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公开(公告)号：US08012666B2
公开(公告)日：2011-09-06
申请号：US11716910
申请日：2007-03-12
申请人： Michael K. Gallagher , Deyan Wang
发明人： Michael K. Gallagher , Deyan Wang
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/095 , G03F7/11
摘要： Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
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公开(公告)号：US07955778B2
公开(公告)日：2011-06-07
申请号：US12454516
申请日：2009-05-19
申请人： Michael K. Gallagher , Deyan Wang
发明人： Michael K. Gallagher , Deyan Wang
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/095 , G03F7/11
摘要： Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
摘要翻译： 提供了覆盖层组合物，其被涂覆在光刻胶组合物上方，包括用于浸没式光刻处理以及非浸没成像。
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公开(公告)号：US20090148789A1
公开(公告)日：2009-06-11
申请号：US12291641
申请日：2008-11-12
CPC分类号： G03F7/091 , G03F7/0752
摘要： In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.
摘要翻译： 一方面，本发明涉及含有有机涂料组合物，特别是抗反射涂料组合物，其含有重复单元，其中发色团部分例如苯基与Si原子间隔开。 在另一方面，提供了配制成液体（有机溶剂）组合物的含硅底层组合物，其中溶剂组分的至少一种溶剂包含羟基。
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公开(公告)号：US20080073754A1
公开(公告)日：2008-03-27
申请号：US11904028
申请日：2007-09-25
IPC分类号： H01L21/469 , H01L23/58
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译： 提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。 这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。 优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。
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公开(公告)号：US20070212646A1
公开(公告)日：2007-09-13
申请号：US11716910
申请日：2007-03-12
申请人： Michael K. Gallagher , Deyan Wang
发明人： Michael K. Gallagher , Deyan Wang
IPC分类号： G03C1/00
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/095 , G03F7/11
摘要： Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
摘要翻译： 提供了覆盖层组合物，其被涂覆在光刻胶组合物上方，包括用于浸没式光刻处理以及非浸没成像。
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公开(公告)号：US06903175B2
公开(公告)日：2005-06-07
申请号：US09960662
申请日：2001-09-22
申请人： Robert H. Gore , Michael K. Gallagher , Yujian You
发明人： Robert H. Gore , Michael K. Gallagher , Yujian You
IPC分类号： C08F2/04 , C08F2/06 , C08F212/00 , C08F220/00 , H05K1/00 , H05K3/28 , C08F118/02
CPC分类号： C08F2/06 , H05K3/285 , H05K3/4676
摘要： Disclosed are methods of preparing solution polymers and compositions derived therefrom.
摘要翻译： 公开了制备溶液聚合物的方法和由其衍生的组合物。
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公开(公告)号：US06852367B2
公开(公告)日：2005-02-08
申请号：US10194851
申请日：2002-07-12
申请人： Yujian You , Robert H. Gore , Michael K. Gallagher
发明人： Yujian You , Robert H. Gore , Michael K. Gallagher
CPC分类号： C08J9/26 , C08J2201/046 , C08J2383/04 , C08K5/09 , C08L83/02 , C09D183/02 , C08L83/00
摘要： Disclosed are stable organo polysilica resin composition containing a B-staged organo polysilica resin and an organic acid, methods of stabilizing such B-staged organo polysilica resin compositions and methods of manufacturing electronic devices using such stable compositions.
摘要翻译： 公开了含有B阶有机聚硅氧烷树脂和有机酸的稳定的有机聚硅氧烷树脂组合物，稳定这种B阶有机聚硅氧烷树脂组合物的方法和使用这种稳定组合物制造电子器件的方法。
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公开(公告)号：US06667147B2
公开(公告)日：2003-12-23
申请号：US10289932
申请日：2002-11-07
申请人： Michael K. Gallagher , Yujian You
发明人： Michael K. Gallagher , Yujian You
IPC分类号： G03F700
CPC分类号： H01L21/02137 , B29C67/202 , H01L21/02203 , H01L21/02282 , H01L21/3122 , H01L21/31695 , H01L21/481 , H01L21/7682 , H01L2221/1047 , H05K1/024 , H05K2201/0116 , Y10T428/24331
摘要： Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material.
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公开(公告)号：US06602804B2
公开(公告)日：2003-08-05
申请号：US10186397
申请日：2002-07-01
申请人： Craig S. Allen , Nikoi Annan , Robert M. Blankenship , Michael K. Gallagher , Robert H. Gore , Angelo A. Lamola , Yujian You
发明人： Craig S. Allen , Nikoi Annan , Robert M. Blankenship , Michael K. Gallagher , Robert H. Gore , Angelo A. Lamola , Yujian You
IPC分类号： H01L2131
CPC分类号： C08J9/26 , C08J2201/046 , C08J2383/04 , H05K1/0313 , H05K3/0011 , Y10S438/96
摘要： Porous dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous dielectric materials. Also disclosed are methods of forming integrated circuits containing such porous dielectric materials.
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公开(公告)号：US06596467B2
公开(公告)日：2003-07-22
申请号：US09948388
申请日：2001-09-08
申请人： Michael K. Gallagher , Yujian You
发明人： Michael K. Gallagher , Yujian You
IPC分类号： H01L2131
CPC分类号： H01L21/02137 , B29C67/202 , H01L21/02203 , H01L21/02282 , H01L21/3122 , H01L21/31695 , H01L21/481 , H01L21/7682 , H01L2221/1047 , H05K1/024 , H05K2201/0116 , Y10T428/24331
摘要： Disclosed are methods of manufacturing electronic devices, particularly integrated circuits. Such methods include the use of low dielectric constant material prepared by using a removable porogen material.
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