公开(公告)号：US20100201978A1

公开(公告)日：2010-08-12

申请号：US12450402

申请日：2008-03-24

Applicant: Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

Inventor： Masaru Hori ,  Hiroyuki Kano ,  Shoji Den

IPC: G01N21/31

CPC classification number: H05H1/0025 ,  G01N21/15 ,  G01N21/3103 ,  G01N2021/158 ,  G01N2201/023 ,  G01N2201/0233 ,  G01N2201/061

Abstract: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere.The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode. The light source further includes a hole 47 axially penetrating the center portions of the first electrode, the insulating spacer, and the second electrode; and an electric discharge gas passage for introducing an electric discharge gas, along the inner wall of the cooling medium passage, to the back surface of the lens so that the electric discharge gas is reflected by the lens and flows through the hole.

Abstract translation: 提供一种实现等离子体气氛的粒子密度的精确测定而不干扰等离子体气氛的状态的光源。 本发明的光源包括管状壳体12; 用于使冷却介质流过其中的冷却介质通道30，所述通道沿着所述壳体的内壁设置; 设置在所述壳体的前端的透镜50; 第一电极44和第二电极45，其设置在壳体内并且在透镜之前垂直于壳体的轴线并且彼此平行; 以及设置在第一电极和第二电极之间的绝缘间隔件46。 光源还包括轴向穿过第一电极，绝缘间隔物和第二电极的中心部分的孔47; 以及放电气体通道，用于沿着冷却介质通道的内壁将放电气体引导到透镜的背面，使得放电气体被透镜反射并流过孔。

公开(公告)号：US20100169027A1

公开(公告)日：2010-07-01

申请号：US12347368

申请日：2008-12-31

Applicant: Xuejiao Hu ,  Alfred Feitisch

Inventor： Xuejiao Hu ,  Alfred Feitisch

IPC: G01N21/59 ,  G01K11/30

CPC classification number: G01N21/39 ,  G01N2201/022 ,  G01N2201/023 ,  G01N2201/0231

Abstract: Thermally controlled enclosures that can be used with gas analyzers are described. The enclosures incorporate one or more phase changing materials that buffer ambient and internal heat loads to reduce the power consumption demand of mechanical or electronic heating apparatus. Maintenance of gas analyzer equipment at a consistent temperature can be important to achieving stable and reproducible results. Related systems, apparatus, methods, and/or articles are also described.

Abstract translation: 描述了可用于气体分析仪的热控制外壳。 外壳采用缓冲环境和内部热负荷的一种或多种相变材料，以减少机械或电子加热设备的功耗需求。 在一致的温度下维护气体分析仪设备对于获得稳定和可重现的结果是重要的。 还描述了相关系统，装置，方法和/或制品。

公开(公告)号：US07482596B2

公开(公告)日：2009-01-27

申请号：US10958665

申请日：2004-10-06

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01J1/42

CPC classification number: G01N21/211 ,  G01N21/01 ,  G01N2201/023

Abstract: A method and system are presented for use in optical processing of an article by VUV radiation. The method comprises: localizing incident VUV radiation propagation from an optical head assembly towards a processing site on the article outside the optical head assembly and localizing reflected VUV radiation propagation from said processing site towards the optical head assembly by localizing a medium, non-absorbing with respect to VUV radiation, in within the light propagation path in the vicinity of said site outside the optical head assembly. The level of the medium is controlled by measuring the reflected VUV radiation.

Abstract translation: 提出了一种用于通过VUV辐射对物品进行光学处理的方法和系统。 该方法包括：将来自光学头组件的入射VUV辐射传播定位到光学头组件外部的制品上的处理位置，并将来自所述处理部位的反射的VUV辐射传播定位到光学头组件，定位介质，不吸收 相对于在光学头组件外部的所述位置附近的光传播路径内的VUV辐射。 通过测量反射的VUV辐射来控制介质的水平。

公开(公告)号：US20050277209A1

公开(公告)日：2005-12-15

申请号：US10644745

申请日：2003-08-21

Applicant: Hideki Tanaka

Inventor： Hideki Tanaka

IPC: C23C16/505 ,  G01J1/00 ,  G01N21/68 ,  G01R31/26 ,  G01T1/24 ,  H01J37/32 ,  H01L21/00 ,  H01L21/3065 ,  H01L21/66

CPC classification number: H01J37/32935 ,  G01N21/68 ,  G01N2201/0227 ,  G01N2201/023

Abstract: In a plasma processing apparatus that forms plasma from a process gas by supplying the process gas into a processing container and applying high-frequency power to an electrode provided inside the processing container on which a workpiece is placed and executes specific plasma processing on the processing surface of the workpiece, apparatus state parameter data indicating a state of the plasma processing apparatus are obtained through measurement executed by a parameter measuring instrument, optical data are obtained through measurement executed by an optical measuring instrument and electrical data are obtained through measurement executed by an electrical measuring instrument. A means for plasma leak judgment judges that a plasma leak has occurred if there is a fluctuation in the data.

Abstract translation: 在等离子体处理装置中，通过将处理气体供给到处理容器中并将高频电力施加在设置有工件的处理容器内部的电极上，从而从处理气体形成等离子体，并对处理面进行特定的等离子体处理 通过由参数测量仪器执行的测量获得指示等离子体处理装置的状态的装置状态参数数据，通过光学测量仪器执行的测量获得光学数据，并且通过由电气执行的测量获得电气数据 测量仪器。 用于等离子体泄漏判定的装置判断如果数据有波动，则发生等离子体泄漏。

公开(公告)号：US06930771B2

公开(公告)日：2005-08-16

申请号：US10717316

申请日：2003-11-19

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J4/04 ,  G01N21/21 ,  G01N21/95 ,  H01L21/00 ,  H01L21/306 ,  H01L21/66 ,  G01N21/00

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

公开(公告)号：US20240060873A1

公开(公告)日：2024-02-22

申请号：US18382047

申请日：2023-10-19

Applicant: iSud Solutions GmbH

Inventor： Joachim Mannhardt

IPC: G01N21/01 ,  G01N21/31

CPC classification number: G01N21/01 ,  G01N21/31 ,  G01N2201/022 ,  G01N2201/127 ,  G01N2201/023

Abstract: An optical analysis device for determining at least one characteristic of a medium in a process environment or a laboratory environment is provided. The optical analysis device includes an optical measuring arrangement with a plurality of components arranged in an interior space of a housing. The housing has at least one entry/exit area for the entry and/or exit of optical radiation, and a mechanical interface for a positionally accurate detachable attachment of the optical analysis device to a location of operation, in particular in a process environment. Advantageously, the mechanical interface spatially overlaps with the optical radiation entry/exit area. This enables fast assembly and disassembly of the optical analysis device in different locations of use.

公开(公告)号：US11852582B2

公开(公告)日：2023-12-26

申请号：US17879665

申请日：2022-08-02

Applicant: East China Normal University

Inventor： Liangqing Zhu ,  Junli Wang ,  Liyan Shang ,  Le Wang ,  Zhigao Hu

IPC: G01N21/35 ,  G01N21/3563 ,  G01N21/01

CPC classification number: G01N21/3563 ,  G01N21/01 ,  G01N2021/3595 ,  G01N2201/023

Abstract: An automatic photocurrent spectrum measurement system based on a Fourier infrared spectrometer, including a light source component, an environment control component, a measuring module, and a control module. The system is configured to evaluate photoelectric performance semiconductor materials or devices under different temperatures, voltage biases or current biases.

公开(公告)号：US20230304936A1

公开(公告)日：2023-09-28

申请号：US18318045

申请日：2023-05-16

Applicant: SHENYANG INSTITUTE OF AUTOMATION, CHINESE ACADEMY OF SCIENCES

Inventor： Lanxiang SUN ,  Haibin YU ,  Shuo LI ,  Zhibo CONG ,  Yang LI ,  Wei DONG

IPC: G01N21/71

CPC classification number: G01N21/718 ,  G01N2201/023 ,  G01N2201/0218

Abstract: An online detection device underwater elements includes an LIBS system in a sealing pressure chamber and an external airflow control system. The airflow control system has a gas probe bin and a gas source. An opening is formed at one end of the gas probe bin while the other end and the sealing pressure chamber are hermetically partitioned through a glass window. A laser in the LIES system outputs laser to an underwater object surface to be detected for generating plasma spectra. A spectrometer collects plasma spectra returned along an original optical path. When the device operates in water, the balance gas storage tank produces gas with the same pressure as underwater. A flow model is invoked according to the current water pressure to accurately control the air flow rate to form a stable gas environment in the gas probe, which improves the plasma excitation and collection efficiency.

公开(公告)号：US20180224357A1

公开(公告)日：2018-08-09

申请号：US15873847

申请日：2018-01-17

Applicant: Christopher James Hintz ,  Kenneth J. Hintz

Inventor： Christopher James Hintz ,  Kenneth J. Hintz

IPC: G01N1/28 ,  G01N21/3577

CPC classification number: G01N1/286 ,  G01N21/3504 ,  G01N21/3577 ,  G01N2021/1723 ,  G01N2201/023

Abstract: Embodiments of the present disclosure demonstrate cavitating measuring devices. A liquid sample is cavitated to generate bubbles of gas. A frequency-specific radiation is emitted and passes through at least one bubble of gas. The frequency-specific radiation emerges from the bubble of gas as an absorption signal comprising the frequency-specific radiation. The absorption signal is detected and communicated to a system processor. The system processor analyzes the absorption signal data and determines the chemical components present in the liquid sample. Embodiments of the present disclosure describe both static and dynamic liquid samples. The liquid samples can be measured at the sample site.

公开(公告)号：US20180038800A1

公开(公告)日：2018-02-08

申请号：US15555620

申请日：2016-03-02

Applicant: Mecanique Analytique Inc.

Inventor： Yves Gamache

IPC: G01N21/67 ,  G01N21/01

CPC classification number: G01N21/67 ,  G01J3/443 ,  G01N21/01 ,  G01N2201/023

Abstract: A plasma-based detector using optical spectroscopic techniques for analysing the constituents of gas samples are provided. The detector includes a plasma-generating mechanism and a plasma-localizing mechanism. Electron-injecting electrodes may be provided in the plasma chamber of the detector. A Pressure control mechanism as well as a doping module may optionally be included. In accordance with some implementations, the collection, detection and analysis of light extracted from the plasma may enable one or more of various operation modes, such as an emission mode, an absorption mode, and indirect detection mode or a constant emission mode.