公开(公告)号：US20210225690A1

公开(公告)日：2021-07-22

申请号：US17224003

申请日：2021-04-06

Applicant: Micron Technology, Inc.

Inventor： Gurtej S. Sandhu ,  Sony Varghese ,  John A. Smythe ,  Hyun Sik Kim

IPC: H01L21/762 ,  H01L21/02 ,  H01L21/768 ,  B29C41/08 ,  H01L21/288

Abstract: Some embodiments include a construction having a horizontally-extending layer of fluorocarbon material over a semiconductor construction. Some embodiments include methods of filling openings that extend into a semiconductor construction. The methods may include, for example, printing the material into the openings or pressing the material into the openings. The construction may be treated so that surfaces within the openings adhere the material provided within the openings while surfaces external of the openings do not adhere the material. In some embodiments, the surfaces external of the openings are treated to reduce adhesion of the material.

公开(公告)号：US10998221B2

公开(公告)日：2021-05-04

申请号：US15650194

申请日：2017-07-14

Applicant: Micron Technology, Inc.

Inventor： Gurtej S. Sandhu ,  Sony Varghese ,  John A. Smythe ,  Hyun Sik Kim

IPC: B29C41/08 ,  H01L21/762 ,  H01L21/02 ,  H01L21/768 ,  H01L21/288 ,  B29C35/08 ,  B32B3/26 ,  B29K83/00 ,  H01L21/67 ,  H01L21/32

Abstract: Some embodiments include a construction having a horizontally-extending layer of fluorocarbon material over a semiconductor construction. Some embodiments include methods of filling openings that extend into a semiconductor construction. The methods may include, for example, printing the material into the openings or pressing the material into the openings. The construction may be treated so that surfaces within the openings adhere the material provided within the openings while surfaces external of the openings do not adhere the material. In some embodiments, the surfaces external of the openings are treated to reduce adhesion of the material.

公开(公告)号：US20190019720A1

公开(公告)日：2019-01-17

申请号：US15650194

申请日：2017-07-14

Applicant: Micron Technology, Inc.

Inventor： Gurtej S. Sandhu ,  Sony Varghese ,  John A. Smythe ,  Hyun Sik Kim

IPC: H01L21/762 ,  H01L21/02

Abstract: Some embodiments include a construction having a horizontally-extending layer of fluorocarbon material over a semiconductor construction. Some embodiments include methods of filling openings that extend into a semiconductor construction. The methods may include, for example, printing the material into the openings or pressing the material into the openings. The construction may be treated so that surfaces within the openings adhere the material provided within the openings while surfaces external of the openings do not adhere the material. In some embodiments, the surfaces external of the openings are treated to reduce adhesion of the material.

公开(公告)号：US20170330784A1

公开(公告)日：2017-11-16

申请号：US15667395

申请日：2017-08-02

Applicant: Micron Technology, Inc.

Inventor： Sony Varghese

IPC: H01L21/683 ,  B32B37/18 ,  B32B37/12 ,  B32B7/14 ,  B32B38/10 ,  B32B37/08

CPC classification number: H01L21/6835 ,  B32B7/14 ,  B32B37/08 ,  B32B37/12 ,  B32B37/1292 ,  B32B37/18 ,  B32B38/10 ,  B32B2309/02 ,  B32B2457/14 ,  H01L21/2007 ,  H01L21/6836 ,  H01L21/78 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  Y10T428/265 ,  Y10T428/2848

Abstract: Methods of forming semiconductor structures include providing a polymeric material over a carrier substrate, bonding another substrate to the polymeric material, and lowering a temperature of the polymeric material to below about 15° C. to separate the another substrate from the carrier substrate. Some methods include forming a polymeric material over a first substrate, securing a second substrate to the first substrate over the polymeric material, cooling the polymeric material to a temperature below a glass transition temperature of the polymeric material, and separating the second substrate from the first substrate. Semiconductor structures may include a polymeric material over at least a portion of a first substrate, an adhesive material over the polymeric material, and a second substrate over the adhesive material. The polymeric material may have a glass transition temperature of about 10° C. or lower and a melting point of about 100° C. or greater.

公开(公告)号：US20180033781A1

公开(公告)日：2018-02-01

申请号：US15728123

申请日：2017-10-09

Applicant: Micron Technology, Inc.

Inventor： Wei Zhou ,  Aibin Yu ,  Zhaohui Ma ,  Sony Varghese ,  Jonathan S. Hacker ,  Bret K. Street ,  Shijian Luo

IPC: H01L25/18 ,  H01L21/683 ,  H01L21/78 ,  H01L23/544 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00 ,  H01L21/56 ,  H01L23/31

CPC classification number: H01L25/18 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6835 ,  H01L21/78 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/544 ,  H01L24/81 ,  H01L24/94 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2223/54433 ,  H01L2223/54486 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/73204 ,  H01L2224/81203 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/18161 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/014

Abstract: Methods of making semiconductor device packages may involve attaching a first semiconductor die to a carrier wafer, an inactive surface of the first semiconductor die facing the carrier wafer. One or more additional semiconductor die may be stacked on the first semiconductor die on a side of the first semiconductor die opposite the carrier wafer to form a stack of semiconductor dice. A protective material may be positioned over the stack of semiconductor dice, a portion of the protective material extending along side surfaces of the first semiconductor die to a location proximate the inactive surface of the first semiconductor die. The carrier wafer may be detached from the first semiconductor die.

公开(公告)号：US09865578B2

公开(公告)日：2018-01-09

申请号：US14730681

申请日：2015-06-04

Applicant: Micron Technology, Inc.

Inventor： Wei Zhou ,  Aibin Yu ,  Zhaohui Ma ,  Sony Varghese ,  Jonathan S. Hacker ,  Bret K. Street ,  Shijian Luo

IPC: H01L29/40 ,  H01L25/18 ,  H01L25/065 ,  H01L25/00 ,  H01L21/56 ,  H01L23/00 ,  H01L23/31 ,  H01L23/544 ,  H01L21/683 ,  H01L21/78

CPC classification number: H01L25/18 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6835 ,  H01L21/78 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/544 ,  H01L24/81 ,  H01L24/94 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2223/54433 ,  H01L2223/54486 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/73204 ,  H01L2224/81203 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/18161 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/014

Abstract: Methods of making semiconductor device packages may involve attaching a first semiconductor die to a carrier wafer, an inactive surface of the first semiconductor die facing the carrier wafer. One or more additional semiconductor die may be stacked on the first semiconductor die on a side of the first semiconductor die opposite the carrier wafer to form a stack of semiconductor dice. A protective material may be positioned over the stack of semiconductor dice, a portion of the protective material extending along side surfaces of the first semiconductor die to a location proximate the inactive surface of the first semiconductor die. The carrier wafer may be detached from the first semiconductor die.

公开(公告)号：US20150179493A1

公开(公告)日：2015-06-25

申请号：US14134199

申请日：2013-12-19

Applicant: Micron Technology, Inc.

Inventor： Sony Varghese

IPC: H01L21/683 ,  H01L21/78 ,  B32B38/10 ,  B32B43/00 ,  B32B37/12 ,  B32B37/18

CPC classification number: H01L21/6835 ,  B32B7/14 ,  B32B37/08 ,  B32B37/12 ,  B32B37/1292 ,  B32B37/18 ,  B32B38/10 ,  B32B2309/02 ,  B32B2457/14 ,  H01L21/2007 ,  H01L21/6836 ,  H01L21/78 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  Y10T428/265 ,  Y10T428/2848

Abstract: Methods of forming semiconductor structures include providing a polymeric material over a carrier substrate, bonding another substrate to the polymeric material, and lowering a temperature of the polymeric material to below about 15° C. to separate the another substrate from the carrier substrate. Some methods include forming a polymeric material over a first substrate, securing a second substrate to the first substrate over the polymeric material, cooling the polymeric material to a temperature below a glass-transition temperature of the polymeric material, and separating the second substrate from the first substrate. Semiconductor structures may include a polymeric material over at least a portion of a first substrate, an adhesive material over the polymeric material, and a second substrate over the adhesive material. The polymeric material may have a glass transition temperature of about 10° C. or lower and a melting point of about 100° C. or greater.

Abstract translation: 形成半导体结构的方法包括在载体基底上提供聚合材料，将另一个基底粘合到聚合物材料上，并将聚合物材料的温度降低到低于约15℃，以将另一个基底与载体基底分开。 一些方法包括在第一衬底上形成聚合物材料，将第二衬底固定在聚合物材料上的第一衬底上，将聚合物材料冷却至低于聚合物材料的玻璃化转变温度的温度，以及将第二衬底与 第一底物。 半导体结构可以包括在第一基底的至少一部分上的聚合物材料，聚合物材料上方的粘合剂材料，以及粘合剂材料上的第二基底。 聚合物材料的玻璃化转变温度可以为约10℃以下，熔点为约100℃以上。

公开(公告)号：US11515198B2

公开(公告)日：2022-11-29

申请号：US16941311

申请日：2020-07-28

Applicant: Micron Technology, Inc.

Inventor： Gurtej S. Sandhu ,  Scott L. Light ,  John A. Smythe ,  Sony Varghese

IPC: H01L21/70 ,  H01L21/762 ,  H01L21/02 ,  H01L21/3105 ,  H01L29/06 ,  G03F7/075 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/023 ,  H01L21/311

Abstract: Some embodiments include a semiconductor construction which has one or more openings extending into a substrate. The openings are at least partially filled with dielectric material comprising silicon, oxygen and carbon. The carbon is present to a concentration within a range of from about 3 atomic percent to about 20 atomic percent. Some embodiments include a method of providing dielectric fill across a semiconductor construction having an opening extending therein. The semiconductor construction has an upper surface proximate the opening. The method includes forming photopatternable dielectric material within the opening and across the upper surface, and exposing the photopatternable dielectric material to patterned actinic radiation. Subsequently, the photopatternable dielectric material is developed to pattern the photopatternable dielectric material into a first dielectric structure which at least partially fills the opening, and to remove the photopatternable dielectric material from over the upper surface.

公开(公告)号：US20180337087A1

公开(公告)日：2018-11-22

申请号：US15598795

申请日：2017-05-18

Applicant: Micron Technology, Inc.

Inventor： Gurtej S. Sandhu ,  Scott L. Light ,  John A. Smythe ,  Sony Varghese

IPC: H01L21/762 ,  H01L21/02 ,  H01L21/3105 ,  H01L29/06 ,  G03F7/075 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC classification number: H01L21/76224 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0757 ,  G03F7/20 ,  G03F7/30 ,  H01L21/02118 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02183 ,  H01L21/02189 ,  H01L21/02345 ,  H01L21/31053 ,  H01L21/31058 ,  H01L29/0649

Abstract: Some embodiments include a semiconductor construction which has one or more openings extending into a substrate. The openings are at least partially filled with dielectric material comprising silicon, oxygen and carbon. The carbon is present to a concentration within a range of from about 3 atomic percent to about 20 atomic percent. Some embodiments include a method of providing dielectric fill across a semiconductor construction having an opening extending therein. The semiconductor construction has an upper surface proximate the opening. The method includes forming photopatternable dielectric material within the opening and across the upper surface, and exposing the photopatternable dielectric material to patterned actinic radiation. Subsequently, the photopatternable dielectric material is developed to pattern the photopatternable dielectric material into a first dielectric structure which at least partially fills the opening, and to remove the photopatternable dielectric material from over the upper surface.

公开(公告)号：US20160358898A1

公开(公告)日：2016-12-08

申请号：US14730681

申请日：2015-06-04

Applicant: MICRON TECHNOLOGY, INC.

Inventor： Wei Zhou ,  Aibin Yu ,  Zhaohui Ma ,  Sony Varghese ,  Jonathan S. Hacker ,  Bret K. Street ,  Shijian Luo

IPC: H01L25/18 ,  H01L25/065 ,  H01L23/31 ,  H01L21/56 ,  H01L21/78 ,  H01L23/00 ,  H01L25/00 ,  H01L21/683

CPC classification number: H01L25/18 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6835 ,  H01L21/78 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/544 ,  H01L24/81 ,  H01L24/94 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2223/54433 ,  H01L2223/54486 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/73204 ,  H01L2224/81203 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/18161 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/014

Abstract: Methods of making semiconductor device packages may involve attaching a first semiconductor die to a carrier wafer, an inactive surface of the first semiconductor die facing the carrier wafer. One or more additional semiconductor die may be stacked on the first semiconductor die on a side of the first semiconductor die opposite the carrier wafer to form a stack of semiconductor dice. A protective material may be positioned over the stack of semiconductor dice, a portion of the protective material extending along side surfaces of the first semiconductor die to a location proximate the inactive surface of the first semiconductor die. The carrier wafer may be detached from the first semiconductor die.

Abstract translation: 制造半导体器件封装的方法可以包括将第一半导体管芯附接到载体晶片，第一半导体管芯的面向载体晶片的非活性表面。 一个或多个附加的半导体管芯可以在第一半导体管芯上与第一半导体管芯的与载体晶片相对的一侧堆叠以形成半导体管芯堆叠。 保护材料可以位于半导体管芯的堆叠之上，保护材料的一部分沿着第一半导体管芯的侧表面延伸到接近第一半导体管芯的非活性表面的位置。 载体晶片可以与第一半导体管芯分离。