公开(公告)号：US20020094664A1

公开(公告)日：2002-07-18

申请号：US09764195

申请日：2001-01-16

申请人： Etec Systems, Inc.

发明人： Bart Scholte van Mast

IPC分类号： H01L021/322

CPC分类号： H01L21/02046 ,  B08B7/0035 ,  H01L21/67028

摘要： A method and apparatus for removal of volatile contaminants from substrate surfaces before the substrate enters a process chamber. Substrate cleaning is achieved by irradiating the substrate with a low-energy electron beam. The interaction of the electrons in the beam with the contaminants present on the surface of the substrate causes evaporation of low vapor pressure species which can be deposited on the surface. A cryoshield pumps the evaporated species. After evaporation and pumping, the substrate passes through a glow discharge chamber wherein the negative surface charge created by the electron beam is neutralized using positive ions. The inventive apparatus can be configured so that no separate vacuum chamber is needed to prepare the substrate.

摘要翻译： 一种用于在衬底进入处理室之前从衬底表面去除挥发性污染物的方法和装置。 通过用低能电子束照射基板来实现基板清洁。 光束中的电子与存在于衬底表面上的污染物的相互作用导致可沉积在表面上的低蒸气压物质的蒸发。 cryoshield泵蒸发的物种。 在蒸发和泵送之后，衬底通过辉光放电室，其中由电子束产生的负表面电荷被正离子中和。 本发明的装置可以被配置为使得不需要单独的真空室来制备基板。

公开(公告)号：US5900667A

公开(公告)日：1999-05-04

申请号：US726449

申请日：1996-10-04

申请人： Lee H. Veneklasen ,  Rudy F. Garcia

发明人： Lee H. Veneklasen ,  Rudy F. Garcia

IPC分类号： H01J37/244 ,  H01L31/115 ,  G01J1/20 ,  H01L27/14 ,  H01L31/00

CPC分类号： H01J37/244 ,  H01J2237/2441 ,  H01J2237/24465

摘要： A solid state electron or x-ray detector is mounted within the time-varying magnetic deflection fields of a charged particle beam system. A minimum volume of high resistivity conductors and insulating materials are used in the mounting to minimize eddy currents that otherwise cause dynamic deflection distortions. Segmented conductive elastomer members make electrical and mechanical contact with the active surface of the detector. A flexible PC board connects the detector active areas to external signal processing electronics.

摘要翻译： 固态电子或X射线检测器安装在带电粒子束系统的时变磁偏转场内。 在安装中使用最小体积的高电阻率导体和绝缘材料，以最小化导致动态偏转失真的涡流。 分段的导电弹性体构件与检测器的有源表面电气和机械接触。 灵活的PC板将检测器有效区域连接到外部信号处理电子设备。

公开(公告)号：US5815245A

公开(公告)日：1998-09-29

申请号：US410601

申请日：1995-03-22

申请人： Timothy N. Thomas ,  Paul C. Allen

发明人： Timothy N. Thomas ,  Paul C. Allen

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/68 ,  G03B27/70

CPC分类号： G03F7/70691 ,  G02B17/008 ,  G03F7/70225 ,  G03F7/70358

摘要： A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.

摘要翻译： 小场扫描光刻系统使用掩模版和坯料的相反运动来补偿诸如常规Wynne-Dyson光学系统的投影系统的图像反转，该系统在空白上形成回复图像。 标线具有恢复的图案。 在扫描期间，光罩沿着与坯件移动方向相反的方向沿着回复的轴线移动。 相反的动作可以在空白处暴露一条条纹，也可以标记掩模版和空白以曝光下一条纹。 在本发明的一个实施例中，标线片和坯料在可独立移动的精密空气轴承平台上。 通常，坯料和掩模版沿着回复的轴线垂直于反转的轴线并且沿相反的方向一起移动。 阶段可以移动掩模版和空白不同的量以校正收缩和温度变化，这导致标线和空白的尺寸不同。

公开(公告)号：US5784925A

公开(公告)日：1998-07-28

申请号：US766271

申请日：1996-12-13

申请人： David Trost ,  Lee Veneklasen

发明人： David Trost ,  Lee Veneklasen

IPC分类号： F16C29/00 ,  F16C29/02 ,  F16C32/06 ,  G03F7/20 ,  H01J37/20 ,  H01J37/305 ,  H01L21/027 ,  G05G11/00 ,  F16C33/06 ,  F16J15/52

CPC分类号： F16C32/06 ,  F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  G03F7/70716 ,  G03F7/70816 ,  H01J37/20 ,  F16C2300/62 ,  H01J2237/20221 ,  H01J2237/3175 ,  Y10S277/913 ,  Y10T74/20354

摘要： A vacuum compatible linear motion device having a fluid bearing is contained within a vacuum chamber having a working pressure of significantly less than one atmosphere. The fluid bearing is contained within a vacuum enclosure within the vacuum chamber and is maintained at a pressure higher than that of the vacuum chamber but less than one atmosphere, thus essentially isolating the fluid bearing. A moveable payload is coupled to the linear motion device such that linear motion in the direction of the long axis of the device is provided to the moveable payload.

摘要翻译： 具有流体轴承的真空兼容的直线运动装置包含在具有明显小于一个大气压的工作压力的真空室内。 流体轴承包含在真空室内的真空外壳内，并保持在比真空室高的压力，但小于一个大气压，因此基本上隔离流体轴承。 可移动有效载荷耦合到线性运动装置，使得在装置的长轴方向上的线性运动被提供给可移动的有效载荷。

公开(公告)号：US5757469A

公开(公告)日：1998-05-26

申请号：US412232

申请日：1995-03-22

申请人： Paul C. Allen

发明人： Paul C. Allen

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B17/008 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70358

摘要： A small field scanning photolithography system has a double pass Wynne-Dyson optical system which provides an erect, non-reverted, unmagnified image. An optical path through the system passes from an object, reflects off an input reflector, passes through a first quadrant of a lens, reflects off a concave mirror, passes through a second quadrant of the lens into folding optics where an intermediate image forms, passes from the folding optics through a third quadrant of the lens, reflects off the concave mirror a second time, passes through a fourth quadrant of the lens, and finally reflects off an output reflector to a plane where a final image forms. Typically, the input and output reflectors and the folding optics are prisms. A field stop may be provided in the folding optics where the intermediate image forms. Magnification adjusting optics can be added to the input and output prisms or to the folding optics. The magnification adjusting optics forms two narrow meniscus air gaps which are equal size for unity magnification. Narrowing one air gap and widening the other air gap changes magnification slightly.

摘要翻译： 小场扫描光刻系统具有双通道Wynne-Dyson光学系统，其提供直立的，未回复的非放大图像。 通过系统的光路从物体通过，从输入反射器反射，穿过透镜的第一象限，从凹面镜反射，穿透透镜的第二象限到中间图像形成的折叠光学器件，通过 从折叠光学透镜透镜的第三象限，第二次从凹面镜反射，穿过透镜的第四象限，最后将输出反射器反射到最终图像形成的平面上。 通常，输入和输出反射器和折叠光学器件是棱镜。 可以在中间图像形成的折叠光学器件中提供场停止。 放大调整光学元件可以添加到输入和输出棱镜或折叠光学元件。 倍率调节光学器件形成两个窄的弯月面气隙，其尺寸相等于单位放大率。 缩小一个气隙并加宽其他气隙，稍微改变放大。

公开(公告)号：US5533170A

公开(公告)日：1996-07-02

申请号：US344417

申请日：1994-11-22

申请人： Robin L. Teitzel ,  Matthew J. Jolley ,  James B. Campbell ,  Richard K. George ,  John Wipfli

发明人： Robin L. Teitzel ,  Matthew J. Jolley ,  James B. Campbell ,  Richard K. George ,  John Wipfli

IPC分类号： G03F1/08 ,  G03F7/20 ,  G06T11/20 ,  H01L21/027 ,  G06K15/00

CPC分类号： G03F7/704 ,  G03F7/70508 ,  G06T11/203

摘要： A rasterizer for generating pixel values for a pattern generation apparatus. The pixel values drive the printing mechanism of the pattern generation apparatus. The rasterizer receives a file defining the pattern to be printed, fractures the pattern into sub frames, rasterizes each sub frame and then coordinates the provision of the shaded pixel values to the pattern generation apparatus. The rasterizer of the present invention is comprised primarily of a host processing means for fracturing and translating the file into one or more sub frames of pixels; geometry engines for rasterizing each sub frame; beam boards for providing the pixel shading values to a pattern generation system; a serial bus for coupling the host processor means to the geometry engines and beam boards and a pixel bus for coupling each of the geometry engines to each of the beam boards.

摘要翻译： 一种用于生成图案生成装置的像素值的光栅化器。 像素值驱动图案生成装置的打印机构。 光栅化器接收定义要打印的图案的文件，将图案断裂成子帧，对每个子帧进行光栅化，然后协调向图案生成装置提供阴影像素值。 本发明的光栅化器主要包括用于将文件压缩并转换成一个或多个像素子帧的主机处理装置; 用于光栅化每个子帧的几何引擎; 光束板，用于将像素着色值提供给图案生成系统; 用于将主处理器装置耦合到几何引擎和波束板的串行总线和用于将每个几何引擎耦合到每个波束板的像素总线。

公开(公告)号：US5393987A

公开(公告)日：1995-02-28

申请号：US69222

申请日：1993-05-28

申请人： Frank E. Abboud ,  Andrew J. Muray ,  C. Neil Berglund

发明人： Frank E. Abboud ,  Andrew J. Muray ,  C. Neil Berglund

IPC分类号： H01J37/305 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/30488

摘要： A raster scan lithography system is modified so that the duration of illumination (dose modulation) for particular pixels is varied to lie between the full on and full off normally used. For instance, three levels of pixel intensity are provided, 100%, 70% and 30% (in addition to off which is 0%). The 30% and 70% pixels are used along the edge of a feature so as to locate the edge when written in between the lines of the cartesian raster scan grid. Thus the edges of the feature are moved off the grid, without the need for multiple passes. This pixel dose modulation uses three preset delay lines determining dwell times for each pixel on a pixel-by-pixel basis, as defined by a two (or more) bit deep memory file associated with the pattern to be written. Additionally, the pixel center locations are directly moved off the grid by deflecting the beam as it scans certain pixels located along feature edges. The amount of deflection is controllably variable to achieve various edge locations. This deflection is used by itself or in combination with dose modulation, and is implemented by an electrostatic deflector in the beam lens for an E-beam system.

摘要翻译： 修改光栅扫描光刻系统，使特定像素的照明持续时间（剂量调制）变化，以处于正常使用的全开和关闭之间。 例如，提供三个等级的像素强度，100％，70％和30％（除了0％之外）。 沿着特征的边缘使用30％和70％的像素，以便在写入笛卡尔光栅扫描网格的线之间时定位边缘。 因此，特征的边缘从网格移开，而不需要多遍。 该像素剂量调制使用三个预设延迟线来确定每个像素在逐个像素的基础上的停留时间，如由要写入的图案相关联的两个（或多个）位深存储器文件所定义的。 此外，像素中心位置通过在扫描沿着特征边缘定位的某些像素时偏转光束而直接从网格移开。 偏转量可控地变化以实现各种边缘位置。 该偏转本身或与剂量调制结合使用，并且由电子束系统的束透镜中的静电偏转器实现。

公开(公告)号：US5345085A

公开(公告)日：1994-09-06

申请号：US37964

申请日：1993-03-26

申请人： Richard W. Prior

发明人： Richard W. Prior

IPC分类号： H01L21/027 ,  G01T1/29 ,  H01J37/304

CPC分类号： G01T1/29 ,  H01J37/304 ,  H01J2237/24507 ,  H01J2237/3045

摘要： A method of electronically measuring parameters of an beam in a raster scan system includes the steps of: choosing a predetermined pixel to be calibrated, moving a grid adjacent this pixel, strobing the beam, incrementally moving the beam toward an axis of the grid, and integrating the signal resulting from the beam as the beam moves toward the axis. The steps of strobing the beam, incrementally moving the beam, and integrating the signal are repeated until the beam crosses the axis. The value of the accumulated signals, provided for example by a charge amplifier, is used to determine the relative position of the axis of the grid. The value of the accumulated signals associated with another axis is also determined. The relative positions of the two axes determine the relative location of the grid. If the grid location is known, the location of an associated substrate which is typically adjacent the grid is also known.

摘要翻译： 一种在光栅扫描系统中电子测量光束参数的方法包括以下步骤：选择要校准的预定像素，移动与该像素相邻的栅格，选通光束，将光束向网格的轴逐渐移动;以及 当光束朝向轴移动时，对从光束产生的信号进行积分。 重复选择光束，逐渐移动光束和积分信号的步骤，直到光束穿过光轴。 使用例如由电荷放大器提供的累加信号的值用于确定电网的轴的相对位置。 还确定与另一轴相关联的累加信号的值。 两个轴的相对位置决定了网格的相对位置。 如果网格位置是已知的，则通常与网格相邻的相关联的基底的位置也是已知的。

公开(公告)号：US5327338A

公开(公告)日：1994-07-05

申请号：US973567

申请日：1992-11-09

申请人： Paul Allen ,  Mike Bohan ,  Tim Thomas ,  Robin Teitzel

发明人： Paul Allen ,  Mike Bohan ,  Tim Thomas ,  Robin Teitzel

IPC分类号： G03F7/20 ,  B41J2/435

CPC分类号： G03F7/704

摘要： A direct-write lithography tool having improved alignment characteristics. The present invention discloses use of an optical alignment apparatus in a multi-beam lithography system. The optical alignment apparatus provides for alignment through a reduction lens utilized by the multi-beam lithography system for writing to semiconductor wafers and the like through use of optics for correction of distortion and curvature caused by viewing with a radiant energy beam of a different wavelength than the beams used for writing. Further, the alignment optics provide for multiple paths in a single optics system through use of liquid crystal retarders and beam splitters to direct the radiant energy beam through a selected optical path. In the present invention, a first optical path may provide for high magnification and a second for low magnification. Further, other optical paths may provide for bright or dark field illumination and viewing.

摘要翻译： 具有改进的对准特性的直写光刻工具。 本发明公开了在多光束光刻系统中使用光学对准装置。 光学对准装置通过多光束光刻系统使用的还原透镜进行对准，用于通过使用用于校正由不同波长的辐射能量束观察引起的失真和曲率的光学元件来写入半导体晶片等 梁用于书写。 此外，对准光学器件通过使用液晶延迟器和分束器来引导辐射能量束通过所选择的光路而在单个光学系统中提供多个路径。 在本发明中，第一光路可以提供高倍率，而第二光路可以提供低放大率。 此外，其他光路可以提供亮场或暗场照明和观看。

公开(公告)号：US5255051A

公开(公告)日：1993-10-19

申请号：US676

申请日：1993-01-05

申请人： Paul C. Allen

发明人： Paul C. Allen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70058 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70725

摘要： A method and apparatus for printing arbitrarily large circuit patterns using small field optics. The use of small field imaging optics allows the use of high NA lens designs capable of printing smaller geometries than otherwise would be possible. The field size in a first axis is extended by scanning an object and image past the lens; the field size in a second axis is extended by stitching the scans together in an overlapped fashion. This overlapped printing technique averages many random and systematic errors and allows the placement of field adjacencies within die boundaries. The effective field size of such a system is limited only by reticle size and stage mechanics. The apparatus further includes error correction loops for enhancing stage synchronization accuracy and for reducing field adjacency errors.