公开(公告)号：US20130312580A1

公开(公告)日：2013-11-28

申请号：US13930279

申请日：2013-06-28

申请人： Masayuki SHIMIZU ,  Shigeru ENDO ,  Takashi MATSUMOTO ,  Hiroshi NAKAI ,  Hiroyuki KOBAYASHI

发明人： Kinshiro NAITO ,  Masayuki SHIMIZU ,  Shigeru ENDO ,  Takashi MATSUMOTO ,  Hiroshi NAKAI ,  Hiroyuki KOBAYASHI

IPC分类号： B26D7/18

CPC分类号： B26D7/1854 ,  B21D28/34 ,  B21D45/003 ,  B26F1/40 ,  B26F1/44 ,  Y10T83/0443 ,  Y10T83/0453 ,  Y10T83/2066 ,  Y10T83/2068 ,  Y10T83/9416 ,  Y10T83/9425 ,  Y10T83/9437

摘要： A die body includes a die hole for punching a work. A core, including a discharge hole, which is in communication with the die hole, is provided in the die body. The core is provided with a plurality of fluid injection ports through which fluid is injected downward of the discharge hole. The die body is provided with inflow ports through which compressed fluid flows into the fluid injection ports. The core is made of resin. The discharge hole is tapered toward its upper side. An outer peripheral surface of the die body is provided with a peripheral groove which is in communication with the inflow ports.

公开(公告)号：US20130278195A1

公开(公告)日：2013-10-24

申请号：US13600665

申请日：2012-08-31

申请人： Hiroyuki KOBAYASHI ,  Yasufumi OGAWA ,  Keiichi ENOKI

发明人： Hiroyuki KOBAYASHI ,  Yasufumi OGAWA ,  Keiichi ENOKI

IPC分类号： H02P6/16

CPC分类号： B60L7/16 ,  B60L2220/46 ,  H02P6/085 ,  H02P6/16 ,  Y02T10/642

摘要： A phase difference between an inductive voltage of an armature winding of a rotating electrical machine and an output of a magnetic pole position sensor is detected by a phase difference detection unit. The output of the magnetic pole position sensor is corrected on the basis of the phase difference thus detected and a power conversion unit is controlled on the basis of the corrected output.

摘要翻译： 由相位差检测单元检测旋转电机的电枢绕组的感应电压与磁极位置传感器的输出之间的相位差。 基于这样检测的相位差校正磁极位置传感器的输出，并且基于经校正的输出来控制功率转换单元。

公开(公告)号：US20130025701A1

公开(公告)日：2013-01-31

申请号：US13556688

申请日：2012-07-24

申请人： Shigeki SUZUKI ,  Hiroshige OWAKI ,  Hiroyuki KOBAYASHI ,  Hiroyuki ISHII

发明人： Shigeki SUZUKI ,  Hiroshige OWAKI ,  Hiroyuki KOBAYASHI ,  Hiroyuki ISHII

IPC分类号： F17D1/00 ,  B21D51/16

CPC分类号： B21D51/16 ,  B41J2/14 ,  Y10T29/494 ,  Y10T137/4673

摘要： A method of manufacturing a flow path member includes inserting the first flow path member into each concave portion of the second flow path member and welding the first flow path member and the second flow path member in a circumferential direction of a region where the first flow path and the second flow path communicates each other; and providing two or more injecting portions which are provided with a gap wider than a gap between a wall surface of the concave portion which faces the first flow path member and a circumference surface of the first flow path member inserted into each concave portion which faces the wall surface, communicate with each concave portion, and are opened to the same side as the concave portion to have a concave shape to each concave portion in the second flow path member.

摘要翻译： 一种流路构件的制造方法，其特征在于，将所述第一流路构件插入到所述第二流路构件的各凹部中，并且将所述第一流路构件和所述第二流路构件沿所述第一流路 并且所述第二流路彼此连通; 并且设置两个以上的注入部，该两个以上的注入部设置有比所述凹部的面向所述第一流路部件的壁面与所述第一流路部件的插入到各个所述凹部的面的 壁面与每个凹部连通，并且与第二流路部件中的每个凹部相对于凹部开放，形成为凹形。

公开(公告)号：US20120291706A1

公开(公告)日：2012-11-22

申请号：US13464427

申请日：2012-05-04

申请人： Hiroyuki KOBAYASHI ,  Hiroaki KAKIUCHI ,  Kiyoshi YASUTAKE

发明人： Hiroyuki KOBAYASHI ,  Hiroaki KAKIUCHI ,  Kiyoshi YASUTAKE

IPC分类号： C23C16/50

CPC分类号： H05H1/2406 ,  H05H2001/2418 ,  H05H2240/10

摘要： In a plasma source of a plasma processing apparatus, the plasma source being of the dielectric barrier discharge mode of an surface discharge type, incorporating electrodes in pairs (an antenna, and a ground) areally formed inside a dielectric, a subject under-processing is kept substantially in contact with the plasma source, thereby causing a plasma to be generated on a plane on a side of the subject under-processing, opposite from a plane on which the plasma source is provided.

摘要翻译： 在等离子体处理装置的等离子体源中，等离子体源是表面放电型的电介质阻挡放电模式，在电介质内形成一对成对的电极（天线和接地），受试者的处理是 与等离子体源基本上保持接触，从而在与处于等离子体源的平面相反的被处理器的一侧上的平面上产生等离子体。

公开(公告)号：US20120132368A1

公开(公告)日：2012-05-31

申请号：US13292137

申请日：2011-11-09

申请人： Hiroyuki KOBAYASHI ,  Takumi TANDOU ,  Shoichi NAKASHIMA ,  Naoshi ITABASHI

发明人： Hiroyuki KOBAYASHI ,  Takumi TANDOU ,  Shoichi NAKASHIMA ,  Naoshi ITABASHI

IPC分类号： H01L21/3065 ,  B01J19/08 ,  C23C16/50

CPC分类号： C23C16/517 ,  H01J37/32073 ,  H01J37/32082

摘要： To improve durability of an electric discharge part of a dielectric barrier discharge system, a plasma treatment apparatus is configured so that a plasma source of a corona discharge system is installed in the vicinity of a plasma source of the dielectric barrier discharge system, a plasma generated by corona discharge is used as an auxiliary plasma, and a discharge sustaining voltage of a main plasma generated by the dielectric barrier discharge is reduced.

摘要翻译： 为了提高电介质阻挡放电系统的放电部分的耐久性，等离子体处理装置被配置为使电晕放电系统的等离子体源安装在电介质阻挡放电系统的等离子体源附近，产生等离子体 通过电晕放电用作辅助等离子体，并且通过电介质阻挡放电产生的主等离子体的放电维持电压降低。

公开(公告)号：US20120113189A1

公开(公告)日：2012-05-10

申请号：US13280933

申请日：2011-10-25

申请人： Hiroyuki KOBAYASHI ,  Shigeki SUZUKI ,  Hiroshige OWAKI

发明人： Hiroyuki KOBAYASHI ,  Shigeki SUZUKI ,  Hiroshige OWAKI

IPC分类号： B41J2/14 ,  B23P11/00 ,  B41J2/145

CPC分类号： B41J2/155 ,  B41J2/14233 ,  B41J2002/14241 ,  B41J2002/14362 ,  B41J2002/14491 ,  B41J2202/20 ,  Y10T29/49401

摘要： A liquid ejecting head includes: a head main body including a nozzle opening that ejects a liquid; and a fixed plate fixed to a liquid ejecting surface of the head main body, and including an exposure opening, the nozzle opening of the head main body being formed in the liquid ejecting surface of the head main body, the nozzle opening of the liquid ejecting surface being exposed to the exposure opening. A positioning hole open to the liquid ejecting surface and positioned with respect to the nozzle opening is provided in the head main body. The fixed plate is fixed to the liquid ejecting surface so as to close the positioning hole. The fixed plate includes an extension portion protruding from the liquid ejecting surface. At least two head positioning holes are provided in the extension portion.16443.1196

摘要翻译： 液体喷射头包括：头主体，其包括喷射液体的喷嘴开口; 以及固定在头主体的喷液面上的固定板，具有曝光口，头主体的喷嘴开口形成在头主体的喷液面上，喷嘴的喷嘴开口 表面暴露于曝光开口。 在头主体中设置有相对于喷嘴开口定位在液体喷射面上的定位孔。 固定板固定在液体喷射表面上，以便关闭定位孔。 固定板包括从液体喷射表面突出的延伸部分。 在延伸部分中设置至少两个头部定位孔。 16443.1196

公开(公告)号：US20110316943A1

公开(公告)日：2011-12-29

申请号：US13081016

申请日：2011-04-06

申请人： Hiroshige OWAKI ,  Shigeki SUZUKI ,  Hiroyuki KOBAYASHI

发明人： Hiroshige OWAKI ,  Shigeki SUZUKI ,  Hiroyuki KOBAYASHI

IPC分类号： B41J2/175

CPC分类号： B41J2/14233 ,  B41J2002/14362 ,  B41J2002/14419 ,  B41J2002/14491

摘要： The flow path unit includes a flow path unit main body to which the liquid supply needle is attached on the upstream side and including a flow path portion with the liquid flow path formed therein, the flow path portion projecting from a lower face of the flow path unit main body, and a cover member fixed to the flow path unit main body and including a wall portion formed so as to surround the flow path portion, the wall portion having a height that reaches the case member.

摘要翻译： 流路单元包括流路单元主体，液体供给针安装在上游侧并且具有形成有液流通道的流路部，流路部从流路的下表面突出 单元主体和固定在流路单元主体上的盖构件，具有形成为围绕流路部的壁部，壁部具有到达壳体的高度。

公开(公告)号：US20100214379A1

公开(公告)日：2010-08-26

申请号：US12712010

申请日：2010-02-24

申请人： Hiroshige OWAKI ,  Hiroyuki KOBAYASHI ,  Kazuhide NAKAMURA

发明人： Hiroshige OWAKI ,  Hiroyuki KOBAYASHI ,  Kazuhide NAKAMURA

IPC分类号： B41J2/175 ,  B29C70/00

CPC分类号： B41J2/16 ,  B41J2/1637

摘要： A manufacturing method produces a liquid ejecting head including first and second flow path members having liquid flow paths that communicate with each other. An integrally-molded member is surrounds the second flow path member on the second flow path member side of the first flow path member to join the first and second flow path members together. A holding process defines a space portion for forming the integrally-molded member in a frame section. The frame section is brought into contact with a contact surface of a recessed portion in the face of the second flow path member opposite the first flow path member, with the first and second flow path members contacting each other such that the liquid flow paths communicate with each other. A molding process fills the space portion with resin, thereby molding the integrally-molded member, and joins the first and second flow path members together.

摘要翻译： 制造方法产生包括具有彼此连通的液体流路的第一和第二流路部件的液体喷射头。 一体模制构件围绕第一流路构件的第二流动通道构件侧上的第二流动通道构件，以将第一和第二流路构件连接在一起。 保持工艺限定了用于在框架部分中形成整体模制构件的空间部分。 框架部分与第二流路部件的与第一流路部件相对的面的凹部的接触表面接触，第一和第二流路部件彼此接触，使得液体流动路径与 彼此。 模制工艺用树脂填充空间部分，从而模制整体模制的构件，并将第一和第二流路构件连接在一起。

公开(公告)号：US20100163181A1

公开(公告)日：2010-07-01

申请号：US12369767

申请日：2009-02-12

申请人： Hiroyuki KOBAYASHI ,  Kenji MAEDA ,  Masaru IZAWA ,  Makoto NAWATA ,  Shingo KIMURA

发明人： Hiroyuki KOBAYASHI ,  Kenji MAEDA ,  Masaru IZAWA ,  Makoto NAWATA ,  Shingo KIMURA

IPC分类号： H01L21/3065 ,  B05C11/00

CPC分类号： H01L21/67201

摘要： There is provided a vacuum processing apparatus including a valve whose opening degree can be set to any size and a control computer which automatically controls a depressurizing rate. The vacuum processing apparatus can reduce the number of foreign particles adhered to a sample to be processed in the lock chamber and can improve the throughput at the same time.

摘要翻译： 提供了一种真空处理装置，其包括可以将开度设定为任意尺寸的阀，以及自动控制减压率的控制计算机。 真空处理装置可以减少在锁室中附着到待处理样品的异物的数量，并且可以同时提高生产量。

公开(公告)号：US20100128539A1

公开(公告)日：2010-05-27

申请号：US12624764

申请日：2009-11-24

申请人： Hiroyuki KOBAYASHI ,  Toshiya UCHIDA

发明人： Hiroyuki KOBAYASHI ,  Toshiya UCHIDA

IPC分类号： G11C7/10

CPC分类号： G11C11/4096 ,  G11C7/1045 ,  G11C7/1051 ,  G11C7/1057 ,  G11C11/4076 ,  G11C2207/105

摘要： A semiconductor memory is provided which includes: a first pad; a second pad disposed adjacent to the first pad; a first output buffer coupled to the first pad; and a second output buffer coupled to the second pad. The first pad is coupled to the second pad by metal.

摘要翻译： 提供半导体存储器，其包括：第一焊盘; 邻近所述第一焊盘设置的第二焊盘; 耦合到所述第一焊盘的第一输出缓冲器; 以及耦合到第二焊盘的第二输出缓冲器。 第一垫通过金属耦合到第二垫。