公告)号：US11426834B2

公开(公告)日：2022-08-30

申请号：US16657901

申请日：2019-10-18

Applicant: EBARA CORPORATION

Inventor： Mitsuru Miyazaki ,  Seiji Katsuoka ,  Naoki Matsuda ,  Junji Kunisawa ,  Kenichi Kobayashi ,  Hiroshi Sotozaki ,  Hiroyuki Shinozaki ,  Osamu Nabeya ,  Shinya Morisawa ,  Takahiro Ogawa ,  Natsuki Makino

IPC: H01L21/67 ,  B24B37/34 ,  H01L21/677 ,  H01L21/306

Abstract: An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

公开(公告)号：US20220005716A1

公开(公告)日：2022-01-06

申请号：US17258916

申请日：2019-07-09

Applicant: EBARA CORPORATION

Inventor： Akihiro Yazawa ,  Takashi Koba ,  Kenichi Kobayashi ,  Kenichi Akazawa ,  Fong-Jie Du ,  Makoto Kashiwagi ,  Asagi Matsugu ,  Takahiro Nanjo ,  Hideharu Aoyama ,  Takashi Mitsuya ,  Tetsuji Togawa

IPC: H01L21/677 ,  B24B37/14 ,  B24B37/26 ,  H01L21/304 ,  B24B37/30 ,  B65G13/02

Abstract: To provide an automated apparatus for conveying a rectangular substrate. According to one embodiment, there is provided a substrate conveying apparatus for conveying the rectangular substrate. The substrate conveying apparatus includes a plurality of conveyance rollers, a plurality of roller shafts, a motor, and a pusher. The plurality of conveyance rollers are configured to support a lower surface of the substrate. To the plurality of roller shafts, the plurality of conveyance rollers are mounted. The motor is configured to rotate the plurality of roller shafts. The pusher is for lifting the substrate on the plurality of conveyance rollers such that the substrate is separated away from the plurality of conveyance rollers. The pusher includes a stage configured to pass through a clearance between the plurality of roller shafts.

公开(公告)号：USD890824S1

公开(公告)日：2020-07-21

申请号：US29676941

申请日：2019-01-16

Applicant: EBARA CORPORATION

Designer： Kenichi Kobayashi ,  Asagi Matsugu ,  Makoto Kashiwagi ,  Manao Hoshina

公开(公告)号：USD890822S1

公开(公告)日：2020-07-21

申请号：US29676931

申请日：2019-01-16

Applicant: EBARA CORPORATION

Designer： Kenichi Kobayashi ,  Asagi Matsugu ,  Makoto Kashiwagi ,  Manao Hoshina

公开(公告)号：US10593570B2

公开(公告)日：2020-03-17

申请号：US15421905

申请日：2017-02-01

Applicant: Ebara Corporation

Inventor： Akihiro Yazawa ,  Kenichi Kobayashi ,  Kenichi Akazawa

IPC: H01L21/67 ,  H01L21/687 ,  B08B1/00 ,  B08B11/02

Abstract: According to the present disclosure, there is provided a substrate holding module that is capable of accommodating a substrate transferred by a transfer robot. The substrate holding module includes a pedestal including a holding mechanism configured to hold the substrate, a cover configured to cover the pedestal, and a moving mechanism configured to move the cover away from the pedestal.

公开(公告)号：US10160013B2

公开(公告)日：2018-12-25

申请号：US14834019

申请日：2015-08-24

Applicant: EBARA CORPORATION

Inventor： Masahiko Sekimoto ,  Toshio Yokoyama ,  Kenichi Kobayashi ,  Kenichi Akazawa

IPC: B08B3/04 ,  H01L21/67

Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.

公开(公告)号：US09786532B2

公开(公告)日：2017-10-10

申请号：US14666196

申请日：2015-03-23

Applicant: EBARA CORPORATION

Inventor： Toshio Yokoyama ,  Masahiko Sekimoto ,  Kenichi Kobayashi ,  Kenichi Akazawa ,  Takashi Mitsuya ,  Keiichi Kurashina

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67718 ,  H01L21/67086 ,  H01L21/67751 ,  H01L21/68707

Abstract: A substrate processing apparatus is described herein. The substrate processing apparatus comprises a transferring device including: a grasping section configured to grasp a substrate holder, a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

公开(公告)号：US20170236727A1

公开(公告)日：2017-08-17

申请号：US15421905

申请日：2017-02-01

Applicant: Ebara Corporation

Inventor： Akihiro Yazawa ,  Kenichi Kobayashi ,  Kenichi Akazawa

IPC: H01L21/67 ,  B08B1/04 ,  B08B5/02 ,  B08B1/00 ,  H01L21/687 ,  B08B3/02

Abstract: According to the present disclosure, there is provided a substrate holding module that is capable of accommodating a substrate transferred by a transfer robot. The substrate holding module includes a pedestal including a holding mechanism configured to hold the substrate, a cover configured to cover the pedestal, and a moving mechanism configured to move the cover away from the pedestal.

公开(公告)号：US20170072531A1

公开(公告)日：2017-03-16

申请号：US15248028

申请日：2016-08-26

Applicant: Ebara Corporation

Inventor： Kenichi Akazawa ,  Kenichi Kobayashi ,  Akihiro Yazawa ,  Manao Hoshina

IPC: B24B41/00 ,  B24B9/00 ,  B08B3/02

Abstract: Disclosed is a reversing machine that reverses a substrate upside down. The reversing machine includes: a first arm pair configured to mount a substrate thereon; a second arm pair facing the first arm pair; an opening/closing mechanism configured to open/close the second arm pair so as to grip the substrate mounted on the first arm pair; and a rotating mechanism configured to rotate the first arm pair and the second arm pair around a predetermined axis that is set inside the first arm pair and the second arm pair and extends along an extension direction of the first arm pair and the second arm pair such that the substrate is reversed upside down.

Abstract translation: 公开了一种反转机，其将衬底颠倒倒置。 倒车机包括：第一臂对，被配置为在其上安装基底; 面对所述第一臂对的第二臂对; 打开/关闭机构，其构造成打开/关闭所述第二臂对，以便夹持安装在所述第一臂对上的所述基板; 以及旋转机构，其构造成使所述第一臂对和所述第二臂对围绕设置在所述第一臂对和所述第二臂对内的预定轴线旋转，并且沿着所述第一臂对和所述第二臂对的延伸方向延伸， 衬底反向颠倒。