公开(公告)号：US08810774B2

公开(公告)日：2014-08-19

申请号：US13178995

申请日：2011-07-08

申请人： Toshiki Iwai ,  Ryo Sasaki

发明人： Toshiki Iwai ,  Ryo Sasaki

IPC分类号： G03B27/53 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03B27/53 ,  G03F9/7046 ,  G03F9/7088

摘要： The present invention provides an exposure apparatus including an obtaining unit configured to obtain data of a first imaging position at which light from a first pattern having, as a longitudinal direction thereof, a first direction perpendicular to an optical axis of a projection optical system forms an image via the projection optical system, and data of a second imaging position at which light from a second pattern having, as a longitudinal direction thereof, a second direction which is not parallel to the first direction and is perpendicular to the optical axis forms an image via the projection optical system, when the first pattern and the second pattern are respectively placed on an object plane of the projection optical system, and a control unit configured to control a stage so that a substrate is positioned at a target position of the substrate along the optical axis.

摘要翻译： 本发明提供了一种曝光装置，包括：获取单元，被配置为获得第一成像位置的数据，在该第一成像位置处，来自具有垂直于投影光学系统的光轴的第一方向的第一图案的光作为其纵向方向形成 通过投影光学系统的图像和第二成像位置的数据，在该第二成像位置处，来自具有与第一方向不平行且垂直于光轴的第二方向作为其纵向方向的第二图案的光形成图像 通过投影光学系统，当第一图案和第二图案分别放置在投影光学系统的物平面上时，以及控制单元，被配置为控制基板以使得基板位于基板的目标位置 光轴。

公开(公告)号：US08593615B2

公开(公告)日：2013-11-26

申请号：US12840553

申请日：2010-07-21

申请人： Ryo Sasaki

发明人： Ryo Sasaki

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G01B9/02028 ,  G01B9/02022 ,  G01B9/0209 ,  G01B11/2441 ,  G01B2290/45 ,  G03B27/58 ,  G03F9/7034

摘要： The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide the measurement light and the reference light to the plurality of detection units, wherein the reference surface is placed such that differences are generated among optical path differences between measurement light beams and reference light beams which enter the plurality of detection units, respectively.

摘要翻译： 本发明提供了一种测量测试表面的高度的测量装置，该装置包括一个图像感测装置，该图像感测装置包括多个检测单元，该多个检测单元被配置为检测由来自测试表面的测量光形成的干扰光和来自参考表面的参考光， 以及光学系统，被配置为将测量光和参考光引导到所述多个检测单元，其中所述参考表面被放置成使得在测量光束和参考光束之间的光程差之间产生差异，所述参考光进入所述多个检测 单位。

公开(公告)号：US08233140B2

公开(公告)日：2012-07-31

申请号：US12239936

申请日：2008-09-29

申请人： Ryo Sasaki

发明人： Ryo Sasaki

IPC分类号： G03B27/52 ,  G03B27/68 ,  G01B11/02

CPC分类号： G01B11/2441 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7049

摘要： The present invention provides a measuring apparatus which measures a shape of a surface of a measurement target object, comprising a light projecting optical system configured to split light from a light source into measurement light and reference light so that the measurement light enters the surface of the measurement target object and the reference light enters a reference mirror, a light receiving optical system configured to guide the measurement light reflected by the surface of the measurement target object and the reference light reflected by the reference mirror to a photoelectric conversion device, and a processing unit configured to calculate the shape of the surface of the measurement target object based on an interference pattern which is detected by the photoelectric conversion device and formed by the measurement light and the reference light.

摘要翻译： 本发明提供了一种测量被测物体的表面形状的测量装置，包括：投影光学系统，被配置为将来自光源的光分离成测量光和参考光，使得测量光进入到 测量目标物体和参考光进入参考反射镜，光接收光学系统，被配置为将由测量对象物体的表面反射的测量光和由参考反射镜反射的参考光引导到光电转换装置，以及处理 单元，被配置为基于由光电转换装置检测并由测量光和参考光形成的干涉图案来计算测量对象物体的表面的形状。

公开(公告)号：US20100125432A1

公开(公告)日：2010-05-20

申请号：US12620280

申请日：2009-11-17

申请人： Ryo Sasaki

发明人： Ryo Sasaki

IPC分类号： G01B11/14 ,  G01B9/02 ,  G06F15/00

CPC分类号： G03F9/7049 ,  G03F9/7026

摘要： A measurement apparatus includes an interferometer, and a computer configured to calculate a phase distribution and an amplitude distribution by Fourier-transforming a first interference signal detected by the photoelectric conversion element of the interferometer, to correct the phase distribution using a correction-use phase difference distribution, to calculate a second interference signal by reverse-Fourier-transforming the phase distribution that has been corrected and the amplitude distribution, and to calculate the position of the target surface based on the second interference signal.

摘要翻译： 测量装置包括干涉仪和计算机，该计算机被配置为通过对由干涉仪的光电转换元件检测到的第一干涉信号进行傅里叶变换来计算相位分布和幅度分布，以使用校正用相位差校正相位分布 分配，以通过对已经被校正的相位分布进行反傅立叶变换和幅度分布来计算第二干扰信号，并且基于第二干扰信号来计算目标表面的位置。

公开(公告)号：US20090009738A1

公开(公告)日：2009-01-08

申请号：US11846996

申请日：2007-08-29

申请人： Ryo Sasaki

发明人： Ryo Sasaki

IPC分类号： G03B27/42 ,  G01B11/26

CPC分类号： G03F7/70725 ,  G03F7/70775 ,  G03F9/7026 ,  G03F9/7034

摘要： This invention discloses a wafer surface level detection method. The wafer surface level detection method includes a first level measurement step of measuring a level of a surface of a substrate having a plurality of shot regions; a position measurement step of measuring a position along the surface of the substrate; a first movement step of moving the substrate in at least a vertical direction on the basis of the measurement result obtained in the first level measurement step and the measurement result obtained in the position measurement step; and a second level measurement step of measuring the level of the surface of the substrate after the first movement step, wherein each of the plurality of shot regions has a measurement region, wherein in the first movement step, the substrate is moved such that a relative position of the measurement region of each of the plurality of shot regions and each of the plurality of shot regions along the surface is constant, and wherein in the second level measurement step, the measurement region of each of the plurality of shot regions is measured.

摘要翻译： 本发明公开了一种晶片表面水平检测方法。 晶片表面水平检测方法包括测量具有多个照射区域的基板的表面的水平的第一电平测量步骤; 位置测量步骤，测量沿衬底表面的位置; 基于在第一电平测量步骤中获得的测量结果和在位置测量步骤中获得的测量结果，在至少垂直方向上移动衬底的第一移动步骤; 以及第二电平测量步骤，用于测量在所述第一移动步骤之后的所述衬底的表面的水平，其中所述多个照射区域中的每一个具有测量区域，其中在所述第一移动步骤中，所述衬底被移动， 多个照射区域中的每一个的测量区域和沿着表面的多个照射区域中的每一个的位置是恒定的，并且其中在第二电平测量步骤中，测量多个照射区域中的每一个的测量区域。

公开(公告)号：USD546289S1

公开(公告)日：2007-07-10

申请号：US29252363

申请日：2006-01-19

申请人： Ryo Sasaki

设计人： Ryo Sasaki

公开(公告)号：US20070147343A1

公开(公告)日：2007-06-28

申请号：US10579677

申请日：2004-11-19

申请人： Ryo Sasaki ,  Yukari Kondou ,  Keizo Ikeda ,  Shinji Usuba

发明人： Ryo Sasaki ,  Yukari Kondou ,  Keizo Ikeda ,  Shinji Usuba

IPC分类号： H04L12/66 ,  H04L12/56

CPC分类号： H04M7/006

摘要： In a voice communication system for transferring voice information stored in a protocol data unit under a predetermined communication protocol over a network under the protocol, end voice terminals for transferring and receiving the voice information in the protocol data unit, and a management server for managing said end voice terminal are provided. The management server includes a manager for storing subscriber information indicative of whether or not the end voice terminals are provided with the capability of predetermined broadband voice communication. A user is informed, at the latest before the user initiates a call from the end voice terminal, of whether or not a telephone set of a called party is provided with the capability of the broadband voice communication through the end voice terminal based on the subscriber information. running in a network under a predetermined communication. This increases the satisfaction of the user and allows a business model justifying charging customers to be built.

摘要翻译： 在用于通过协议的网络上以预定的通信协议传送存储在协议数据单元中的语音信息的语音通信系统中，用于在协议数据单元中传送和接收语音信息的终端语音终端，以及用于管理所述 提供终端语音终端。 管理服务器包括用于存储指示终端语音终端是否具有预定宽带语音通信能力的用户信息的管理器。 在用户从终端语音终端发起呼叫之前，最终通知用户通过终端语音终端基于该用户是否向被叫方的电话机提供宽带语音通信的能力 信息。 在预定通信下在网络中运行。 这增加了用户的满意度，并允许商业模式证明为客户建立收费。

公开(公告)号：US08902430B2

公开(公告)日：2014-12-02

申请号：US13007006

申请日：2011-01-14

申请人： Wataru Yamaguchi ,  Ryo Sasaki ,  Takahiro Matsumoto

发明人： Wataru Yamaguchi ,  Ryo Sasaki ,  Takahiro Matsumoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02044 ,  G01B9/02022 ,  G01B9/0209 ,  G01B2290/35 ,  G01B2290/70

摘要： An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted.

摘要翻译： 一种设备，包括：将从光源发射的光分成参考光和被摄体光的系统，使被摄体光进入物体，并将由物体反射的被摄体光与参考光组合;检测单元， 以检测组合的对象和参考光之间的相干光，设置在参考光或被摄体光的光路内的元件，被配置为改变参考光和被摄体光之间的路径长度差，以及相对于第 参考光和被摄体光在检测单元的光接收表面中;以及位置可变机构，被配置为使得光学元件的位置可变，其中，通过改变元件的位置，光程长度差 并且相对位置被独立调整。

公开(公告)号：US20110176139A1

公开(公告)日：2011-07-21

申请号：US13007006

申请日：2011-01-14

申请人： Wataru Yamaguchi ,  Ryo Sasaki ,  Takahiro Matsumoto

发明人： Wataru Yamaguchi ,  Ryo Sasaki ,  Takahiro Matsumoto

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/02044 ,  G01B9/02022 ,  G01B9/0209 ,  G01B2290/35 ,  G01B2290/70

摘要： An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted.

摘要翻译： 一种设备，包括：将从光源发射的光分成参考光和被摄体光的系统，使被摄体光进入物体，并将由物体反射的被摄体光与参考光组合;检测单元， 以检测组合的对象和参考光之间的相干光，设置在参考光或被摄体光的光路内的元件，被配置为改变参考光和被摄体光之间的路径长度差，以及相对于第 参考光和被摄体光在检测单元的光接收表面中;以及位置可变机构，被配置为使得光学元件的位置可变，其中，通过改变元件的位置，光程长度差 并且相对位置被独立调整。

公开(公告)号：US20110032504A1

公开(公告)日：2011-02-10

申请号：US12840553

申请日：2010-07-21

申请人： Ryo Sasaki

发明人： Ryo Sasaki

IPC分类号： G03B27/58 ,  G01B11/02

CPC分类号： G01B9/02028 ,  G01B9/02022 ,  G01B9/0209 ,  G01B11/2441 ,  G01B2290/45 ,  G03B27/58 ,  G03F9/7034

摘要： The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an optical system configured to guide the measurement light and the reference light to the plurality of detection units, wherein the reference surface is placed such that differences are generated among optical path differences between measurement light beams and reference light beams which enter the plurality of detection units, respectively.

摘要翻译： 本发明提供了一种测量测试表面的高度的测量装置，该装置包括一个图像感测装置，该图像感测装置包括多个检测单元，该多个检测单元被配置为检测由来自测试表面的测量光形成的干扰光和来自参考表面的参考光， 以及光学系统，被配置为将测量光和参考光引导到所述多个检测单元，其中所述参考表面被放置成使得在测量光束和参考光束之间的光程差之间产生差异，所述参考光进入所述多个检测 单位。