公开(公告)号：US08581487B2

公开(公告)日：2013-11-12

申请号：US13503604

申请日：2010-11-25

申请人： Takashi Sawai ,  Emi Mukai ,  Kousuke Katabe ,  Akira Miyake

发明人： Takashi Sawai ,  Emi Mukai ,  Kousuke Katabe ,  Akira Miyake

IPC分类号： H05B33/22

CPC分类号： H01L33/60 ,  H01L33/44 ,  H01L33/486 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00012

摘要： A light-emitting device includes a substrate, a pair of electrode layers disposed on the substrate, a light-emitting element disposed between the pair of electrode layers to keep a first space with each of the pair of electrode layers while electrically connecting with each of the pair of electrode layers, and a pair of reflection layers, each extending in overlapping relation from one to the other one of the pair of electrode layers as seen in a transparent plan view. The light-emitting element is disposed between the pair of reflection layers to keep a second space with each of the pair of reflection layers.

摘要翻译： 发光装置包括基板，设置在基板上的一对电极层，设置在该对电极层之间的发光元件，以与第一对电极层中的每一个电极层保持第一空间，同时与 一对电极层和一对反射层，每个反射层以透明平面图的方式从该对电极层中的一个至另一个的重叠关系延伸。 所述发光元件设置在所述一对反射层之间，以与所述一对反射层中的每一个保持第二空间。

公开(公告)号：US20120025986A1

公开(公告)日：2012-02-02

申请号：US13148675

申请日：2010-03-24

申请人： Yoshiharu Hino ,  Akira Miyake ,  Daisuke Kuroki ,  Takuya Yamaguchi ,  Yusuke Minemura

发明人： Yoshiharu Hino ,  Akira Miyake ,  Daisuke Kuroki ,  Takuya Yamaguchi ,  Yusuke Minemura

IPC分类号： G08B13/14

CPC分类号： H01Q1/2225 ,  G06K7/10445 ,  G06K2017/0048 ,  H01Q1/38 ,  H01Q7/00 ,  H01Q9/27

摘要： A work direction determining device includes a passive tag type IC tag secured at a predetermined position on the front surface thereof. The IC tag includes a substrate, an IC module and an antenna coil disposed on the substrate in an offset manner. The device includes an antenna communicating with the IC tag, and a determination circuit. Where the work and the direction determining device are located at respective predetermined communication positions, communication is done between the antenna of the direction determining device and the antenna coil of the IC tag, and the magnitude of communication intensity during the communication is determined by the determination circuit to thereby determine a direction of the work.

摘要翻译： 工作方向确定装置包括固定在其前表面上的预定位置处的无源标签型IC标签。 IC标签包括以偏移方式设置在基板上的基板，IC模块和天线线圈。 该装置包括与IC标签通信的天线和确定电路。 在工作和方向确定装置位于相应的预定通信位置的情况下，在方向确定装置的天线和IC标签的天线线圈之间进行通信，并且通信确定通信强度的大小 电路，从而确定工作的方向。

公开(公告)号：US07544960B2

公开(公告)日：2009-06-09

申请号：US11124000

申请日：2005-05-06

申请人： Takeshi Miyachi ,  Akira Miyake

发明人： Takeshi Miyachi ,  Akira Miyake

IPC分类号： G03B21/00 ,  G01B11/24

CPC分类号： G03F7/70316 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70591 ,  G21K1/062 ,  G21K2201/067

摘要： A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.

摘要翻译： 具有多层膜的光学元件的制造方法包括以下步骤：在基板上形成多层膜，当将多个膜的波长为2〜40nm的光照射时，测定从多层膜发射的次级辐射， 基于测量步骤的测量结果确定照射到多层膜的光与从多层膜反射的光之间的相位差，以及基于所确定的相位差来修饰多层膜。

公开(公告)号：US07543948B2

公开(公告)日：2009-06-09

申请号：US11548107

申请日：2006-10-10

申请人： Akira Miyake

发明人： Akira Miyake

IPC分类号： G02B5/08

CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G02B5/0841 ,  G03F7/70316 ,  G21K1/062 ,  Y10S359/90

摘要： A method for manufacturing a multilayer mirror that includes a substrate and a multilayer film formed on the substrate, and has a reflection surface shape includes the steps of estimating a surface shape variation amount as a difference between a surface shape of the substrate before the multilayer film is formed on the substrate and a surface shape of the multilayer mirror after the multilayer film is formed on the substrate, processing the surface shape of the substrate into a shape generated by subtracting the surface shape variation amount from the reflection surface shape, and forming the multilayer film on the substrate processed by the processing step.

摘要翻译： 一种制造多层反射镜的方法，其包括形成在基板上的基板和多层膜，并且具有反射面形状的步骤包括以下步骤：将表面形状变化量估计为多层膜之前的基板的表面形状之间的差异 形成在基板上，并且在基板上形成多层膜之后的多层反射镜的表面形状，将基板的表面形状加工成从反射表面形状减去表面形状变化量所产生的形状，并形成 通过处理步骤处理的基板上的多层膜。

公开(公告)号：US07453560B2

公开(公告)日：2008-11-18

申请号：US10933570

申请日：2004-09-03

申请人： Akira Miyake

发明人： Akira Miyake

IPC分类号： G01N21/00 ,  G01B9/02

CPC分类号： G03F7/706

摘要： There is provided an evaluation method of a reflective optical element on which a multilayer film is formed, including the step of calculating a phase difference between light incident upon the multilayer film and light reflected from the multilayer film using a standing wave produced when introducing light with a wavelength of 2 to 40 into the optical element.

摘要翻译： 提供了一种其上形成多层膜的反射型光学元件的评价方法，包括以下步骤：使用在将光引入时产生的驻波计算入射到多层膜上的光与多层膜反射的光之间的相位差 波长为2〜40的光学元件。

公开(公告)号：US07280184B2

公开(公告)日：2007-10-09

申请号：US11123975

申请日：2005-05-06

申请人： Takayuki Hasegawa ,  Akira Miyake

发明人： Takayuki Hasegawa ,  Akira Miyake

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.

摘要翻译： 一种由多个光学元件组成的光学系统的调整方法，所述多个光学元件具有多层膜，所述调整方法包括对于每个光学元件获得EUV光（极紫外光）的相位分布之间的差异的第一测量步骤， 从所述光学元件反射并且从所述光学元件反射具有比所述EUV光更长的波长的光的相位分布，测量所述光通过所述光学系统的相位分布的第二测量步骤， 决定步骤，其基于由所述第一测量步骤获得的相位分布差和由所述第二测量步骤测量的相位分布，决定所述EUV光通过所述光学系统的相位分布;以及调整步骤， 基于由判定步骤决定的相位分布的光学元件的位置和姿势。

公开(公告)号：US07091507B2

公开(公告)日：2006-08-15

申请号：US11060198

申请日：2005-02-17

申请人： Fumitaro Masaki ,  Akira Miyake

发明人： Fumitaro Masaki ,  Akira Miyake

IPC分类号： H05H1/00 ,  H05H1/24 ,  G21G4/00 ,  G01J1/00

CPC分类号： H05G2/001 ,  G03F7/70916 ,  G03F7/70925

摘要： A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.

摘要翻译： 一种用于将激光照射到靶上用于产生等离子体并用于从等离子体产生光的光发生器包括：用于将光引入靶的第一光学系统，用于引入光的第二光学系统和用于照射的单元 通过改变激光的照射条件与用于产生等离子体的照射条件不同，将激光附着到第一和第二光学系统中的至少一个的碎片上。

公开(公告)号：US6038279A

公开(公告)日：2000-03-14

申请号：US730999

申请日：1996-10-16

申请人： Akira Miyake ,  Masami Tsukamoto

发明人： Akira Miyake ,  Masami Tsukamoto

IPC分类号： G03F7/20 ,  H05G2/00 ,  G21K5/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033

摘要： An X-ray generating device employing a laser-excited plasma light source has a plurality of luminescent points, or a luminescent portion the form of which is variable in terms of the configuration, size, position and the number of luminescent points. An object such as a mask is illuminated by X-rays generated from the light source under Kohler's illumination conditions. Also disclosed are an X-ray generating method using such a device, as well as a method of producing a semiconductor device.

摘要翻译： 采用激光激发等离子体光源的X射线产生装置具有多个发光点或发光部分，其形状在发光点的形状，大小，位置和数量上是可变的。 在K + E，uml o + EE hler的照明条件下，由光源产生的X射线照射诸如掩模的物体。 还公开了使用这种器件的X射线产生方法以及半导体器件的制造方法。

公开(公告)号：US5848119A

公开(公告)日：1998-12-08

申请号：US674720

申请日：1996-07-02

申请人： Akira Miyake ,  Masami Hayashida

发明人： Akira Miyake ,  Masami Hayashida

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/04 ,  G21K7/00 ,  H01L21/027 ,  H05H13/04 ,  G21K5/00

CPC分类号： G21K1/06 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70875 ,  G03F7/70983

摘要： An illumination system includes a spectral optical element for separating radiation light from a radiation source, including at least one of X-rays and vacuum ultraviolet rays. The spectral optical element provides an emission angle to the radiation light which changes with the wavelength thereof. The system also includes an optical arrangement for illuminating an object with radiation light of a particular wavelength from the spectral optical element, and an absorption element for absorbing at least a portion of radiation light of a wavelength longer than the particular wavelength from the spectral optical element.

摘要翻译： 照明系统包括用于分离来自辐射源的辐射光的光谱光学元件，其包括X射线和真空紫外线中的至少一种。 光谱光学元件提供与其波长变化的辐射光的发射角。 该系统还包括用于利用来自分光光学元件的特定波长的辐射光照射物体的光学装置，以及吸收元件，用于从波长光学元件吸收长于特定波长的波长的至少一部分辐射光 。

公开(公告)号：US5770335A

公开(公告)日：1998-06-23

申请号：US687782

申请日：1996-07-31

申请人： Akira Miyake ,  Keiko Chiba

发明人： Akira Miyake ,  Keiko Chiba

IPC分类号： G03F1/22 ,  G03F1/68 ,  G21K1/10 ,  H01L21/027 ,  G03F9/00 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F1/22 ,  G03F1/29

摘要： A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.

摘要翻译： 用于辐射的掩模，包括X射线和真空紫外线之一。 掩模包括用于支撑辐射吸收材料的图案的透射构件和设置在透射构件上的移相器材料。 移相器材料的辐射吸收率小于辐射吸收材料的辐射吸收率。 在设置移相器材料的部分处的透射构件的厚度小于其另一部分的厚度。