公开(公告)号：US20120183676A1

公开(公告)日：2012-07-19

申请号：US13395879

申请日：2010-09-10

申请人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato

发明人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato

IPC分类号： C23C16/04 ,  B05D5/12 ,  C23C16/52

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  H01L51/0011

摘要： The present invention (i) uses a mask unit (80) including: a shadow mask (81) that has an opening (82) and that is smaller in area than a vapor deposition region (210) of a film formation substrate (200) and; a vapor deposition source (85) that has a emission hole (86) for emitting a vapor deposition particle, the emission hole (86) being provided so as to face the shadow mask (81), the shadow mask (81) and the vapor deposition source (85) being fixed in position relative to each other, (ii) adjusts an amount of a void between the shadow mask (81) and the film formation substrate (200), (iii) moves at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof while uniformly maintaining the amount of the void between the mask unit (80) and the film formation substrate (200), and (iv) sequentially deposit the vapor deposition particle onto the vapor deposition region (210) through the opening (82) of the shadow mask (81). This makes it possible to form a high-resolution vapor deposition pattern on a large-sized substrate.

摘要翻译： 本发明（i）使用掩模单元（80），其包括：具有开口（82）并且面积小于成膜基板（200）的气相沉积区域（210）的荫罩（81） 和; 具有用于发射气相沉积粒子的发射孔（86）的蒸气源（85），所述发射孔（86）设置成面对荫罩（81），荫罩（81）和蒸气 沉积源（85）相对于彼此固定在适当位置，（ii）调节荫罩（81）和成膜基底（200）之间的空隙量，（iii）移动至少第一个 掩模单元（80）和成膜基板（200），同时均匀地保持掩模单元（80）和成膜基板（200）之间的空隙量，并且（iv）顺序地将 气相沉积颗粒通过荫罩（81）的开口（82）到蒸镀区域（210）上。 这使得可以在大尺寸基板上形成高分辨率气相沉积图案。

公开(公告)号：US09748526B2

公开(公告)日：2017-08-29

申请号：US14004896

申请日：2012-03-09

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C14/24 ,  H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  H05B33/10

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

公开(公告)号：US09299946B2

公开(公告)日：2016-03-29

申请号：US14008535

申请日：2012-03-27

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L33/14 ,  H01L51/50 ,  H05B33/14 ,  H01L51/56 ,  H01L27/32 ,  H01L51/52

CPC分类号： H01L51/504 ,  H01L27/3213 ,  H01L27/3218 ,  H01L27/3244 ,  H01L51/5265 ,  H01L51/56 ,  H05B33/145

摘要： TFT substrate (10) includes a plurality of pixel regions each including light emitting regions of at least three colors, which light emitting regions include light emitting layers (23R(1), 23G, 23R(2), and 23B), respectively, and two adjacent ones of the light emitting regions are a combination other than a combination of (i) a light emitting region included in a light emitting layer (23G) of a color having a highest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance and (ii) a light emitting region included in a light emitting layer (23B) of a color having a lowest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance.

摘要翻译： TFT基板（10）包括分别包括至少三种颜色的发光区域的多个像素区域，该发光区域分别包括发光层（23R（1），23G，23R（2）和23B），以及 两个相邻的发光区域是除了（i）包含在发光层（23G）中的发光区域的组合之外的组合，在发光层的发光层的情况下具有最高电流效率的颜色 所述至少三种颜色的发光区域发射具有相同亮度的光，以及（ii）包含在具有最低电流效率的颜色的发光层（23B）中的发光区域，在发光层的发光层 至少三种颜色的发光区域发射具有相同亮度的光。

公开(公告)号：US09240572B2

公开(公告)日：2016-01-19

申请号：US13984799

申请日：2012-03-02

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56 ,  C23C16/455 ,  H01L51/00

CPC分类号： H01L51/56 ,  C23C14/044 ,  C23C14/12 ,  C23C14/562 ,  C23C16/45578 ,  H01L51/0011

摘要： A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.

摘要翻译： 蒸镀装置包括：蒸镀源（60），具有排出气相沉积粒子（91）的多个气相沉积源开口（61），具有多个限制开口（82）的限制单元（80） 气相沉积掩模（70），其中多个掩模开口（71）仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区（72）中。 多个气相沉积区域沿着与基板（10）的法线方向正交的第二方向和基板的移动方向排列，其中气相沉积微粒不具有非气相沉积区域（73） 夹在其间。 沿着平行于第二方向的直线上的非蒸镀区域的位置，沿着基板的移动方向的不同位置，沿蒸镀粒子的法线方向 底物。 因此，可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。

公开(公告)号：US09209355B2

公开(公告)日：2015-12-08

申请号：US14192062

申请日：2014-02-27

申请人： Naoyuki Senda ,  Yoshitaka Dozen ,  Kohei Yokoyama ,  Manabu Niboshi ,  Yuto Tsukamoto ,  Satoshi Inoue ,  Shinichi Kawato ,  Katsuhiro Kikuchi

发明人： Naoyuki Senda ,  Yoshitaka Dozen ,  Kohei Yokoyama ,  Manabu Niboshi ,  Yuto Tsukamoto ,  Satoshi Inoue ,  Shinichi Kawato ,  Katsuhiro Kikuchi

IPC分类号： H01L33/08 ,  H01L33/58 ,  H01L51/50 ,  H01L27/32 ,  H01L33/36

CPC分类号： H01L33/08 ,  H01L27/3246 ,  H01L33/58 ,  H01L51/5044

摘要： Occurrence of a crosstalk phenomenon in a light-emitting device is inhibited. The light-emitting device includes an insulating layer; a first lower electrode over the insulating layer; a second lower electrode over the insulating layer; a structure over the insulating layer and between the first lower electrode and the second lower electrode; a first partition wall between the first lower electrode and the structure, over the insulating layer; a second partition wall between the second lower electrode and the structure, over the insulating layer; a first light-emitting unit over the first lower electrode, the first partition wall, the structure, the second partition wall, and the second lower electrode; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit.

摘要翻译： 在发光装置中发生串扰现象被抑制。 发光装置包括绝缘层; 绝缘层上的第一下电极; 绝缘层上的第二下电极; 绝缘层上方和第一下电极与第二下电极之间的结构; 绝缘层之间的第一下部电极和结构之间的第一分隔壁; 位于所述第二下电极和所述结构之间的第二分隔壁，绝缘层上; 第一下部电极上的第一发光单元，第一分隔壁，结构，第二分隔壁和第二下部电极; 在所述第一发光单元上方的中间层; 在所述中间层上方的第二发光单元; 以及位于第二发光单元上的上电极。

公开(公告)号：US09159948B2

公开(公告)日：2015-10-13

申请号：US14215684

申请日：2014-03-17

申请人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

发明人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

IPC分类号： H01L35/24 ,  H01L51/52 ,  H01L27/32

CPC分类号： H01L51/5218 ,  H01L27/3246 ,  H01L51/5209 ,  H01L51/5215 ,  H01L51/5265

摘要： To inhibit surface reflection of a display device. A display device which includes a reflective electrode layer 110; a partition 118 formed to surround the reflective electrode layer; a layer 120 containing a light-emitting organic compound and formed over the partition and the reflective electrode layer; a semi-transmissive electrode layer 122 formed over the layer containing the light-emitting organic compound; and a coloring layer 162 formed over the semi-transmissive electrode layer. The coloring layer overlaps with the reflective electrode layer and the partition. The partition does not overlap with the reflective electrode layer.

摘要翻译： 抑制显示装置的表面反射。 一种显示装置，包括反射电极层110; 形成为围绕反射电极层的隔壁118; 包含发光有机化合物并形成在隔板和反射电极层上的层120; 在包含发光有机化合物的层上形成的半透射电极层122; 以及形成在半透射电极层上的着色层162。 着色层与反射电极层和隔板重叠。 隔板与反射电极层不重叠。

公开(公告)号：US09076989B2

公开(公告)日：2015-07-07

申请号：US13976422

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/56 ,  H05B33/04 ,  H05B33/10 ,  H01L21/02 ,  H01L51/00 ,  C23C14/04 ,  C23C16/04 ,  H01L27/32

CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C16/042 ,  H01L21/02104 ,  H01L27/3211 ,  H01L51/0011 ,  H01L2227/323 ,  H01L2251/566 ,  H05B33/04 ,  H05B33/10

摘要： A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.

摘要翻译： 掩模膜（13）形成为在显示区域（R1）（发光区域）和密封区域中具有开口。 随后，形成具有条纹图案的发光层（8R，8G，8B）。 然后，剥离掩模膜（13），从而提供以高分辨率图案化的发光层（8R，8G，8B）。

公开(公告)号：US09055653B2

公开(公告)日：2015-06-09

申请号：US13637627

申请日：2011-02-10

申请人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

发明人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

IPC分类号： C23C14/24 ,  C23C14/04 ,  H05B33/10 ,  C23C14/12 ,  C23C14/22 ,  H01L27/32 ,  H01L51/56 ,  H01L51/00

CPC分类号： H05B33/10 ,  C23C14/042 ,  C23C14/044 ,  C23C14/12 ,  C23C14/225 ,  C23C14/24 ,  H01L27/3211 ,  H01L51/0011 ,  H01L51/56

摘要： A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.

摘要翻译： 沉积装置50在用于有机EL显示器的基板10上以预定图案形成薄膜3。 第一校正板81和第二校正板82被放置在荫罩60和发射沉积颗粒的沉积源53之间。 每个校正板81,82具有多个叶片83和支撑多个叶片板83的框架84.叶片板83相对于荫罩60倾斜放置，并且延伸 在与沉积掩模60垂直的方向上观察时，在相邻的刮板83之间具有开口86，彼此平行。

公开(公告)号：US08691016B2

公开(公告)日：2014-04-08

申请号：US13522007

申请日：2010-10-29

申请人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato

发明人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato

IPC分类号： B05C11/11 ,  C23C16/00 ,  H01L21/00 ,  H01L21/31 ,  H01L21/469

CPC分类号： H01L51/001 ,  C23C14/042 ,  C23C14/12 ,  H01L27/3211 ,  H01L51/0011 ,  H01L51/56

摘要： A deposition mask 601 is used to form a thin film 3 in a prescribed pattern on a substrate 10 by deposition. Each of a plurality of improved openings 62A of the deposition mask 601 has a protruding opening portion 64, and is formed so that the opening amount at an end in a lateral direction is larger than that in a central portion in the lateral direction. In a deposition apparatus 50, the deposition mask 601 is held in a fixed relative positional relation with a deposition source 53 by a mask unit 55. In the case of forming the thin film 3 in a stripe pattern on the substrate 10 by the deposition apparatus 50, deposition particles are sequentially deposited on the substrate 10 while relatively moving the substrate 10 along a scanning direction with a gap H being provided between the substrate 10 and the deposition mask 601.

摘要翻译： 沉积掩模601用于通过沉积在衬底10上以规定的图案形成薄膜3。 沉积掩模601的多个改进开口62A中的每一个具有突出的开口部分64，并且形成为使得横向端部的开口量大于在横向方向上的中心部分的开口量。 在沉积装置50中，沉积掩模601通过掩模单元55与沉积源53保持固定的相对位置关系。在通过沉积装置在基板10上形成条纹图案的薄膜3的情况下 如图50所示，在衬底10和衬底10之间设置有间隙H的同时使衬底10沿着扫描方向相对移动的同时，沉积粒子依次沉积在衬底10上。

公开(公告)号：US08673077B2

公开(公告)日：2014-03-18

申请号：US13984283

申请日：2012-03-02

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： C23C16/00 ,  H01L21/31

CPC分类号： H01L51/5012 ,  C23C14/042 ,  C23C14/243 ,  C23C14/564 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

摘要： Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.

摘要翻译： 从至少一个气相沉积源开口（61）排出的气相沉积颗粒（91）通过限制单元（80）的多个限制开口（82）和气相沉积掩模的多个掩模开口（71） 70），并且粘附到沿着第二方向（10a）相对移动以形成涂膜的基板（10）。 限制单元包括彼此堆叠的多个板构件。 因此，可以以低成本有效地形成在大尺寸基板上抑制边缘模糊的气相沉积涂膜。