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公开(公告)号:US11776926B2
公开(公告)日:2023-10-03
申请号:US17674487
申请日:2022-02-17
Applicant: Micron Technology, Inc.
Inventor: Kyle K. Kirby , Bret K. Street
IPC: H01L23/00 , H01L23/48 , H01L25/065 , H01L25/00
CPC classification number: H01L24/20 , H01L23/481 , H01L24/05 , H01L24/19 , H01L24/82 , H01L24/94 , H01L25/0657 , H01L25/50 , H01L2224/214
Abstract: Systems and methods for semiconductor devices having a substrate with bond pads, a die pair in a stacked configuration above the bond pads and having a first die having an oxide layer, a second die having an oxide layer attached to the first oxide layer, and conductive bonds electrically coupling the dies. Interconnects extend between the bond pads and the die pair, electrically coupling die pair to the substrate. The device may include a second die pair electrically coupled to: (1) the first die pair with secondary interconnects; and (2) the substrate with through-silicon vias extending through the first die pair. The top die of a die pair may be a thick die for use at the top of a pair stack. Pairs may be created by matching dies of a first silicon wafer to dies of a second silicon wafer, combination bonding the wafers, and dicing the die pairs.
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公开(公告)号:US20230260876A1
公开(公告)日:2023-08-17
申请号:US17670391
申请日:2022-02-11
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Kyle K. Kirby , Bret K. Street , Kunal R. Parekh
IPC: H01L23/48 , H01L23/00 , H01L25/065 , H01L25/00 , H01L21/768
CPC classification number: H01L23/481 , H01L24/16 , H01L25/0657 , H01L25/50 , H01L21/76898 , H01L2225/06541
Abstract: A semiconductor device having monolithic conductive columns, and associated systems and methods, are disclosed herein. The semiconductor device can include a semiconductor substrate, a conductive pad, an opening, a non-conductive liner, and a plug of non-conductive material. The conductive pad may be at a surface of the semiconductor substrate. The opening may extend through the semiconductor substrate from the conductive pad to a second surface and define a side wall. The liner may coat the side wall and the plug may fill the opening. A second opening may be formed through the semiconductor device and the opening and a conductive material sintering therein.
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公开(公告)号:US20230048311A1
公开(公告)日:2023-02-16
申请号:US17666437
申请日:2022-02-07
Applicant: Micron Technology, Inc.
Inventor: Bharat Bhushan , Akshay N. Singh , Keizo Kawakita , Bret K. Street
IPC: H01L23/00 , H01L25/065
Abstract: Bond pads for semiconductor die assemblies, and associated methods and systems are disclosed. In one embodiment, a semiconductor die assembly includes a first semiconductor die including a first bond pad on a first side of the first semiconductor die. The semiconductor die assembly further includes a second semiconductor die including a second bond pad on a second side of the second semiconductor die. The first bond pad is aligned and bonded to the second bond pad at a bonding interface between the first and second bond pads, and at least one of the first and second bond pads include a first metal and a second metal different than the first metal. Further, the first metal is located at the bonding interface and the second metal has a first thickness corresponding to at least one-fourth of a second thickness of the first or second bond pad.
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公开(公告)号:US20210118852A1
公开(公告)日:2021-04-22
申请号:US16939756
申请日:2020-07-27
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Randon K. Richards , Aparna U. Limaye , Dong Soon Lim , Chan H. Yoo , Bret K. Street , Eiichi Nakano , Shijian Luo
IPC: H01L25/065 , H01L25/18 , H01L23/00 , H01L23/552 , H01L23/66 , H01L21/78 , H01L21/66 , H01L25/00 , H01Q1/48 , H01Q1/22
Abstract: Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more microelectronic devices are stacked on the substrate, each microelectronic device comprising an active surface having bond pads operably coupled to conductive traces extending over a dielectric material to via locations beyond at least one side of the stack, and vias extending through the dielectric materials at the via locations and comprising conductive material in contact with at least some of the conductive traces of each of the two or more electronic devices and extending to exposed conductors of the substrate. Methods of fabrication and related electronic systems are also disclosed.
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公开(公告)号:US10861797B2
公开(公告)日:2020-12-08
申请号:US16036697
申请日:2018-07-16
Applicant: Micron Technology, Inc.
Inventor: Bret K. Street
IPC: H01L23/373 , H01L23/00 , H01L21/326 , H01L21/324 , F03G7/06
Abstract: A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.
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公开(公告)号:US20200211999A1
公开(公告)日:2020-07-02
申请号:US16236250
申请日:2018-12-28
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Bret K. Street , Benjamin L. McClain , Mark E. Tuttle
Abstract: A thermocompression bonding (TCB) apparatus can include a wall having a height measured in a first direction and configured to be positioned between a first pressing surface and a second pressing surface of a semiconductor bonding apparatus. The apparatus can include a cavity at least partially surrounded by the wall, the cavity sized to receive a semiconductor substrate and a stack of semiconductor dies positioned between the semiconductor substrate and the first pressing surface, the stack of semiconductor dies and semiconductor substrate having a combined unpressed stack height as measured in the first direction. In some embodiments, the unpressed stack height is greater than the height of the wall, and the wall is configured to be contacted by the first pressing surface to limit movement of the first pressing surface toward the second pressing surface during a semiconductor bonding process.
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公开(公告)号:US20200083178A1
公开(公告)日:2020-03-12
申请号:US16127769
申请日:2018-09-11
Applicant: Micron Technology, Inc.
Inventor: Bret K. Street , Wei Zhou , Christopher J. Gambee , Jonathan S. Hacker , Shijian Luo
IPC: H01L23/00 , H01L25/065 , H01L25/00
Abstract: A semiconductor device assembly that includes a substrate having a first side and a second side, the first side having at least one dummy pad and at least one electrical pad. The semiconductor device assembly includes a first semiconductor device having a first side and a second side and at least one electrical pillar extending from the second side. The electrical pillar is connected to the electrical pad via solder to form an electrical interconnect. The semiconductor device assembly includes at least one dummy pillar extending from the second side of the first semiconductor device and a liquid positioned between an end of the dummy pillar and the dummy pad. The surface tension of the liquid pulls the dummy pillar towards the dummy pad. The surface tension may reduce or minimize a warpage of the semiconductor device assembly and/or align the dummy pillar and the dummy pad.
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公开(公告)号:US20200020646A1
公开(公告)日:2020-01-16
申请号:US16036697
申请日:2018-07-16
Applicant: Micron Technology, Inc.
Inventor: Bret K. Street
IPC: H01L23/00 , H01L23/373 , H01L21/324 , H01L21/326
Abstract: A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.
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39.
公开(公告)号:US20190267352A1
公开(公告)日:2019-08-29
申请号:US16405935
申请日:2019-05-07
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Bret K. Street
IPC: H01L25/065 , H01L23/64 , H01L25/00 , H01L23/495 , H01L23/48
Abstract: A semiconductor device includes a first die; a second die attached over the first die; a first metal enclosure and a second metal enclosure both directly contacting and vertically extending between the first die and the second die, wherein the first metal enclosure peripherally encircles a set of one or more internal interconnects and the second metal enclosure peripherally encircles the first metal enclosure without directly contacting the first metal enclosure; a first enclosure connector electrically connecting the first metal enclosure to a first voltage level; a second enclosure connector electrically connecting the second metal enclosure to a second voltage level; and wherein the first metal enclosure, the second metal enclosure, the first enclosure connector, and the second enclosure connector are configured to provide an enclosure capacitance.
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公开(公告)号:US10103134B2
公开(公告)日:2018-10-16
申请号:US15728123
申请日:2017-10-09
Applicant: Micron Technology, Inc.
Inventor: Wei Zhou , Aibin Yu , Zhaohui Ma , Sony Varghese , Jonathan S. Hacker , Bret K. Street , Shijian Luo
IPC: H01L29/40 , H01L25/18 , H01L21/56 , H01L25/00 , H01L25/065 , H01L23/00 , H01L23/31 , H01L21/683 , H01L21/78 , H01L23/544
Abstract: Methods of making semiconductor device packages may involve attaching a first semiconductor die to a carrier wafer, an inactive surface of the first semiconductor die facing the carrier wafer. One or more additional semiconductor die may be stacked on the first semiconductor die on a side of the first semiconductor die opposite the carrier wafer to form a stack of semiconductor dice. A protective material may be positioned over the stack of semiconductor dice, a portion of the protective material extending along side surfaces of the first semiconductor die to a location proximate the inactive surface of the first semiconductor die. The carrier wafer may be detached from the first semiconductor die.
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