BOND PADS FOR SEMICONDUCTOR DIE ASSEMBLIES AND ASSOCIATED METHODS AND SYSTEMS

    公开(公告)号:US20230048311A1

    公开(公告)日:2023-02-16

    申请号:US17666437

    申请日:2022-02-07

    Abstract: Bond pads for semiconductor die assemblies, and associated methods and systems are disclosed. In one embodiment, a semiconductor die assembly includes a first semiconductor die including a first bond pad on a first side of the first semiconductor die. The semiconductor die assembly further includes a second semiconductor die including a second bond pad on a second side of the second semiconductor die. The first bond pad is aligned and bonded to the second bond pad at a bonding interface between the first and second bond pads, and at least one of the first and second bond pads include a first metal and a second metal different than the first metal. Further, the first metal is located at the bonding interface and the second metal has a first thickness corresponding to at least one-fourth of a second thickness of the first or second bond pad.

    Electrically or temperature activated shape-memory materials for warpage control

    公开(公告)号:US10861797B2

    公开(公告)日:2020-12-08

    申请号:US16036697

    申请日:2018-07-16

    Inventor: Bret K. Street

    Abstract: A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.

    METHODS AND SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES

    公开(公告)号:US20200211999A1

    公开(公告)日:2020-07-02

    申请号:US16236250

    申请日:2018-12-28

    Abstract: A thermocompression bonding (TCB) apparatus can include a wall having a height measured in a first direction and configured to be positioned between a first pressing surface and a second pressing surface of a semiconductor bonding apparatus. The apparatus can include a cavity at least partially surrounded by the wall, the cavity sized to receive a semiconductor substrate and a stack of semiconductor dies positioned between the semiconductor substrate and the first pressing surface, the stack of semiconductor dies and semiconductor substrate having a combined unpressed stack height as measured in the first direction. In some embodiments, the unpressed stack height is greater than the height of the wall, and the wall is configured to be contacted by the first pressing surface to limit movement of the first pressing surface toward the second pressing surface during a semiconductor bonding process.

    Die Features for Self-Alignment During Die Bonding

    公开(公告)号:US20200083178A1

    公开(公告)日:2020-03-12

    申请号:US16127769

    申请日:2018-09-11

    Abstract: A semiconductor device assembly that includes a substrate having a first side and a second side, the first side having at least one dummy pad and at least one electrical pad. The semiconductor device assembly includes a first semiconductor device having a first side and a second side and at least one electrical pillar extending from the second side. The electrical pillar is connected to the electrical pad via solder to form an electrical interconnect. The semiconductor device assembly includes at least one dummy pillar extending from the second side of the first semiconductor device and a liquid positioned between an end of the dummy pillar and the dummy pad. The surface tension of the liquid pulls the dummy pillar towards the dummy pad. The surface tension may reduce or minimize a warpage of the semiconductor device assembly and/or align the dummy pillar and the dummy pad.

    Electrically or Temperature Activated Shape-Memory Materials for Warpage Control

    公开(公告)号:US20200020646A1

    公开(公告)日:2020-01-16

    申请号:US16036697

    申请日:2018-07-16

    Inventor: Bret K. Street

    Abstract: A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.

    SEMICONDUCTOR DEVICE WITH A LAYERED PROTECTION MECHANISM AND ASSOCIATED SYSTEMS, DEVICES, AND METHODS

    公开(公告)号:US20190267352A1

    公开(公告)日:2019-08-29

    申请号:US16405935

    申请日:2019-05-07

    Abstract: A semiconductor device includes a first die; a second die attached over the first die; a first metal enclosure and a second metal enclosure both directly contacting and vertically extending between the first die and the second die, wherein the first metal enclosure peripherally encircles a set of one or more internal interconnects and the second metal enclosure peripherally encircles the first metal enclosure without directly contacting the first metal enclosure; a first enclosure connector electrically connecting the first metal enclosure to a first voltage level; a second enclosure connector electrically connecting the second metal enclosure to a second voltage level; and wherein the first metal enclosure, the second metal enclosure, the first enclosure connector, and the second enclosure connector are configured to provide an enclosure capacitance.

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