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163 条记录 (耗时 0.037 秒)

    Positive resist composition
    33.
    发明授权
    Positive resist composition 有权

    公开(公告)号：US06605409B2

    公开(公告)日：2003-08-12

    申请号：US09860440

    申请日：2001-05-21

    申请人： Kunihiko Kodama ,  Shinichi Kanna

    发明人： Kunihiko Kodama ,  Shinichi Kanna

    IPC分类号： G03F7004

    CPC分类号： C07D275/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

    摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.

    Positive-working resist composition
    34.
    发明授权
    Positive-working resist composition 有权
    正面抗蚀剂组成

    公开(公告)号：US06602646B1

    公开(公告)日：2003-08-05

    申请号：US09684888

    申请日：2000-10-06

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.

    摘要翻译： 本发明提供一种消除图案上的边缘粗糙度并提供优异的抗蚀剂图案轮廓的高灵敏度化学放大正性抗蚀剂组合物。 提供了一种新型的正性抗蚀剂组合物，其包含（A）含有由至少一个含有由通式（pI）至（pVI）表示的脂环族烃部分并且单体组分含量为5的部分保护的碱溶性基团的树脂 通过凝胶渗透色谱法（GPC）确定的总图案面积的百分比或更少，其通过酸的作用相对于碱性显影剂的溶液速度增加，和（B）能够产生酸的化合物 用活性射线或辐射照射。

    Positive photoresist composition
    35.
    发明授权
    Positive photoresist composition 有权
    正光致抗蚀剂组合物

    公开(公告)号：US06576392B1

    公开(公告)日：2003-06-10

    申请号：US09456827

    申请日：1999-12-06

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hidekazu Ohashi

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hidekazu Ohashi

    IPC分类号： G03C173

    CPC分类号： G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A positive photoresist composition comprising a photo-acid gererator and a specific resin. The resin contains repeating units each having a group represented by formula (I): —SO2—O—R wherein R represents an optionally substituted alkyl, cycloalkyl, or alkenyl group and comes to have an increased rate of dissolution in an alkaline developing solution by the action of an acid, or contains alkali-soluble groups protected by partial structures containing an alicyclic hydrocarbon and represented by at least one of formulae (pI) to (pVI) defined in the specification and which decomposes by the action of an acid to have enhanced solubility in an alkali. The latter is used in combination with a compound which decomposes by the action of an acid to generate a sulfonic acid.

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含光酸注射器和特定树脂。 树脂含有各自具有由式（I）表示的基团的重复单元：其中R表示任选取代的烷基，环烷基或烯基，并且通过酸的作用使碱显影溶液的溶解速率增加， 或含有由说明书中定义的至少一种式（pI）至（pVI）表示的含有脂环族烃的部分结构保护的碱溶性基团，其通过酸的作用而分解，从而具有增强的在碱中的溶解度。 后者与通过酸的作用分解以产生磺酸的化合物组合使用。

    Positive photosensitive composition
    36.
    发明授权
    Positive photosensitive composition 失效

    公开(公告)号：US06517991B1

    公开(公告)日：2003-02-11

    申请号：US09606681

    申请日：2000-06-30

    申请人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

    发明人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

    IPC分类号： G03F7004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III) as described in the specification or (B-2) a resin having at least one monovalent polyalicyclic group represented by formula (Ib) as described in the specification and a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution. The positive photosensitive composition containing the resin according to the present invention has high transmittance to far ultraviolet light particularly having a wavelength of 220 nm or less and exhibits good dry etching resistance. Further, the positive photosensitive composition exhibits high sensitivity, good resolution and good pattern profile when far ultraviolet light having a wavelength of 250 nm or less, particularly 220 nm or less (especially an ArF excimer laser beam) is employed as an exposure light source, and thus it can be effectively employed for the formation of fine pattern necessary for the production of semiconductor elements.

    Error correcting method and apparatus for information data having error correcting product code block
    37.
    发明授权
    Error correcting method and apparatus for information data having error correcting product code block 失效
    具有纠错产品代码块的信息数据的纠错方法和装置

    公开(公告)号：US6138263A

    公开(公告)日：2000-10-24

    申请号：US55911

    申请日：1998-04-07

    申请人： Kunihiko Kodama

    发明人： Kunihiko Kodama

    IPC分类号： G06F11/10 ,  G11B20/10 ,  G11B20/18 ,  H03M13/00 ,  H03M13/15 ,  H03M13/27 ,  H03M13/29

    CPC分类号： H03M13/293 ,  G11B20/1813 ,  H03M13/00 ,  H03M13/15 ,  H03M13/151 ,  H03M13/29 ,  H03M13/2909 ,  G11B20/10527 ,  H03M13/1515

    摘要： When the number of pieces of error position information detected by using one symbol, of internal and external symbols constituting an error correcting code added to information data, which has a data sequence substantially corresponding to the reception order of the information data exceeds the erasure correcting ability based on the other symbol, error position information is selected upon weighting based on the continuity of the error position information in consideration of the fact that burst error position information exhibits high continuity. By selecting error position information upon weighting based on continuity, erasure correction, which cannot be performed in the prior art, can be performed.

    摘要翻译： 当通过使用一个符号，构成添加到信息数据的纠错码的内部和外部符号检测到的具有与信息数据的接收顺序基本对应的数据序列的错误位置信息的数量超过了擦除校正能力 基于另一符号，考虑到突发错误位置信息表现出高连续性的事实，基于误差位置信息的连续性加权来选择错误位置信息。 通过基于连续性加权来选择错误位置信息，可以执行在现有技术中不能执行的擦除校正。

    Positive photosensitive composition
    38.
    发明授权
    Positive photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US5981140A

    公开(公告)日：1999-11-09

    申请号：US932168

    申请日：1997-09-17

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/121 ,  Y10S430/122

    摘要： A positive photosensitive composition comprising:a compound represented by formula (I) or (I') and a compound represented by formula (II) as compounds which generate a sulfonic acid upon irradiation with actinic rays or radiation: ##STR1## The substituents in these formulae are as defined in the specification. The positive photosensitive composition has high sensitivity and high resolving power, undergoes neither a decrease in resist pattern line width nor the formation of a T-top resist pattern surface with the lapse of time from exposure to heat treatment, and exhibits less profile deterioration such as residual standing wave and collapse.

    摘要翻译： 一种正型光敏组合物，其包含：由式（I）或（I'）表示的化合物和由式（II）表示的化合物作为在光化射线或辐射照射时产生磺酸的化合物：这些式中的取代基为 在规范中定义。 正型感光性组合物具有高灵敏度和高分辨能力，经历曝光与热处理后的时间不会影响抗蚀剂图案线宽度的降低和T型抗蚀剂图形表面的形成，并且表现出较小的轮廓劣化，例如 残余驻波和崩溃。