摘要:
The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which achieves a high average radiation output in the EUV region and sufficiently long life and long-term stability, is met according to the invention in that a first electrode housing and a second electrode housing which are electrically separated from one another so as to be resistant to breakdown form parts of a vacuum chamber for a gas discharge for plasma generation, and the second electrode housing has an electrode collar which is enclosed concentrically by the first electrode housing so that the gas discharge is oriented substantially only parallel to the axis of symmetry of the electrode housings, and the electrode collar is stepped radially relative to the concentric insulator layer in such a way that at least one end region of the electrode collar is at a distance from the concentric insulator layer such that a concentric gap is formed. A substantially longer operating duration is achieved by the optimized electrode geometry in conjunction with material selection and effective heat dissipation.
摘要:
A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween. The external electrode is also formed to shield the outer gas volume and walls of the discharge chamber from the preionization unit. A semi-transparent external electrode prevents charged particles emanating from the main discharge area from settling on the housing and causing field distortion and discharge instabilities.
摘要:
A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.
摘要:
A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.
摘要:
An excimer or molecular fluorine laser includes one or more sliding surface discharge preionization units each including an elongated preionization electrode spaced from one or more associated preionization electrodes by an elongated dielectric within the discharge chamber. The dielectric includes a sliding discharge surface at a long axis, or side, surface of its cross-section substantially facing the discharge volume of the laser. A portion of each of the elongated and associated preionization electrodes conductively contacts a surface of the dielectric portion preferably at a cross-sectional short axis, or top or bottom, side of the dielectric. A significant area of the surface of at least one, and preferably both, of the elongated and associated electrodes contacts the corresponding surface of the dielectric such that the contact area is substantially larger than the area of the sliding discharge surface. Moreover, the sliding surface is preferably oriented and positioned such that generated UV radiation illuminates the laser gas at a substantially central location of the discharge volume.
摘要:
A molecular fluorine (F2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates comprise a material that is substantially transparent at 157 nm, such as CaF2, MgF2, LiF2, BaF2, LiF, SrF2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur®, ultra low expansion glass, and quartz. A beam expander is preferably provided before the etalon for expanding the beam before the beam is incident on the etalon. The beam expander is preferably configured to reduce the divergence of the beam.
摘要:
A method and apparatus are provided for temporally stretching and smoothing of the pulses of an output beam of excimer and lithography lasers. The method and apparatus are based upon providing an optical delay line or circuit having a plurality of optical reflectors and a plurality of beam recombiners or splitters so arranged as to divide the pulse into numerous portions which vary in their travel time through the circuit. As a result, the energy of the incident pulse is greatly stretched and smoothed.
摘要:
A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.
摘要:
The present invention is an apparatus and method for stabilization of laser output beam characteristics by automatically adjusting the angular and the lateral positions of the output beam. A component of the output beam is detected at a far field location and also at a near field location along an optical path of the component. Both the angular and the lateral positions of the output beam are determined, as well as characteristics of the output beam, after the component is detected at both the near and the far field locations. Both the angular position and the lateral position of the output beam are automatically adjusted to optimize the output beam. The adjustment of both the angular position and the lateral position are made possible by using a beam steering device preferably including two mirrors.
摘要:
A final stage capacitance of a pulse compression circuit for an excimer or molecular fluorine lithography laser system is provided by a set of peaking capacitors connected through a first inductance to the electrodes and a set of sustaining capacitors connected to the electrodes through a second inductance substantially greater than the first inductance. Current pulses through the discharge are temporally extended relative to current pulses of a system having its final stage capacitance provided only by a set of peaking capacitors connected to the electrodes via the first inductance. An amplified spontaneous emission (ASE) level in the laser pulses is reduced thereby enhancing their spectral purity.