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67 条记录 (耗时 0.039 秒)

    Removable pellicle for immersion lithography
    32.
    发明授权
    Removable pellicle for immersion lithography 有权
    浸没光刻用可拆卸防护薄膜

    公开(公告)号：US08067147B2

    公开(公告)日：2011-11-29

    申请号：US10596647

    申请日：2004-12-22

    申请人： Peter Dirksen ,  Robert Duncan Morton ,  Peter Zandbergen ,  David Van Steenwinckel ,  Yuri Aksenov ,  Jeroen Herman Lammers ,  Johannes Van Wingerden ,  Laurent Marinier

    发明人： Peter Dirksen ,  Robert Duncan Morton ,  Peter Zandbergen ,  David Van Steenwinckel ,  Yuri Aksenov ,  Jeroen Herman Lammers ,  Johannes Van Wingerden ,  Laurent Marinier

    IPC分类号： G03F7/00

    CPC分类号： G03F7/70341 ,  G03F7/70983

    摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.

    摘要翻译： 一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明 使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。 透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。 因此，照射可以更完整，并且缺陷减少。 对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。 辐射可以用于任何目的，包括检查，加工，图案化等。 可以将透明层的去除与显影抗蚀剂层的步骤组合。

    Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device
    35.
    发明申请
    Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device 审中-公开
    光刻投影装置，制造电子装置用基板的方法以及获得的电子装置

    公开(公告)号：US20070103658A1

    公开(公告)日：2007-05-10

    申请号：US10596510

    申请日：2004-12-07

    申请人： Peter Dirksen

    发明人： Peter Dirksen

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70308 ,  G03F7/70633

    摘要： The invention proposes a lithographic projection device such as a wafer stepper for forming a pattern on a substrate or wafer, comprising a(n) (actinic) radiation or light source (2), illumination optics (4) for directing light issuing from said light source onto a mask (6) and projection optics (8) for directing diffracted radiation or light from said mask to the substrate/wafer to be imaged, wherein an optical filter (9) is provided downstream of said projection optics and an imageable substrate (7) having an optical filter (9) on the side to be imaged.

    摘要翻译： 本发明提出了一种光刻投影装置，例如用于在衬底或晶片上形成图案的光刻投影装置，包括（n）（光化）辐射或光源（2），照明光学器件（4），用于引导从所述光 来源于掩模（6）和投影光学器件（8），用于将衍射的辐射或来自所述掩模的光引导到待成像的衬底/晶片，其中在所述投影光学器件的下游提供滤光器（9）和可成像衬底（ 7）在要成像的一侧具有滤光器（9）。

    Alignment device and lithographic apparatus comprising such a device
    37.
    发明授权
    Alignment device and lithographic apparatus comprising such a device 失效
    对准装置和包括这种装置的光刻设备

    公开(公告)号：US06417922B1

    公开(公告)日：2002-07-09

    申请号：US09324421

    申请日：1999-06-01

    申请人： Peter Dirksen ,  Antonius M. Nuijs

    发明人： Peter Dirksen ,  Antonius M. Nuijs

    IPC分类号： G01B1100

    CPC分类号： G03F7/70258 ,  G03F9/70 ,  H01L21/681

    摘要： An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.

    摘要翻译： 一种用于光刻设备的对准装置，用于对准具有第二对准标记的具有第二对象的第一对准标记的第一物体，其具有第二对准标记，该激光器发射具有 波长为1000nm，数量级为1100nm。

    Radiation-source unit for generating a beam having two directions of polarisation and two frequencies
    38.
    发明授权
    Radiation-source unit for generating a beam having two directions of polarisation and two frequencies 失效
    用于产生具有两个偏振方向和两个频率的光束的辐射源单元

    公开(公告)号：US5485272A

    公开(公告)日：1996-01-16

    申请号：US247933

    申请日：1994-05-24

    申请人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

    发明人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

    IPC分类号： G01B9/02 ,  G02F1/33 ,  G02F2/02 ,  G03F9/00 ,  G11B7/135 ,  H01S5/00

    CPC分类号： G03F9/7049 ,  G02F1/33

    摘要： A radiation-source unit is described which produces a radiation beam (30) with two components (9, 10) which are polarized perpendicularly relative to one another and which have different frequencies. The unit comprises a radiation source, a beam splitter (4), an acousto-optical modulation system (13, 18) for generating the frequency difference, and a beam combiner (25). Since the beam splitter and the beam combiner are transmission elements and their connecting line extends through the center of the modulation system the unit is compact and no alignment problems occur. Moreover, the frequency difference is adjustable over a wide range.

    摘要翻译： 描述了辐射源单元，其产生具有彼此垂直偏振且具有不同频率的两个分量（9,10）的辐射束（30）。 该单元包括辐射源，分束器（4），用于产生频率差的声光调制系统（13,18）和光束组合器（25）。 由于分束器和光束组合器是传输元件，并且其连接线延伸穿过调制系统的中心，所以该单元是紧凑的，并且不会发生对准问题。 此外，频率差可在宽范围内调节。

    Proximity sensor, in particular microphone for reception of sound signals in the human audible sound range, with ultrasonic proximity estimation
    39.
    发明授权
    Proximity sensor, in particular microphone for reception of sound signals in the human audible sound range, with ultrasonic proximity estimation 有权
    接近传感器，特别是用于在人类声音范围内接收声音信号的麦克风，具有超声波接近估计

    公开(公告)号：US08401513B2

    公开(公告)日：2013-03-19

    申请号：US12828482

    申请日：2010-07-01

    申请人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

    发明人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

    IPC分类号： H04M9/00

    CPC分类号： H04R19/005 ,  G01S15/06 ,  G01S15/876 ,  H03K17/94 ,  H03K2217/94005 ,  H04M1/6016 ,  H04M1/72569 ,  H04R19/04 ,  H04R2400/01

    摘要： Proximity sensor, particularly for usage in an electronic mobile device, comprising at least one acoustic transducer adapted for receiving acoustic signals at least in parts of the frequency range of human audible sound and emitting and/or receiving ultrasonic signals for proximity estimation. The acoustic transducer preferably is a Micro-Electro-Mechanical-Systems (MEMS) microphone. Further, a method in an electronic device comprising an acoustic transducer is provided comprising the steps of generating at least one electric signal in the frequency range of ultrasonic sound, emitting at least one ultrasonic signal by means of the acoustic transducer; receiving at least one ultrasonic signal by means of the acoustic transducer; deducing from the at least one emitted ultrasonic signal and the at least one received ultrasonic signal at least the delay between emission of the emitted ultrasonic signal and reception of the corresponding ultrasonic signal.

    摘要翻译： 特别是用于电子移动设备的接近传感器，包括至少一个声学传感器，适于在至少部分人类可听见的声音的频率范围内接收声学信号，并发射和/或接收用于邻近估计的超声波信号。 声换能器优选地是微机电系统（MEMS）麦克风。 此外，提供了一种包括声换能器的电子设备中的方法，包括以下步骤：在超声波的频率范围内产生至少一个电信号，借助于声换能器发射至少一个超声波信号; 通过声换能器接收至少一个超声波信号; 从所述至少一个发射的超声波信号和所述至少一个接收到的超声波信号中减去所发射的超声信号的发射与对应的超声波信号的接收之间的延迟。