公开(公告)号：US20150192863A1

公开(公告)日：2015-07-09

申请号：US14661964

申请日：2015-03-18

申请人： NIKON CORPORATION

发明人： Yuichi SHIBAZAKI

IPC分类号： G03F7/20

CPC分类号： G03F7/70108 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  Y10T29/49004

摘要： An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four heads installed on the wafer stage on a scale plate which covers the movement range of the wafer stage except for the area right under a projection optical system. Placement distances of the heads here are each set to be larger than width of the opening of the scale plates, respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.

公开(公告)号：US20140354966A1

公开(公告)日：2014-12-04

申请号：US14459883

申请日：2014-08-14

申请人： NIKON CORPORATION

发明人： Yuichi SHIBAZAKI

IPC分类号： G03F7/20

CPC分类号： G03F7/70775 ,  G01B21/042 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/681 ,  Y10T29/49002

摘要： A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional information and positional information (p1, q1), (p2, q2), and (p3, q3) in a surface parallel to the XY plane of a head (an encoder) used for measurement of the positional information. Accordingly, it becomes possible to control the movement of the stage with good precision, while switching the head (the encoder) used for control during the movement of the stage using the encoder system which includes a plurality of heads.

摘要翻译： 控制器使用至少包括编码器系统的X编码器和Y编码器中的每一个的三个编码器来测量XY平面内的台的位置信息，并且基于测量结果，在XY平面中驱动该平台 在与用于测量位置信息的头（编码器）的XY平面平行的表面中的位置信息和位置信息（p1，q1），（p2，q2）和（p3，q3）。 因此，在使用包括多个头的编码器系统的台架移动期间切换用于控制的头（编码器）的同时，可以高精度地控制台的移动。

公开(公告)号：US20140247436A1

公开(公告)日：2014-09-04

申请号：US14273887

申请日：2014-05-09

申请人： NIKON CORPORATION

发明人： Yuichi SHIBAZAKI

IPC分类号： G03F7/20

CPC分类号： G03F9/7003 ,  G01B9/02 ,  G01B11/14 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7088 ,  Y10T29/49002

摘要： An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.

摘要翻译： 曝光装置配备有微动平台，当舞台位于与投影光学系统的出射表面相对的位置时，能够保持液体的投影光学系统，以及在预定距离内 微动阶段用投影光学系统保持液体的微细运动阶段，并且在保持接近状态的同时与微动载台一起移动，然后在运动之后用投影光学系统保持液体。 因此，可以互换地在投影光学系统的正下方放置多个级，这可以抑制曝光装置的占地面积的增加。

公开(公告)号：US08810774B2

公开(公告)日：2014-08-19

申请号：US13178995

申请日：2011-07-08

申请人： Toshiki Iwai ,  Ryo Sasaki

发明人： Toshiki Iwai ,  Ryo Sasaki

IPC分类号： G03B27/53 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03B27/53 ,  G03F9/7046 ,  G03F9/7088

摘要： The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

摘要翻译： 本发明提供了一种曝光装置，包括：获取单元，被配置为获得第一成像位置的数据，在该第一成像位置处，来自具有垂直于投影光学系统的光轴的第一方向的第一图案的光作为其纵向方向形成 通过投影光学系统的图像和第二成像位置的数据，在该第二成像位置处，来自具有与第一方向不平行且垂直于光轴的第二方向作为其纵向方向的第二图案的光形成图像 通过投影光学系统，当第一图案和第二图案分别放置在投影光学系统的物平面上时，以及控制单元，被配置为控制基板以使得基板位于基板的目标位置 光轴。

公开(公告)号：US08767183B2

公开(公告)日：2014-07-01

申请号：US12794192

申请日：2010-06-04

申请人： Arie Jeffrey Den Boef

发明人： Arie Jeffrey Den Boef

IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F9/7046 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

摘要： In order to improve overlay measurement, product marker gratings on a substrate are measured in a lithographic apparatus by an alignment sensor using scatterometry. Then information relating to the transverse profile of the product marker grating, such as its asymmetry, is determined from the measurement. After printing an overlay marker grating on a resist film, the lateral overlay of the overlay marker grating with respect to the product marker grating is measured by scatterometry and using the determined asymmetry information in combination with a suitable process model. The alignment sensor data may be used to first reconstruct the product grating and this information is fed forward to the scatterometer that measures the stack of product and resist grating and light scattered by the stack is used for reconstruction of a model of the stack to calculate overlay. The overlay may then, optionally, be fed back to the lithographic apparatus for correction of overlay errors.

摘要翻译： 为了改善覆盖测量，通过使用散射测量的对准传感器在光刻设备中测量衬底上的产品标记光栅。 然后，从测量确定与产品标记光栅的横向轮廓相关的信息，例如其不对称性。 在抗蚀剂膜上印刷覆盖标记光栅之后，通过散射法测量覆盖标记光栅相对于产品标记光栅的横向覆盖，并且使用所确定的不对称信息与合适的工艺模型相结合。 对准传感器数据可以用于首先重建产品光栅，并且将该信息向前馈送到测量产品堆叠并抵抗光栅的散射仪，并且由堆叠散射的光用于重建堆叠的模型以计算叠加 。 然后，覆盖层可以可选地被反馈到光刻设备以校正重叠误差。

公开(公告)号：US08760629B2

公开(公告)日：2014-06-24

申请号：US12640299

申请日：2009-12-17

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03F9/7003 ,  G01B9/02 ,  G01B11/14 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7088 ,  Y10T29/49002

摘要： An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.

摘要翻译： 曝光装置配备有微动平台，当舞台位于与投影光学系统的出射表面相对的位置时，能够保持液体的投影光学系统，以及在预定距离内 微动阶段用投影光学系统保持液体的微细运动阶段，并且在保持接近状态的同时与微动载台一起移动，然后在运动之后用投影光学系统保持液体。 因此，可以互换地在投影光学系统的正下方放置多个级，这可以抑制曝光装置的占地面积的增加。

公开(公告)号：US08364437B2

公开(公告)日：2013-01-29

申请号：US12649477

申请日：2009-12-30

申请人： Hiroyuki Morinaga ,  Kazutaka Ishigo ,  Takaki Kumanomido

发明人： Hiroyuki Morinaga ,  Kazutaka Ishigo ,  Takaki Kumanomido

IPC分类号： G01C9/00 ,  G01C17/00 ,  G01C19/00

CPC分类号： G03F9/7046

摘要： A method of inspecting a mark arrangement according to an embodiment of the present invention includes: generating mask data in which mark seed data that includes an inspection mark that includes vector information and is not drawn on a mask and mark data is arranged on a scribe line of the mask, calculating coordinates of the inspection mark from a reference position of the mark seed data, detecting an arrangement state of the inspection mark with respect to the reference position by using the coordinates and vector information, and judging whether the mark seed data is correctly arranged by comparing the arrangement state of the inspection mark with an arrangement check rule.

摘要翻译： 根据本发明的实施例的检查标记装置的方法包括：生成掩码数据，其中包括包括矢量信息的检查标记的标记种子数据并且未绘制在掩码上并且标记数据被布置在划线 从所述标记种子数据的参考位置计算所述检查标记的坐标，使用所述坐标和向量信息检测所述检查标记相对于所述参考位置的布置状态，并且判断所述标记种子数据是否为 通过比较检查标记的布置状态和布置检查规则来正确布置。

公开(公告)号：US08107052B2

公开(公告)日：2012-01-31

申请号：US12198179

申请日：2008-08-26

申请人： Yuji Kosugi

发明人： Yuji Kosugi

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70725 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7046 ,  G03F9/7084

摘要： An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by the stage, a controller configured to define an arrangement of measurement points with respect to each of a plurality of shot regions arranged along a straight line, and to cause the measuring device to sequentially measure positions of the surface with respect to the defined measurement points in the plurality of shot regions while causing the stage to move to scan the substrate along the straight line. The controller is configured to define the arrangement such that the plurality of shot regions have the arrangement in common with each other.

摘要翻译： 曝光装置被配置为在扫描基板的同时使基板曝光。 该装置包括：被配置为保持基板并移动的台架，被配置成测量由载物台保持的基板的表面的位置的测量装置;被配置为定义相对于多个测量点中的每一个的测量点的布置的控制器 沿着直线布置的射出区域，并且使得测量装置在使所述载物台移动以沿着所述直线扫描所述基板时，相对于所述多个拍摄区域中的所述确定的测量点依次测量所述表面的位置。 控制器被配置为限定布置，使得多个射击区域具有彼此共同的布置。

公开(公告)号：US20120019795A1

公开(公告)日：2012-01-26

申请号：US13174013

申请日：2011-06-30

申请人： Sytse POSTMA ,  Marcus Adrianus Van De Kerkhof ,  Bearrach Moest ,  Vasco Miguel Matias Serrao

发明人： Sytse POSTMA ,  Marcus Adrianus Van De Kerkhof ,  Bearrach Moest ,  Vasco Miguel Matias Serrao

IPC分类号： G03B27/54

CPC分类号： G03F9/7088 ,  G03F9/7046

摘要： Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.

摘要翻译： 公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。 该方法涉及所述图案形成装置和所述基板的对准，并且包括将辐射束施加到所述图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所述得到的空间图像的目标体积根据扫描方案扫描图像传感器，所述图像传感器和所述基板的相对位置是已知的或随后确定的; 并且测量所述图像的特征，从而确定所述对准结构相对于所述图像传感器的位置; 其中使用替代扫描方案，其中例如执行通过整个目标体积的两次或多次扫描，其具有与常规单次连续扫描相同的总持续时间。

公开(公告)号：US20110242509A1

公开(公告)日：2011-10-06

申请号：US13156993

申请日：2011-06-09

申请人： Satoru OISHI

发明人： Satoru OISHI

IPC分类号： G03B27/52 ,  G01B11/14

CPC分类号： G03F9/7046 ,  G03F9/7092 ,  H01L21/681 ,  H01L21/682

摘要： A method detects a position of a mark based on an image signal of the mark. The method includes steps of obtaining a first position of the mark by performing a first process for the image signal, extracting plural feature values from the image signal based on the first position, and detecting the position of the mark by obtaining an offset value for the first position based on the plural feature values.

摘要翻译： 方法基于标记的图像信号来检测标记的位置。 该方法包括以下步骤：通过对图像信号执行第一处理来获得标记的第一位置，基于第一位置从图像信号中提取多个特征值，以及通过获得标记的偏移值来检测标记的位置 基于多个特征值的第一位置。