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38 条记录 (耗时 0.028 秒)

    Method for magnetron sputter deposition
    31.
    发明申请
    Method for magnetron sputter deposition 审中-公开
    磁控溅射沉积方法

    公开(公告)号：US20060076231A1

    公开(公告)日：2006-04-13

    申请号：US10962772

    申请日：2004-10-12

    申请人： Ronghua Wei

    发明人： Ronghua Wei

    IPC分类号： C23C14/00 ,  C23C14/32

    CPC分类号： H01J37/3405 ,  C23C14/046 ,  C23C14/35

    摘要： A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an interior surface substantially defining a bore having a longitudinal axis; positioning a magnetron within thed bore along substantially the length of said longitudinal axis and substantially radially equidistant from the interior surface, said magnetron comprising an external sputter target material; and, generating a circumferential magnetic field about the sputter target material for a time and under sputter deposition conditions effective to produce an interior surface comprising a substantially uniform coating comprising said sputter target material.

    摘要翻译： 一种在中空工件的内表面上沉积涂层的方法。 所述方法包括在真空室中设置所述中空工件，所述中空工件包括基本上限定具有纵向轴线的孔的内表面; 将磁控管沿所述纵向轴线的大致长度定位在所述钻孔内，并且与所述内表面基本上径向等距离地定位，所述磁控管包括外部溅射靶材料; 以及在有效产生包括包括所述溅射靶材料的基本上均匀的涂层的内表面的时间和溅射沉积条件下，围绕溅射靶材料产生周向磁场。

    Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings
    34.
    发明授权
    Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings 有权
    耐氧化纳米晶MCrAl（Y）涂层和形成这种涂层的方法

    公开(公告)号：US08790791B2

    公开(公告)日：2014-07-29

    申请号：US12760864

    申请日：2010-04-15

    申请人： Narayana S. Cheruvu ,  Ronghua Wei

    发明人： Narayana S. Cheruvu ,  Ronghua Wei

    IPC分类号： B32B15/04 ,  C23C14/18 ,  C23C14/35 ,  C23C14/16 ,  C22C19/07 ,  C22C38/00 ,  C22C30/00 ,  C22C19/05 ,  C23C14/34

    CPC分类号： C23C14/165 ,  C22C19/05 ,  C22C19/07 ,  C22C30/00 ,  C22C38/00 ,  C23C14/345 ,  C23C14/354 ,  Y10T428/12014 ,  Y10T428/12576

    摘要： The present disclosure relates to an oxidation resistant nanocrystalline coating and a method of forming an oxidation resistant nanocrystalline coating. An oxidation resistant coating comprising an MCrAl(Y) alloy may be deposited on a substrate, wherein M, includes iron, nickel, cobalt, or combinations thereof present greater than 50 wt % of the MCrAl(Y) alloy, chromium is present in the range of 15 wt % to 30 wt % of the MCrAl(Y) alloy, aluminum is present in the range of 6 wt % to 12 wt % of the MCrAl(Y) alloy and yttrium, is optionally present in the range of 0.1 wt % to 0.5 wt % of the MCrAl(Y) alloy. In addition, the coating may exhibit a grain size of 200 nm or less as deposited.

    摘要翻译： 本公开内容涉及抗氧化纳米晶体涂层和形成耐氧化纳米晶体涂层的方法。 包含MCrAl（Y）合金的抗氧化涂层可以沉积在基底上，其中M包括大于MCrAl（Y）合金的50重量％的铁，镍，钴或其组合，铬存在于 范围为MCrAl（Y）合金的15重量％〜30重量％，铝以MCrAl（Y）合金和钇的6重量％〜12重量％的范围存在，任选以0.1重量％ ％至0.5wt％的MCrAl（Y）合金。 此外，涂层可以表现出沉积的200nm或更小的晶粒尺寸。

    Processing Tubular Surfaces Using Double Glow Discharge
    35.
    发明申请
    Processing Tubular Surfaces Using Double Glow Discharge 有权
    使用双辉光放电处理管状表面

    公开(公告)号：US20100006421A1

    公开(公告)日：2010-01-14

    申请号：US12169837

    申请日：2008-07-09

    申请人： Ronghua Wei

    发明人： Ronghua Wei

    IPC分类号： C23C14/34

    CPC分类号： C23C14/345 ,  C23C14/046 ,  C23C14/16 ,  C23C14/165 ,  C23C14/48 ,  C23C14/541

    摘要： A method of sputtering a component includes positioning a conductive substrate into a vacuum chamber, wherein the conductive substrate is tubular and has a surface. A source electrode including a source material may be inserted into the conductive substrate. A first bias voltage ΔVac1 may be applied between the conductive substrate and the vacuum chamber and a second bias voltage ΔVas1 may be applied between the source electrode and the vacuum chamber, sputtering the source material onto the conductive substrate.

    摘要翻译： 溅射部件的方法包括将导电基板定位到真空室中，其中导电基板是管状的并具有表面。 可以将包括源材料的源电极插入到导电基板中。 可以在导电基板和真空室之间施加第一偏置电压DeltaVac1，并且可以在源电极和真空室之间施加第二偏置电压DeltaVas1，将源材料溅射到导电基板上。

    Magnetron sputtering apparatus and method for depositing a coating using same
    36.
    发明授权
    Magnetron sputtering apparatus and method for depositing a coating using same 有权
    磁控管溅射装置和使用其沉积涂层的方法

    公开(公告)号：US07520965B2

    公开(公告)日：2009-04-21

    申请号：US10963341

    申请日：2004-10-12

    申请人： Ronghua Wei

    发明人： Ronghua Wei

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3405 ,  C23C14/046 ,  C23C14/0641 ,  C23C14/35 ,  H01J37/3452

    摘要： A method for depositing a coating using a magnetron sputtering apparatus and a magnetron sputtering apparatus comprising: a support structure comprising a hollowed shaft comprising a central conduit having a longitudinal axis; a sputter target material defining a bore which is external to the central conduit, the bore also having the longitudinal axis a magnet assembly supported about the support structure, the magnet assembly having a first end, a second end, and a plurality of magnets supported therebetween and being effective, upon rotation, to generate a circumferential external magnetic field about the sputter target material; a first sealed end extending radially inward from adjacent the sputter target material proximate the first end of the magnet assembly and a second sealed end extending radially inward from adjacent the sputter target material proximate the second end of the magnet assembly, wherein the first sealed end, the second sealed end, and the sputter target material seal the magnet assembly therebetween; a cooling system comprising one or more coolant passage extending through the magnet assembly, the central conduit comprising a coolant inlet and a coolant outlet at the first sealed end; and, one or more rotors supported about the support structure and rotatable therewith by coolant passing through the one or more coolant passages.

    摘要翻译： 一种使用磁控溅射装置和磁控管溅射装置沉积涂层的方法，包括：支撑结构，其包括中空轴，所述中空轴包括具有纵向轴线的中心导管; 限定在中心导管外部的孔的溅射靶材料，所述孔还具有围绕所述支撑结构支撑的所述纵向轴线的磁体组件，所述磁体组件具有第一端部，第二端部和在其间支撑的多个磁体 并且在旋转时有效地围绕溅射靶材料产生周向的外部磁场; 靠近所述磁体组件的第一端处从所述溅射靶材料附近径向向内延伸的第一密封端和靠近所述磁体组件的所述第二端处从所述溅射靶材料的附近径向向内延伸的第二密封端，其中所述第一密封端， 第二密封端，并且溅射靶材料将磁体组件密封在其间; 冷却系统，包括延伸穿过所述磁体组件的一个或多个冷却剂通道，所述中心导管包括在所述第一密封端处的冷却剂入口和冷却剂出口; 并且一个或多个转子支撑在支撑结构上并且随着通过一个或多个冷却剂通道的冷却剂随之旋转。

    Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces
    38.
    发明授权
    Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces 失效

    公开(公告)号：US06767436B2

    公开(公告)日：2004-07-27

    申请号：US10256151

    申请日：2002-09-25

    申请人： Ronghua Wei

    发明人： Ronghua Wei

    IPC分类号： C23C1434

    CPC分类号： C23C14/046 ,  C23C14/022 ,  C23C14/345 ,  C23C14/35 ,  C23C14/355 ,  H01J37/3405 ,  H01J37/342 ,  H01J37/3452 ,  H01J37/3497

    摘要： A plasma-enhanced coaxial magnetron sputter-cleaning and coating assembly for sputter-cleaning and coating the interior surfaces of a cylindrical workpiece is provided. The apparatus sputter-coats the workpiece using a cylindrical sputtering material, the material having an interior and an exterior. The apparatus includes a core cooling system surrounded by a ring magnet assembly including a plurality of axially aligned ring magnets, with the core cooling system and the ring magnet assembly axially aligned with, and residing in the interior of, the cylindrical sputtering material. A cylindrical-shaped filament circumferentially surrounds the exterior of the cylindrical sputtering material. An anode comprised of a wire screen circumferentially surrounds, and is external to the filament; whereby the apparatus for plasma-enhanced coaxial magnetron sputter-cleaning and coating may be housed inside the workpiece in order to sputter-clean and coat the interior of the workpiece.