公开(公告)号：US5340684A

公开(公告)日：1994-08-23

申请号：US158490

申请日：1993-11-29

申请人： Rumiko Hayase ,  Masayuki Oba ,  Naoko Kihara ,  Yukihiro Mikogami

发明人： Rumiko Hayase ,  Masayuki Oba ,  Naoko Kihara ,  Yukihiro Mikogami

IPC分类号： G03F7/075 ,  H01L21/312 ,  H01L23/29 ,  G03F7/023 ,  G03F7/115

CPC分类号： H01L21/312 ,  G03F7/0754 ,  G03F7/0757 ,  G03F7/0758 ,  H01L23/293 ,  H01L2924/0002 ,  Y10S430/106

摘要： A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a repeating unit having a siloxane bond, and a repeating unit other than these two repeating units, and a photosensitive agent consisting of an ester compound or an amide-ester compound of naphthoquinonediazidesulfonic acid or benzoquinonediazidesulfonic acid. The photosensitive composition is used as a passivation film of a semiconductor device or a photoresist.

摘要翻译： 光敏组合物含有由具有羟基的重复单元和具有硅氧烷键的重复单元或具有羟基的重复单元，具有硅氧烷键的重复单元和除了这两个重复的重复单元之外的重复单元构成的聚酰亚胺 单元，以及由萘化二叠氮磺酸或苯醌二叠氮磺酸的酯化合物或酰胺 - 酯化合物组成的感光剂。 光敏组合物用作半导体器件或光致抗蚀剂的钝化膜。

公开(公告)号：US5332648A

公开(公告)日：1994-07-26

申请号：US813694

申请日：1991-12-27

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  G03C1/73

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可形成精细的抗蚀剂图案。 （1）其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

公开(公告)号：US5216077A

公开(公告)日：1993-06-01

申请号：US874226

申请日：1992-04-27

申请人： Akira Yoshizumi ,  Shinetsu Fujieda ,  Ken Uchida ,  Naoko Kihara ,  Kazuhiro Sawai ,  Tsutomu Nagata ,  Shinji Murakami ,  Shigeyuki Kouchiyama

发明人： Akira Yoshizumi ,  Shinetsu Fujieda ,  Ken Uchida ,  Naoko Kihara ,  Kazuhiro Sawai ,  Tsutomu Nagata ,  Shinji Murakami ,  Shigeyuki Kouchiyama

IPC分类号： C08L61/06 ,  C08L63/00 ,  H01B3/40

CPC分类号： H01B3/40 ,  C08L61/06 ,  C08L63/00

摘要： A rubber-modified phenolic resin composition contains a novolak-type phenolic resin in which at least one modifying agent selected from the group consisting of an ABS resin and an MBS resin is homogeneously dispersed. The composition has good impact resistance and thermal shock resistance. The composition is prepared by adding at least one modifying agent described above to a novolak-type phenolic resin which is heated and melted at its softening point or more, so that the modifying agent is homogeneous dispersed in the resin. The resin composition is suitably used as a curing agent for an epoxy resin encapsulant for sealing electronic devices.

摘要翻译： 橡胶改性酚醛树脂组合物含有酚醛清漆型酚醛树脂，其中至少一种选自ABS树脂和MBS树脂的改性剂均匀分散。 该组合物具有良好的抗冲击性和耐热冲击性。 通过将上述至少一种改性剂加入到其软化点或更高温度下被加热和熔化的酚醛清漆型酚醛树脂来制备组合物，使得改性剂均匀分散在树脂中。 树脂组合物适合用作环氧树脂密封剂用于密封电子器件的固化剂。

公开(公告)号：US07618675B2

公开(公告)日：2009-11-17

申请号：US11248587

申请日：2005-10-13

申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

IPC分类号： B05D1/34

CPC分类号： G11B5/855

摘要： The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.

摘要翻译： 本发明提供使用自组装嵌段共聚物的相分离结构并使图案变化最小化的图案形成方法。 在其上预先形成有凹槽结构的基底上涂覆有包含至少一个具有介晶基团的嵌段的嵌段共聚物溶液。 导致嵌段共聚物在槽中自组装形成嵌段共聚物组合物，其被规则地排列。 本发明还涉及通过使用通过图案形成方法获得的图案作为模板来处理基板的处理方法。

公开(公告)号：US20080041818A1

公开(公告)日：2008-02-21

申请号：US11727158

申请日：2007-03-23

申请人： Naoko Kihara ,  Hiroyuki Hieda

发明人： Naoko Kihara ,  Hiroyuki Hieda

IPC分类号： C23F1/02

CPC分类号： H01L21/3086 ,  B82Y10/00 ,  Y10S438/942

摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.

摘要翻译： 提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤， 所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含 聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

公开(公告)号：US20070172584A1

公开(公告)日：2007-07-26

申请号：US11657720

申请日：2007-01-25

申请人： Naoko Kihara ,  Satoshi Shirotori ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

发明人： Naoko Kihara ,  Satoshi Shirotori ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

IPC分类号： B05D5/12

CPC分类号： G11B5/855

摘要： A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.

摘要翻译： 图案化磁记录介质的制造方法包括：通过用电磁辐射或电子束分解的抗蚀剂涂覆磁性膜以具有低分子量，通过压印方法在抗蚀剂上形成图案，转印图案 通过使用其上形成有图案的抗蚀剂作为掩模，并且通过将抗蚀剂暴露于电磁辐射或电子束来除去抗蚀剂到磁性膜。

公开(公告)号：US06879099B2

公开(公告)日：2005-04-12

申请号：US10819283

申请日：2004-04-07

申请人： Naoko Kihara ,  Yasushi Mori ,  Katsuyuki Naito

发明人： Naoko Kihara ,  Yasushi Mori ,  Katsuyuki Naito

IPC分类号： H01L27/32 ,  H01L51/00 ,  H01L51/30 ,  H01L51/50 ,  H01L51/52 ,  H05B33/12 ,  H05B33/22 ,  H01J1/62 ,  H01J63/04

CPC分类号： H01L51/5088 ,  H01L27/3244 ,  H01L27/3295 ,  H01L51/0037 ,  H01L51/0038 ,  H01L51/0052 ,  H01L51/524 ,  H01L51/5246

摘要： Provided is an organic EL display including a substrate, anodes arranged on one major surface of the substrate, an insulating separator layer covering the major surface of the substrate and having through-holes in the positions of the anodes, organic emitting layers disposed on the anodes, buffer layers disposed between the anodes and the organic emitting layers, and a cathode covering the organic emitting layers, wherein a central portion of each of the buffer layers is thicker than its periphery.

摘要翻译： 提供了一种有机EL显示器，包括基板，布置在基板的一个主表面上的阳极，覆盖基板的主表面并且在阳极位置具有通孔的绝缘隔离层，设置在阳极上的有机发光层 设置在阳极和有机发光层之间的缓冲层，以及覆盖有机发光层的阴极，其中每个缓冲层的中心部分比其周边厚。

公开(公告)号：US06340552B1

公开(公告)日：2002-01-22

申请号：US08247356

申请日：1994-05-23

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03C1492

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种 组; X表示

公开(公告)号：US06306553B1

公开(公告)日：2001-10-23

申请号：US08473963

申请日：1995-06-07

申请人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

发明人： Naoko Kihara ,  Fumihiko Yuasa ,  Tohru Ushirogouchi ,  Tsukasa Tada ,  Osamu Sasaki ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03C176

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/116 ,  Y10S430/118

摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.

摘要翻译： 一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要，组合物还包含碱溶性聚合物。 酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时， 该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种 组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

公开(公告)号：US06177229B1

公开(公告)日：2001-01-23

申请号：US09237659

申请日：1999-01-27

申请人： Satoshi Saito ,  Naoko Kihara ,  Toru Ushirogouchi

发明人： Satoshi Saito ,  Naoko Kihara ,  Toru Ushirogouchi

IPC分类号： G03C173

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/115

摘要： Disclosed is a positive photosensitive composition, comprising an alkali soluble resin having at least some or all of the alkali soluble groups protected by a substituent which can be decomposed by an acid, a compound which generates an acid upon irradiation with an actinic radiation, and a compound which generates water under action of an acid catalyst.

摘要翻译： 公开了一种正型光敏组合物，其包含碱溶性树脂，其具有至少部分或全部由可被酸分解的取代基保护的碱溶性基团，在用光化辐射照射时产生酸的化合物，以及 在酸催化剂作用下产生水的化合物。