公开(公告)号：US20050247876A1

公开(公告)日：2005-11-10

申请号：US10504869

申请日：2003-05-19

申请人： Hiroki Kawada ,  Takashi Iizumi ,  Tadashi Otaka

发明人： Hiroki Kawada ,  Takashi Iizumi ,  Tadashi Otaka

IPC分类号： G01B15/00 ,  G01N23/225 ,  H01J3/02 ,  H01J9/04 ,  H01J37/065 ,  H01J37/28

CPC分类号： G01B15/00 ,  G01N23/225 ,  H01J3/02 ,  H01J9/042 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/06308 ,  H01J2237/2814

摘要： An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

摘要翻译： 本发明的目的是抑制由于扫描电子束的收缩量不同于图案的事实而引起的测量误差。 为了实现该目的，根据本发明，就样品图案的种类和通过扫描测量的特定图案的尺寸值准备指示电子束照射在样品上时图形尺寸变化过程的功能 特定图案上的电子束被拟合到为特定图案准备的功能，以在特定图案改变之前计算特定图案的尺寸。

公开(公告)号：US20050182595A1

公开(公告)日：2005-08-18

申请号：US11102703

申请日：2005-04-11

申请人： Yasuhiro Mitsui ,  Yasutsugu Usami ,  Isao Kawata ,  Yuya Toyoshima ,  Tadashi Otaka ,  Nobuyuki Iriki

发明人： Yasuhiro Mitsui ,  Yasutsugu Usami ,  Isao Kawata ,  Yuya Toyoshima ,  Tadashi Otaka ,  Nobuyuki Iriki

IPC分类号： G01Q30/04 ,  H01L23/544 ,  G06F15/00

CPC分类号： H01L22/34

摘要： A test pattern formed in a scribe line area of a wafer is irradiated with a light beam to measure the width thereof; the test pattern is irradiated with an electron beam so as to measure the width thereof; an amount of change in the width of the test pattern is calculated; a dummy pattern having the same width as that of a semiconductor device of the wafer is irradiated with an electron beam to measure the width thereof; and the width of a pattern is estimated by the use of the calculated amount of width change so as to determine the shape of the pattern. Thus, a shape measuring system and method capable of determining the shape of a micropattern in a semiconductor device without changing the dimensions of the micropattern can be provided.

公开(公告)号：US06791084B2

公开(公告)日：2004-09-14

申请号：US10246453

申请日：2002-09-19

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： H01J3728

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US06653634B1

公开(公告)日：2003-11-25

申请号：US09575635

申请日：2000-05-22

申请人： Tadashi Otaka ,  Kouichi Nagai

发明人： Tadashi Otaka ,  Kouichi Nagai

IPC分类号： G02B2118

CPC分类号： H01J37/28 ,  H01J2237/2816 ,  H01J2237/2826

摘要： A method of measuring length with a scanning type electron microscope (SEM) includes the steps of: performing length measurement with the SEM of an already know pattern provided in advance in a predetermined region on a specimen (S 101˜S 104); obtaining a magnification correction coefficient through comparison of the length measurement result with the designed value of the already known pattern (S 105, S 108); and determining a true size by multiplying a measured length value of a measurement point performed by the SEM by the obtained magnification correction coefficient (S 109˜S 111), thereby, a method which is free from a length measurement error regardless to the constitution of the specimen and the film type thereof.

摘要翻译： 使用扫描型电子显微镜（SEM）测量长度的方法包括以下步骤：使用预先在样本上的预定区域中提供的已知图案的SEM进行长度测量（S101〜S104）。 通过将长度测量结果与已知图案的设计值进行比较来获得倍率校正系数（S105，S108）; 并且通过将由SEM执行的测量点的测量长度值乘以所获得的倍率校正系数（S 109〜S 111）来确定真实尺寸，由此，不考虑长度测量误差的方法，而与 试样及其膜型。

公开(公告)号：US06274876B1

公开(公告)日：2001-08-14

申请号：US09657241

申请日：2000-09-07

申请人： Yoshimi Kawanami ,  Akio Yoneyama ,  Tadashi Otaka

发明人： Yoshimi Kawanami ,  Akio Yoneyama ,  Tadashi Otaka

IPC分类号： G21K510

CPC分类号： G01N23/00

摘要： The inspection apparatus uses a particle beam and has a high throughput by obtaining a characteristic frequency corresponding to the characteristic quantity of focusing-shift from a Fourier spectrum of a sample image using a focusing-shift evaluator. A beam blur profile is produced corresponding to the characteristic frequency in a beam blur profile generator. A component of the beam-blur profile is removed from the sample image stored in one dimensional image memory using a de-convolution operator. A dimensional measurement is performed in a critical dimension evaluator for an obtained sample image. Since time spent for focus adjustment using particle beam scanning is obviated, it is possible to reduce the inspection time for a dimension and an appearance abnormality of a semiconductor element.

摘要翻译： 检查装置使用粒子束并且通过使用聚焦移位评估器从样本图像的傅立叶频谱获得与聚焦移位的特征量相对应的特征频率而具有高吞吐量。 对应于光束模糊分布生成器中的特征频率产生光束模糊轮廓。 使用去卷积运算符从存储在一维图像存储器中的样本图像中去除光束模糊轮廓的分量。 对于获得的样本图像，在关键维度评估器中执行尺寸测量。 由于消除了使用粒子束扫描进行焦点调整的时间，因此可以减少半导体元件的尺寸和外观异常的检查时间。

公开(公告)号：US5866904A

公开(公告)日：1999-02-02

申请号：US970201

申请日：1997-11-14

申请人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

发明人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

IPC分类号： G01Q30/02 ,  G01B15/00 ,  G01B15/04 ,  G01Q30/04 ,  H01J37/26

CPC分类号： G01B15/00 ,  G01B15/04 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

公开(公告)号：US5442183A

公开(公告)日：1995-08-15

申请号：US137965

申请日：1993-10-19

申请人： Hironobu Matsui ,  Mikio Ichihashi ,  Shinjiroo Ueda ,  Tadashi Otaka ,  Kazue Takahashi ,  Toshiaki Kobari ,  Kenji Odaka

发明人： Hironobu Matsui ,  Mikio Ichihashi ,  Shinjiroo Ueda ,  Tadashi Otaka ,  Kazue Takahashi ,  Toshiaki Kobari ,  Kenji Odaka

IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q30/16 ,  G01Q30/18 ,  H01J37/12 ,  H01J37/28 ,  H01J49/06 ,  H01J37/256

CPC分类号： H01J37/28 ,  H01J37/12 ,  H01J2237/18

摘要： A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample. All of the lens electrodes except for the final electrode are supplied with positive voltages as opposed to a negative voltage to the final electrode when the charged particle beam is negatively charged (e.g., electron beam). All of the lens electrodes except for the final electrode are supplied with negative voltages as opposed to a positive voltage to the final electrode when the charged electron beam is positively charged (e.g., positive ion beam). The deflecting system is so constructed as to deflect the charged particle beam within the inner space of the plurality of lens electrodes excluding the final electrode.

摘要翻译： 带电粒子束装置包括带电粒子束产生系统，用于使带电粒子源产生带电粒子束。 聚焦系统将带电粒子束聚焦到样品上。 偏转系统使聚焦的带电粒子束扫描样品的表面。 抽空系统排空带电粒子束通过的空间。 检测器检测通过将带电粒子束照射到样品上而获得的信息。 图像显示系统基于从检测器转发的检测信号，将样品表面上的信息的分布状态显示为图像。 聚焦系统完全由包含多个透镜电极的静电透镜构成，其中一个透镜电极是最靠近样品的最终电极。 当带电粒子束带负电（例如电子束）时，除了最终电极之外的所有透镜电极都被提供与正电压相对的最终电极的正电压。 当带电的电子束带正电（例如，正离子束）时，除了最终电极之外的所有透镜电极都被提供有与正电压相反的负电压。 偏转系统被构造成使带电粒子束在除了最终电极之外的多个透镜电极的内部空间内偏转。

公开(公告)号：US5324950A

公开(公告)日：1994-06-28

申请号：US913450

申请日：1992-07-15

申请人： Tadashi Otaka ,  Mikio Ichihashi

发明人： Tadashi Otaka ,  Mikio Ichihashi

IPC分类号： G01Q60/00 ,  H01J37/073 ,  H01J37/18 ,  H01J41/12 ,  H01J37/252

CPC分类号： H01J37/18 ,  H01J37/073

摘要： Improvements in a charged particle beam apparatus are contemplated and especially a column structure incorporating a superhigh vacuum evacuation system is provided which is reduced in size and weight and has high performance. In order to evacuate surrounding space of a charged particle source to superhigh vacuum, ion pumps are built in a vacuum enclosure of a column. Each ion pump includes a magnet unit 15, a yoke and an electrode, and the magnet unit per se is built in the vacuum enclosure. A charged particle beam focusing optics for focusing and deflecting a charged particle beam from the charged particle beam source is arranged in a space which is defined interiorly of the yoke. The column structure can be reduced in size and weight and a charged particle beam apparatus having high performance can be obtained.

摘要翻译： 考虑了带电粒子束装置的改进，特别是提供了结合超高真空排气系统的柱结构，其减小了尺寸和重量并且具有高性能。 为了排空带电粒子源的周围空间以超高真空，将离子泵内置在塔的真空外壳中。 每个离子泵包括磁体单元15，磁轭和电极，并且磁体单元本身内置在真空外壳中。 用于聚焦和偏转带电粒子束源的带电粒子束的带电粒子束聚焦光学器件被布置在限定在轭的内部的空间中。 可以减小柱结构的尺寸和重量，并且可以获得具有高性能的带电粒子束装置。

公开(公告)号：US5254856A

公开(公告)日：1993-10-19

申请号：US717018

申请日：1991-06-18

申请人： Hironobu Matsui ,  Mikio Ichihashi ,  Shinjiroo Ueda ,  Tadashi Otaka ,  Kazue Takahashi ,  Toshiaki Kobari ,  Kenji Odaka

发明人： Hironobu Matsui ,  Mikio Ichihashi ,  Shinjiroo Ueda ,  Tadashi Otaka ,  Kazue Takahashi ,  Toshiaki Kobari ,  Kenji Odaka

IPC分类号： G01Q30/02 ,  G01Q30/04 ,  G01Q30/16 ,  G01Q30/18 ,  H01J37/12 ,  H01J37/28 ,  H01J49/06 ,  H01J37/10 ,  H01J37/18

CPC分类号： H01J37/28 ,  H01J37/12 ,  H01J2237/18

摘要： A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample. All of the lens electrodes except for the final electrode are supplied with positive voltages as opposed to a negative voltage to the final electrode when the charged particle beam is negatively charged (e.g., electron beam). All of the lens electrodes except for the final electrode are supplied with negative voltages as opposed to a positive voltage to the final electrode when the charged electron beam is positively charged (e.g., positive ion beam). The deflecting system is so constructed as to deflect the charged particle beam within the inner space of the plurality of lens electrodes excluding the final electrode.

公开(公告)号：US20110260057A1

公开(公告)日：2011-10-27

申请号：US13124599

申请日：2009-10-22

申请人： Tadashi Otaka ,  Hiroyuki Ito ,  Ryoichi Ishii ,  Manabu Yano ,  Hajime Kawano

发明人： Tadashi Otaka ,  Hiroyuki Ito ,  Ryoichi Ishii ,  Manabu Yano ,  Hajime Kawano

IPC分类号： H01J37/26

CPC分类号： H01J37/20 ,  H01J37/28 ,  H01J2237/20214 ,  H01J2237/2811 ,  H01J2237/2817

摘要： According to a charged particle beam apparatus of this invention, an inspection position on a test sample (wafer coordinate system) is converted to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm (102,1012) and a rotating stage (103,1011) being rotated to be moved for the inspection position on the test sample.In this case, a plurality of inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism. With this configuration, a charged particle beam apparatus which is small-sized and capable of easy stage control can be realized.

摘要翻译： 根据本发明的带电粒子束装置，将测试样品（晶片坐标系）上的检查位置转换为检查机构（载台坐标系（极坐标系））的设定位置，旋转臂（102， 1012）和旋转台（103,1011）旋转以移动以用于测试样品上的检查位置。 在这种情况下，根据旋转臂的旋转，将多个检查装置布置在由旋转台的中心拉伸的轨迹上。 提供了一种用于计算误差（例如，旋转台的中心偏移）和补偿误差的功能，通过该功能，在装备有双轴旋转平台机构的带电粒子束装置中提高了检查精度。 利用这种结构，可以实现小型化并且能够容易地进行阶段控制的带电粒子束装置。