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81 条记录 (耗时 0.045 秒)

    Light-emitting device
    1.
    发明授权
    Light-emitting device 有权
    发光装置

    公开(公告)号：US09209355B2

    公开(公告)日：2015-12-08

    申请号：US14192062

    申请日：2014-02-27

    申请人： Naoyuki Senda ,  Yoshitaka Dozen ,  Kohei Yokoyama ,  Manabu Niboshi ,  Yuto Tsukamoto ,  Satoshi Inoue ,  Shinichi Kawato ,  Katsuhiro Kikuchi

    发明人： Naoyuki Senda ,  Yoshitaka Dozen ,  Kohei Yokoyama ,  Manabu Niboshi ,  Yuto Tsukamoto ,  Satoshi Inoue ,  Shinichi Kawato ,  Katsuhiro Kikuchi

    IPC分类号： H01L33/08 ,  H01L33/58 ,  H01L51/50 ,  H01L27/32 ,  H01L33/36

    CPC分类号： H01L33/08 ,  H01L27/3246 ,  H01L33/58 ,  H01L51/5044

    摘要： Occurrence of a crosstalk phenomenon in a light-emitting device is inhibited. The light-emitting device includes an insulating layer; a first lower electrode over the insulating layer; a second lower electrode over the insulating layer; a structure over the insulating layer and between the first lower electrode and the second lower electrode; a first partition wall between the first lower electrode and the structure, over the insulating layer; a second partition wall between the second lower electrode and the structure, over the insulating layer; a first light-emitting unit over the first lower electrode, the first partition wall, the structure, the second partition wall, and the second lower electrode; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit.

    摘要翻译： 在发光装置中发生串扰现象被抑制。 发光装置包括绝缘层; 绝缘层上的第一下电极; 绝缘层上的第二下电极; 绝缘层上方和第一下电极与第二下电极之间的结构; 绝缘层之间的第一下部电极和结构之间的第一分隔壁; 位于所述第二下电极和所述结构之间的第二分隔壁，绝缘层上; 第一下部电极上的第一发光单元，第一分隔壁，结构，第二分隔壁和第二下部电极; 在所述第一发光单元上方的中间层; 在所述中间层上方的第二发光单元; 以及位于第二发光单元上的上电极。

    Display device, manufacturing method thereof, and electronic device
    4.
    发明授权
    Display device, manufacturing method thereof, and electronic device 有权
    显示装置及其制造方法以及电子装置

    公开(公告)号：US09343515B2

    公开(公告)日：2016-05-17

    申请号：US14215692

    申请日：2014-03-17

    申请人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

    发明人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

    IPC分类号： H01J1/62 ,  H01J63/04 ,  H01L27/32 ,  H01L51/52

    CPC分类号： H01L27/3246 ,  H01L51/5218 ,  H01L51/5265 ,  H01L51/5281

    摘要： A display device that includes a reflective electrode; a transparent electrode; a partition; an EL layer formed over the partition and the transparent electrode; a semi-transmissive electrode formed over the EL layer; and a coloring layer over the semi-transmissive electrode. A light-emitting region is formed to overlap with the transparent electrode, the EL layer, the semi-transmissive electrode, and the coloring layer. A non-light-emitting region is formed to overlap with the transparent electrode, the partition, the EL layer, and the coloring layer. The non-light-emitting region is formed to surround the light-emitting region. The sum of the optical length of the transparent electrode and the optical length of the EL layer is adjusted to fulfill a condition of a microcavity intensifying light of the color of the coloring layer. The optical length of the partition in the non-light-emitting region is adjusted to weaken external light incident through the coloring layer.

    摘要翻译： 一种显示装置，包括反射电极; 透明电极; 一个分区 形成在隔板和透明电极上的EL层; 形成在EL层上的半透射电极; 和半透射电极上的着色层。 形成发光区域与透明电极，EL层，半透射电极和着色层重叠。 形成与透明电极，隔板，EL层和着色层重叠的非发光区域。 非发光区域形成为围绕发光区域。 调整透明电极的光学长度和EL层的光学长度的总和，以实现着色层的颜色的微腔增强光的条件。 调整非发光区域中的隔板的光学长度，以削弱通过着色层入射的外部光。

    Vapor deposition mask, and manufacturing method and manufacturing device for organic EL element using vapor deposition mask
    6.
    发明授权
    Vapor deposition mask, and manufacturing method and manufacturing device for organic EL element using vapor deposition mask 有权
    气相沉积掩模，以及使用气相沉积掩模的有机EL元件的制造方法和制造装置

    公开(公告)号：US09580791B2

    公开(公告)日：2017-02-28

    申请号：US13697164

    申请日：2011-04-26

    申请人： Satoshi Inoue ,  Shinichi Kawato ,  Nobuhiro Hayashi ,  Tohru Sonoda

    发明人： Satoshi Inoue ,  Shinichi Kawato ,  Nobuhiro Hayashi ,  Tohru Sonoda

    IPC分类号： C23C16/04 ,  H05B33/10 ,  C23C14/04 ,  B05C21/00 ,  H01L51/00 ,  H01L51/50

    CPC分类号： C23C14/042 ,  B05C21/005 ,  H01L51/0011 ,  H01L51/50

    摘要： A vapor deposition mask (70) includes a first layer (71), a second layer (72) and a third layer (73) in this order. A plurality of first openings (71h), a plurality of second openings (72h) and a plurality of third openings (73h) are formed respectively in the first layer, the second layer and the third layer. The first openings, the second openings and the third openings communicate with each other, thereby constituting mask openings (75). The opening dimension of the second openings is larger than the opening dimension of the first openings and is larger than the opening dimension of the third openings. With this configuration, it is possible to prevent reduction of the opening dimension of the mask openings or clogging of the mask openings due to the vapor deposition particles adhering to the mask openings.

    摘要翻译： 蒸镀掩模（70）依次包括第一层（71），第二层（72）和第三层（73）。 多个第一开口（71h），多个第二开口（72h）和多个第三开口（73h）分别形成在第一层，第二层和第三层中。 第一开口，第二开口和第三开口彼此连通，从而构成掩模开口（75）。 第二开口的开口尺寸大于第一开口的开口尺寸，并且大于第三开口的开口尺寸。 利用这种构造，可以防止由于气相沉积颗粒粘附到掩模开口而导致的掩模开口的开口尺寸的减小或掩模开口的堵塞。

    Vapor deposition method, vapor deposition device and organic EL display device
    7.
    发明授权
    Vapor deposition method, vapor deposition device and organic EL display device 有权
    蒸镀法，蒸镀装置以及有机EL显示装置

    公开(公告)号：US09391275B2

    公开(公告)日：2016-07-12

    申请号：US13703873

    申请日：2011-08-17

    申请人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

    发明人： Tohru Sonoda ,  Nobuhiro Hayashi ,  Shinichi Kawato ,  Satoshi Inoue

    IPC分类号： C23C16/00 ,  H01L51/00 ,  C23C14/04 ,  H01L27/32 ,  H01L51/56

    CPC分类号： H01L51/0008 ,  C23C14/042 ,  H01L27/3211 ,  H01L27/3244 ,  H01L51/0011 ,  H01L51/56

    摘要： A vapor deposition source (60), a plurality of control plates (80) and a vapor deposition mask (70) are disposed in this order. A substrate (10) is moved relative to the vapor deposition mask in a state in which the substrate and the vapor deposition mask are spaced apart at a fixed interval. Vapor deposition particles (91) discharged from a vapor deposition source opening (61) of the vapor deposition source pass through neighboring inter-control plate spaces (81) and mask openings (71) formed in the vapor deposition mask, and then adhere to the substrate to form a coating film (90). At least a part of the coating film is formed by the vapor deposition particles that have passed through two or more different inter-control plate spaces. It is thereby possible to form a coating film in which edge blur and variations in the thickness are suppressed.

    摘要翻译： 蒸镀源（60），多个控制板（80）和蒸镀掩模（70）依次配置。 在基板和气相沉积掩模以固定间隔间隔开的状态下，基板（10）相对于气相沉积掩模移动。 从气相沉积源的气相沉积源开口（61）排出的气相沉积颗粒（91）通过相邻的控制板间隙（81）和形成在气相沉积掩模中的掩模开口（71），然后粘附到 基板以形成涂膜（90）。 涂膜的至少一部分由已经通过两个或更多个不同的控制间隙的气相沉积颗粒形成。 由此，可以形成抑制边缘模糊和厚度变化的涂膜。

    Crucible and deposition apparatus
    9.
    发明授权
    Crucible and deposition apparatus 有权
    坩埚和沉积设备

    公开(公告)号：US08673082B2

    公开(公告)日：2014-03-18

    申请号：US13980875

    申请日：2012-01-13

    申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

    发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

    IPC分类号： C23C16/00

    CPC分类号： C23C16/448 ,  C23C14/243 ,  C23C16/042 ,  G03B37/06 ,  H01L51/0008

    摘要： A crucible (50) of the present invention includes: an opening (55a) from which vapor deposition particles are injected toward a film formation substrate on which a film is to be formed; a focal point member (54a), provided so as to face the opening (55a), which reflects vapor deposition particles injected from the opening (55a); and a revolution paraboloid (55b) which reflects, toward the film formation substrate, vapor deposition particles which have been reflected by the focal point member (54a).

    摘要翻译： 本发明的坩埚（50）包括：朝向要在其上形成膜的成膜基板上注入蒸镀颗粒的开口（55a） 设置成面对开口（55a）的焦点部件（54a），其反射从开口（55a）喷射的气相沉积粒子; 以及向所述成膜基板反射已被所述焦点部件（54a）反射的气相沉积粒子的旋转抛物面（55b）。

    DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE
    10.
    发明申请
    DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE 审中-公开
    沉积颗粒发射装置，沉积颗粒排放方法和沉积装置

    公开(公告)号：US20140014036A1

    公开(公告)日：2014-01-16

    申请号：US14007956

    申请日：2012-03-23

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L21/02 ,  B65D85/00

    摘要： A vapor deposition particle emitting device of the present invention includes: a nozzle section (110) having emission holes (111) from which gaseous vapor deposition particles are emitted out; a heating plate unit (100), provided in the nozzle section (110), which is made up of heating plates (101) each having a surface on which a vapor deposition material remains as a result of adherence of vapor deposition particles to the surface; and a heating device (160) for heating the vapor deposition material, which is thus remaining on the surface of each of the heating plates (101), so that a temperature of the vapor deposition material is not less than a temperature at which to become transformed into gaseous form.

    摘要翻译： 本发明的气相沉积粒子发射装置包括：喷嘴部分（110），其具有从其中排出气态气相沉积颗粒的发射孔（111）; 设置在所述喷嘴部分（110）中的加热板单元（100），所述加热板单元由加热板（101）组成，所述加热板具有由于气相沉积颗粒粘附到所述表面而具有气相沉积材料的表面的表面 ; 以及用于加热蒸镀材料的加热装置（160），其被保持在每个加热板（101）的表面上，使得蒸镀材料的温度不低于成为 转化成气态。