ABS through aggressive stitching
    31.
    发明授权
    ABS through aggressive stitching 失效
    ABS通过积极的拼接

    公开(公告)号:US07251102B2

    公开(公告)日:2007-07-31

    申请号:US10782496

    申请日:2004-02-19

    IPC分类号: G11B5/127

    摘要: Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electro-plated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.

    摘要翻译: 积极(即紧公差)缝合为磁性写入头提供了几个优点,但是在极修整期间以一些损失为代价。 通过用一层电镀材料代替在修整期间用于保护缝合极的氧化铝填料层已经克服了这个问题。 由于与沉积电镀方法相关的优越的台阶覆盖,因此可以进行极细修剪,而不会在缝合极被修剪时引入应力。

    Low DC coil resistance planar writer
    32.
    发明授权
    Low DC coil resistance planar writer 失效
    低直流线圈电阻平面写入器

    公开(公告)号:US07126789B2

    公开(公告)日:2006-10-24

    申请号:US10633133

    申请日:2003-08-01

    IPC分类号: G11B5/147

    CPC分类号: G11B5/3103 Y10T29/49032

    摘要: Present processes used for planarizing a cavity filled with a coil and hard baked photoresist require that a significant amount of the thickness of the coils be removed. This increases the DC resistance of the coil. In the present invention, CMP is terminated as soon as the coils are exposed, allowing their full thickness to be retained and resulting in minimum DC resistance. Application of this process to the manufacture of a planar magnetic write head is described.

    摘要翻译: 用于平坦化填充有线圈和硬烘烤光致抗蚀剂的空腔的现有方法需要去除大量的线圈厚度。 这增加了线圈的直流电阻。 在本发明中,一旦线圈暴露,CMP就终止,允许其保持其全部厚度并且导致最小的直流电阻。 描述了该方法在平面磁写头的制造中的应用。

    Stitched write head design having a sunken shared pole
    38.
    发明授权
    Stitched write head design having a sunken shared pole 失效
    拼接写头设计有一个凹陷的共享极点

    公开(公告)号:US06469875B1

    公开(公告)日:2002-10-22

    申请号:US09525672

    申请日:2000-03-15

    IPC分类号: G11B539

    摘要: A structure and a method for a stitched write head having a sunken share pole. The method includes forming a bottom coil dielectric layer over the first half shared pole. Coils are formed over the bottom coil dielectric layer. Next, second half shared poles (P1) are formed over the first half shared pole (S2). We form a top coil dielectric layer over the structure. In a key step, we chemical-mechanical polish the top coil dielectric layer. A write gap layer (WG) is formed over the front second half shared pole and the top coil dielectric layer over the coils. An upper pole (P3) and hard mask are formed over the write gap layer. We etch the write gap layer and the second half shared pole (P1) using the upper pole as an etch mask to remove a portion of the second half shared pole (P1) adjacent to the write gap layer thereby forming a partially trimmed pole.

    摘要翻译: 一种具有凹陷的共享极的缝合写头的结构和方法。 该方法包括在第一半共享极上形成底部线圈电介质层。 线圈形成在底部线圈电介质层上。 接下来,在第一半共享极(S2)上形成第二半共享极(P1)。 我们在结构上形成顶层线圈介电层。 在关键步骤中,我们化学机械抛光顶层线圈介电层。 写入间隙层(WG)形成在线圈上的前第二半共享极和顶部线圈电介质层上。 在写间隙层上形成上极(P3)和硬掩模。 我们使用上极蚀刻写间隙层和第二半共享极(P1)作为蚀刻掩模,以去除与写间隙层相邻的第二半共享极(P1)的一部分,从而形成部分修整的极。

    Ion implantation method for fabricating magnetoresistive (MR) sensor element
    40.
    发明授权
    Ion implantation method for fabricating magnetoresistive (MR) sensor element 失效
    用于制造磁阻(MR)传感器元件的离子注入方法

    公开(公告)号:US06383574B1

    公开(公告)日:2002-05-07

    申请号:US09360118

    申请日:1999-07-23

    IPC分类号: B05D500

    摘要: A method for forming a magnetoresistive (MR) layer first employs a substrate over which is formed a magnetoresistive (MR) layer formed of a magnetoresistive (MR) material. There is then ion implanted selectively, while employing an ion implant method, the magnetoresistive (MR) layer to form: (1) an ion implanted portion of the magnetoresistive (MR) layer formed of an ion implanted magnetoresistive (MR) material; and (2) an adjoining non ion implanted portion of the magnetoresistive (MR) layer formed of the magnetoresistive (MR) material, where the ion implanted magnetoresistive (MR) material is a non magnetoresistive (MR) material. The method may be employed for forming within magnetoresistive (MR) sensor elements magnetoresistive (MR) layers with enhanced dimensional uniformity, and in particular enhanced overlay dimensional uniformity.

    摘要翻译: 形成磁阻(MR)层的方法首先采用形成由磁阻(MR)材料形成的磁阻(MR)层的衬底。 然后选择性地离子注入,同时采用离子注入法,磁阻(MR)层形成:(1)由离子注入的磁阻(MR)材料形成的磁阻(MR)层的离子注入部分; 和(2)由磁阻(MR)材料形成的磁阻(MR)层的邻接非离子注入部分,其中离子注入磁阻(MR)材料是非磁阻(MR)材料。 该方法可以用于在具有增强的尺寸均匀性的磁阻(MR)传感器元件磁阻(MR)层内形成,特别是增强的覆盖尺寸均匀性。